CN-114613656-B - Method for manufacturing showerhead, and plasma processing apparatus

Abstract

The invention provides a method for manufacturing a shower head, a shower head and a plasma processing device, wherein cracks generated around a sleeve can be restrained during high-temperature use. A method for manufacturing a showerhead for ejecting a process gas for generating plasma into a plasma generation space in a chamber in which a substrate is disposed and the plasma is generated in a plasma processing apparatus for performing a process for generating plasma on the substrate, the method comprising a step of preparing a metal substrate having a portion having a gas ejection hole and a sleeve mounting hole in a main body portion, a step of mounting a sleeve to the sleeve having the gas ejection hole in the sleeve, a step of HIPing the substrate and the sleeve, and a step of joining the sleeve HIP to the substrate, and a step of forming a ceramic spray film on a surface of the substrate on the chamber side and a surface of the sleeve on the chamber side.

Inventors

• SASAKI YOSHIHIKO
• NAN YAREN

Assignees

• 东京毅力科创株式会社
• 东京毅力科创株式会社

Dates

Publication Date

20260421

Application Date

20211126

Priority Date

20201209

Claims (14)

1. 1. A method for manufacturing a showerhead for ejecting a process gas for generating a plasma into a plasma generation space in a chamber in which the substrate is disposed and the plasma is generated in a plasma processing apparatus for performing a process using the plasma on the substrate, The shower head includes a main body having a plurality of gas discharge holes for discharging the process gas, and a gas diffusion space provided in the main body and into which the process gas is introduced and which communicates with the gas discharge holes, The manufacturing method of the spray header comprises the following steps: A step of preparing a metal base material which constitutes a portion of the main body portion having the gas ejection holes and has a plurality of sleeve mounting holes; A step of attaching a sleeve to each of the sleeve attachment holes of the base material, the sleeve having the gas ejection hole therein; HIP-treating the base material and the sleeve, HIP-bonding the sleeve to the base material, and A step of forming a ceramic spray film on a surface of the base material on the plasma generation space side and a surface of the sleeve on the plasma generation space side, The method for manufacturing a showerhead further includes a step of performing polishing or grinding to flush a surface of the base material on the plasma generation space side with a surface of the sleeve on the plasma generation space side after HIP bonding the sleeve to the base material and before forming the sprayed film, The method for manufacturing the showerhead further comprises a step of forming a ceramic spray film on the surface of the base material on the gas diffusion space side and the surface of the sleeve on the gas diffusion space side, The method for manufacturing a showerhead further includes a step of performing polishing or grinding to flush the surface of the base material on the gas diffusion space side with the surface of the sleeve on the gas diffusion space side after the HIP bonding of the sleeve to the base material and before the step of forming a sprayed film on the surface of the base material on the gas diffusion space side with the surface of the sleeve on the gas diffusion space side.
2. 2. The method of manufacturing a showerhead of claim 1, wherein, The substrate is made of an aluminum material, and the HIP treatment is performed at a temperature of 300-550 ℃.
3. 3. The method of manufacturing a showerhead according to claim 2, The HIP treatment is performed at a temperature of 400 ℃ to 450 ℃.
4. 4. The method for manufacturing a showerhead according to any one of claims 1 to 3, The sleeve is constructed of a corrosion resistant metallic material.
5. 5. The method of manufacturing a showerhead as claimed in claim 4, wherein, The step of forming the sprayed film on the surface of the plasma generating space is performed in a state in which the substrate is heated to a temperature of 150 ℃ to 250 ℃.
6. 6. The method for manufacturing a showerhead according to any one of claims 1 to 3, The sleeve is composed of ceramic.
7. 7. The method for manufacturing a showerhead according to any one of claims 1 to 3, The thermal spraying film formed on the plasma generating space side contains yttrium oxide.
8. 8. The method for manufacturing a showerhead according to any one of claims 1 to 3, The plate-shaped gas ejection portion of the main body portion having the base material and a plurality of sleeves having the gas ejection holes is coupled to the base portion having the concave portion so as to cover the concave portion, and a space formed by the concave portion and the gas ejection portion becomes the gas diffusion space.
9. 9. A showerhead for ejecting a process gas for generating plasma into a plasma generation space in a chamber in which a substrate is disposed and which generates plasma in a plasma processing apparatus for performing a process using plasma on the substrate, The shower head has: A main body part having a plurality of gas ejection holes for ejecting the process gas, and A gas diffusion space provided in the main body, into which the process gas is introduced and which communicates with the gas discharge holes, The portion of the main body portion having the gas ejection hole has: a base material composed of a metal; A sleeve mounted on the base material and having the gas ejection holes therein, and A ceramic sprayed film formed on a surface of the base material on the plasma generation space side and a surface of the sleeve on the plasma generation space side, The sleeve HIP is bonded to the substrate, For the substrate and the sleeve subjected to HIP bonding, the surface on the plasma generation space side of the substrate and the surface on the plasma generation space side of the sleeve are flush, the surface on the gas diffusion space side of the substrate and the surface on the gas diffusion space side of the sleeve are flush, The showerhead further includes another spray coating film made of ceramic formed on the surface of the base material on the gas diffusion space side and the surface of the sleeve on the gas diffusion space side.
10. 10. The showerhead of claim 9, wherein, The base material is composed of an aluminum material.
11. 11. The showerhead of claim 9 or 10, wherein, The sleeve is composed of a corrosion resistant metallic material or ceramic.
12. 12. The showerhead of claim 9 or 10, wherein, The sprayed film contains yttrium oxide.
13. 13. A plasma processing apparatus for processing a substrate by using plasma, wherein, The plasma processing apparatus includes: a chamber accommodating the substrate; A mounting table for mounting a substrate in the chamber; a plasma generating mechanism for generating the plasma in the chamber, and The showerhead according to any one of claims 9 to 12, which is provided in the chamber so as to face the stage, and supplies a process gas for generating the plasma to a plasma generation space in the chamber.
14. 14. The plasma processing apparatus according to claim 13, wherein, The plasma generating means is configured to have a high-frequency antenna and a high-frequency power supply for supplying high-frequency power to the high-frequency antenna, and to form inductively coupled plasma in the plasma generating space in the chamber by supplying high-frequency power to the high-frequency antenna, The high-frequency antenna is provided to face a face of the showerhead on a side opposite to the plasma generation space, The showerhead is disposed as a ceiling wall of the chamber, functions as a metal window of the inductively coupled plasma, and has a structure divided into a plurality of parts by an insulating member so that a magnetic field and an eddy current generated by a high-frequency current flowing to the high-frequency antenna reach the plasma generation space side.

