CN-116693857-B - Compound containing multifunctional polysiloxane structure and application thereof

Abstract

The invention belongs to the technical field of photoresist, in particular to a compound containing a multifunctional polysiloxane structure and application thereof, wherein the structural formula is selected from a general formula I or a general formula II, through transesterification and free radical addition reaction, multifunctional reaction functional groups are introduced into the polymer structure, and the hydrophilic and hydrophobic properties, the temperature resistance and the chemical resistance of the polymer can be improved by adjusting the types of introduced monomers. The compound is used for preparing a photoresist composition through a solvent, a monomer with an ethylene unsaturated bond, a photosensitizer and other assistants, and the photoresist has the advantages of low dielectric constant, good adhesion performance, high residual film rate, good UV transmittance, good pattern formation and chemical resistance, and the like.

Inventors

• BI YANGANG
• YAN JUNXIONG
• ZHU HONGWEI
• CUI SHUYING
• DOU FAN
• TENG FUAI
• LIU TIANYONG
• WANG ZHENYU
• FU TIANLIN
• XU JING
• Hong Haizhe

Assignees

• 烟台希尔德材料科技有限公司

Dates

Publication Date

20260505

Application Date

20230629

Claims (7)

1. 1. A photoresist composition is characterized in that the photoresist composition is prepared from a compound containing a multifunctional polysiloxane structure, a solvent, a monomer with ethylene unsaturated bonds, a sensitizer and an auxiliary agent; the structural formula of the compound containing the multifunctional polysiloxane structure is selected from the following general formula II: A general formula II; In the general formula II, R 2 and R 3 are independently selected from one or two of C1-C20 linear alkyl, branched alkyl and aromatic hydrocarbon derivatives, R 4 is methyl or hydrogen atom, R 6 is one or two of methyl, ethyl, propyl or butyl, R 5 and R 7 are independently selected from one of hydrogen atom, C1-C20 linear alkyl, branched alkyl and aromatic hydrocarbon derivatives; n is an integer from 10 to 20; a:b:c=1:44.5-99:44.5-99; The compound containing the multi-functional polysiloxane structure accounts for 5-30% of the total weight of the composition; the solvent accounts for 30-80% of the total weight of the composition; the monomer with ethylene unsaturated bond accounts for 5% -35% of the total weight of the composition; The sensitizer accounts for 0.5-10% of the total weight of the composition.
2. 2. The photoresist composition according to claim 1, wherein the solvent is one or two or more selected from the group consisting of diethylene glycol dimethyl ether, ethylene glycol dimethyl ether, propylene glycol dimethyl ether, methyl acrylate, propyl acrylate, methyl cellulose, ethyl cellulose, diethylene glycol methyl ether acetate, diethylene glycol ethyl ether acetate, methyl isobutyl ketone, cyclohexanone, dimethoxyformamide, N-dimethylacetamide, N-methyl-2-pyrrolidone, γ -butadiene, diglycine, ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether.
3. 3. The photoresist composition according to claim 1, wherein the monomer having an ethylene unsaturated bond is one or more selected from the group consisting of methacrylate, ethyl (meth) acrylate, butyl (meth) acrylate, ethylene glycol di (meth) acrylate, polyethylene glycol (meth) acrylate, trimethylpropane di (meth) acrylate, trimethylpropane tri (meth) acrylate, pentadiene alkyd ester, dipentaerythritol hexaacrylate, pentyltetrahydroacrylate, ethylene glycol terephthalate, ethylene glycol (meth) acrylate, α, β -unsaturated carboxylic acid ester, bisphenol a dipropylene glycol ether acrylate, β -hydroxyethyl (meth) acrylate phthalate, β -hydroxyethyl (meth) acrylate toluene diisocyanate, polyisocyanate, dimethylpropane tetraacrylate, ethylene cyanurate (2-hydroxyethyl acrylate) isocyanate, ethylene oxide ethylene phthalate, ethylene oxide trimethamine, ethylene glycol phthalate, propylene glycol phthalate triacrylate, styrene derivative.
4. 4. The photoresist composition according to claim 1, wherein the sensitizer is selected from the group consisting of benzophenone, 1-hydroxy-1-phenylcyclohexane, benzyldimethyl ketone, 1-benzyl-1-dimethylamino-1- (4-pentadiene-phenylketone) propane, 2-pentadiene-2- (4-methyl methacrylate) phenylpropane, 1-chloro-4-propoxyphenylketone, isopropoxypropion, diethoxyphenylacetone, ethoxyphenylacetone, 4-phenyl-4-methyldiphenylsulfanilamide, phenylbutyl ether, 2-hydroxy-2-phenylpropane, 2-hydroxy-2- (4-isopropyl) benzoic acid ethyl ester, 4-butylbenzene trichloromethane, 4-phenoxyphenyldichloromethane, ethyl benzoate, 1,7-BIS (9-acrylic acid) hexane, 9-n-butyl-3, 6-BIS (2-morpholinobutylmethol thiol), diphenyl (2, 4, 6-trimethylbenzoyl) -phosphonate, 10-butyl-2-ketamine, 4'-BIS (4, 4' -dimethylamino) -BIS- [2- (4-isopropyl) benzoic acid ethyl ester, 4-butylbenzene trichloromethane, 4-BIS- [3, 6-BIS- [ 2-methoxy ] methyl- [3, 6-BIS- [3, 6-methyl ] benzene ] methyl- [3, 5-BIS- [3, 5-chloro ] propane, 5-BIS- [3, 5-dichloro ] benzene ] methyl- [3, 5-chloro ] propane One or two or more of 2-methyl-4, 6-bis (trichloromethyl) -s-triazine, 2-benzene-4, 6-bis (trichloromethyl) -s-triazine and 2-naphthalene-4, 6-bis (trichloromethyl) -s-triazine.
5. 5. The photoresist composition according to claim 1, wherein the auxiliary agent is one or a combination of two or more of a photo-increasing/decreasing agent, a thermal polymerization inhibitor, an antifoaming agent, and a leveling agent.
6. 6. Photoresist composition according to any of claims 1 to 5, characterized in that it is prepared as follows: after all the raw materials are mixed, propylene glycol methyl ether acetate is dissolved into the raw material mixture to make the solid concentration be 15-18%, and then the mixture is stirred at normal temperature, and then filtered by a microporous filter to prepare the photoresist composition.
7. 7. The photoresist composition according to claim 6, where the pore size of the microporous filter is 0.2 μm.

