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CN-118639170-B - Functional film with grid pattern and preparation method thereof

CN118639170BCN 118639170 BCN118639170 BCN 118639170BCN-118639170-B

Abstract

The invention belongs to the field of patterning material preparation, and particularly relates to a functional film with grid patterns and a preparation method thereof. The preparation method comprises the following steps of 1) spontaneously generating carbonate hemispheres at a gas-liquid interface and organizing the carbonate hemispheres into an ordered carbonate hemispheric array, 2) transferring the carbonate hemispheres to the surface of a substrate, 3) depositing functional materials on the surface of the substrate covered with a carbonate hemispheric array mask, and 4) removing the carbonate hemispheric array mask and a deposition layer above the carbonate hemispheres to obtain the functional film with the grid pattern. The invention has the advantages of fundamentally improving and simplifying the system, integrating a plurality of original independent processes into a coherent whole, greatly reducing the complexity of the whole system and the required investment cost, and having large-scale application prospect in wider industrial fields.

Inventors

  • WANG HONG
  • WANG SEN
  • LV LIYUN

Assignees

  • 天津大学

Dates

Publication Date
20260508
Application Date
20240507

Claims (6)

  1. 1. A method for preparing a functional film with a grid pattern, comprising the steps of: Preparing a mixed clarified aqueous solution of metal cations and a surfactant, fully stirring and uniformly mixing, transferring into an open container, standing in an air environment, and forming a carbonate hemispherical array at a gas-liquid interface by absorbing carbon dioxide in the air, wherein the metal cations are carbonate water-insoluble metal ions, the metal cations are Ca, mg or Zn, the concentration of the metal cations is less than or equal to 50g/L, the surfactant is a Tween, span, polyether, polyester or amino acid surfactant, and the concentration of the surfactant is less than or equal to the corresponding critical micelle concentration; Transferring the carbonate hemisphere array to the surface of the substrate, wherein the substrate is in contact transfer with the carbonate hemisphere array from the air side or in contact transfer with the carbonate hemisphere array from the solution side; Step 3), depositing a functional material on the surface of the base material covered with the carbonate hemispherical array mask; and 4) removing the carbonate hemisphere array mask and the deposition layer above the carbonate hemisphere array mask to obtain the functional film with the grid pattern.
  2. 2. The method for producing a functional film having a grid pattern according to claim 1, wherein the substrate in step 2) is an inorganic, organic or inorganic-organic composite material having a flat surface.
  3. 3. The method for preparing the functional film with the grid pattern according to claim 1, wherein the functional material in the step 3) is a metal material or a compound material, the metal material is gold, silver or copper, the compound material is ITO or AZO, and the surface deposition mode is thermal evaporation, electron beam evaporation or magnetron sputtering technology.
  4. 4. The method for preparing a functional thin film with a grid pattern according to claim 1, wherein the method for removing the carbonate hemisphere array mask and the deposition layer thereon in the step 4) is tape stripping, natural soaking or ultrasonic cleaning.
  5. 5. The method for producing a functional thin film having a grid pattern according to claim 4, wherein the tape-stripping method or the natural soaking method is selected when the thickness of the deposited layer is less than 50 nm, and the ultrasonic cleaning method is selected when the deposited thickness is 50 nm or more.
  6. 6. A functional film having a grid pattern, which is obtained by the production method according to any one of claims 1 to 5, wherein the thickness of the functional film is 1 μm or less.

Description

Functional film with grid pattern and preparation method thereof Technical Field The invention belongs to the field of patterning material preparation, and particularly relates to a functional film with grid patterns and a preparation method thereof. Background As a rapidly developing patterning material deposition technique, colloid patterning (Co l l oi da lLithography) has been attracting attention in recent years because of its low operating cost and convenient large-area patterning advantages. The colloid particle preparing, arranging and pattern transferring technology is the core of the method. Traditionally, monodisperse microspheres ranging from tens of nanometers to tens of micrometers have been obtained by emulsion polymerization or sol-gel techniques and further sieving treatments. The monodisperse microspheres with uniform size and shape are organized and arranged on the surface of liquid to obtain a regular and orderly two-dimensional array, the two-dimensional array is used as a mask pattern to cover the surface of a substrate, and after functional materials are transferred to the surface of the substrate in a deposition mode, the mask is removed to obtain the functional film with the surface covered with the pattern. Currently, polystyrene microspheres are the most common among all colloidal particles used to construct masking materials. However, if the mask material is used as a basic component of a mask material for a colloid pattern forming process and a corresponding functional film production process is established based on the colloid pattern forming process, the following obvious defects and disadvantages exist: (1) During large-scale production, the synthesis of polystyrene microspheres involves the use and consumption of a large amount of organic petrochemical raw materials, such as styrene, divinylbenzene and the like. These microspheres, which are the mask material, are eventually dissolved and discarded in the mask removal step, thus causing unnecessary material waste. (2) The nano-and micron-sized monodisperse microspheres are obtained by complex cleaning, screening and collecting processes, and the separated polystyrene particles with other sizes except the monodisperse microspheres are subjected to additional treatment, so that the utilization rate of raw materials is greatly reduced, and the preparation cost of mask materials is additionally increased. (3) The whole operation steps are complex and relatively separated, and a plurality of independent steps and links which are not subordinate to each other are involved, such as polystyrene microsphere synthesis, screening, dispersion, organization, ablation and the like, so that difficulties are brought to the coupling of the system, and the integrated construction cost is increased. (4) The operation flow is complicated and lengthy, the investment of manpower and equipment is increased, a large amount of energy and raw materials are consumed, and the wide application of the technology in large-scale industrial production is limited. (5) The mask removal process involves a dissolution operation of the polystyrene microspheres, and an organic solvent such as toluene or N-methyl-2-pyrrolidone must be used, and both the use and the discharge thereof have a negative effect on the surrounding environment. Disclosure of Invention The invention aims to overcome the defects in the prior art and provides a functional film with a grid pattern and a preparation method thereof. In order to achieve the above purpose, the invention adopts the following technical scheme: A process for preparing the functional film with grid pattern includes such steps as generating carbonate hemispheres spontaneously at gas-liquid interface and organizing them into ordered carbonate hemispheres, transferring the carbonate hemispheres to substrate, depositing functional material on the surface of substrate, and removing the mask and depositing layer. The specific steps of the step 1) are that a mixed clear water solution of metal cations and a surfactant is prepared, is fully stirred and uniformly mixed and then is transferred into an open container, is kept stand in an air environment, and forms a carbonate hemispherical array at a gas-liquid interface by absorbing carbon dioxide in the air. The metal cations are carbonate water-insoluble metal ions, the metal cations are Ca, mg or Zn, and the concentration of the metal cations is less than or equal to 50g/L. The surfactant is Tween, span, polyether, polyester or amino acid surfactant, and the concentration of the surfactant is less than or equal to the corresponding Critical Micelle Concentration (CMC). The substrate in the step 2) is an inorganic, organic or inorganic-organic composite material with a flat surface, and specifically can be a PET substrate, a PI substrate, a glass substrate and the like, and the shape and the thickness of the substrate can be selected according to actual needs. The transfer i