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CN-115462719-B - Cleaning base station, cleaning equipment, cleaning system and docking device

CN115462719BCN 115462719 BCN115462719 BCN 115462719BCN-115462719-B

Abstract

The present disclosure relates to a cleaning base station, a cleaning device, a cleaning system and a docking apparatus. The cleaning system comprises a cleaning base station, cleaning equipment, an elastic mechanism and a pressure release mechanism, wherein a first butt joint part is arranged on the cleaning base station, a second butt joint part is arranged on the cleaning equipment, the second butt joint part can be matched with the first butt joint part when the cleaning equipment is arranged on the cleaning base station, the elastic mechanism can buffer pressure when the first butt joint part is in butt joint with the second butt joint part, and the pressure release mechanism can release pressure of at least part of pressure generated when the first butt joint part is in butt joint with the second butt joint part. According to the cleaning system, partial pressure of the first butt joint part to the second butt joint part is relieved through the pressure relief mechanism, so that the pressure buffered by the elastic mechanism is reduced, the elastic mechanism is prevented from being excessively compressed under the action of larger pressure, larger reverse thrust is generated, and cleaning equipment is reversely pushed.

Inventors

  • ZHANG MINGCONG
  • Request for anonymity
  • ZENG LINGBAO
  • WANG XUEBIN

Assignees

  • 科沃斯机器人股份有限公司

Dates

Publication Date
20260505
Application Date
20220916

Claims (13)

  1. 1. A cleaning system, comprising: A cleaning base station (1), wherein a first butt joint part (11) is arranged on the cleaning base station (1); A cleaning device (2), wherein a second docking part (21) is arranged on the cleaning device (2), and the second docking part (21) can be matched with the first docking part (11) when the cleaning device (2) is arranged on the cleaning base station (1); An elastic mechanism (3), the elastic mechanism (3) being configured to buffer pressure when the first docking portion (11) is docked with the second docking portion (21); a pressure release mechanism (4), the pressure release mechanism (4) being configured to release at least part of the pressure generated when the first docking portion (11) is docked with the second docking portion (21) to such an extent that the elastic force when the elastic mechanism (3) is buffered is smaller than the braking force of the cleaning device (2) on the cleaning base station (1); When the first butt joint part (11) is in butt joint with the second butt joint part (21), the elastic mechanism (3) buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a first stroke, the elastic mechanism (3) continuously buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a second stroke, and the pressure release mechanism (4) releases the pressure of the impact between the first butt joint part (11) and the second butt joint part (21).
  2. 2. Cleaning system according to claim 1, characterized in that in the first stroke the spring force F1 stored when the spring means (3) is damped is less than 20N, the braking force F2 of the cleaning device (2) on the cleaning base station (1) being 20 to 60N.
  3. 3. The cleaning system according to claim 1, wherein the pressure release mechanism (4) starts to release pressure from the first docking portion (11) and the second docking portion (21) while the elastic mechanism (3) starts to buffer the first docking portion (11) and the second docking portion (21) when the first docking portion (11) and the second docking portion (21) are docked.
  4. 4. Cleaning system according to claim 1, characterized in that the cleaning base station (1) comprises a base (12) and a sliding seat (5) guided on the base (12), the first docking part (11) being fixed on the sliding seat (5), the elastic means (3), the pressure release means (4) being arranged between the sliding seat (5) and the base (12), respectively.
  5. 5. The cleaning system according to claim 4, wherein the elastic mechanism (3) is a spring, and two ends of the spring are respectively connected with the sliding seat (5) and the base (12).
  6. 6. The cleaning system according to claim 4, characterized in that the pressure release mechanism (4) is fixed on the base (12), the pressure-receiving end (41) of the pressure release mechanism (4) is in abutment with the sliding seat (5) in the initial position, or a gap is formed between the pressure-receiving end and the sliding seat (5), The pressure relief mechanism (4) is fixed on the sliding seat (5), and a pressure receiving end (41) of the pressure relief mechanism (4) is abutted with the base (12) at the initial position or has a gap with the base (12).
  7. 7. Cleaning system according to claim 6, characterized in that the pressure relief mechanism (4) is a damper.
  8. 8. A cleaning system according to claim 6, characterized in that the pressure relief mechanism (4) is configured to move in a direction towards the base (12) when subjected to pressure, in order to relieve the pressure between the slide seat (5) and the base (12).
  9. 9. The cleaning system according to claim 1, characterized in that the cleaning device (2) comprises a base (12) and a sliding seat (5) guided on the base (12), the second docking portion (21) being fixed on the sliding seat (5), the elastic means (3), the pressure release means (4) being arranged between the sliding seat (5) and the base (12), respectively.
  10. 10. The cleaning system according to claim 1, wherein the first docking portion (11), the second docking portion (21) are charging pole pieces, and the cleaning device (2) is configured to be charged after docking of the charging pole pieces.
  11. 11. A cleaning base station, characterized in that the cleaning base station (1) is configured for accommodating a cleaning device (2), comprising: A first docking portion (11), the cleaning device (2) being configured to be placed on a cleaning base station (1), the first docking portion (11) being capable of mating with a second docking portion (21) on the cleaning device (2); An elastic mechanism (3), the elastic mechanism (3) being configured to buffer pressure when the first docking portion (11) is docked with the second docking portion (21); a pressure release mechanism (4), the pressure release mechanism (4) being configured to release at least part of the pressure generated when the first docking portion (11) is docked with the second docking portion (21) to such an extent that the elastic force when the elastic mechanism (3) is buffered is smaller than the braking force of the cleaning device (2) on the cleaning base station (1); When the first butt joint part (11) is in butt joint with the second butt joint part (21), the elastic mechanism (3) buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a first stroke, the elastic mechanism (3) continuously buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a second stroke, and the pressure release mechanism (4) releases the pressure of the impact between the first butt joint part (11) and the second butt joint part (21).
  12. 12. A cleaning apparatus, comprising: a second docking portion (21), the cleaning device (2) being configured to be placed on a cleaning base station (1), the second docking portion (21) being capable of mating with a first docking portion (11) on the cleaning base station (1); An elastic mechanism (3), the elastic mechanism (3) being configured to buffer pressure when the first docking portion (11) is docked with the second docking portion (21); A pressure release mechanism (4), wherein the pressure release mechanism (4) is configured to release at least part of pressure generated by the abutting of the first abutting portion (11) and the second abutting portion (21) until the elastic force of the elastic mechanism (3) is smaller than the braking force of the cleaning equipment (2) on the cleaning base station (1); When the first butt joint part (11) is in butt joint with the second butt joint part (21), the elastic mechanism (3) buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a first stroke, the elastic mechanism (3) continuously buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a second stroke, and the pressure release mechanism (4) releases the pressure of the impact between the first butt joint part (11) and the second butt joint part (21).
  13. 13. A docking device, comprising: a first abutting section (11); -a second abutment (21), the second abutment (21) being configured to be able to cooperate with the first abutment (11) during movement; An elastic mechanism (3), the elastic mechanism (3) being configured to buffer pressure when the first docking portion (11) is docked with the second docking portion (21); a pressure release mechanism (4), wherein the pressure release mechanism (4) is configured to release at least part of pressure generated when the first docking part (11) is docked with the second docking part (21) to the extent that the elastic force of the elastic mechanism (3) is smaller than the braking force of the cleaning equipment (2) on the cleaning base station (1) when the elastic mechanism (3) is buffered; When the first butt joint part (11) is in butt joint with the second butt joint part (21), the elastic mechanism (3) buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a first stroke, the elastic mechanism (3) continuously buffers the impact between the first butt joint part (11) and the second butt joint part (21) in a second stroke, and the pressure release mechanism (4) releases the pressure of the impact between the first butt joint part (11) and the second butt joint part (21).

