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CN-117800614-B - Tectorial membrane product and preparation method and application thereof

CN117800614BCN 117800614 BCN117800614 BCN 117800614BCN-117800614-B

Abstract

The invention relates to a film-coated product, a preparation method and application thereof, wherein the film-coated product comprises a first film layer, a glass layer and a second film layer which are sequentially laminated, the first film layer is an optical film layer, the second film layer is a transparent film coating layer, and the stress of the optical film layer and the stress of the transparent film coating layer are respectively set as tensile stress or respectively set as compressive stress. The transparent coating layer of the coated product can offset deformation of the glass layer caused by at least partial optical film layer stress, further improves the strength and shock resistance of the glass, has simple preparation process, does not need material conversion, has higher yield of products, does not interfere and influence the optical characteristics of the optical film layer, and has wider adaptability.

Inventors

  • XU HAIBO
  • LIU YUYANG
  • MA LAN
  • LUO FUHUA

Assignees

  • 惠州比亚迪电子有限公司

Dates

Publication Date
20260505
Application Date
20220923

Claims (14)

  1. 1. A film-coated product is characterized by comprising a first film layer, a glass layer and a second film layer which are sequentially laminated, wherein the first film layer is an optical film layer, the second film layer is a transparent film coating layer, and the stress of the optical film layer and the stress of the transparent film coating layer are respectively set to be tensile stress or respectively set to be compressive stress; the second film layer is formed by mixed film materials containing more than three compounds of SiO 2 、SiO、YbF 3 and LaF 3 .
  2. 2. The coated article of claim 1, wherein the first film layer comprises a plurality of stacked optical film sublayers; Each optical film sub-layer is one of a Nb 2 O 5 layer, an Al 2 O 3 layer, a TiO 2 layer, a SiO 2 layer, a NiO layer, a Ta 2 O 5 layer, a Y 2 O 3 layer and a ZrO 2 layer, wherein the first film layer comprises at least two optical film sub-layers, and the number of the optical film sub-layers is any integer of 3-30; The thickness of the first film layer is 50-2000nm.
  3. 3. The coated article of claim 2, wherein the first film layer has a thickness of 100-1500nm.
  4. 4. The coated article of claim 2, wherein the thickness of the second film layer is calculated according to the formula T 2 ：T 2 =A×T Nb2O5 +B×T Al2O3 +C×T TiO2 +D×T SiO2 +E×T NiO +F×T Ta2O5 +G×T Y2O3 +H×T ZrO2 ; T Nb2O5 is the total thickness of all Nb 2 O 5 layers, T Al2O3 is the total thickness of all Al 2 O 3 layers, T TiO2 is the total thickness of all TiO 2 layers, T SiO2 is the total thickness of all SiO 2 layers, T NiO is the total thickness of all NiO layers, T Ta2O5 is the total thickness of all Ta 2 O 5 layers, T Y2O3 is the total thickness of all Y 2 O 3 layers, and T ZrO2 is the total thickness of all ZrO 2 layers; The A is an arbitrary value between 0.3 and 0.9, the B is an arbitrary value between 0.1 and 0.6, the C is an arbitrary value between 0.3 and 0.9, the D is an arbitrary value between 0.2 and 0.8, the E is an arbitrary value between 0.1 and 0.5, the F is an arbitrary value between 0.2 and 0.8, the G is an arbitrary value between 0.1 and 0.5, and the H is an arbitrary value between 0.2 and 0.8.
  5. 5. The coated article of claim 4, wherein a is 0.67, B is 0.33, C is 0.67, D is 0.5, E is 0.25, F is 0.5, G is 0.25, and H is 0.5.
  6. 6. The coated article of claim 1, wherein the thickness ratio of the second film layer to the first film layer is 0.4-0.9:1.
  7. 7. The coated article of claim 1, wherein the second film layer is a film layer formed from a mixture of SiO 2 、SiO、YbF 3 and LaF 3 .
  8. 8. The coated article of claim 7, wherein the second film comprises 1-15% SiO 2 by mass, 10-30% SiO by mass, 30-50% YbF 3 by mass, and 30-50% LaF 3 by mass.
  9. 9. The coated article of claim 8, wherein the second film layer comprises 5-10% SiO 2 , 15-25% SiO, 35-45% YbF 3 , and 30-40% LaF 3 .
  10. 10. The coated article of claim 1, wherein the glass layer is any one of soda lime glass, high alumina glass, all-tempered glass, semi-tempered glass, and heat-tempered glass.
  11. 11. The method for preparing the film-coated product according to any one of claims 1 to 10, wherein the method comprises the steps of plating a first film layer on a first surface of a glass layer to obtain a first film layer coated on the glass layer; Or plating a second film layer on the first surface of the glass layer to obtain a second film layer coated on the glass layer, and then plating a first film layer on the second surface of the glass layer to obtain a coated product.
  12. 12. The method of claim 11, wherein the first film layer and the second film layer are each formed using electron beam evaporation.
  13. 13. Use of the coated article according to any one of claims 1 to 10 in a housing for electronic equipment, automotive glass, architectural glass or optical instruments.
  14. 14. The method of claim 13, wherein the electronic device is selected from one or more of a smart phone, a tablet, a smart television, a smart wearable device, a portable computer, or a desktop computer, and the optical instrument is selected from one or more of a magnifying glass, a microscope, a telescope, a polarizer, or an industrial camera.

