CN-117228961-B - Device and method for nondestructively preparing anti-dazzle glass by laser

Abstract

The invention provides a device and a method for nondestructively preparing anti-dazzle glass by laser, which belong to the field of glass manufacturing, wherein the device comprises an ultrafast laser atomization unit, a high-temperature passivation unit and a sample changing unit, wherein the ultrafast laser atomization unit is used for carrying out laser scanning etching treatment on glass to be treated by utilizing ultrafast laser so as to form a micro-nano structure with randomness on the surface of the glass to be treated, so that atomized glass is obtained; the high-temperature passivation unit is used for heating the surface of the atomized glass to remelt the micro-nano structure of the atomized glass so as to adjust the glossiness, the haze and the transmittance, and further the anti-dazzle glass is prepared, and the sample changing unit is used for transporting the atomized glass and the anti-dazzle glass so as to change samples of the laser atomization unit and the high-temperature passivation unit. The invention can form an anti-dazzle structure with random textures on the surface of the glass to be treated, further reduces the reflectivity of the glass to the incident light, plays the role of anti-dazzle, has good wear resistance and scratch resistance, and can directly process glass with any thickness.

Inventors

• DENG LEIMIN
• LIU YI
• DING YUHANG
• TANG AIGUO
• HAO ZHENYU
• Lu Wangrong
• WU XINQIAN
• CHEN QIAODAN
• Chang Shunda
• YANG SHAORUI
• XU XINKE
• WU SI
• SU XIAOHUI
• MA HAORAN
• WANG QUANJI

Assignees

• 华中科技大学

Dates

Publication Date

20260505

Application Date

20231031

Claims (9)

1. 1. A method for preparing anti-dazzle glass by laser without damage is characterized in that the method comprises the following steps: s1, carrying out laser scanning etching treatment on glass to be treated by using ultra-fast laser to form a micro-nano structure with randomness on the surface of the glass to be treated so as to obtain atomized glass; S2, heating the atomized glass to enable the micro-nano structure on the surface to be remelted so as to adjust glossiness, haze and transmittance, and further obtaining the anti-dazzle glass, wherein the substrate temperature of the atomized glass is guaranteed to be 400-650 ℃, and the surface of the atomized glass is heated to 800-2000 ℃.
2. 2. The method for nondestructively preparing antiglare glass by laser according to claim 1, wherein in step S1, a damaged area is preset on the glass to be treated, and then the glass to be treated is subjected to laser scanning etching treatment by using ultrafast laser.
3. 3. An apparatus for the laser non-destructive preparation of antiglare glass for carrying out the method according to claim 1 or 2, characterized in that the apparatus comprises an ultrafast laser atomizing unit (a), a high temperature passivation unit (C) and a sample exchange unit (B), wherein: The ultrafast laser atomization unit (A) is used for carrying out laser scanning etching treatment on glass to be treated by using ultrafast laser so as to form a micro-nano structure with randomness on the surface of the glass to be treated, so that atomized glass is obtained; The high-temperature passivation unit (C) is used for heating the surface of the atomized glass to remelt the micro-nano structure of the atomized glass so as to adjust the glossiness, the haze and the transmittance of the atomized glass, so that the anti-dazzle glass is prepared, the high-temperature passivation unit (C) ensures that the substrate temperature of the atomized glass is 400-650 ℃, and the surface of the atomized glass is heated to 800-2000 ℃; The sample changing unit (B) is used for transporting the atomized glass and the anti-dazzle glass to change samples of the laser atomizing unit (A) and the high-temperature passivation unit (C).
4. 4. The device for nondestructively preparing anti-dazzle glass by laser according to claim 3, wherein the ultrafast laser atomization unit (A) comprises a sample stage module and an ultrafast laser (1), a beam expanding collimator lens (2), a first light guide lens (3), a second light guide lens (4) and a scanning focusing module which are sequentially arranged above the sample stage module along the light propagation direction, the sample stage module is used for placing glass to be processed, the ultrafast laser (1) is used for emitting ultrafast laser and sending the ultrafast laser into the beam expanding collimator lens (2) for beam expanding collimation, and the ultrafast laser after beam expanding collimation sequentially passes through the first light guide lens (3) and the second light guide lens (4) and then is incident into the scanning focusing module to carry out laser scanning etching processing on the glass to be processed under the control of the scanning focusing module.
5. 5. The device for nondestructively preparing anti-dazzle glass by laser according to claim 4, wherein the scanning focusing module comprises a scanning galvanometer (5), a scanning field lens (6), a Z-axis moving mechanism (11), a laser displacement sensor (13) and an industrial camera (12), wherein the scanning galvanometer (5) and the scanning field lens (6) are mutually matched to scan and gather ultra-fast laser, the Z-axis moving mechanism (11) is connected with the scanning galvanometer (5) and the scanning field lens (6) and is used for driving the scanning galvanometer and the scanning field lens to move along the Z-axis direction, the laser displacement sensor (13) and the industrial camera (12) are fixed below the Z-axis moving mechanism (11), the laser displacement sensor (13) is used for measuring the displacement of the Z-axis moving mechanism (11), and the industrial camera (12) is used for monitoring the surface state of glass to be processed in real time.
6. 6. The device for nondestructively preparing the anti-dazzle glass by using the laser according to claim 4, wherein the sample stage module comprises a clamp (9) and an XY axis moving mechanism (10), the clamp (9) is arranged above the XY axis moving mechanism (10) and is used for clamping and fixing glass to be treated, and the XY axis moving mechanism (10) is used for driving the glass to be treated to move along a X, Y axis.
7. 7. The device for nondestructively preparing anti-dazzle glass by laser according to any one of claims 4 to 6, wherein the ultrafast laser atomization unit (a) further comprises a plasma agglutinate guiding mechanism (7), and the plasma agglutinate guiding mechanism (7) is arranged above the sample stage module and is used for removing waste generated by laser scanning etching treatment.
8. 8. The apparatus for nondestructively preparing antiglare glass by laser according to claim 3, wherein the high temperature passivation unit (C) comprises a heating mechanism (16), a constant temperature base (15) and a circulating cooling mechanism (17), wherein the heating mechanism (16) is used for heating the surface of the atomized glass to remelt the surface micro-nano structure thereof, the constant temperature base (15) is used for maintaining the temperature of the atomized glass substrate, and the circulating cooling mechanism (17) is used for maintaining the temperature of the heating mechanism (16) and the constant temperature base (15) constant.
9. 9. The device for nondestructively preparing anti-dazzle glass by laser according to claim 3, wherein the sample changing unit (B) comprises a transferring mechanism (14), and the transferring mechanism (14) is arranged between the ultrafast laser atomizing unit (A) and the high-temperature passivation unit (C) and is used for grabbing and transferring the atomized glass and the anti-dazzle glass so as to change samples.

