CN-116504324-B - Method for screening optimal electroplating conditions of nickel-phosphorus-graphene

Abstract

The invention discloses a method for screening electroplating conditions of nickel-phosphorus-graphene, which provides a calculation formula of a difference value of plating thickness, provides a linear fitting formula of the plating thickness and temperature at different temperatures, provides a linear fitting formula of the plating thickness and current density at different current densities, and provides a linear fitting formula of the plating thickness and the graphene concentration at different graphene concentrations, so that when the numerical values of the graphene concentration, the current density and the temperature are given, the numerical values are calculated by adopting corresponding formulas respectively, and the optimal conditions for preparing the nickel-phosphorus-graphene plating are screened and obtained according to the judgment condition that the sum of the variance value of the result and the difference value of the plating thickness is close to zero. Therefore, the invention has the technical effect of screening out the optimal conditions required by electroplating so as to improve the electroplating uniformity.

Inventors

• RONG YAN
• LI ANG
• HE HUIPING
• KONG XIANGNING
• LIU YUANHANG
• MA TE
• LIU XINYUAN

Assignees

• 郑州大学

Dates

Publication Date

20260505

Application Date

20230322

Claims (7)

1. 1. A method of screening plating conditions for nickel-phosphorus-graphene, comprising: S1, preparing an electroplating solution, wherein the electroplating solution comprises 250g/L of nickel salt, 15g/L of additional salt, 30g/L of complexing agent, 20g/L of phosphate, graphene and water; s2, a calculation formula of a difference value of the coating thickness comprises: H=H max -H min (1) Wherein H represents the difference of the coating thickness, H max represents the maximum value of the coating thickness, and H min represents the minimum value of the coating thickness; Fixing the values of the graphene concentration and the current density, changing the temperature of the electroplating solution to obtain H T values at different temperatures, and performing linear fitting on the H T values and the corresponding temperatures to obtain the following formula: H T =0.0001T 2 -0.0026T+0.184(2) fixing the values of the concentration and the temperature of graphene, changing the current density of the electroplating liquid in the electroplating process to obtain H A values under different current densities, and performing linear fitting on the H A values and the corresponding current densities to obtain the following formula: H A =0.0098e 0.0231A (3) Fixing the current density of the electroplating solution and the numerical value of the temperature of the electroplating solution in the electroplating process, changing the concentration of graphene to obtain H C values under different graphene concentrations, and performing linear fitting on the H C values and the corresponding graphene concentrations to obtain the following formula: H C =-0.01C+0.8(4) And S3, giving numerical values of the temperature, the current density and the graphene concentration of the electroplating solution, respectively adopting corresponding formulas to calculate the numerical values to obtain numerical values of H T 、H A and H C , carrying out variance calculation on the three numerical values to obtain a variance value S 2 , carrying out summation calculation on the three numerical values to obtain a sum of differences of the thickness of the coating, and screening the condition that the sum of the value of S 2 and the difference of the thickness of the coating is more close to 0, namely the condition for preparing the nickel-phosphorus-graphene coating.
2. 2. The method for screening electroplating conditions of nickel-phosphorus-graphene according to claim 1, wherein: the nickel salt comprises nickel sulfate.
3. 3. A method of screening nickel-phosphorus-graphene electroplating conditions according to claim 1, wherein the additional salt comprises nickel chloride.
4. 4. The method for screening electroplating conditions of nickel-phosphorus-graphene according to claim 1, wherein: the complexing agent includes boric acid.
5. 5. The method for screening electroplating conditions of nickel-phosphorus-graphene according to claim 1, wherein: the phosphate salt comprises sodium hypophosphite.
6. 6. A computer device comprising a processor and a memory, the memory having stored thereon computer program instructions for execution on the processor, when executing the computer program instructions, performing a method of screening plating conditions of nickel-phosphorus-graphene according to any one of claims 1-5.
7. 7. A computer storage medium, characterized in that it stores computer instructions, which, when executed by a processor, implement a method of screening plating conditions of nickel-phosphorus-graphene according to any one of claims 1-5.