Description

Tectorial membrane product and preparation method and application thereof Technical Field The disclosure relates to the technical field of material processing, in particular to a film-coated product, and a preparation method and application thereof. Background Glass has excellent light transmittance, mechanical properties and chemical stability, and is widely used in the fields of electronic industry, building industry, optical industry and the like. In order to meet the further demands of people on the appearance and performance of glass products, decorative films or functional films are usually evaporated or sputtered on the surface of the glass in a vacuum manner, but the films often have large internal stress, so that the glass substrate is warped or distorted, and the shock resistance of the glass products is greatly reduced. At present, a sublayer is mainly arranged between glass and a functional or decorative film layer to serve as a buffer layer, an organic substance is used as a buffer coating, and the buffer layer has the defects of weak combination with the glass, poor durability and weather resistance, easiness in cracking, yellowing and the like, and is thicker, so that the light transmittance of a glass product is more or less affected. The buffer layer coating process has low yield and is complicated by taking the micromolecular siloxane and the siloxane end-capped organic matters as buffer layers, and buffer layer coating equipment and vacuum coating equipment are needed. Therefore, the strength and impact resistance of the existing glass products need to be further improved. Disclosure of Invention The invention aims to provide a film coated product, a preparation method and application thereof, wherein the transparent film coated layer of the film coated product can offset deformation of a glass layer caused by internal stress of at least part of an optical film layer, further improve strength and shock resistance of the glass layer, can not interfere and influence optical characteristics of the optical film layer, has wider adaptability, and has simple preparation process, no material conversion and higher yield of products. In order to achieve the above object, a first aspect of the present disclosure provides a film-coated product, which includes a first film layer, a glass layer and a second film layer that are sequentially stacked, where the first film layer is an optical film layer, the second film layer is a transparent film-coated layer, and stress of the optical film layer and stress of the transparent film-coated layer are set as tensile stress or as compressive stress respectively. Optionally, the first film layer comprises at least a plurality of stacked optical film sublayers; Each optical film sub-layer is one of a Nb 2O5 layer, an Al 2O3 layer, a TiO 2 layer, a SiO 2 layer, a NiO layer, a Ta 2O5 layer, a Y 2O3 layer and a ZrO 2 layer, wherein the first film layer comprises at least two optical film sub-layers, and the number of the optical film sub-layers is any integer of 3-30; the thickness of the first film layer is 50-2000nm, preferably 100-1500nm. Optionally, the thickness of the second film layer is calculated according to the formula T2：T2＝A×TNb2O5+B×TAl2O3+C×TTiO2+D×TSiO2+E×TNiO+F×TTa2O5+G×TY2O3+H×TZrO2; T Nb2O5 is the total thickness of all Nb 2O5 layers, T Al2O3 is the total thickness of all Al 2O3 layers, T TiO2 is the total thickness of all TiO 2 layers, T SiO2 is the total thickness of all SiO 2 layers, T NiO is the total thickness of all NiO layers, T Ta2O5 is the total thickness of all Ta 2O5 layers, T Y2O3 is the total thickness of all Y 2O3 layers, and T ZrO2 is the total thickness of all ZrO 2 layers; The A is an arbitrary value between 0.3 and 0.9, the B is an arbitrary value between 0.1 and 0.6, the C is an arbitrary value between 0.3 and 0.9, the D is an arbitrary value between 0.2 and 0.8, the E is an arbitrary value between 0.1 and 0.5, the F is an arbitrary value between 0.2 and 0.8, the G is an arbitrary value between 0.1 and 0.5, the H is an arbitrary value between 0.2 and 0.8, preferably, the A is 0.67, the B is 0.33, the C is 0.67, the D is 0.5, the E is 0.25, the F is 0.5, the G is 0.25, and the H is 0.5. Optionally, the thickness ratio of the second film layer to the first film layer is 0.4-0.9:1. Optionally, the second film layer is a film layer formed by a mixed film material formed by more than three compounds of SiO 2、SiO、YbF3 and LaF 3, and the refractive index of each compound in the mixed film material is 1.50-1.55. Optionally, the second film layer is a film layer formed by a mixture of SiO 2、SiO、YbF3 and LaF 3. Optionally, the mass fraction of SiO 2 in the second film layer is 1-15%, the mass fraction of SiO is 10-30%, the mass fraction of YbF 3 is 30-50%, the mass fraction of LaF 3 is 30-50%, preferably, the mass fraction of SiO 2 in the second film layer film material is 5-10%, the mass fraction of SiO is 15-25%, the mass fraction of