Description

Cleaning base station, cleaning equipment, cleaning system and docking device Technical Field The present disclosure relates to the field of cleaning machines, and more particularly, to a docking device, and a cleaning apparatus and a cleaning base station using the docking device, and a cleaning system using the cleaning apparatus and the cleaning base station. Background With the progress of technology and the continuous improvement of living standard, the demands of people for cleaning devices are increasing, and intelligent cleaning devices are becoming more common, such as commercial robots for cleaning in commercial environments such as shops and office buildings. Because of the limited battery capacity, the cleaning robot needs to periodically move to the base station for docking and charging. Because the robot has certain motion inertia, the robot can collide with the base station during docking, and the damage of components is caused. Especially for commercial robots, the volume is larger, the movement inertia is large, and the damage to parts caused by collision is more likely to occur. In order to avoid hard collision between the robot and the base station body as much as possible, the existing docking platforms of the base station are mostly provided with telescopic buffer structures, and some buffer strokes are reserved. In case the elasticity of the buffer structure is small, hard collision between the robot and the base station is still possible. And under the condition that the elasticity of the buffer structure is large, after the robot stops moving, the resilience force of the buffer structure can be larger than the braking force between the robot and the ground, so that the robot can be pushed out reversely. After the robot is reversely pushed, the contact area of the charging pole piece between the robot and the base station is reduced, so that the problems of serious heating at the pole piece and the like can be caused, and the robot and the base station can be burnt out when serious. Disclosure of Invention The present disclosure provides a cleaning base station, a cleaning apparatus, a cleaning system, and a docking device in order to solve the problems existing in the prior art. According to a first aspect of the present disclosure, there is provided a cleaning system comprising: the cleaning base station is provided with a first butt joint part; The cleaning device is configured to be placed on the cleaning base station, and the second docking part can be matched with the first docking part; an elastic mechanism configured to buffer pressure when the first docking portion is docked with the second docking portion; And the pressure release mechanism is configured to release at least part of pressure generated when the first abutting portion abuts against the second abutting portion. In one embodiment of the disclosure, the pressure relief mechanism is configured to relieve at least part of the pressure when the first docking portion is docked with the second docking portion to such an extent that the elastic force when the elastic mechanism is buffered is less than the braking force of the cleaning device on the cleaning base station. In one embodiment of the disclosure, when the first butt joint part is in butt joint with the second butt joint part, the elastic mechanism buffers the impact between the first butt joint part and the second butt joint part in a first stroke, and in a second stroke, the elastic mechanism continuously buffers the impact between the first butt joint part and the second butt joint part, and the pressure release mechanism releases the pressure of the impact between the first butt joint part and the second butt joint part. In one embodiment of the present disclosure, in the first stroke, the elastic force F1 stored when the elastic mechanism is buffered is smaller than 20N, and the braking force F2 of the cleaning apparatus on the cleaning base station is 20 to 60N. In one embodiment of the disclosure, when the first docking portion and the second docking portion dock, the pressure release mechanism starts to release pressure from the first docking portion and the second docking portion while the elastic mechanism starts to buffer the first docking portion and the second docking portion. In one embodiment of the disclosure, the cleaning base station comprises a base and a sliding seat in guiding fit with the base, the first abutting part is fixed on the sliding seat, and the elastic mechanism and the pressure release mechanism are respectively arranged between the sliding seat and the base. In one embodiment of the disclosure, the elastic mechanism is a spring, and two ends of the spring are respectively connected with the sliding seat and the base. In one embodiment of the present disclosure, the pressure relief mechanism is fixed on the base, and the pressure-receiving end of the pressure relief mechanism abuts against the sliding seat in the initial posit