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CN-115768495-B - Forming monolithic nanostructures on implantable devices

CN115768495BCN 115768495 BCN115768495 BCN 115768495BCN-115768495-B

Abstract

The present disclosure relates to a method for forming a monolithic nanostructure on an implantable device, the method comprising a. Depositing a metal film onto a surface of an implantable device, b. Heating the metal film for a period of time such that the metal film is converted into a plurality of discrete nanoparticles, the plurality of nanoparticles thereby forming an etch mask on the surface of the implantable device, c. Etching the implantable device such that the surface of the implantable device is etched through the etch mask, thereby forming a monolithic nanostructure on the surface of the implantable device, and d. (optionally) removing the etch mask, e.g. by immersion in aqua regia solution.

Inventors

  • Ou Yiyu
  • PETERSEN PAUL M.

Assignees

  • 丹麦科技大学

Dates

Publication Date
20260505
Application Date
20210527
Priority Date
20200527

Claims (20)

  1. 1. A method of forming a monolithic nanostructure on an implantable device, the nanostructure configured for osseointegration and prevention of bacterial growth of the implantable device, the method comprising: a. Depositing a metal film onto a surface of an implantable device; b. Heating the metal film for a period of time such that the metal film is converted into a plurality of discrete nanoparticles, the plurality of nanoparticles thereby forming an etch mask on a surface of the implantable device, and C. Etching the surface of the implantable device through an etch mask to form a monolithic nanostructure on the surface of the implantable device, wherein the surface of the implantable device and the etch mask are etched simultaneously, wherein a sidewall angle of the nanostructure is between 18 ° and 85 °, Wherein the nanostructures are tapered, extending from the surface of the implantable device, or the nanostructures are provided as a number of ridges, the ridges being formed between recessed indentations of the surface of the implantable device.
  2. 2. The method of forming a monolithic nanostructure of claim 1, wherein the surface of the implantable device is etched at an etch rate that is 0.01-1 times the etch rate of the etch mask.
  3. 3. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the metal film is heated for a temperature of at least between 1 minute and 70 ℃ and 900 ℃.
  4. 4. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the average diameter of the nanoparticles is between 10 nm and 350 nm.
  5. 5. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein etching is performed by wet etching.
  6. 6. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the method further comprises the step of removing the etch mask.
  7. 7. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein etching is performed by dry etching.
  8. 8. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the density of the nanostructures is between 1 μιη -2 and 2000 μιη -2 .
  9. 9. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the average height of the nanostructure is between 10 nm and 500 nm.
  10. 10. A method of forming monolithic nanostructures according to claim 1 or 2, wherein the average spacing between the nanostructures is between 10 nm and 300 nm.
  11. 11. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the tip width of the nanostructure is less than 0.5 μm.
  12. 12. A method of forming a monolithic nanostructure according to claim 1 or 2, wherein the side wall angle of the nanostructure is between 25 ° and 75 °.
  13. 13. An implantable device comprising a surface having monolithic nanostructures for osseointegration and bacterial membrane prevention, the nanostructures being formed according to the method of any one of claims 1 to 12, Wherein the nanostructure is tapered, extending from a surface of the implantable device, wherein a sidewall angle of the nanostructure is between 18 DEG and 85 DEG, or The nanostructure is ridged, formed between a number of concave indentations of the surface, wherein a sidewall angle of the nanostructure is between 18 ° and 85 °.
  14. 14. The implantable device of claim 13, wherein an average spacing between the nanostructures is between 10 nm and 300 nm.
  15. 15. An implantable device according to claim 13 or 14, wherein the aspect ratio of the nanostructures is between 0.14 and 50.
  16. 16. An implantable device according to claim 13 or 14, wherein the average height of the nanostructures is between 10nm and 500 nm.
  17. 17. An implantable device according to claim 13 or 14, wherein the average size of the nanoparticles is between 10nm and 350 nm.
  18. 18. An implantable device according to claim 13 or 14, wherein the density of the nanostructures at the surface is between 1 μιη -2 to 2000 μιη -2 .
  19. 19. An implantable device according to claim 13 or 14, wherein the tip width of the nanostructures is below 0.5 μm.
  20. 20. An implantable device according to claim 13 or 14, wherein the base width of the nanostructures is below 1 μm.

