CN-117259063-B - Isostatic graphite tantalum carbide coating deposition equipment for epitaxial substrate

CN117259063BCN 117259063 BCN117259063 BCN 117259063BCN-117259063-B

Abstract

The invention discloses isostatic graphite tantalum carbide coating deposition equipment for an epitaxial substrate, in particular to the technical field of coating deposition equipment, which comprises a base for supporting, the top of base is provided with gathers together the deposition subassembly, gather together the deposition subassembly and including the connecting plate that is used for supporting, the connecting plate sets up at the top of base. According to the invention, through the corresponding matching use of each structure, the two first heating plates are mutually close to limit the material first, so that the phenomenon of displacement of the subsequent material during coating deposition is avoided, the material can be gathered between the first heating plate and the second heating plate, the coating can be gathered between the first heating plate, the second heating plate and the material during deposition, the deposition efficiency is improved, and the coating can be continuously gathered downwards through the trapezoid section formed by combining the second guide plate and the first guide plate, so that the density is higher.

Inventors

ZHAO GUANGXIE
JU DESHENG
WANG MIN
YUAN HAIYUN
LI BINGKUN

Assignees

山东华达新材料有限公司

Dates

Publication Date: 20260505
Application Date: 20230926

Claims (7)

1. The isostatic graphite tantalum carbide coating deposition equipment for the epitaxial substrate comprises a base (1) for supporting, and is characterized in that a gathering deposition assembly is arranged at the top of the base (1); The gathering deposition assembly comprises; the connecting plate (101) is used for supporting, and the connecting plate (101) is arranged at the top of the base (1); The frame opening (102) is used for dislocation, and the frame opening (102) is arranged on the connecting plate (101); the transition ports (103) are used for dislocation, and the transition ports (103) are arranged on two sides of the inner wall of the frame port (102); the two first guide plates (2) are used for guiding, the first guide plates (2) are respectively arranged on two sides of the inner wall of the frame opening (102), and the two frame openings (102); Two second guide plates (3) for guiding, and each second guide plate (3) is respectively arranged in a corresponding transition port (103); wherein, the vertical section shape of each second guide plate (3) and each first guide plate (2) is combined into a trapezoid; the gathering deposition assembly further comprises; two first heating plates (104) capable of oppositely displacing, and each first heating plate (104) is respectively arranged at the bottom of a corresponding first guide plate (2); two second heating plates (105) capable of oppositely displacing, and each second heating plate (105) is respectively arranged at the bottom of the corresponding second guide plate (3); the cross-sectional shapes of the first heating plate (104) and the second heating plate (105) are combined into a rectangle, and the outer sides of the first heating plate (104) and the second heating plate (105) are respectively provided with a deformable sealing sleeve; the second pin connecting rods (301) are used for supporting, every two of the second pin connecting rods (301) are arranged on one side of the corresponding second guide plate (3) in a group, and one end of each second pin connecting rod (301) extends to the connecting plate (101) and is detachably connected with the connecting plate (101); Two top plates (302) with adjustable angles, wherein each top plate (302) is respectively arranged between the two corresponding second pin connecting rods (301) and is movably connected with the second pin connecting rods (301) through shaft pins; two second hydraulic rods (306) for driving, wherein each second hydraulic rod (306) is respectively arranged at one side of a corresponding vertical plate (305); the output end of the second hydraulic rod (306) drives the top plate (302) to rotate along the axis point of the joint of the top plate (302) and the second pin connecting rod (301), and the top plate (302) drives the second guide plate (3) to displace and contact with the second heating plate (105) when being inclined.
2. An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates as claimed in claim 1, wherein: the gathering deposition assembly further comprises; Two handles (106) for lifting, wherein each handle (106) is respectively arranged at two sides of the top of the connecting plate (101), and the two handles (106) are detachably connected with the connecting plate (101); The two guide grooves (107) are used for guiding, and the two guide grooves (107) are formed in the upper surface of the base (1).
3. An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates as claimed in claim 1, wherein: the gathering deposition assembly further comprises; the first shaft pin connecting rods (201) are used for supporting, two of the first shaft pin connecting rods (201) are arranged on one side of the top of the corresponding first guide plate (2), and one ends of the two first shaft pin connecting rods (201) extend to the connecting plate (101) and are detachably connected with the connecting plate (101); Two angle-adjustable reinforcing frames (202), wherein each reinforcing frame (202) is respectively arranged on a corresponding first shaft pin connecting rod (201) and is movably connected with the first shaft pin connecting rod (201); The first pulleys (203) are used for transition, and each first pulley (203) is respectively arranged on a corresponding reinforcing frame (202) and is movably connected with the reinforcing frame (202); And the two locating frames (204) are used for limiting, each locating frame (204) is arranged on one side of the corresponding first guide plate (2), and the locating frames (204) are detachably connected with the connecting plate (101).
4. An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates as claimed in claim 3 wherein: the gathering deposition assembly further comprises; the supporting blocks (205) are used for supporting, every two supporting blocks (205) are respectively arranged on two sides of the top of the corresponding locating frame (204), and the supporting blocks (205) are movably connected with the locating frame (204); The plurality of extension rods (206) are used for supporting, each two of the extension rods (206) are respectively arranged on one side of the corresponding first guide plate (2), and the extension rods (206) are detachably connected with the connecting plate (101) through bolts; a plurality of first shaft pin seats (207) for supporting, wherein each two of the first shaft pin seats (207) are respectively arranged on the corresponding extension rod (206) in a group and are detachably connected with the extension rod (206); The first hydraulic rods (208) are used for driving, and each two of the first hydraulic rods (208) are respectively arranged on the corresponding first shaft pin seat (207) and are movably connected with the first shaft pin seat (207) through shaft pins; The output end of each first hydraulic rod (208) extends to the corresponding reinforcing frame (202) respectively and is movably connected with the reinforcing frame (202) through a shaft pin.
5. An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates as claimed in claim 1, wherein: the gathering deposition assembly further comprises; the second pulleys (303) are used for transition, the second pulleys (303) are respectively arranged on the corresponding top plates (302), and the second pulleys (303) are movably connected with the top plates (302).
6. An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates as claimed in claim 1, wherein: the gathering deposition assembly further comprises; Two second shaft pin seats (304) for supporting, wherein each second shaft pin seat (304) is respectively arranged at one side of a corresponding second guide plate (3), and the second shaft pin seats (304) are detachably connected with the connecting plate (101); The two risers (305) can rotate, and each riser (305) is respectively arranged on a corresponding second shaft pin seat (304) and is movably connected with the second shaft pin seat (304) through a shaft pin; Each second hydraulic rod (306) penetrates through the corresponding vertical plate (305) and extends to the top plate (302) to be movably connected with the top plate (302) through a shaft pin.
7. An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates according to claim 2, wherein two of said guide grooves (107) are staggered and the cross-sectional shapes of two of said guide grooves (107) are combined into a cross shape, and said first heating plate (104) and said second heating plate (105) are slidably connected to said guide grooves (107), respectively.

