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CN-117561559-B - Method for manufacturing display device

CN117561559BCN 117561559 BCN117561559 BCN 117561559BCN-117561559-B

Abstract

The light-emitting element layer forming step includes a step of forming a plurality of first electrodes (21 a) on the thin film transistor layer, a step of forming an edge cap so as to cover the peripheral end portions of the first electrodes (21 a), a step of forming a light-emitting functional layer on the first electrodes (21 a) exposed from the edge cap, and a step of forming a second electrode so as to cover the light-emitting functional layers and the edge cap, wherein in the step of forming the first electrodes, a plurality of dummy electrodes (21 d) of the same material as that of the first electrodes (21 a) are formed around the plurality of first electrodes (21 a), and in the step of forming the edge cap, the plurality of dummy electrodes (21 d) are removed before the edge cap is formed.

Inventors

  • Shinzaki Yasuhira

Assignees

  • 夏普显示科技株式会社

Dates

Publication Date
20260512
Application Date
20210726

Claims (10)

  1. 1. A method for manufacturing a display device includes: a thin film transistor layer forming step of forming a thin film transistor layer on a base substrate; A light-emitting element layer forming step of forming a light-emitting element layer on the thin film transistor layer, the light-emitting element layer being provided with a plurality of first electrodes, a plurality of light-emitting functional layers, and a common second electrode, which are sequentially stacked in correspondence with a plurality of sub-pixels constituting a display region, the method of manufacturing the display device being characterized in that, The light-emitting element layer forming step includes: a first electrode forming step of forming the plurality of first electrodes on the thin film transistor layer; an edge cap forming step of forming an edge cap so as to cover the peripheral end portions of the first electrodes; a light-emitting function layer forming step of forming the light-emitting function layers on the first electrodes exposed from the edge cover, and A second electrode forming step of forming the second electrode so as to cover the light-emitting functional layers and the edge cover, In the first electrode forming step, when forming the plurality of first electrodes, a plurality of dummy electrodes made of the same material as each of the first electrodes are formed around the plurality of first electrodes, In the edge cap forming step, the plurality of dummy electrodes are removed before the edge cap is formed.
  2. 2. The method of manufacturing a display device according to claim 1, wherein, The edge cover forming step includes: A resin cover forming step of forming a resin cover that covers the plurality of first electrodes and that is thinner at a portion other than the peripheral end portion of each of the first electrodes than at a portion corresponding to the peripheral end portion of each of the first electrodes; a dummy electrode removing step of removing the plurality of dummy electrodes exposed from the resin cover, and And an ashing step of forming the edge cover by ashing to thin the resin cover.
  3. 3. The method of manufacturing a display device according to claim 2, wherein, In the resin cover forming step, the photosensitive resin film is exposed to half exposure to form the resin cover.
  4. 4. The method for manufacturing a display device according to any one of claims 1 to 3, wherein, In the first electrode forming step, the plurality of dummy electrodes are formed in a frame shape so as to surround the plurality of first electrodes.
  5. 5. The method of manufacturing a display device according to claim 4, wherein, In the first electrode forming step, the plurality of dummy electrodes are formed in a plurality of rows.
  6. 6. The method of manufacturing a display device according to claim 4, wherein, In the first electrode forming step, the plurality of dummy electrodes are formed so that the pattern density of the plurality of dummy electrodes is the same as the pattern density of the plurality of first electrodes.
  7. 7. The method for manufacturing a display device according to any one of claims 1 to 3, wherein, The light-emitting element layer forming step includes a sealing film forming step of forming a sealing film on the light-emitting element layer, the sealing film being sequentially laminated with a first inorganic sealing film, an organic sealing film, and a second inorganic sealing film.
  8. 8. The method for manufacturing a display device according to claim 7, wherein, A border region is provided around the display region, The thin film transistor layer is provided with a planarization film on the light emitting element layer side in the display region, A first barrier wall is provided in the frame region so as to overlap with a peripheral end portion of the organic sealing film so as to surround the display region, and a second barrier wall is provided so as to surround the first barrier wall, The first barrier wall and the second barrier wall include: a lower resin layer formed of the same material as the planarization film in the same layer; an upper resin layer formed of the same material as the edge cover and And a metal layer formed between the lower resin layer and the upper resin layer and made of the same material as the first electrodes.
  9. 9. The method for manufacturing a display device according to claim 8, wherein, A light spacer is provided on the display area side of the first blocking wall in the bezel area, The photo spacer includes: a lower resin layer formed of the same material as the planarization film in the same layer; an upper resin layer formed of the same material as the edge cover and And a metal layer formed between the lower resin layer and the upper resin layer and made of the same material as the first electrodes.
  10. 10. The method for manufacturing a display device according to any one of claims 1 to 3, wherein, The luminous functional layers are organic electroluminescent layers.

