CN-118726944-B - Air source supply system and chemical vapor deposition equipment

Abstract

The invention discloses an air source supply system and chemical vapor deposition equipment, wherein the air source supply system for preventing air leakage comprises a reactant storage device, a first box body, a second box body and a reactant output pipeline, the reactant storage device is sleeved in the first box body, the pressure in the first box body is positive pressure, the first box body is sleeved in the second box body, the pressure in the second box body is negative pressure, one end of the reactant output pipeline is communicated with the reactant storage device, and the other end of the reactant output pipeline is used as an output end of the air source supply system. The air source supply system adopts a multi-box structure, and can effectively prevent air leakage and improve the operation and environmental safety by setting internal and external pressure differences.

Inventors

• YANG RUNQING
• Han Zijia
• XU CAN

Assignees

• 中微半导体设备(上海)股份有限公司

Dates

Publication Date

20260508

Application Date

20230329

Claims (20)

1. 1. An air source supply system is characterized by comprising a reactant storage device, a first box body, a second box body and a reactant output pipeline; The reactant storage device is sleeved in the first box body, and the pressure in the first box body is positive pressure; the first box body is sleeved in the second box body, and the pressure in the second box body is negative pressure; one end of the reactant output pipeline is communicated with the reactant storage device, and the other end of the reactant output pipeline is used as an output end of the air source supply system.
2. 2. The gas supply system of claim 1, wherein the reactant delivery conduit passes sequentially through the walls of the first and second tanks, the pressure within the first tank being greater than the pressure within the reactant delivery conduit within the first tank.
3. 3. The air supply system according to claim 1, wherein the relative pressure in the first tank is 50 to 300Pa, and the relative pressure in the second tank is-50 to-200 Pa.
4. 4. The gas supply system of claim 1, further comprising a gas delivery conduit in communication with said first tank for continuously delivering gas into said first tank to maintain a positive pressure within said first tank.
5. 5. The gas supply system of claim 4, wherein the gas is nitrogen or an inert gas.
6. 6. The gas supply system of claim 1, further comprising a gas exhaust conduit, wherein one end of the gas exhaust conduit is connected to the second tank, and wherein gas in the second tank is exhausted from the gas exhaust conduit to maintain a negative pressure in the second tank.
7. 7. The gas supply system of claim 6, wherein said gas exhaust conduit is provided with a suction pump for drawing gas from said second chamber.
8. 8. The gas supply system of claim 6, wherein said gas exhaust conduit is provided with at least one scrubber for scrubbing contaminants from the gas exhausted from said gas exhaust conduit.
9. 9. The gas supply system of claim 6, wherein said gas exhaust conduit is provided with a valve for controlling the flow of gas through said gas exhaust conduit.
10. 10. The gas supply system of claim 1, wherein said first housing is not completely sealed.
11. 11. The gas supply system of claim 10, wherein a vent is provided in a wall of said first housing, and wherein gas in said first housing is vented into said second housing through said vent.
12. 12. The gas supply system of claim 1, further comprising a third tank, wherein the second tank is nested within the third tank, and wherein the pressure within the third tank is positive.
13. 13. The gas supply system of claim 12, wherein the relative pressure in the third tank is 50 to 300pa.
14. 14. The gas supply system of claim 12, wherein said first tank, said second tank, and said third tank are each provided with a pressure sensor.
15. 15. The gas supply system of claim 14, wherein said first tank, said second tank, and said third tank are each provided with an alarm device, and wherein the corresponding alarm device issues a warning when the pressure in said first tank, said second tank, or said third tank is not within a target range.
16. 16. The gas supply system of claim 14, further comprising a control unit coupled to each pressure sensor, the control unit controlling the pressure in the first tank, the second tank, and the third tank, respectively, based on real-time monitoring data of each pressure sensor.
17. 17. The gas supply system of claim 1, wherein the reactant storage device comprises a heater for heating the feedstock within the reactant storage device.
18. 18. The gas source supply system of claim 1, further comprising a reactant input conduit in communication with said reactant storage device for replenishing feedstock into said reactant storage device.
19. 19. The gas source supply system of claim 1, wherein the output is in communication with a reaction chamber for performing a chemical vapor deposition process.
20. 20. A chemical vapor deposition apparatus comprising a reaction chamber and a gas source supply system according to any one of claims 1-19; The reaction cavity is communicated with the gas source supply system, and raw materials in the reactant storage device are conveyed into the reaction cavity through the reactant output pipeline.

