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CN-117295222-B - Multidirectional source capacitive coupling plasma source device and processing method thereof

CN117295222BCN 117295222 BCN117295222 BCN 117295222BCN-117295222-B

Abstract

The invention discloses a multidirectional source capacitive coupling plasma source device and a treatment method thereof, wherein the device comprises a vacuum cavity, a capacitor electrode, a control switch and a control switch, wherein an insulating shell which is made of quartz glass materials and is used for coating the vacuum cavity is arranged outside the vacuum cavity, the insulating shell is hollow and is provided with the capacitor electrode, the capacitor electrode is made of electrode materials according to a circular structure, the capacitor electrode in each direction is arranged into a plurality of parallel equidistant arrangements, the capacitor electrode is connected with the outside of the insulating shell through a first connecting point formed by conductive metal, and the control switch is connected with the first connecting point through a wire and is controlled to be opened and closed by controlling the connection of the capacitor electrode to realize the control of final discharge. The invention can realize omnibearing plasma distribution control in the cavity by designing the multidirectional built-in capacitor in the cavity, and the capacitor electrode at each side is excited by a separate radio frequency power supply to realize independent control of the plasma distribution at each side.

Inventors

  • OuYang Wenchong
  • WU ZHENGWEI
  • ZHOU FAN
  • LU FU

Assignees

  • 中国科学技术大学

Dates

Publication Date
20260508
Application Date
20230925

Claims (7)

  1. 1. A multi-directional source capacitively coupled plasma source apparatus, comprising: the vacuum cavity (1), the outside of the vacuum cavity (1) is provided with an insulating shell which is made of quartz glass material and is used for coating the vacuum cavity (1), and the inside of the insulating shell is hollow and is provided with a capacitor electrode; The capacitor electrode (2) is made of electrode materials according to a circular structure, the capacitor electrode (2) in each direction is arranged into a plurality of parallel equidistant arrangement, and the capacitor electrode (2) is connected with the outside of the insulating shell through a first connecting point (1 '-4',7'-10',13'-16',19 '-22') formed by conductive metal; a control switch (3) connected to the first connection point (1 '-4',7'-10',13'-16',19 '-22') via a wire, the control of the capacitive electrode (2) for final discharge being achieved by controlling the opening and closing thereof; a vacuum pump (4) for evacuating the vacuum chamber (1) to achieve a high vacuum degree; the two air guide pipes (5) are of hollow pipeline structures, one ends of the two air guide pipes (5) are connected with the vacuum cavity (1), and the other end of one air guide pipe (5) is connected with the vacuum pump (4); a vacuum gauge (6) connected to one side of the corresponding air duct (5) and measuring the vacuum degree of the vacuum chamber (1); A gas cylinder (7) which is connected with one side of the corresponding gas guide pipe (5) to charge gas into the vacuum cavity (1) as working gas for discharging the capacitive coupling plasma device; A radio frequency power supply (8) connected with the plurality of capacitor electrodes (2) through the control switch (3) and first connection points (1 '-4',7'-10',13'-16',19 '-22'), and a grounding end connected with second connection points (5 '-6',11'-12',17'-18',23 '-24') of the vacuum cavity (1), so as to ionize working gas filled in the vacuum cavity and generate plasma; The first connection points (1 '-4',7'-10',13'-16',19 '-22') and the second connection points (5 '-6',11'-12',17'-18',23 '-24') are made of conductive metal and are of circular structures, wherein the first connection points (1 '-4',7'-10',13'-16',19 '-22') are connected with the control switch (3) through connection parts; The connecting part comprises an external thread (9) arranged on the first connecting point and a screwing ring (10) detachably connected with the first connecting point, an inner thread (11) is arranged on the inner ring of the screwing ring (10), the internal thread (11) and the external thread (9) are mutually matched to enable the screwing ring (10) to be in threaded connection with the first connecting point, one end of the first connecting point is provided with a sliding groove (12), two symmetrical clamping plates (13) are connected in the sliding groove (12) in a sliding mode, the clamping plates (13) are made of conductive metal, a rectangular block (19) is fixedly connected in the sliding groove (12), the rectangular block (19) penetrates through the two clamping plates (13), the rectangular block (19) is sleeved with a pressure spring (14), two ends of the pressure spring (14) are respectively connected with two clamping plates (13) so that the clamping plates (13) are far away from the center, two edges of the clamping plates (13) far away from the center are arranged into round corner structures, two side surfaces of the clamping plates (13) far away from the center are fixed with arc-shaped blocks (15), two side surfaces of the clamping plates (13) close to the center are fixed with a plurality of semi-cylindrical rubber strips (16), the two rubber strips (16) are arranged in a staggered mode, the inner wall of the tightening ring (10) is fixed with a fastening arc plate (18) along with the rotation of the tightening ring (10), the fastening arc plate (18) synchronously rotates and props against the arc-shaped block (15) so that the two clamping plates (13) are close to each other, two groove bodies (20) are formed in the outer wall of the fastening ring (10), a fixing rod (21) and a sliding connection sliding block (22) are fixedly connected in the groove bodies (20), the fixing rod (21) penetrates through the corresponding sliding block (22), one side of the sliding block (22) is fixedly connected with an insulating protection ring (23), a spring (24) is sleeved on the outer wall of the fixing rod (21), and two ends of the spring (24) are connected with the groove bodies (20) and the sliding block (22) respectively.
  2. 2. A multi-directional source capacitively coupled plasma source device according to claim 1, wherein all capacitances of the capacitive electrode (2) in the vacuum chamber (1) are completely uniform, and are arranged side by side at equal distances in up, down, left and right directions, and a distance between two capacitances on the same side is about 0.2 m.
  3. 3. A multi-directional source capacitively coupled plasma source device according to claim 2, wherein the control switch (3) is manually controlled and is connected to the capacitive electrodes (2) in a one-to-one correspondence, and is arranged side by side at equal distances in four directions, up and down, left and right.
  4. 4. A multidirectional source capacitive coupling plasma source apparatus according to claim 3, wherein said air duct (5) is connected to said air cylinder (7) and said vacuum pump (4) at the upper and lower sides of said vacuum chamber (1), respectively, said air duct (5) connected to said air cylinder (7) being controlled by a needle valve, said air duct (5) connected to said vacuum pump (4) being controlled by a manual flapper valve.
  5. 5. The multidirectional source capacitively coupled plasma source device according to claim 4, wherein the vacuum gauge (6), the vacuum pump (4) and the gas guide tube (5) are combined to realize the vacuum degree regulation of the vacuum cavity (1) before the capacitively coupled plasma source device discharges.
  6. 6. A multi-directional source capacitively coupled plasma source device according to claim 5, wherein the second connection point (5 '-6',11'-12',17'-18',23 '-24') is connected to ground by a bias voltage source.
  7. 7. A multi-directional source capacitively coupled plasma source device according to claim 6, wherein the rf power sources (8) are present around the vacuum chamber (1) in correspondence, each rf power source (8) controlling the discharge of the capacitive electrode (2) on one side independently.

