Search

CN-115411174-B - Be used for stable continuous annealing device of piezoelectric film

CN115411174BCN 115411174 BCN115411174 BCN 115411174BCN-115411174-B

Abstract

The invention discloses a piezoelectric film stabilizing continuous annealing device, which belongs to the technical field of annealing and comprises a bottom plate, wherein a film placing roller and a winding roller are respectively arranged on the left side and the right side of the upper surface of the bottom plate, and the opposite surfaces of the film placing roller and the winding roller are respectively fixedly connected with the left side surface and the right side surface of an annealing box. According to the invention, the controller, the temperature sensor, the heat pipe, the flow guide pipe, the constant temperature box and the transition box are arranged, the temperature in the transition box is lower than the temperature at the left side in the annealing box, then the piezoelectric film is continuously conveyed rightward and cooled by the cooling roller, the purpose of annealing and cooling step by step is effectively achieved, the influence on the crystal structure of the piezoelectric film due to a water cooling mode is avoided, so that the tensile resistance of the piezoelectric film is deteriorated, meanwhile, the surface stress of the piezoelectric film is prevented from being increased due to the fact that the annealing temperature is reduced too fast, the stable and continuous annealing of the piezoelectric film is realized, and the service performance of the piezoelectric film is improved.

Inventors

  • GUAN TAO
  • LIU HAO
  • WEI SHUJING

Assignees

  • 三三智能科技(日照)有限公司

Dates

Publication Date
20260512
Application Date
20220830

Claims (10)

  1. 1. The utility model provides a be used for stable continuous annealing device of piezoelectricity film, includes bottom plate (1), wherein the left and right sides of bottom plate (1) upper surface is provided with respectively put membrane roller (2) and wind-up roll (3), put the opposite face of membrane roller (2) and wind-up roll (3) and the left and right sides face fixed connection of annealing case (5) respectively, the lower surface of annealing case (5) is fixedly connected with the upper surface of two supporting legs (4), the lower surface of two supporting legs (4) all is fixedly connected with the upper surface of bottom plate (1), the left and right sides of annealing case (5) upper surface all is provided with leading wheel (6), the outer wall of two leading wheels (6) is equipped with same piezoelectricity film (7), piezoelectricity film (7) set up in annealing case (5), the left side of annealing case (5) inner wall is provided with electrothermal tube (9), the one end and the heater (10) at the back of electrothermal tube (9), the back of heater (10) joint is at the back of annealing case (5). The utility model discloses a tempering box, including tempering box (5) inner wall, piezoelectric film (7) and transition box (11), the left side of tempering box (5) inner wall is equipped with three electrothermal roller (8), piezoelectric film (7) twines on three electrothermal roller (8), the middle part of piezoelectric film (7) sets up in transition box (11), the lower surface of transition box (11) is connected with the upper surface fixed of tempering box (5), the bottom of transition box (11) is connected with the upper surface of incubator (15), the middle part of incubator (15) joint at tempering box (5) inner wall, the left surface of tempering box (5) communicates with the left side of tempering box (5) inner wall through four first heat conduction assemblies (12), the bottom joint of transition box (11) has four second heat conduction assemblies (14), and four second heat conduction assemblies (14) all communicate with the left side of tempering box (5) bottom.
  2. 2. The device for stabilizing and continuously annealing the piezoelectric film according to claim 1, wherein three cooling rollers (21) are arranged on the right side of the inner wall of the annealing box (5), the piezoelectric film (7) is wound on the outer walls of the three cooling rollers (21), and a semiconductor refrigerating sheet is arranged in the middle of the cooling rollers (21).
  3. 3. The continuous annealing device for piezoelectric film stabilization, as set forth in claim 1, characterized in that guide rollers (16) are fixedly connected to both left and right sides of the incubator (15), the piezoelectric film (7) is located between the two guide rollers (16), and a middle portion of a lower surface of the piezoelectric film (7) is overlapped with tops of the two support rollers (18).
  4. 4. The device for stabilizing and continuously annealing piezoelectric thin films according to claim 3, wherein the two ends of the supporting roller (18) are respectively provided with a supporting plate (17), and the two supporting plates (17) are clamped on the outer wall of the same supporting component (19).
  5. 5. The device for stabilizing and continuously annealing the piezoelectric film according to claim 4, wherein the supporting component (19) comprises two stop blocks (193), one side of each stop block (193) is fixedly connected with the left side face of the incubator (15), the same connecting shaft (192) is arranged between the two stop blocks (193), the outer wall of the connecting shaft (192) is clamped with the two support plates (17), two coil springs (191) are sleeved on the outer surface of the connecting shaft (192), and two ends of each coil spring (191) are fixedly connected with the opposite faces of each stop block (193) and each support plate (17).
  6. 6. The device for stabilizing and continuously annealing a piezoelectric film according to claim 1, wherein the first heat conducting component (12) comprises a heat conducting pipe (122), the left end of the heat conducting pipe (122) is clamped at the left side of the transition box (11), the bottom of the heat conducting pipe (122) is communicated with the left side of the inner wall of the annealing box (5), and a first electromagnetic valve (121) is arranged on the outer wall of the heat conducting pipe (122).
  7. 7. The device for stable continuous annealing of piezoelectric thin films according to claim 6, wherein the second heat conduction component (14) comprises a flow guide pipe (142), the flow guide pipe (142) is of U-shaped design, the right end of the flow guide pipe (142) is communicated with the bottom of the incubator (15), the left end of the flow guide pipe (142) is communicated with the left side of the bottom of the annealing box (5), and a second electromagnetic valve (141) is arranged on the outer wall of the flow guide pipe (142).
  8. 8. The continuous annealing device for piezoelectric film stabilization, as set forth in claim 7, characterized in that a temperature sensor (13) is disposed on the front surface of the transition box (11), the temperature sensor (13) is used for monitoring the real-time temperature in the transition box (11), and a controller (20) is disposed on the front surface of the incubator (15).
  9. 9. A continuous annealing apparatus for piezoelectric thin film stabilization according to claim 8, wherein the output of said temperature sensor (13) is connected to the input of a controller (20), and the output of said controller (20) is connected to the inputs of four first solenoid valves (121) and four second solenoid valves (141).
  10. 10. The device for stabilizing and continuously annealing the piezoelectric film according to claim 1, wherein a plurality of vent holes (22) are formed in the right side of the bottom of the annealing box (5), cover plates (23) are arranged on the left side and the right side of the upper surface of the annealing box (5), a top plate (24) is arranged on the top of the transition box (11), and observation windows are arranged on the left side and the right side of the front face of the annealing box (5).

