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CN-116569312-B - Substrate processing apparatus, liquid raw material replenishment system, method for manufacturing semiconductor device, substrate processing method, and recording medium

CN116569312BCN 116569312 BCN116569312 BCN 116569312BCN-116569312-B

Abstract

A technique is provided with a vaporizing vessel for vaporizing a liquid material inside, a liquid material replenishment line having one end connected to the vaporizing vessel and the other end connected to a liquid material supply source, a first valve provided in the liquid material replenishment line, a second valve provided on an upstream side of the first valve in the liquid material replenishment line, a liquid material storage unit formed between the first valve and the second valve, and a control unit for controlling opening and closing of the first valve and the second valve so as to supply the liquid material into the vaporizing vessel by opening the second valve in a state where the first valve is closed, and then closing the second valve to open the first valve and discharge the liquid material filled in the liquid material storage unit into the vaporizing vessel by filling and discharging the liquid material.

Inventors

  • Shou Qijianyi

Assignees

  • 株式会社国际电气

Dates

Publication Date
20260505
Application Date
20201225

Claims (20)

  1. 1. A substrate processing apparatus, comprising: a vaporization container for vaporizing a liquid raw material inside; a liquid raw material replenishing line having one end connected to a nozzle formed in the vaporizing vessel and the other end connected to a supply source of the liquid raw material; a first valve provided in a portion of the liquid raw material replenishment line that is continuous with the nozzle and that is axially oriented in the up-down direction; A second valve provided in the liquid raw material replenishing line at a position upstream of the first valve and above the first valve; A liquid raw material reservoir formed between the first valve and the second valve, and And a control unit configured to be able to control opening and closing of the first valve and the second valve so as to supply the liquid raw material into the vaporizing vessel by opening the second valve in a state where the first valve is closed to fill the liquid raw material storage unit with the liquid raw material, and then closing the second valve to open the first valve, and by performing a filling and discharging process of discharging the liquid raw material filled in the liquid raw material storage unit into the vaporizing vessel.
  2. 2. The substrate processing apparatus according to claim 1, wherein, The substrate processing apparatus includes: A processing chamber for processing the substrate, and A process gas supply pipe connecting the process chamber and the vaporizing vessel, and introducing a process gas obtained by vaporizing the liquid raw material in the vaporizing vessel into the process chamber, The control unit is configured to control the first valve and the second valve so as to execute the filling and discharging process each time a process using the process gas is performed for the substrate within the process chamber a preset number of times.
  3. 3. The substrate processing apparatus according to claim 2, wherein, The control unit is configured to control the first valve and the second valve so as to repeat the filling/discharging process until the amount of the liquid raw material supplied into the vaporizing vessel becomes a process consumption amount consumed by performing the process for the substrate using the process gas for the set number of times.
  4. 4. The substrate processing apparatus according to claim 2, wherein, The amount of the liquid raw material discharged into the vaporization container in the filling and discharging process 1 time is equal to or less than a process consumption amount consumed by performing the process for the substrate using the process gas for the set number of times.
  5. 5. The substrate processing apparatus according to claim 2, wherein, The volume of the liquid raw material reservoir is equal to or less than the processing consumption amount consumed by performing the processing for the substrate using the processing gas for the set number of times.
  6. 6. The substrate processing apparatus according to claim 1, wherein, The liquid raw material reservoir has a volume larger than the amount of the liquid raw material discharged into the vaporization container in 1 time of the filling discharge process.
  7. 7. The substrate processing apparatus according to any one of claims 1 to 6, wherein, The liquid raw material is fed from the supply source to the liquid raw material replenishment line at a feed pressure higher than the pressure in the vaporization vessel.
  8. 8. The substrate processing apparatus according to claim 7, wherein, The delivery pressure is 10 times or more the pressure in the vaporization container.
  9. 9. The substrate processing apparatus according to any one of claims 1 to 6, wherein, The substrate processing apparatus further includes a liquid level sensor for measuring a liquid level of the liquid raw material in the vaporizing vessel, The control unit is configured to control the first valve and the second valve so as to execute the filling/discharging process a predetermined number of times until the liquid surface of the liquid material measured by the liquid level sensor reaches a preset filling level.
  10. 10. The substrate processing apparatus according to claim 9, wherein, The control unit is configured to control the first valve and the second valve so as to stop the filling/discharging process when the liquid level of the liquid material measured by the liquid level sensor reaches the filling level.
  11. 11. The substrate processing apparatus according to any one of claims 1 to 6, wherein, The control unit is configured to control the first valve and the second valve so as to execute the filling and discharging process a predetermined number of times until the amount of the liquid raw material supplied into the vaporizing vessel becomes a predetermined supply amount.
  12. 12. The substrate processing apparatus according to claim 11, wherein, The liquid raw material reservoir has a volume smaller than the supply prescribed amount.