Description

Multidirectional source capacitive coupling plasma source device and processing method thereof Technical Field The invention relates to the technical field of crystal and semiconductor manufacturing, in particular to a multidirectional source capacitive coupling plasma source device and a processing method thereof. Background With the widespread use of plasma in the fields of crystal processing, semiconductor manufacturing, and the like, plasma devices typified by dielectric barrier discharge, inductively coupled plasma discharge, and capacitively coupled plasma discharge have been attracting attention. In the current semiconductor and integrated circuit industry applications, how to achieve process uniformity of plasma to film coating and material etching is a critical issue. In a low-pressure environment in the vacuum cavity, the introduced gas is excited and discharged by a radio frequency power supply to generate active particles such as electrons, ions, free radicals and the like, so as to form plasma. The plasma reacts with the etched or coated material surface in various chemical, physical and other activities, so as to enhance the material surface performance. The better the plasma uniformity, the more uniform and stable the effect on material processing. Therefore, compared to dielectric barrier discharge and inductively coupled plasma discharge sources, capacitively coupled plasma devices are widely used in processes such as etching due to their better plasma uniformity; At present, a capacitive coupling plasma device for material modification and industrial manufacture is mostly used for realizing discharge by applying a radio frequency power supply to an upper electrode and a lower electrode to form plasma, the electrode structure of the capacitive coupling plasma source device is generally a parallel electrode, a radio frequency power source is applied to the upper electrode, a bias power source is applied to the lower electrode, and two side walls of a cavity are at a certain distance from the electrode, so that the plasma discharge state in the initial design is mainly determined by the distance between the upper electrode and the lower electrode and cannot be adjusted in the later stage; the plasma distribution in the cavity of the plasma generating device developed after the electrode spacing is determined can only be controlled by adjusting the discharge parameters, and the plasma distribution has poor controllability and insufficient uniformity. In addition, the discharge state and mode of the capacitive coupling plasma generating device are single, and the start and stop of discharge can be controlled only by a single power supply. Therefore, most of the current capacitively coupled plasma source processing devices have the problems of insufficient plasma distribution uniformity, poor controllability of discharge state and the like, which have great adverse effects on the manufacturing processes such as material etching, coating and the like; In order for plasma devices to have better uniformity and stability in crystal processing, semiconductor manufacturing applications, it is desirable to have a more uniform plasma distribution within the vacuum chamber and a more controlled state of the capacitively coupled plasma device. Therefore, it is necessary to invent a multi-directional source capacitively coupled plasma device having multiple controllable modes in each direction to achieve better process performance and controllable modes in process fabrication such as material etching and coating. Disclosure of Invention The invention aims to provide a multidirectional source capacitive coupling plasma source device which has better plasma uniformity, plasma distribution controllability and multi-mode state, and solves some problems and limitations of the existing capacitive coupling plasma. In order to achieve the above purpose, the present invention adopts the following technical scheme: a multi-directional source capacitively coupled plasma source apparatus comprising: The vacuum cavity is provided with an insulating shell which is made of quartz glass materials and is used for coating the vacuum cavity, and the insulating shell is hollow and is provided with a capacitor electrode; The capacitor electrodes are made of electrode materials according to a circular structure, the capacitor electrodes in each direction are arranged in a plurality of parallel and equidistant modes, and the capacitor electrodes are connected with the outside of the insulating shell through first connecting points formed by conductive metal; The control switch is connected with the first connecting point through a wire, and realizes the control of the capacitor electrode which is finally discharged by controlling the opening and closing of the control switch; the vacuum pump is used for exhausting the vacuum cavity to realize high vacuum degree; the two air ducts are of hollow pipeline structures, one ends of th