CN-117587359-B - Corner guide mask plate and preparation method thereof

Abstract

The invention relates to the technical field of mask plate manufacturing and discloses a lead angle mask plate and a preparation method thereof, wherein the lead angle mask plate comprises the steps of sequentially preparing a conductive film, a solid photoresist film and a first photoresist film on a transparent carrier plate, photoetching the first photoresist film to form a first lead angle photoresist film pattern, and electroforming to form a first lead angle electroforming film; preparing a second photoresist film on the first corner guide photoresist film pattern and the first corner guide electroforming film, photoetching the second photoresist film to form a second corner guide photoresist film pattern, electroforming the second corner guide electroforming film on the first corner guide electroforming film, binding the formed corner guide electroforming film assembly on a mask frame, and finally demoulding to form the corner guide mask plate. The invention can make the thickness of the mask plate thin enough by the electroforming method, and simultaneously set the lead angle for the holes of the mask plate by twice electroforming, the method can be used for preparing the mask plate with thinner thickness and higher hole lead angle precision, and the mask plate is favorable for uniformly filling the organic film in the substrate pixels, so that the pixel filling rate and the material utilization rate are improved.

Inventors

• YANG YIXIN

Assignees

• 季华实验室

Dates

Publication Date

20260505

Application Date

20231123

Claims (3)

1. 1. The preparation method of the corner guide mask plate is characterized by comprising the following steps: preparing a conductive film on a transparent carrier plate; preparing a solid photoresist film on the conductive film; preparing a first photoresist film on the solid photoresist film; Carrying out photoetching treatment on the first photoresist film to form a first lead angle photoresist film pattern; Performing first electroforming treatment on the solid photoresist film to obtain a first lead angle electroforming film complementary with the first lead angle photoresist film pattern, wherein an included angle alpha between the hole lead angle side edge formed by the first lead angle electroforming film and the plane of the transparent carrier plate is 30-60 degrees; preparing a second photoresist film on the first corner-guide photoresist film pattern and the first corner-guide electroformed film; performing photoetching treatment on the second photoresist film to form a second corner-guide photoresist film pattern; performing secondary electroforming treatment on the first lead angle electroforming film to obtain a second lead angle electroforming film complementary to the second lead angle photoresist film pattern, wherein an included angle beta between a hole lead angle side edge formed by the second lead angle electroforming film and the transparent carrier plate is 120-150 degrees, the second lead angle electroforming film and the first lead angle electroforming film form a lead angle electroforming film assembly, and a hole center line formed by the first lead angle electroforming film coincides with a hole center line formed by the second lead angle electroforming film; binding the angle-guiding electroforming film assembly to a mask frame to form a mask plate; The method comprises the steps of peeling the transparent carrier plate, the conductive film and the mask plate, and concretely comprises the steps of irradiating the surface of the transparent carrier plate, which is away from the mask plate, by laser so as to preliminarily separate the mask plate from the conductive film and the transparent carrier plate; and cleaning the photoresist foreign matters on the mask plate to obtain the angle guiding mask plate, wherein the thicknesses of the first photoresist film and the second photoresist film are independently selected to be 1-20 mu m, and the materials of the first angle guiding electroformed film and the second angle guiding electroformed film are different.
2. 2. The method for manufacturing a corner-guide mask according to claim 1, further comprising the step of, after the second electroforming process: And continuously preparing the angle guiding reinforcing rib film on the second angle guiding electroforming film in an electroforming mode.
3. 3. The corner guide mask plate is characterized by being prepared by adopting the preparation method of the corner guide mask plate according to any one of claims 1-2.

Description

Corner guide mask plate and preparation method thereof Technical Field The invention relates to the technical field of mask manufacturing, in particular to a corner guide mask and a preparation method thereof. Background OLED displays have many advantages over LCD displays, such as good color reproduction, short response time, good low temperature characteristics, and thickness can be made thinner, lighter in weight, and good flexibility, so OLED displays are replacing LCD displays that have been put on the market in large scale with their excellent performance. In an evaporation machine for manufacturing an OLED display screen, in order to evaporate RGB light-emitting layer organic materials onto RGB pixel points of a substrate, a light-emitting layer evaporation chamber is provided, and a precision mask plate (FMM) for shielding other pixels during evaporation is arranged in the evaporation chamber. According to the cosine law of vapor deposition, a certain evaporation incident angle exists when a part of the vapor of the organic material is deposited on the substrate, so that the substrate pixels are uniformly filled with the organic film and the material utilization rate is improved, and the holes of the mask pixels are often provided with guide angles. The delay mask slice adopts a wet two-sided etching mode to form two-sided lead angles of the mask slice to solve the problem. However, the higher the resolution, the thinner the mask is required, and the more difficult the casting method becomes to make hole lead angles, and the accuracy cannot be ensured. Accordingly, the prior art is still in need of improvement and development. Disclosure of Invention In view of the shortcomings of the prior art, the invention aims to provide a corner guide mask plate and a preparation method thereof, and aims to solve the problem that the precision of the corner guide of a hole of a mask plate cannot be ensured when the mask plate with high resolution is prepared in the prior art. The technical scheme of the invention is as follows: A preparation method of a corner guide mask plate comprises the following steps: preparing a conductive film on a transparent carrier plate; preparing a solid photoresist film on the conductive film; preparing a first photoresist film on the solid photoresist film; Carrying out photoetching treatment on the first photoresist film to form a first lead angle photoresist film pattern; performing first electroforming treatment on the solid photoresist film to obtain a first lead angle electroforming film complementary with the first lead angle photoresist film pattern; preparing a second photoresist film on the first corner-guide photoresist film pattern and the first corner-guide electroformed film; performing photoetching treatment on the second photoresist film to form a second corner-guide photoresist film pattern; Performing second electroforming treatment on the first lead angle electroforming film to obtain a second lead angle electroforming film complementary with the second lead angle photoresist film pattern, wherein the second lead angle electroforming film and the first lead angle electroforming film form a lead angle electroforming film assembly; binding the angle-guiding electroforming film assembly to a mask frame to form a mask plate; and stripping the transparent carrier plate, the conductive film and the mask plate, and cleaning the photoresist foreign matters on the mask plate to obtain the corner-guide mask plate. The angle guiding mask plate is prepared by the method, wherein an included angle alpha between the side edge of the hole guiding angle formed by the first angle guiding electroforming film and the plane of the transparent carrier plate is smaller than 90 degrees. The angle guide mask plate is prepared by the method, wherein the included angle beta between the side edge of the hole guide angle formed by the second angle guide electroforming film and the transparent carrier plate is larger than 90 degrees. The preparation method of the angle guiding mask plate comprises the step of enabling the center line of a hole formed by the first angle guiding electroforming film to coincide with the center line of a hole formed by the second angle guiding electroforming film. The preparation method of the lead angle mask plate comprises the following steps of: And continuously preparing the angle guiding reinforcing rib film on the second angle guiding electroforming film in an electroforming mode. The preparation method of the angle guiding mask plate comprises the steps of irradiating the surface of the transparent carrier plate, deviating from the mask plate, with laser to enable the mask plate, the conductive film and the transparent carrier plate to be primarily separated, and separating the mask plate, the conductive film and the transparent carrier plate through a demolding process to obtain the angle guiding mask plate. The preparation method of the corner guide ma