Description

Isostatic graphite tantalum carbide coating deposition equipment for epitaxial substrate Technical Field The invention relates to the technical field of coating deposition equipment, in particular to isostatic pressing graphite tantalum carbide coating deposition equipment for an epitaxial substrate. Background An isostatic graphite tantalum carbide coating deposition apparatus for epitaxial substrates is an apparatus for depositing a graphite tantalum carbide coating on an epitaxial substrate. The graphite tantalum carbide coating has excellent corrosion resistance, high-temperature stability and mechanical properties, and is commonly used for applications in the fields of semiconductors, photoelectrons, material science and the like. The apparatus employs an isostatic technique, i.e., utilizes static pressure at high temperature and high pressure to deposit graphite tantalum carbide material on the epitaxial substrate surface. And (3) reacting the carbon source with the metal source by heating and high pressure to generate a graphite tantalum carbide film, and depositing on the epitaxial substrate. The apparatus generally comprises a reaction chamber, a heating system, a static pressure system, a control system and the like. The isostatic graphite tantalum carbide coating deposition device for the epitaxial substrate can realize high-quality coating deposition, and provides an effective way for improving the performance and the function of the epitaxial substrate. Wherein, through retrieving the discovery, patent application number CN202220631373.9 discloses a sintering tantalum carbide coating preparation equipment on graphite base plate, including box, coating mixing box, spraying subassembly, support frame and temperature regulator, be provided with air inlet and gas outlet on the box, its characterized in that: the inner wall of the box body is provided with a spray pipe which is annularly arranged, a plurality of spray nozzles are circumferentially and uniformly distributed on the spray pipe, the spray pipe is connected with an external paint mixing box, a support frame is connected with a rotary lifting mechanism, the rotary lifting mechanism comprises a lifting cylinder, a rotary motor, a mounting plate and a connecting shaft, the connecting shaft is connected with the support frame and is rotatably arranged on the mounting plate, the rotary motor is fixed on the mounting plate, an output end of the rotary motor is connected with the connecting shaft through a gear or belt transmission, the lifting cylinder is arranged below the mounting plate, and an output end of the lifting cylinder is connected with the mounting plate; This structure is when using, through setting up annular spray tube and connecting support frame and rotatory elevating system, in the spraying process, utilize each nozzle on the annular spray tube to spray the coating simultaneously, when the lift cylinder drives the graphite base plate on the support frame and slowly goes up and down, the rotating electrical machines can also drive the graphite base plate and slowly rotate to guaranteed the even spraying of coating on the graphite base plate, but this structure is difficult to gather on article when carrying out the deposit when using, and the effect is not good when causing the coating deposit, influences shaping quality. Disclosure of Invention In order to overcome the defects in the prior art, the invention provides isostatic graphite tantalum carbide coating deposition equipment for an epitaxial substrate, and aims to solve the problems in the background art. In order to achieve the aim, the invention provides the technical scheme that the isostatic graphite tantalum carbide coating deposition equipment for the epitaxial substrate comprises a base for supporting, wherein a gathering deposition assembly is arranged at the top of the base; The gathering deposition assembly comprises; the connecting plate is used for supporting and is arranged at the top of the base; the frame openings are used for dislocation and are arranged on the connecting plate; The transition ports are arranged on two sides of the inner wall of the frame port; the two first heating plates can oppositely displace, and each first heating plate is respectively arranged at the bottom of the corresponding first guide plate; two second heating plates capable of oppositely moving, and each second heating plate is respectively arranged at the bottom of the corresponding second guide plate; The cross section shapes of the first heating plate and the second heating plate are combined into a rectangle, and the outer sides of the first heating plate and the second heating plate are respectively provided with a deformable sealing sleeve; the handles are used for lifting and pulling, are respectively arranged on two sides of the top of the connecting plate, and are detachably connected with the connecting plate; the two guide grooves are used for guiding and are bot