CN-117415082-B - Quartz tube cleaning method and system

CN117415082BCN 117415082 BCN117415082 BCN 117415082BCN-117415082-B

Abstract

The invention discloses a quartz tube cleaning method and a system, wherein the method comprises the steps of calling a hooking mechanism to hook a quartz tube when a cleaning instruction is received by a processor in a quartz tube cleaning device, moving the quartz tube to a first concentrated sulfuric acid tank for peracid cleaning, after peracid cleaning is finished, moving the quartz tube to a second concentrated sulfuric acid tank for second peracid cleaning by the hooking mechanism, simultaneously recovering concentrated sulfuric acid in the first concentrated sulfuric acid tank, injecting pure water into the first concentrated sulfuric acid tank after recovery is finished, calling the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank again, flushing the quartz tube with pure water according to a preset flushing time, calling the hooking mechanism to move the quartz tube to a cleaning tank after pure water flushing is finished, and moving the quartz tube to a target storage position after the quartz tube is flushed and dried by a cleaning component in the cleaning tank, so that the automatic cleaning of the quartz tube is realized, and the cleaning efficiency and the cleaning cleanliness of the quartz tube are effectively improved.

Inventors

ZHENG JINLONG
WANG GUOCHAO
ZHOU TIEJUN
MA JINFENG

Assignees

广东先导微电子科技有限公司

Dates

Publication Date: 20260512
Application Date: 20231205

Claims (7)