Description

Be used for stable continuous annealing device of piezoelectric film Technical Field The invention belongs to the technical field of annealing, and particularly relates to a stable continuous annealing device for a piezoelectric film. Background The piezoelectric film is a film material with piezoelectric performance, which is prepared by film forming technologies such as evaporation, sputtering, chemical deposition, vapor phase epitaxy, casting, rolling and the like, and mainly comprises three major types of inorganic piezoelectric films (such as ZnO, alN, cdS and the like), organic piezoelectric films (such as polyvinyl fluoride PVF, polyvinylidene fluoride PVF2 and the like) and organic-inorganic compound piezoelectric films (such as PVF2-PZT, PVF2-BaTiO3 and the like), wherein the inorganic piezoelectric films with polycrystalline structures, particularly the ZnO and AlN films, have electromechanical coupling coefficients close to the single crystal value, and the c-axis preferentially oriented polycrystalline films have piezoelectricity similar to the single crystal value, and in the production and processing procedures of the piezoelectric films, the film surface has a force called surface stress, so that wrinkling and cracking of the film layer are easy to cause, so that the surface stress of the film is reduced or eliminated is an effective method for preventing the film layer from wrinkling and the surface stress is annealed by an annealing device. At present, in the annealing process based on the piezoelectric film, the coiled film is put into a special annealing furnace to be annealed, the film is heated to a certain temperature, the film is kept for a sufficient time, then the film is cooled at a proper speed, in order to improve the whole annealing efficiency, the piezoelectric film is naturally cooled in a water cooling mode or directly cooled by using a cooling medium, the piezoelectric film is not ideal in crystal structure in the water cooling mode, the tensile resistance is easy to be poor, the temperature of the piezoelectric film is reduced too fast by using the cooling medium to increase the surface stress of the film, the service performance of the film is influenced, and therefore, the continuous annealing device for stabilizing the piezoelectric film is needed to solve the problems. Disclosure of Invention (One) solving the technical problems In order to overcome the defects in the prior art, the invention provides a stable continuous annealing device for a piezoelectric film, which solves the problems that the piezoelectric film is naturally cooled in a water cooling mode or directly cooled by using a cooling medium, the crystal structure of the piezoelectric film is not ideal in the water cooling mode, the tensile resistance is poor easily, and the surface stress of the film is increased and the service performance is influenced due to the fact that the temperature of the piezoelectric film is reduced too quickly by using the cooling medium. (II) technical scheme The technical scheme is that the continuous annealing device for stabilizing the piezoelectric film comprises a bottom plate, wherein a film placing roller and a winding roller are respectively arranged on the left side and the right side of the upper surface of the bottom plate, the opposite surfaces of the film placing roller and the winding roller are respectively and fixedly connected with the left side and the right side of an annealing box, the lower surface of the annealing box is fixedly connected with the upper surfaces of two supporting legs, the lower surfaces of the two supporting legs are fixedly connected with the upper surface of the bottom plate, guide wheels are arranged on the left side and the right side of the upper surface of the annealing box, the same piezoelectric film is arranged on the outer walls of the two guide wheels, the piezoelectric film is arranged in the annealing box, an electric heating tube is arranged on the left side of the inner wall of the annealing box, one end of the back surface of the electric heating tube is connected with a heater, and the heater is clamped on the back surface of the annealing box. The left side of annealing box inner wall is equipped with three electric heating roller, the piezoelectric film winding is on three electric heating roller, the middle part of piezoelectric film sets up in the transition incasement, the lower surface of transition case and the last fixed surface of annealing box are connected, the bottom of transition case is connected with the upper surface of thermostated container, the thermostated container joint is at the middle part of annealing box inner wall, the left surface of annealing box is through four first heat conduction components, communicates with the left side of annealing box inner wall, the bottom joint of transition case has four second heat conduction components, and four second heat conduction components all communicate w