Description

Device and method for nondestructively preparing anti-dazzle glass by laser Technical Field The invention belongs to the field of glass manufacturing, and in particular relates to a device and a method for preparing anti-dazzle glass by laser without damage. Background The manufacturing process of antiglare glass has been continuously improved and developed, resulting in manufacturing methods based on mechanical, chemical and laser. The mechanical processing method is mainly classified into a sand blasting method and a sand polishing method, and the chemical processing method is mainly classified into a chemical etching method, a chemical spraying method and a glass surface coating method. The main current processing technologies are chemical etching and chemical spraying, and both technologies need etching liquid containing hydrofluoric acid. The hydrofluoric acid and the reacted fluorine-containing chemical waste liquid have huge harm to the environment, and even the fluoride ions in the waste liquid after sedimentation treatment are easily reduced out in the natural environment and permeate into the soil. In recent years, the manufacturing process of anti-dazzle glass based on laser processing technology, which is more environment-friendly than chemical method, is gradually developed. CN110449745A discloses a laser etching method of antiglare glass, which comprises feeding the processed and formed plate glass into a rail high temperature furnace, heating to a specific temperature region below the glass transition temperature for laser engraving, feeding the plate glass into the high temperature furnace after engraving, cooling to room temperature, and completing the manufacture of antiglare glass. However, according to the technical scheme, a periodic structure is prepared on the surface of the glass by using a laser scanning method, so that the surface of the glass is rasterized, and the problem of poor display effect is caused. Disclosure of Invention Aiming at the defects of the prior art, the invention aims to provide a device and a method for preparing anti-dazzle glass by laser without damage, and aims to solve the problem that the existing anti-dazzle glass laser preparation technology can cause the surface rasterization of glass. In order to achieve the above object, according to an aspect of the present invention, there is provided an apparatus for laser non-destructive preparation of antiglare glass, the apparatus comprising an ultrafast laser atomizing unit, a high temperature passivation unit, and a sample changing unit, wherein: the ultrafast laser atomization unit is used for carrying out laser scanning etching treatment on glass to be treated by using ultrafast laser so as to form a micro-nano structure with randomness on the surface of the glass to be treated, so that atomized glass is obtained; The high-temperature passivation unit is used for heating the surface of the atomized glass to remelt the micro-nano structure of the atomized glass so as to adjust the glossiness, the haze and the transmittance, and further prepare the anti-dazzle glass; the sample changing unit is used for transporting the atomized glass and the anti-dazzle glass to change samples of the laser atomizing unit and the high-temperature passivation unit. The ultra-fast laser atomization unit comprises a sample stage module, an ultra-fast laser, a beam expanding collimating lens, a first light guide lens, a second light guide lens and a scanning focusing module, wherein the ultra-fast laser, the beam expanding collimating lens, the first light guide lens, the second light guide lens and the scanning focusing module are arranged above the sample stage module in sequence along the light propagation direction, the sample stage module is used for placing glass to be processed, the ultra-fast laser is used for emitting ultra-fast laser and sending the ultra-fast laser into the beam expanding collimating lens to expand and collimate, and the ultra-fast laser after the expanded and collimated is incident into the scanning focusing module after being reflected by the first light guide lens and the second light guide lens in sequence so as to carry out laser scanning etching processing on the glass to be processed under the control of the scanning focusing module. The scanning focusing module comprises a scanning galvanometer, a scanning field lens, a Z-axis moving mechanism, a laser displacement sensor and an industrial camera, wherein the scanning galvanometer and the scanning field lens are mutually matched to scan and gather ultra-fast laser, the Z-axis moving mechanism is connected with the scanning galvanometer and the scanning field lens and used for driving the scanning galvanometer and the scanning field lens to move along the Z-axis direction, the laser displacement sensor and the industrial camera are fixed below the Z-axis moving mechanism, the laser displacement sensor is used for measuring the displacement of th