1. The quartz tube cleaning method is characterized by being applied to a processor in a quartz tube cleaning device, wherein the quartz tube cleaning device comprises a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank, and the method comprises the following steps: when a cleaning instruction is received, a hooking mechanism is called to hook the quartz tube; Calling the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for peracid cleaning; The quartz tube is moved to the second concentrated sulfuric acid tank through the hooking mechanism for peracid cleaning, concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered, and pure water is injected into the first concentrated sulfuric acid tank; The quartz tube is moved to the first concentrated sulfuric acid tank again through the hooking mechanism, and pure water flushing is carried out on the quartz tube according to the preset flushing time length; After the pure water is washed, the hooking mechanism is called to move the quartz tube to the washing tank for washing and drying, and then the quartz tube is moved to a target storage position; The quartz tube cleaning device further comprises an acid storage component and a water inlet pipeline connected to the first concentrated sulfuric acid tank, wherein the acid storage component is connected with the first concentrated sulfuric acid tank through an acid-resistant pipeline, a circulating pump is arranged on the acid-resistant pipeline, the quartz tube is moved to the second concentrated sulfuric acid tank through the hooking mechanism to carry out peracid cleaning, concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered, and pure water is injected into the first concentrated sulfuric acid tank, and the quartz tube cleaning device comprises the following steps: The quartz tube is moved to the second concentrated sulfuric acid tank through the hooking mechanism for peracid cleaning; Starting the circulating pump, recycling the concentrated sulfuric acid in the first concentrated sulfuric acid tank to the acid storage component along the acid-resistant pipeline, and monitoring the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank in real time; When the liquid level is smaller than a first preset liquid level threshold value, the water inlet pipeline is conducted, pure water is injected into the first concentrated sulfuric acid tank until the water level in the first concentrated sulfuric acid tank reaches a preset water inlet height; the acid storage component is internally provided with a heating device, and the method further comprises the following steps: after the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered to the acid storage component, the heating device is called to heat and preserve heat the recovered concentrated sulfuric acid according to a preset heating temperature; the bottom of the first concentrated sulfuric acid tank is also provided with a water outlet, the quartz tube is moved to the first concentrated sulfuric acid tank again through the hooking mechanism, and the quartz tube is flushed with pure water according to the preset flushing time length, and the method comprises the following steps: when the water level in the first concentrated sulfuric acid tank reaches a preset water inlet height, the quartz tube is moved into the first concentrated sulfuric acid tank again through the hooking mechanism for soaking; when the soaking time reaches the preset soaking time, the water outlet is opened until the water level in the first concentrated sulfuric acid tank is reduced to zero; And (3) conducting the water inlet pipeline, spraying and flushing the quartz tube according to the preset spraying time, and starting the water outlet until the preset spraying time is reached.
2. The method of claim 1, wherein the quartz tube cleaning device further comprises a storage hooking mechanism, a cleaning brush head assembly and a placing frame are arranged in the cleaning tank, and the step of calling the hooking mechanism to move the quartz tube to the cleaning tank for cleaning and drying after the pure water is completely washed, and then moving the quartz tube to a target storage position comprises the following steps: After the pure water flushing is finished, the quartz tube is moved to the placing frame through the hooking mechanism and released; transferring the cleaning brush head assembly to flush and blow-dry the quartz tube; And transferring the storage hooking mechanism to hook the dried quartz tube, and moving the quartz tube to a target storage position.
3. The method of claim 2, wherein the cleaning brush head assembly comprises a cleaning brush, a flushing pipe head and a blowing pipe head which are arranged in sequence, and the step of calling the cleaning brush head assembly to flush and blow-dry the quartz tube comprises the following steps: transferring the cleaning brush into the quartz tube, cleaning the quartz tube according to a preset cleaning time, and then removing the quartz tube; transferring the flushing pipe head into the quartz pipe, flushing the quartz pipe according to preset flushing time, and then removing the quartz pipe; transferring the air blowing pipe head into the quartz pipe, and blowing air into the quartz pipe at a first preset temperature according to a preset first air blowing time; and calling the air blowing pipe head to blow air into the quartz pipe at a second preset temperature according to a preset second air blowing time, and then removing the quartz pipe.
4. The method according to claim 1, wherein the method further comprises: After the pure water flushing is completed, starting the circulating pump, and guiding the concentrated sulfuric acid in the acid storage assembly into the first concentrated sulfuric acid tank along the acid-resistant pipeline until the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank reaches a second preset liquid level threshold; and executing the step of calling the hooking mechanism to hook the quartz tube when the cleaning instruction is received in a jumping manner.
5. The method of claim 1, wherein the concentrated sulfuric acid in the first concentrated sulfuric acid tank is concentrated sulfuric acid having a temperature of 60-90 ℃; the concentrated sulfuric acid in the second concentrated sulfuric acid tank is concentrated sulfuric acid at normal temperature.
6. The method of claim 1, wherein an ultrasonic assembly is disposed in each of the first concentrated sulfuric acid tank and the second concentrated sulfuric acid tank, and wherein the peracid cleaning comprises: When the quartz tube is moved to the first concentrated sulfuric acid tank or the second concentrated sulfuric acid tank, the ultrasonic assembly is started according to a specific frequency to acid-wash the quartz tube; the opening time of the ultrasonic assembly in the first concentrated sulfuric acid tank is 60 seconds, and the opening time of the ultrasonic assembly in the second concentrated sulfuric acid tank is 30 seconds.
7. A quartz tube cleaning system, characterized by a processor for use in a quartz tube cleaning apparatus for performing the quartz tube cleaning method of any of claims 1 to 6, said quartz tube cleaning apparatus comprising a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank, and a cleaning tank, said system comprising: The hooking and calling module is used for calling the hooking mechanism to hook the quartz tube when a cleaning instruction is received; the primary acid washing module is used for calling the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for peracid washing; the secondary acid washing module is used for moving the quartz tube to the second concentrated sulfuric acid tank through the hooking mechanism for peracid washing, recovering concentrated sulfuric acid in the first concentrated sulfuric acid tank, and injecting pure water into the first concentrated sulfuric acid tank; The pure water flushing module is used for moving the quartz tube to the first concentrated sulfuric acid tank again through the hooking mechanism and flushing the quartz tube with pure water according to a preset flushing time length; the washing and drying module is used for transferring the hooking mechanism to move the quartz tube to the washing tank for washing and drying after the pure water washing is completed, and then moving the quartz tube to a target storage position; The quartz tube cleaning device further comprises an acid storage component and a water inlet pipeline connected to the first concentrated sulfuric acid tank, wherein the acid storage component is connected with the first concentrated sulfuric acid tank through an acid-resistant pipeline, a circulating pump is arranged on the acid-resistant pipeline, and the secondary acid washing module is specifically used for: The quartz tube is moved to the second concentrated sulfuric acid tank through the hooking mechanism for peracid cleaning; Starting the circulating pump, recycling the concentrated sulfuric acid in the first concentrated sulfuric acid tank to the acid storage component along the acid-resistant pipeline, and monitoring the liquid level of the concentrated sulfuric acid in the first concentrated sulfuric acid tank in real time; When the liquid level is smaller than a first preset liquid level threshold value, the water inlet pipeline is conducted, pure water is injected into the first concentrated sulfuric acid tank until the water level in the first concentrated sulfuric acid tank reaches a preset water inlet height; the acid storage component is internally provided with a heating device, and the system further comprises: after the concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered to the acid storage component, the heating device is called to heat and preserve heat the recovered concentrated sulfuric acid according to a preset heating temperature; The bottom of the first concentrated sulfuric acid tank is also provided with a water outlet, and the pure water flushing module is specifically used for: when the water level in the first concentrated sulfuric acid tank reaches a preset water inlet height, the quartz tube is moved into the first concentrated sulfuric acid tank again through the hooking mechanism for soaking; when the soaking time reaches the preset soaking time, the water outlet is opened until the water level in the first concentrated sulfuric acid tank is reduced to zero; And (3) conducting the water inlet pipeline, spraying and flushing the quartz tube according to the preset spraying time, and starting the water outlet until the preset spraying time is reached.

