CN-113889589-B - Display device and method for manufacturing the same

Abstract

A display device and a method for manufacturing the same are provided. A method for manufacturing a display device includes forming a first hole extending into a substrate by a first wet etching process using a first etchant and forming a second hole extending further into the substrate from the first hole by a second wet etching process using a second etchant. The second etchant has a pH different from the pH of the first etchant.

Inventors

• LI ZAIBIN
• Yan Enjing
• An Yijun
• JIN SHENGXUN

Assignees

• 三星显示有限公司

Dates

Publication Date

20260505

Application Date

20210630

Priority Date

20200702

Claims (20)

1. 1. A method for manufacturing a display device, the method comprising: Forming a first hole extending from a first surface of a substrate into the substrate by a first wet etching process using a first etchant, and Forming a second hole extending further into the substrate from the first hole by a second wet etching process using a second etchant, wherein the second etchant has a pH different from the pH of the first etchant, Wherein the method further comprises forming an etch stop layer on a second surface of the substrate opposite the first surface, Wherein a surface of the etch stop layer contacts the substrate and the etch stop layer overlaps the first and second holes.
2. 2. The method of claim 1, wherein the first and second holes penetrate the substrate and the surface of the etch stop layer is exposed by the second hole.
3. 3. The method of claim 1, further comprising: forming a filling metal filling the interiors of the first hole and the second hole.
4. 4. The method of claim 1, further comprising: the substrate is irradiated with a laser before the first hole is formed in the substrate.
5. 5. The method of claim 1, wherein the pH of the first etchant is alkaline and the pH of the second etchant is acidic.
6. 6. The method of claim 5, wherein the first etchant comprises potassium hydroxide and the second etchant comprises hydrofluoric acid.
7. 7. The method of claim 5, wherein the etch stop layer comprises an organic material.
8. 8. The method of claim 5, further comprising: A third hole extending further into the substrate from the second hole is formed by a third wet etching process using a third etchant having an alkaline pH.
9. 9. The method of claim 8, wherein the third etchant is the same as the first etchant.
10. 10. The method of claim 8, wherein the first, second, and third holes together penetrate the substrate and the surface of the etch stop layer is exposed by the third hole.
11. 11. The method of claim 8, wherein the etch stop layer comprises one of a metal and an inorganic material.
12. 12. A method for manufacturing a display device, the method comprising: Forming a first hole extending into the substrate from a first surface of the substrate by a first wet etching process using a first etchant; forming a second hole extending further into the substrate from the first hole by a second wet etching process using a second etchant, wherein the pH of the first etchant is less than 7 and the pH of the second etchant is greater than 7, and A third hole extending further into the substrate from the second hole is formed by a third wet etching process using a third etchant having an acidic pH.
13. 13. The method of claim 12, wherein the second etchant comprises potassium hydroxide and the first etchant comprises hydrofluoric acid.
14. 14. The method of claim 12, further comprising forming an etch stop layer on a second surface of the substrate opposite the first surface, wherein the etch stop layer overlaps the first, second, and third holes, Wherein the etch stop layer comprises one of a metal and an inorganic material.
15. 15. The method of claim 12, wherein the third etchant is the same as the first etchant.
16. 16. The method of claim 14, wherein the first, second, and third holes together penetrate the substrate and the surface of the etch stop layer is exposed by the third hole.
17. 17. The method of claim 14, wherein the etch stop layer comprises an organic material.
18. 18. A display device, comprising: a substrate including a hole penetrating the substrate, and A filling metal disposed on the first surface of the substrate and filling the inside of the hole, Wherein the holes comprise a first hole and a second hole, and Wherein a first taper angle formed by an upper surface of the first hole and a side surface of the first hole and a second taper angle formed by a plane parallel to the first surface of the substrate and a side surface of the second hole are different from each other, Wherein, the display device further includes: an etch stop layer disposed on a second surface of the substrate opposite the first surface and overlapping the aperture.
19. 19. The display device according to claim 18, further comprising: a display panel disposed on the second surface of the substrate opposite to the first surface, Wherein the filler metal is electrically connected to the display panel.
20. 20. A display device, comprising: a substrate including a hole penetrating the substrate, and A filling metal disposed on the first surface of the substrate and filling the inside of the hole, Wherein the holes comprise a first hole and a second hole, and Wherein a first taper angle formed by an upper surface of the first hole and a side surface of the first hole and a second taper angle formed by a plane parallel to the first surface of the substrate and a side surface of the second hole are different from each other, Wherein the hole further comprises a third hole connected to the second hole, wherein the third hole extends further from the second hole into the substrate.