Description

Method for screening optimal electroplating conditions of nickel-phosphorus-graphene Technical Field The invention relates to a method for screening optimal electroplating conditions of nickel-phosphorus-graphene. Background The research on nickel-phosphorus alloy plating is a hot spot in the academic world in recent years, and one direction is to observe the change of the structure and the performance of the plating by adding other metal or nonmetal substances into the plating solution, so that the nickel-phosphorus alloy plating has a wider application range. Graphene is called as a future revolutionary material, and in recent years, the excellent mechanical property, self-lubricating property, heat conducting property, non-toxicity, light weight, high strength and other properties of the graphene are discovered through research on the graphene, so that the graphene has more promising application in the aspect of alloy plating. In the prior art, the manufacturing method of the nickel-phosphorus-graphene plating layer generally adopts two methods of electroplating and chemical plating, the thickness of the chemical plating layer is uniform and easy to control, the surface is smooth and flat, post-plating processing is not needed generally, the method is suitable for repairing and selectively plating out the ultra-poor work piece, the common plating piece is in a manner of saving cost and generally adopts electroplating, in an electroplating experiment, the uniformity of the final plating layer is influenced by the temperature, the current density and the concentration of each component in the plating solution, so that a plating condition suitable for the electroplating requirement can be selected to obtain a more uniform electroplating layer, in the prior art, the electroplating experiment generally adopts fixed temperature, concentration and voltage, the plating piece with good or poor plating uniformity is obtained randomly, polishing is carried out on the plating piece with poor effect, the extra workload of workers is increased, and compared with the electroplating process of the screened optimal electroplating condition, the method has the problems of time consumption and labor consumption and poor electroplating effect. Disclosure of Invention In order to at least solve the technical problems of poor electroplating effect and uneven plating layer in the background technology, the invention provides a method for screening optimal conditions of nickel-phosphorus-graphene electroplating, which has the technical effect of screening optimal conditions required by electroplating so as to improve electroplating uniformity. In order to achieve the above purpose, the invention is realized by the following technical scheme: In a first aspect, the present invention provides a method of screening plating conditions of nickel-phosphorus-graphene, comprising: S1, preparing an electroplating solution, wherein the electroplating solution comprises 250g/L of nickel salt, 15g/L of additional salt, 30g/L of complexing agent, 20g/L of phosphate, graphene and water; s2, a calculation formula of a difference value of the coating thickness comprises: H=Hmax-Hmin (1) Wherein H represents the difference of the coating thickness, H max represents the maximum value of the coating thickness, and H min represents the minimum value of the coating thickness; Fixing the values of graphene concentration and current density, changing the temperature to obtain H T values at different temperatures, and performing linear fitting on the H T values and the corresponding temperatures to obtain the following formula: HT＝0.0001T2-0.0026T+0.184 (2) fixing the values of the graphene concentration and the temperature, changing the current density to obtain H A values under different current densities, and performing linear fitting on the H A values and the corresponding current densities to obtain the following formula: HA＝0.0098e0.0231A (3) Fixing the values of current density and temperature, changing the graphene concentration to obtain H C values under different graphene concentrations, and performing linear fitting on the H C values and the corresponding graphene concentrations to obtain the following formula: HC=-0.01C+0.8 (4) And S3, giving the numerical values of the temperature, the current density and the graphene concentration, respectively adopting corresponding formulas to calculate the numerical values to obtain numerical values of H T、HA and H C, carrying out variance calculation on the three numerical values to obtain a variance value S 2, carrying out summation calculation on the three numerical values to obtain the sum of differences of the coating thickness, and screening the condition that the sum of the value of S 2 and the difference of the coating thickness is more close to 0, namely the condition for preparing the nickel-phosphorus-graphene coating. According to one embodiment of the invention, the nickel salt comprises