Description

Air source supply system and chemical vapor deposition equipment Technical Field The invention relates to the field of chemical vapor deposition equipment, in particular to an air source supply system for preventing air leakage and chemical vapor deposition equipment. Background A Chemical Vapor Deposition (CVD) process is a technique for forming a uniform and dense thin film by performing a chemical reaction in a reaction chamber using a plurality of chemical gases as reactants, and depositing a product on a target substrate. Reactants involved in the chemical vapor deposition process are supplied by a gas supply system. The air tightness requirement of the air source supply system is strict, once reactants leak, the environment can be polluted and endangered, and the chemical properties of part of the reactants are active, so that after the reactants are contacted with trace oxygen or water vapor, the safety risks such as combustion and explosion exist, and the life safety of operators is endangered. Thus, the gas supply system both prevents leakage of the reactants to the outside and blocks oxygen or moisture from the air from entering the system. The reactants used in some CVD processes are liquid at ambient temperature, and a lower saturated vapor pressure results in a smaller amount of reactants involved in the CVD process, resulting in reduced quality of the final deposited film. For the reactant, the saturated vapor pressure of the reactant is generally increased by a pre-heating mode, so that the transmission quantity of reactant gas is increased, the reaction efficiency is improved, and the quality of the deposited film is improved. But the temperature rise increases the diffusion rate of the reactants and further increases the risk of leakage of the reactants. Disclosure of Invention The invention aims to provide an air source supply system with a multi-box structure, which is used for preventing raw material gas from leaking, reducing environmental pollution and guaranteeing operation safety. In order to achieve the above object, the present invention provides an air supply system, including a reactant storage device, a first tank, a second tank, and a reactant output pipe; The reactant storage device is sleeved in the first box body, and the pressure in the first box body is positive pressure; the first box body is sleeved in the second box body, and the pressure in the second box body is negative pressure; one end of the reactant output pipeline is communicated with the reactant storage device, and the other end of the reactant output pipeline is used as an output end of the air source supply system. Optionally, the pressure within the first tank is greater than the pressure within the reactant output conduit within the first tank. Optionally, the relative pressure in the first box body is 50-300 Pa, and the relative pressure in the second box body is-50 to-200 Pa. Optionally, the device further comprises a gas conveying pipeline, wherein the gas conveying pipeline is communicated with the first box body and is used for continuously conveying gas into the first box body, and the pressure in the first box body is maintained to be positive pressure. Optionally, the gas is nitrogen or an inert gas. Optionally, the device further comprises a gas exhaust pipeline, one end of the gas exhaust pipeline is connected with the second box body, and the gas in the second box body is exhausted by the gas exhaust pipeline, so that the pressure in the second box body is maintained to be negative pressure. Optionally, an air pump is arranged on the air exhaust pipeline and is used for pumping air in the second box body. Optionally, at least one scrubber is arranged on the gas exhaust pipeline, and the scrubber is used for scrubbing pollutants in the gas exhausted by the gas exhaust pipeline. Optionally, a valve is arranged on the gas exhaust pipeline and used for controlling the gas flow of the gas exhaust pipeline. Optionally, the first casing is not completely sealed. Optionally, an exhaust hole is formed in the wall of the first box body, and the gas in the first box body is discharged into the second box body through the exhaust hole. Optionally, the device further comprises a third box body, wherein the second box body is sleeved in the third box body, and the pressure in the third box body is positive pressure. Optionally, the relative pressure in the third box body is 50-300 Pa. Optionally, the first box, the second box and the third box are respectively provided with a pressure sensor. Optionally, the first box, the second box and the third box are respectively provided with an alarm device, and when the pressure of the first box, the second box or the third box is not in the target range, the corresponding alarm device gives out a warning. Optionally, the air source supply system further comprises a control unit, wherein the control unit is connected with each pressure sensor, and the control unit res