  13. 13. The substrate processing apparatus according to any one of claims 1 to 6, wherein, A liquid raw material supply nozzle having an upstream end connected to the liquid raw material replenishing line is provided in the vaporizing vessel, The liquid material supply nozzle is disposed such that its discharge port is located above the liquid surface of the liquid material stored in the vaporizing vessel.
  14. 14. The substrate processing apparatus according to any one of claims 1 to 6, wherein, The first valve and the second valve are disposed vertically above the vaporization container.
  15. 15. The substrate processing apparatus according to any one of claims 1 to 6, wherein, The control unit is configured to be able to execute control of the first valve and the second valve so that both are closed before one of them is opened in the filling discharge process.
  16. 16. The substrate processing apparatus according to any one of claims 1 to 6, wherein, The liquid raw material reservoir has a volume smaller than that of the vaporization container.
  17. 17. A liquid raw material replenishment system comprising: a liquid raw material replenishing line having one end connected to a nozzle formed in a vaporization container for vaporizing a liquid raw material therein and the other end connected to a supply source of the liquid raw material; a first valve provided in a portion of the liquid raw material replenishment line that is continuous with the nozzle and that is axially oriented in the up-down direction; A second valve provided in the liquid raw material replenishing line at a position upstream of the first valve and above the first valve; A liquid raw material reservoir formed between the first valve and the second valve, and And a control unit configured to be able to control opening and closing of the first valve and the second valve so as to supply the liquid raw material into the vaporizing vessel by opening the second valve in a state where the first valve is closed to fill the liquid raw material storage unit with the liquid raw material, and then closing the second valve to open the first valve, and by performing a filling and discharging process of discharging the liquid raw material filled in the liquid raw material storage unit into the vaporizing vessel.
  18. 18. A method for manufacturing a semiconductor device, characterized in that, The liquid raw material is supplied into the vaporization container by performing a filling process and a discharging process in the substrate processing apparatus, The substrate processing apparatus includes: the vaporization container for vaporizing the liquid raw material inside; a liquid raw material replenishing line having one end connected to a nozzle formed in the vaporizing vessel and the other end connected to a supply source of the liquid raw material; a first valve provided in a portion of the liquid raw material replenishment line that is continuous with the nozzle and that is axially oriented in the up-down direction; a second valve provided in the liquid raw material replenishing line at a position upstream of the first valve and above the first valve, and A liquid raw material reservoir portion formed between the first valve and the second valve, The filling step of opening the second valve in a state where the first valve is closed to fill the liquid raw material into the liquid raw material reservoir portion, And a discharging step of closing the second valve and opening the first valve after the filling step, and discharging the liquid raw material filled in the liquid raw material storage portion into the vaporizing vessel.
  19. 19. A substrate processing method, characterized in that, The substrate processing apparatus performs a filling step and a discharging step to supply a liquid raw material liquid into the vaporization container, The substrate processing apparatus includes: the vaporization container for vaporizing the liquid raw material inside; a liquid raw material replenishing line having one end connected to a nozzle formed in the vaporizing vessel and the other end connected to a supply source of the liquid raw material; a first valve provided in a portion of the liquid raw material replenishment line that is continuous with the nozzle and that is axially oriented in the up-down direction; a second valve provided in the liquid raw material replenishing line at a position upstream of the first valve and above the first valve, and A liquid raw material reservoir portion formed between the first valve and the second valve, The filling step of opening the second valve in a state where the first valve is closed to fill the liquid raw material into the liquid raw material reservoir portion, And a discharging step of closing the second valve and opening the first valve after the filling step, and discharging the liquid raw material filled in the liquid raw material storage portion into the vaporizing vessel.
  20. 20. A computer-readable recording medium having a program recorded thereon, characterized in that, The program causes a substrate processing apparatus to execute a process of supplying a liquid raw material into a vaporization container by performing a filling process and a discharging process in the substrate processing apparatus, The substrate processing apparatus includes: a liquid raw material replenishing line having one end connected to a nozzle formed in the vaporizing vessel and the other end connected to a supply source of the liquid raw material; a first valve provided in a portion of the liquid raw material replenishment line that is continuous with the nozzle and that is axially oriented in the up-down direction; a second valve provided in the liquid raw material replenishing line at a position upstream of the first valve and above the first valve, and A liquid raw material reservoir portion formed between the first valve and the second valve, The filling step of opening the second valve in a state where the first valve is closed to fill the liquid raw material into the liquid raw material reservoir portion, The discharging step is performed by closing the second valve and opening the first valve after the filling step, and discharging the liquid raw material filled in the liquid raw material reservoir into the vaporizing vessel.