Description

Method for manufacturing display device Technical Field The present invention relates to a method for manufacturing a display device. Background In recent years, attention has been paid to a self-luminous organic EL display device using an organic electroluminescence (hereinafter also referred to as "EL") element as a display device in place of a liquid crystal display device. The organic EL display device having the top emission structure includes an organic EL element layer in which a plurality of first electrodes (reflective electrodes), a plurality of organic EL layers, and a common second electrode (transparent electrode) are sequentially stacked in correspondence with a plurality of sub-pixels constituting a display region for displaying an image. For example, patent document 1 discloses a method for manufacturing a reflective electrode having a laminated structure including molybdenum, wherein, when the reflective electrode is formed, the reflective electrode is etched with an aqueous solution (weak acid etching solution) containing nitric acid, acetic acid, and phosphoric acid, and then selectively etched with an aqueous ozone solution, thereby making the outer edge shape of the reflective electrode uniform. Prior art literature Patent literature Patent document 1 International publication No. 2018/159510 Disclosure of Invention The invention aims to solve the technical problems However, in the organic EL display device, a frame region is provided around the display region, and in the display region, the plurality of first electrodes are arranged in a matrix, but the first electrodes on the frame region side may be formed smaller than the designed size. In this way, the display quality is lowered because the display unevenness is visually recognized. The present invention has been made in view of the above-described points, and an object of the present invention is to suppress variation in the size of a first electrode disposed in a display region. Technical scheme for solving technical problems In order to achieve the above object, the method for manufacturing a display device according to the present invention includes a thin film transistor layer forming step of forming a thin film transistor layer on a base substrate, a light emitting element layer forming step of forming a light emitting element layer on the thin film transistor layer, the light emitting element layer being formed with a plurality of first electrodes, a plurality of light emitting function layers, and a common second electrode in this order corresponding to a plurality of sub-pixels constituting a display region, the light emitting element layer forming step including a first electrode forming step of forming the plurality of first electrodes on the thin film transistor layer, an edge cover forming step of forming an edge cover so as to cover peripheral ends of the first electrodes, a light emitting function layer forming step of forming the light emitting function layers on the first electrodes exposed from the edge cover, and a second electrode forming step of forming the second electrode so as to cover the light emitting function layers and the edge cover, wherein in the first electrode forming step, when forming the plurality of first electrodes, a dummy electrode is formed in the first electrode forming step, the plurality of dummy electrode is removed before forming the plurality of first electrodes in the first electrode forming step of dummy electrode. Advantageous effects According to the present invention, variations in the size of the first electrode disposed in the display region can be suppressed. Drawings Fig. 1 is a plan view schematically showing the structure of an organic EL display device according to a first embodiment of the present invention. Fig. 2 is a plan view of a display region of the organic EL display device according to the first embodiment of the present invention. Fig. 3 is a sectional view of the organic EL display device taken along the line III-III in fig. 1. Fig. 4 is an equivalent circuit diagram of a thin film transistor layer constituting the organic EL display device of the first embodiment of the present invention. Fig. 5 is a cross-sectional view of an organic EL layer constituting an organic EL display device according to a first embodiment of the present invention. Fig. 6 is a sectional view of a frame region of the organic EL display device along the VI-VI line in fig. 1. Fig. 7 is a sectional view schematically showing a resin cover forming step of an edge cap forming step in an organic EL element layer forming step constituting a method of manufacturing an organic EL display device according to a first embodiment of the present invention. Fig. 8 is a cross-sectional view schematically showing a dummy electrode removal process subsequent to the edge cap formation process of fig. 7. Fig. 9 is a cross-sectional view schematically showing an ashing process subsequent to the edge cap f