Description

Method for manufacturing showerhead, and plasma processing apparatus Technical Field The present disclosure relates to a method for manufacturing a showerhead, and a plasma processing apparatus. Background In the manufacturing process of a Flat Panel Display (FPD), electrodes, wirings, and the like are formed by performing a plasma process such as plasma etching on a predetermined film formed on a glass substrate as a subject to be processed. In a plasma processing apparatus that performs such plasma processing, a processing gas is ejected from a showerhead disposed above a stage in a state where a substrate is disposed on the stage disposed in a chamber, into the chamber, and plasma is generated in the chamber. The showerhead is formed of a metal such as aluminum and is exposed to a process gas and plasma, and various techniques for suppressing the showerhead corrosion have been proposed. For example, patent document 1 proposes a technique in which a recess is formed on the outlet side of a gas discharge hole of a substrate provided in a showerhead, a cylindrical sleeve is fixed to the recess, and a plasma-resistant coating film is formed to cover the surface of the substrate on the plasma generation space side. Prior art literature Patent literature Patent document 1 Japanese patent application laid-open No. 2017-22356 Disclosure of Invention Problems to be solved by the invention The present disclosure provides a method of manufacturing a showerhead, and a plasma processing apparatus capable of suppressing occurrence of cracks around a sleeve when used at high temperature. Solution for solving the problem A method for manufacturing a showerhead according to an aspect of the present disclosure is a method for manufacturing a showerhead for ejecting a process gas for generating a plasma into a plasma generation space in a chamber in which the plasma is generated by applying a process to a substrate, the showerhead including a main body portion having a plurality of gas ejection holes for ejecting the process gas, and a gas diffusion space provided in the main body portion, into which the process gas is introduced and which communicates with the gas ejection holes, the method including a step of preparing a metal substrate that forms a portion of the main body portion having the gas ejection holes and has a plurality of sleeve attachment holes, a step of attaching a sleeve to each of the sleeve attachment holes of the substrate, the sleeve having the gas ejection holes inside the sleeve, a step of HIP-bonding the substrate and the sleeve to the substrate, and a step of forming a ceramic coating film on a surface of the substrate on the plasma generation space side and a surface of the sleeve on the plasma generation space side. ADVANTAGEOUS EFFECTS OF INVENTION According to the present disclosure, a method of manufacturing a showerhead, and a plasma processing apparatus are provided that can suppress occurrence of cracks around a sleeve when used at high temperatures. Drawings Fig. 1 is a cross-sectional view showing a plasma processing apparatus according to embodiment 1. Fig. 2 is a view showing a part of a gas ejection portion constituting a main body portion of the showerhead of the plasma processing apparatus of fig. 1. Fig. 3 is a process cross-sectional view for explaining a method of manufacturing a showerhead. Fig. 4 is a view showing a crack generated when a gap is formed between the sleeve and the base material. Fig. 5 is a view showing a case where a height difference exists at a boundary portion between a surface of the base material and the sleeve on the gas diffusion space side and a surface of the chamber side. Fig. 6 is a view showing a part of a gas ejection portion constituting a main body portion of a showerhead in the plasma processing apparatus according to embodiment 2. Fig. 7 is a diagram showing the results of heat resistance tests performed on a structure obtained by bonding a sleeve and a structure obtained by HIP bonding as in the prior art, with respect to a gas ejection portion of a shower head having the structure of fig. 2. Fig. 8 is a diagram showing the results of heat resistance tests performed on a structure obtained by bonding a sleeve to a gas ejection portion of a showerhead having the structure of fig. 6 as in the prior art and a structure obtained by HIP bonding. Detailed Description Hereinafter, embodiments will be described with reference to the drawings. < Embodiment 1 > First, embodiment 1 will be described. Fig. 1 is a cross-sectional view showing a plasma processing apparatus according to embodiment 1. The plasma processing apparatus shown in fig. 1 is an inductively coupled plasma processing apparatus, and can be suitably used for etching a metal film when forming a thin film transistor on a rectangular substrate, for example, on a glass substrate for an FPD. The inductively coupled plasma processing apparatus includes a square-tube-shaped airtight main body c