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CN-117046332-B - Gas mixing device and semiconductor process equipment

CN117046332BCN 117046332 BCN117046332 BCN 117046332BCN-117046332-B

Abstract

The embodiment of the invention provides a gas mixing device and semiconductor process equipment, and relates to the field of semiconductors. The gas mixing device comprises a body, wherein a gas mixing cavity is arranged in the body, and a first flow passage, a second flow passage and a gas outlet flow passage which are communicated with the gas mixing cavity are further arranged in the body. One end of the first runner and one end of the second runner, which are communicated with the mixing cavity, extend towards the center of the mixing cavity. The gas mixing device can enable multiple gases to be mixed more uniformly, so that the requirements of a semiconductor process can be met.

Inventors

  • JIA XIN
  • ZHU JIAQI
  • ZHANG YANZHE
  • LIU SIRAN

Assignees

  • 拓荆创益(沈阳)半导体设备有限公司

Dates

Publication Date
20260512
Application Date
20230829

Claims (9)

  1. 1. The gas mixing device is characterized by comprising a body (110), wherein a gas mixing cavity (111) is arranged in the body (110), and the body (110) is further provided with a first flow channel (113), a second flow channel (115) and a gas outlet flow channel (117) which are communicated with the gas mixing cavity (111); one end of the first flow channel (113) and one end of the second flow channel (115) which are communicated with the air mixing cavity (111) extend towards the center of the air mixing cavity (111); The first runner (113) comprises a first air inlet section (119), a first pressure stabilizing section (123) and a first pressurizing section (121) which are sequentially connected, the flow area of the first air inlet section (119) is larger than that of the first pressurizing section (121), and the flow area of the first pressure stabilizing section (123) is larger than that of the first air inlet section (119); The second flow channel (115) comprises a second air inlet section (125), a second pressure stabilizing section (129) and a second pressurizing section (127) which are sequentially connected, the flow area of the second air inlet section (125) is larger than that of the second pressurizing section (127), and the flow area of the second pressure stabilizing section (129) is larger than that of the second air inlet section (125); Wherein one end of the first air inlet section (119) is communicated with the outside of the body (110), the other end of the first air inlet section is communicated with one end of the first pressurizing section (121), and the other end of the first pressurizing section (121) is communicated with the air mixing cavity (111) and extends obliquely towards the center direction of the air mixing cavity (111); One end of the second air inlet section (125) is communicated with the outside of the body (110), the other end of the second air inlet section is communicated with one end of the second pressurizing section (127), and the other end of the second pressurizing section (127) is communicated with the air mixing cavity (111) and extends obliquely towards the center direction of the air mixing cavity (111).
  2. 2. The gas mixing device according to claim 1, wherein one end of the first pressure stabilizing section (123) is communicated with the first gas inlet section (119), and the other end is communicated with the first pressurizing section (121); one end of the second pressure stabilizing section (129) is communicated with the second air inlet section (125), and the other end of the second pressure stabilizing section is communicated with the second pressurizing section (127).
  3. 3. The air mixing device according to claim 1 or 2, wherein the first pressurizing section (121) comprises a plurality of branch flow passages a (131) which are arranged in the same direction, one ends of the plurality of branch flow passages a (131) are communicated with the first air inlet section (119), the other ends of the plurality of branch flow passages a (131) are communicated with the air mixing chamber (111) and extend obliquely towards the center direction of the air mixing chamber (111), and the sum of the flow areas of the plurality of branch flow passages a (131) is smaller than the flow area of the first air inlet section (119); The second pressurizing section (127) comprises a plurality of branch flow passages B (133) which are arranged in the same direction, one ends of the branch flow passages B (133) are communicated with the second air inlet section (125), the other ends of the branch flow passages B (133) are communicated with the air mixing cavity (111), the branch flow passages B (133) are obliquely extended towards the center direction of the air mixing cavity (111), and the sum of the flow areas of the branch flow passages B (133) is smaller than the flow area of the second air inlet section (125).
  4. 4. A gas mixing device according to claim 3, wherein the openings at the ends of the plurality of branch flow passages a (131) communicating with the gas mixing chamber (111) are arranged obliquely toward the center of the gas mixing chamber (111), and the included angle with the depth direction of the gas mixing chamber (111) is in the range of 30 ° -60 °; the openings of the ends, communicated with the air mixing cavity (111), of the branch flow passages B (133) are obliquely arranged towards the center of the air mixing cavity (111), and the included angle between the openings and the depth direction of the air mixing cavity (111) is 30-60 degrees.
  5. 5. The air mixing device according to claim 1, wherein the air mixing chamber (111) is flat, and the first flow passage (113) and the second flow passage (115) are respectively communicated with both sides of the air mixing chamber (111) in the length direction.
  6. 6. The gas mixing device according to claim 1, wherein the gas outlet channel (117) is disposed at the center of the body (110), and two sides of the gas mixing chamber (111) close to the gas outlet channel (117) are provided with step-shaped turbulence surfaces (135), and the turbulence surfaces (135) can turbulence the gas in the gas mixing chamber (111) to make the gas mixing more uniform.
  7. 7. The gas mixing device of claim 2, wherein the body (110) comprises a first body member (137), a second body member (139), and a third body member (141); The air mixing cavity (111) is partially arranged in the second body part (139), the other part is arranged in the third body part (141), the first air inlet section (119) and the second air inlet section (125) are respectively concavely arranged on one side of the first body part (137), the first voltage stabilizing section (123) and the second voltage stabilizing section (129) are respectively arranged on the other side of the first body part (137) and are correspondingly communicated, the air outlet flow passage (117) and the part of the air mixing cavity (111) are arranged in the third body part (141), and the first body part (137), the second body part (139) and the third body part (141) are sequentially laminated.
  8. 8. The gas mixing device according to claim 7, wherein the cross sections of the first gas inlet section (119), the first pressure stabilizing section (123) and the first pressurizing section (121) are all circular, and the diameter of the first pressure stabilizing section (123) is larger than the diameter of the first gas inlet section (119), and the diameter of the first gas inlet section (119) is larger than the diameter of the first pressurizing section (121); The sections of the second air inlet section (125), the second pressure stabilizing section (129) and the second pressurizing section (127) are all round, the diameter of the second pressure stabilizing section (129) is larger than that of the second air inlet section (125), and the diameter of the second air inlet section (125) is larger than that of the second pressurizing section (127).
  9. 9. A semiconductor processing apparatus comprising the gas mixing device of any one of claims 1-8.