Description

Forming monolithic nanostructures on implantable devices The present disclosure relates to a method for forming a monolithic nanostructure on a prosthetic device, and a prosthetic device comprising a surface having a monolithic nanostructure. Background An implant is a medical device used to replace missing biological structures, support damaged biological structures, or augment existing biological structures. Medical implants are artificial devices, unlike implants, which are a type of transplanted biomedical tissue. The surface of the implant that is in contact with the body may be made of biomedical materials, such as titanium, silicone or apatite, depending on the most practical materials. In some cases, the implant may contain electronics, such as artificial pacemakers and cochlear implants. There are several types of medical implants, such as orthopedic implants, which are used to alleviate problems of the bones and joints of the body. They are commonly used to treat fractures, osteoarthritis, scoliosis, spinal stenosis, and chronic pain. Examples include a wide variety of needles, rods, screws, and plates that can be anchored to a fractured bone as the bone heals. Another example of an implant is a dental implant, which is a surgical member for engagement with a bone of a jaw or skull to support a dental prosthesis such as a crown, bridge, denture, facial prosthesis, or as an orthodontic anchor. Dental implants rely on a biological process called osseointegration, in which materials such as titanium form a tight bond with bone. Implantation of a dental implant generally involves positioning the dental implant such that it may osseointegrate. Osseointegration requires different amounts of healing time before a dental prosthesis (typically a tooth, bridge or denture) is attached to the implant or a abutment (abutment) is placed where the dental prosthesis is to be fixed. Because of their biocompatibility and mechanical properties, most dental implants are made of commercially pure titanium. However, for medical implants in general, and dental implants in particular, a great challenge is bacterial infection and subsequent implant degradation. In fact, it is estimated that 5% of all dental implants end up with failure immediately after implantation, and about half of the dental implants are subject to bacterial infection. Thus, one of the major challenges in plantations, especially dental plantations, in order to achieve long-term success of implantation, is to improve the osseointegration of the implant while preventing bacterial infection. Methods to improve osseointegration or bacterial prevention of implants already exist and generally rely on mechanical, chemical or physical methods such as plasma spraying or sandblasting and acid etching. These methods generally rely on roughening of the implant surface to increase the total surface area, thereby promoting cell migration and attachment to the implant, thereby enhancing the osseointegration process. For bacterial prevention of implant surfaces, one common approach is to use zirconium, such as blasting titanium surfaces with zirconia particles. This approach has shown the potential to reduce bacterial adhesion to implant surfaces, at least for certain bacterial species. However, since the surface of such implants contains a plurality of elements, long-term stability may be problematic and there may be a further risk of side effects. Disclosure of Invention The inventors have appreciated that implantable devices having surfaces comprising monolithic nanostructures may result in improved osseointegration and improved bacterial prevention. Accordingly, the present disclosure relates in a first aspect to a method for forming a monolithic nanostructure on an implantable device, the method comprising: depositing a metal film onto a surface of an implantable device; heating the metal film for a period of time such that the metal film is converted into a plurality of nanoparticles, the plurality of nanoparticles thereby forming an etch mask on a surface of the implantable device; Etching an implantable device such that a surface of the implantable device is etched through an etch mask to form a monolithic nanostructure on the surface of the implantable device, and The etch mask is (optionally) removed. Implantable devices are used in many different areas of the body and may also be used for different reasons, such as to support healing or to anchor a prosthesis. Since the oral microbiota may contain a variety of bacterial species, the most challenging environment for implantable devices is the oral cavity. The microbial aggregates in the oral cavity may form a coating on the teeth, known as plaque. However, if a dental implant is present in the oral cavity, the same bacteria may cause peri-implant diseases, including peri-implant mucositis (generally without bone loss) affecting the gingival tissue surrounding the dental implant, or peri-implant inflammation