Description

Substrate processing apparatus, liquid raw material replenishment system, method for manufacturing semiconductor device, substrate processing method, and recording medium Technical Field The present disclosure relates to a substrate processing apparatus, a liquid raw material replenishment system, a method for manufacturing a semiconductor device, a substrate processing method, and a recording medium. Background Patent document 1 discloses a liquid raw material replenishment system for replenishing a vaporizing vessel of a substrate processing apparatus with a liquid raw material. Prior art literature Patent literature Patent document 1 WO2018/056346 Disclosure of Invention Problems to be solved by the invention However, when the liquid raw material fed from the feeding system is replenished into the vaporizing vessel, it may be difficult to accurately control the feeding amount of the liquid raw material fed into the vaporizing vessel. The present disclosure aims to control the supply amount so that a predetermined amount of liquid raw material is accurately supplied into a vaporization container when replenishing the liquid raw material into the vaporization container. Means for solving the problems According to the present disclosure, there is provided a technique including a vaporizing vessel for vaporizing a liquid material therein, a liquid material replenishment line having one end connected to the vaporizing vessel and the other end connected to a supply source of the liquid material, a first valve provided in the liquid material replenishment line, a second valve provided on an upstream side of the first valve in the liquid material replenishment line, a liquid material storage unit formed between the first valve and the second valve, and a control unit for controlling opening and closing of the first valve and the second valve so as to supply the liquid material into the vaporizing vessel by opening the second valve in a state where the first valve is closed and then closing the second valve to open the first valve, and a filling and discharging process for discharging the liquid material filled in the liquid material storage unit into the vaporizing vessel. Effects of the invention According to the present disclosure, when replenishing the liquid raw material into the vaporizing vessel, the supply amount can be controlled so that a predetermined amount of the liquid raw material is accurately supplied into the vaporizing vessel. Drawings Fig. 1 is a block diagram showing a storage tank and the like included in a substrate processing apparatus according to an embodiment of the present disclosure. Fig. 2 is a cross-sectional view showing a processing chamber and the like included in the substrate processing apparatus according to the embodiment of the present disclosure. Fig. 3 is a schematic configuration diagram showing a substrate processing apparatus according to an embodiment of the present disclosure. Fig. 4 is a block diagram for explaining a controller included in the substrate processing apparatus according to the embodiment of the present disclosure. Fig. 5 is a diagram showing a film formation sequence in the case of performing film formation processing on a wafer using the substrate processing apparatus according to the embodiment of the present disclosure. Fig. 6 is a flow chart of a liquid feedstock replenishment process according to an embodiment of the present disclosure. Fig. 7A is a diagram showing a state of filling the liquid raw material before the valve 758 is opened in S14 of the liquid raw material replenishing process of fig. 6. Fig. 7B is a diagram showing a state of filling the liquid raw material before the valve 759 is opened in S18 after the valve 758 is opened in S14 of the liquid raw material replenishment process in fig. 6. Fig. 7C is a diagram showing a state of filling the liquid raw material after the valve 759 is opened in S12 of the liquid raw material replenishment process in fig. 6. Fig. 8 is a flow chart of a liquid feedstock replenishment process according to a further embodiment of the present disclosure. Fig. 9 is a diagram showing a modification of the liquid raw material reservoir according to the embodiment of the present disclosure. Detailed Description The inventors of the present invention have conducted intensive studies on the relationship between the amount of a liquid raw material stored in a storage tank and the in-plane uniformity of a film formed on a substrate by vaporizing the liquid raw material to generate a raw material gas. As a result, the present inventors have found that when the amount of the liquid raw material stored in the storage tank becomes smaller, the in-plane uniformity of the film formed on the substrate is improved. Therefore, the amount of the liquid raw material stored in the storage tank is required to be reduced, but for this purpose, the replenishment of the liquid raw material into the storage tank needs to be perfo