Description

Compound containing multifunctional polysiloxane structure and application thereof Technical Field The invention relates to a compound containing a multi-functional polysiloxane structure and application thereof, belonging to the technical field of photoresist. Background A thin film transistor liquid crystal display (thin film transistor liquid CRYSTAL DISPLAY, abbreviated as LCDTFT-LCD) is one type of liquid crystal display, and uses thin film transistor technology to improve image quality, and its structure mainly includes three components of Color Filter (CF) substrate, liquid crystal, and thin film transistor (Thin Film Transistor, TFT) substrate. A tft-lcd has high-speed response characteristics and can be applied to many pixels, and thus has contributed greatly to the realization of high-quality, large-sized, color, etc. of a display screen comparable to a Cathode Ray Tube (CRT). The low dielectric constant organic insulating film is important for reducing parasitic capacitance between the pixel electrode and the wiring. Low dielectric constant materials are also required to meet the thermal stability, mechanical properties and chemical properties required for insulating film materials. When an organic insulating film is formed using a photoresist composition containing a conventional binder resin, not only a sufficiently low dielectric constant is not exhibited, but also adhesion to a metal is poor, a residual film rate after development is low, resulting in poor flatness of a pattern. Therefore, an adhesive suitable for an organic insulating film is required. Disclosure of Invention The present invention addresses the above-described shortcomings of the prior art by providing a compound containing a multifunctional polysiloxane structure and its use. The technical scheme for solving the technical problems is as follows: it is an object of the present invention to provide a compound containing a multifunctional polysiloxane structure having a structural formula selected from the following general formula I or general formula II: In the general formula I, R 2 and R 3 are independently selected from one or two of C1-C20 linear alkyl or branched alkyl, alkenyl derivative, cycloalkyl or aromatic hydrocarbon derivative, R 4 is methyl or hydrogen atom, R 6 is one or two of methyl, ethyl, propyl, isopropyl, butyl, isobutyl or acrylate group with R 4 group; n is an integer from 1 to 20; In the general formula II, R 2 and R 3 are independently selected from one or two of C1-C20 linear alkyl or branched alkyl, alkenyl derivatives, cycloalkyl or aromatic hydrocarbon derivatives, R 4 is methyl or hydrogen atom, R 6 is one or two of methyl, ethyl, propyl, isopropyl, butyl, isobutyl or acrylate with R 4 groups, R 5 and R 7 are independently selected from one of hydrogen atom, C1-C20 linear alkyl or branched alkyl, alkenyl derivatives, cycloalkyl, aromatic hydrocarbon derivatives, epoxy or polyhydroxy group derivatives; n is an integer from 1 to 20; the structure of the general formula I is obtained by the following reaction equation I: In the reaction equation I, R 1 is selected from one or two of methyl, ethyl, propyl, isopropyl, butyl and isobutyl, R 2 and R 3 are respectively and independently selected from one or two of C1-C20 linear alkyl or branched alkyl, alkenyl derivatives, cycloalkyl or aromatic hydrocarbon derivatives, R 4 is methyl or hydrogen atom, R 5 is methyl or hydrogen atom, the type of R 6 mainly depends on the numerical value of x, when x=1, R 6 is the same group as R 1, when x=4, R 6 is substituted acrylate, and when x=2 or 3, R 6 is one or two of R 1 and/or acrylate. Taking as an example when x=2, the following reaction equation II is performed to give the structure of formula II: R In the reaction equation II, a, b and C are the molar ratio of each monomer, y=x, and R 5 and R 7 are each independently selected from one of hydrogen atom, C1-C20 linear alkyl or branched alkyl, alkenyl derivative, cycloalkyl, aromatic hydrocarbon derivative, epoxy group or polyhydroxy group derivative. Based on the technical scheme, the invention can also make the following improvements: further, the reaction temperature of the reaction equation I is 30-150 ℃, preferably 40-120 ℃, more preferably 50-100 ℃, the reaction time is 1-24 hours, preferably 3-12 hours, more preferably 5-8 hours. Further, the average molecular weight of the product in reaction equation I is 200 to 20000, the dispersity (Mw/Mn) is 1.0 to 5.0, the preferable molecular weight range is 500 to 15000, the dispersity (Mw/Mn) is 1.0 to 4.5, and the more preferable dispersity (Mw/Mn) is 1.0 to 3.0. The solvent used in the reaction equation I may be a protic organic solvent such as alcohols, or one or more aprotic organic solvents such as N, N-dimethylformamide, N-diethylformamide, N-methylpyrrolidone, N-and pyrrolidone, tetrahydrofuran, ethyl acetoacetate, diethylene glycol dimethyl ether, methyl methoxypropyl propyl ester, ethylene glycol dimet