CN-113050372-B - Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device

Abstract

The invention relates to a photosensitive resin composition for black resist, a light shielding film, a color filter, a touch panel and a display device. The invention provides a photosensitive resin composition for black resist, which has high light-shielding property and low reflectivity and can inhibit the generation of aggregates. The photosensitive resin composition for black resist comprises (A) a photosensitive resin containing an unsaturated group, (B) a photopolymerizable monomer having at least 2 or more unsaturated bonds, (C) a photopolymerization initiator, (D) at least 1 light-shielding component selected from black pigments, color-mixed pigments and light-shielding materials, (E) silicon oxide particles, and (F) a solvent.

Inventors

• UCHIDA KAZUYUKI
• Ogawa Chunye

Assignees

• 日铁化学材料株式会社

Dates

Publication Date

20260512

Application Date

20201225

Priority Date

20191226

Claims (7)

1. 1. A photosensitive resin composition for a black resist, comprising the following components as essential components: (A) An unsaturated group-containing photosensitive resin, (B) A photopolymerizable monomer having at least 2 or more unsaturated bonds, (C) A photopolymerization initiator, (D) At least 1 light-shielding component selected from black pigment and mixed color pigment, (E) Silica particles (F) A solvent; the solvent (F) includes a1 st solvent which is propylene glycol monomethyl ether acetate, and a2 nd solvent having a relative dielectric constant of 10 to 30 at 23 ℃; The 2 nd solvent is ethyl lactate or 3-methoxy-3-methyl butanol; The content of the aforementioned 2 nd solvent is 25 to 50 mass% relative to the total mass of the aforementioned (F) solvent; the relative dielectric constant of the solvent (F) as a whole at 23 ℃ is 8.5 or more.
2. 2. A photosensitive resin composition for a black resist, comprising the following components as essential components: (A) An unsaturated group-containing photosensitive resin, (B) A photopolymerizable monomer having at least 2 or more unsaturated bonds, (C) A photopolymerization initiator, (D) At least 1 light-shielding component selected from black pigment and mixed color pigment, (E) Silica particles (F) A solvent; The aforementioned (F) solvent comprises a1 st solvent which is propylene glycol monomethyl ether acetate, a2 nd solvent having a relative dielectric constant of 10 to 30 at 23 ℃, and a3 rd solvent having a boiling point of 150 to 350 ℃ at normal pressure; The 2 nd solvent is ethyl lactate or 3-methoxy-3-methyl butanol; the content of the aforementioned 2 nd solvent is 20 to 50 mass% relative to the total mass of the aforementioned (F) solvent; The 3 rd solvent is diethylene glycol ethyl methyl ether or diethylene glycol dibutyl ether; the relative dielectric constant of the solvent (F) as a whole at 23 ℃ is 8.5 or more.
3. 3. The photosensitive resin composition for a black resist according to claim 1 or 2, wherein the unsaturated group-containing photosensitive resin (a) is obtained by reacting a reactant of an epoxide having 2 glycidyl ether groups derived from bisphenol and (meth) acrylic acid represented by the general formula (1) with a polycarboxylic acid or an anhydride thereof; In the general formula (1), R 1 、R 2 、R 3 and R 4 are each independently any one of a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogen atom, X is a fluorene-9, 9-diyl group or a single bond represented by the general formula (2) -CO-、-SO 2 -、-C(CF 3 ) 2 -、-Si(CH 3 ) 2 -、-CH 2 -、-C(CH 3 ) 2 -、-O-、, and l is an integer of 0 to 10; 。
4. 4. A light-shielding film obtained by curing the photosensitive resin composition for a black resist according to any one of claims 1 to 3.
5. 5. A color filter having the light-shielding film according to claim 4 as a black matrix.
6. 6. A touch panel having the light shielding film according to claim 4 as a black matrix.
7. 7. A display device having the color filter of claim 5 or the touch panel of claim 6.

Description

Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device Technical Field The invention relates to a photosensitive resin composition for black resist, a light shielding film formed by curing the photosensitive resin composition, a color filter and a touch panel with the light shielding film, and a display device with the color filter and the touch panel. Background In recent years, mobile terminals have been actively developed, and display devices such as touch panels and liquid crystal panels used outdoors or in vehicles have been increased. In the display device, a light shielding film is provided on the outer frame of the touch panel in order to shield light leakage from the peripheral portion of the back liquid crystal panel, and a black matrix is provided on the liquid crystal panel in order to suppress light leakage from the screen when black is displayed and to suppress color mixing between adjacent color resists (color resists). In a display device or the like, in order to suppress light leakage or the like and to improve the screen visibility of the display device or the like, there is a case where the concentration of a black pigment in a light shielding film is increased to increase the light shielding property of the light shielding film (to reduce the light transmittance of the light shielding film). Since the refractive index of the black pigment is higher than that of the transparent substrate or the curable resin, there is a concern that the refractive index may be increased when the concentration of the black pigment in the light shielding film is increased, as viewed from the side opposite to the side of the transparent substrate on which the light shielding film is formed. Therefore, there are problems such as increased reflection at the interface between the light shielding film formed on the transparent substrate and the transparent substrate, and further, a sharp boundary between the black matrix and the light shielding film due to the difference in reflectance between the light shielding film and the colored portion of the color filter. Accordingly, a photosensitive resin composition for a black resist having both high light-shielding properties and low reflectance, a light-shielding film obtained by curing the composition, and a color filter are desired. For example, patent document 1 discloses a black photosensitive resin composition containing hydrophobic silica particles and a specific dispersant (urethane-based dispersant). According to patent document 1, a black matrix having both high light-shielding properties and low reflectance can be formed by using hydrophobic silica particles and a specific dispersant. [ Prior Art literature ] [ Patent literature ] Patent document 1 japanese patent application laid-open No. 2015-161815. Disclosure of Invention [ Problem to be solved by the invention ] However, the inventors of the present application have studied and found that the black photosensitive resin composition described in patent document 1 cannot provide a light shielding film having both desired light shielding properties and reflectance. In the black photosensitive resin composition described in patent document 1, aggregates derived from the silica particles are generated, which may cause light leakage in the thick line portion and the outer frame portion and foreign matter in the opening portion. Accordingly, the present inventors have studied in order to solve the problems of the conventional photosensitive resin composition, and as a result, have found that silica particles have a characteristic of being easily aggregated by silanol groups present on the particle surface, and generally, can be dispersed in an organic solvent by coating with a silane coupling agent. However, it is not easy to coat all silanol groups present on the surface with a silane coupling agent, and when the resin composition is mixed with a different polarity, the dispersion state becomes unstable, and aggregation tends to occur. It was found that by mixing a polar solvent having a high relative dielectric constant as a resist solvent in an appropriate range, silanol groups on the surfaces of silicon oxide particles are stabilized by a solvation action (solvation), and aggregation of the silicon oxide particles can be suppressed. The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a photosensitive resin composition for a black resist, which has high light-shielding properties and low reflectance and can suppress the occurrence of aggregates, a light-shielding film obtained by curing the photosensitive resin composition, a color filter and a touch panel each having the light-shielding film, and a display device having the color filter and the touch panel. [ Means for solving the problems ] The photosensitive resin composition for a black resist comprises, as essen