Description

Quartz tube cleaning method and system Technical Field The invention relates to the technical field of quartz tube cleaning, in particular to a quartz tube cleaning method and system. Background Gallium arsenide and indium phosphide substrates have application markets in the field of manufacturing radio frequency devices such as high-frequency high-power devices, optical fiber communication, wireless transmission, radio astronomy and the like. Radio frequency devices fabricated using indium phosphide substrates have shown excellent performance in satellite, radar, etc. application scenarios. The method has stronger competitiveness in the aspects of radio frequency front ends of radar and communication systems and analog/mixed signal wide bandwidth circuits, and is suitable for high-speed data processing, high-precision wide bandwidth A/D conversion and other applications. In addition, devices related to indium phosphide-based radio frequency devices such as low noise amplifiers, modules and receivers are also widely used in devices such as satellite communications, millimeter wave radar, active and passive millimeter wave imaging. At bandwidth levels above 100GHz, the use of indium phosphide-based radio frequency devices has significant advantages in terms of wireless transmission in backhaul networks and point-to-point communication networks, and in the future indium phosphide substrates will be expected to become the dominant substrate material for radio frequency devices in 6G communication and even 7G communication wireless transmission networks. However, before and after crystal growth and annealing, a diffusion furnace and other devices are needed, and the quartz tube is an indispensable device in the diffusion furnace, and the cleanliness of the quartz tube also affects the quality of a finished product of the wafer, but the cleaning of the quartz tube belongs to a time-consuming and labor-consuming process. The existing quartz tube cleaning method generally adopts the steps of manually placing the quartz tube into concentrated sulfuric acid and cold concentrated sulfuric acid with the heating temperature of 60-80+/-5 ℃, and then manually flushing by a water gun and a hairbrush. Above-mentioned scheme is because concentrated sulfuric acid's existence, if manual operation is improper to lead to scalding easily, and the cleaning process of quartz capsule all realizes through the manual mode, and its cleaning efficiency is lower and can't guarantee to wash the cleanliness factor. Disclosure of Invention The invention provides a quartz tube cleaning method and a quartz tube cleaning system, which solve the technical problems that in the prior art, due to the existence of concentrated sulfuric acid, scalding is easy to occur if manual operation is improper, the cleaning process of the quartz tube is realized by a manual mode, the cleaning efficiency is low, and the cleaning cleanliness cannot be ensured. The invention provides a quartz tube cleaning method which is applied to a processor in a quartz tube cleaning device, wherein the quartz tube cleaning device comprises a hooking mechanism, a first concentrated sulfuric acid tank, a second concentrated sulfuric acid tank and a cleaning tank, and the method comprises the following steps: when a cleaning instruction is received, a hooking mechanism is called to hook the quartz tube; Calling the hooking mechanism to move the quartz tube to the first concentrated sulfuric acid tank for peracid cleaning; The quartz tube is moved to the second concentrated sulfuric acid tank through the hooking mechanism for peracid cleaning, concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered, and pure water is injected into the first concentrated sulfuric acid tank; The quartz tube is moved to the first concentrated sulfuric acid tank again through the hooking mechanism, and pure water flushing is carried out on the quartz tube according to the preset flushing time length; and after the pure water is washed, calling the hooking mechanism to move the quartz tube to the cleaning tank for washing and drying, and then moving the quartz tube to a target storage position. Optionally, the quartz tube cleaning device further comprises an acid storage component and a water inlet pipeline connected to the first concentrated sulfuric acid tank, wherein the acid storage component is connected with the first concentrated sulfuric acid tank through an acid-resistant pipeline, a circulating pump is arranged on the acid-resistant pipeline, the quartz tube is moved to the second concentrated sulfuric acid tank through the hooking mechanism to carry out peracid cleaning, concentrated sulfuric acid in the first concentrated sulfuric acid tank is recovered, and pure water is injected into the first concentrated sulfuric acid tank, and the quartz tube cleaning device comprises the following steps: The quartz tube is moved to the second concentrated sulfuric acid t