Description

Display device and method for manufacturing the same Technical Field Exemplary embodiments of the present disclosure relate generally to a display device and a method for manufacturing the display device. Background The display device is generally divided into a display area and a non-display area surrounding the display area. The display device includes a substrate overlapping a display region and a non-display region, a display panel disposed on a surface of the substrate and overlapping the display region, and a driver disposed on the surface of the substrate and overlapping the non-display region. The driver supplies a signal or voltage to the display panel, and the display panel displays an image. The non-display area is typically the bezel of the display device. Disclosure of Invention Some embodiments provide a method for manufacturing a display device having a reduced bezel. Some embodiments provide a display device manufactured using the method. A method for manufacturing a display device includes forming a first hole extending into a substrate by a first wet etching process using a first etchant and forming a second hole extending further from the first hole into the substrate by a second wet etching process using a second etchant, wherein the second etchant has a pH different from a pH of the first etchant. According to an embodiment, the method may further include forming an etch stop layer on the substrate, wherein a surface of the etch stop layer contacts the substrate. According to an embodiment, the first hole and the second hole penetrate the substrate, and a surface of the etch stop layer is exposed by the second hole. According to an embodiment, the method may further include forming a filler metal filling the interiors of the first and second holes. According to an embodiment, the method may further comprise irradiating the substrate with a laser before forming the first hole exposing the interior of the substrate. According to an embodiment, the pH of the first etchant may be alkaline and the pH of the second etchant may be acidic. According to an embodiment, the first etchant may include potassium hydroxide, and the second etchant may include hydrofluoric acid. According to an embodiment, the etch stop layer may comprise an organic material. According to an embodiment, the method may further include forming a third hole extending further into the substrate from the second hole by a third wet etching process using a third etchant, the third etchant having an alkaline pH. According to an embodiment, the third etchant may be the same as the first etchant. According to an embodiment, the first hole, the second hole, and the third hole may penetrate the substrate together, and a surface of the etch stop layer may be exposed by the third hole. According to an embodiment, the etch stop layer may include one of a metal and an inorganic material. According to an embodiment, the pH of the first etchant may be acidic and the pH of the second etchant may be alkaline. According to an embodiment, the second etchant comprises potassium hydroxide and the first etchant comprises hydrofluoric acid. According to an embodiment, the etch stop layer may include one of a metal and an inorganic material. According to an embodiment, the method may further include forming a third hole extending further into the substrate from the second hole by a third wet etching process using a third etchant, the third etchant having an acidic pH. According to an embodiment, the etch stop layer may comprise an organic material. The display device according to an embodiment includes a substrate including a hole penetrating the substrate, and a filling metal disposed on a first surface of the substrate and filling an inside of the hole. The holes may include a first hole and a second hole, and a first taper angle formed by an upper surface of the first hole and a side surface of the first hole and a second taper angle formed by a plane parallel to the first surface of the substrate and a side surface of the second hole may be different from each other. According to an embodiment, the display device may further include an etch stop layer disposed on a second surface of the substrate opposite the first surface and overlapping the hole. According to an embodiment, the display device may further include a display panel disposed on a second surface of the substrate opposite to the first surface. The filler metal may be electrically connected to the display panel. According to an embodiment, the holes may further comprise a third hole connected to the second hole, wherein the third hole extends further from the second hole into the substrate. A method for manufacturing a display device includes irradiating a substrate with laser light, forming an etch stop layer on the substrate, wherein a surface of the etch stop layer contacts the substrate, and forming a hole in the substrate at a point irradiated by the laser light in the substra