Description

Gas mixing device and semiconductor process equipment Technical Field The invention relates to the field of semiconductor equipment, in particular to a gas mixing device and semiconductor process equipment. Background In the preparation of semiconductor products, it is often necessary to introduce two or more mixed gases into the process chamber to complete the process steps. The existing gas introduced into the process chamber has low mixing uniformity, and influences the quality formed in the process steps. Disclosure of Invention The object of the present invention includes, for example, providing a gas mixing device and a semiconductor process arrangement that enables a more uniform mixing of multiple gases so that the requirements of the semiconductor process can be met. Embodiments of the invention may be implemented as follows: In a first aspect, the invention provides an air mixing device, which comprises a body, wherein an air mixing cavity is arranged in the body, and the body is further provided with a first flow channel, a second flow channel and an air outlet flow channel which are communicated with the air mixing cavity; And one ends of the first flow channel and the second flow channel, which are communicated with the air mixing cavity, extend towards the center of the air mixing cavity. In an alternative embodiment, the first flow path includes a first intake section and a first pressurization section; the flow area of the first air inlet section is larger than that of the first pressurizing section; One end of the first air inlet section is communicated with the outside of the body, the other section of the first air inlet section is communicated with one end of the first pressurizing section, and the other section of the first pressurizing section is communicated with the air mixing cavity and extends obliquely towards the center direction of the air mixing cavity; The second flow passage comprises a second air inlet section and a second pressurizing section; The flow area of the second air inlet section is larger than that of the second pressurizing section; one end of the second air inlet section is communicated with the outside of the body, the other section is communicated with one end of the second pressurizing section, and the other section of the second pressurizing section is communicated with the air mixing cavity and extends obliquely towards the center direction of the air mixing cavity. In an alternative embodiment, the first flow channel further comprises a first pressure stabilizing section; the flow area of the first pressure stabilizing section is larger than that of the first air inlet section, one end of the first pressure stabilizing section is communicated with the first air inlet section, and the other end of the first pressure stabilizing section is communicated with the first pressurizing section; The first runner further comprises a second pressure stabilizing section; The flow area of the second pressure stabilizing section is larger than that of the second air inlet section, one end of the second pressure stabilizing section is communicated with the second air inlet section, and the other end of the second pressure stabilizing section is communicated with the second pressurizing section. In an alternative embodiment, the first pressurizing section includes a plurality of branch flow passages a arranged in the same direction, one ends of the plurality of branch flow passages a are all communicated with the first air inlet section, the other ends of the plurality of branch flow passages a are all communicated with the air mixing cavity and extend obliquely towards the center direction of the air mixing cavity, and the sum of the flow areas of the plurality of branch flow passages a is smaller than the flow area of the first air inlet section; The second pressurizing section comprises a plurality of branch flow passages B which are arranged in the same direction, one ends of the branch flow passages B are communicated with the second air inlet section, the other ends of the branch flow passages B are communicated with the air mixing cavity and extend obliquely towards the center direction of the air mixing cavity, and the sum of the flow areas of the branch flow passages B is smaller than the flow area of the second air inlet section. In an optional embodiment, the openings at one end of the plurality of branch flow passages A, which are communicated with the air mixing cavity, are obliquely arranged towards the center of the air mixing cavity, and the included angle between the openings and the depth direction of the air mixing cavity is 30-60 degrees; The openings of one end of the plurality of branch flow passages B, which are communicated with the air mixing cavity, are obliquely arranged towards the center of the air mixing cavity, and the included angle between the plurality of branch flow passages B and the depth direction of the air mixing cavity is 30-60 deg