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CN-118773580-B - Base ring assembly and substrate processing equipment

CN118773580BCN 118773580 BCN118773580 BCN 118773580BCN-118773580-B

Abstract

The invention discloses a base ring assembly and substrate processing equipment, the base ring assembly comprises an annular main body, the inner side wall of the annular main body surrounds a reaction cavity of the substrate processing equipment, a gas inlet and a gas outlet are arranged on the side wall of the annular main body, the gas inlet and the gas outlet are opposite to each other, an upper fluid groove is formed by downwards sinking the top surface of the annular main body, a lower fluid groove is formed by upwards sinking the bottom surface of the annular main body, an annular upper cover plate covers the upper fluid groove, the annular upper cover plate is provided with an upper annular gas passage, an annular lower cover plate covers the lower fluid groove, the annular lower cover plate is provided with a lower annular gas passage, and the upper annular gas passage and the lower annular gas passage are connected with an external gas regulating device through a gas branch positioned in the annular main body. The invention improves the yield of the epitaxial substrate or the epitaxial film by adjusting the gas near the base ring component.

Inventors

  • PANG YUNLING
  • JIANG YONG
  • ZOU YUSHEN

Assignees

  • 中微半导体设备(上海)股份有限公司

Dates

Publication Date
20260512
Application Date
20230406

Claims (20)

  1. 1. A base ring assembly for use in a substrate processing apparatus, comprising: an annular body having an inner sidewall surrounding a reaction chamber of the substrate processing apparatus; A gas inlet and a gas outlet are arranged on the side wall of the annular main body, wherein the gas inlet and the gas outlet are arranged opposite to each other; an upper fluid channel formed by a top surface of the annular body recessed downward; A lower fluid groove formed by a bottom surface of the annular body being recessed upward; an annular upper cover plate covering the upper fluid channel, the annular upper cover plate being provided with an upper annular gas passage; an annular lower cover plate covering the lower fluid channel, the annular lower cover plate being provided with a lower annular gas passage; the annular main body is arranged between an upper cover and a lower cover of the substrate processing equipment, and the lower cover is arranged opposite to the upper cover; Wherein the edge of the upper cover is connected with the upper surface of the annular upper cover plate in an airtight manner, and a gap between the upper cover and the annular upper cover plate forms the upper annular gas passage, and/or The edge of the lower cover is connected with the lower surface of the annular lower cover plate in an airtight manner, and a gap between the lower cover and the annular lower cover plate forms the lower annular gas passage; the upper annular gas passage and the lower annular gas passage are connected with an external gas regulating device through a gas branch in the annular main body, and the gas regulating device is used for regulating the gas pressure born by the top surface of the annular upper cover plate and/or the bottom surface of the annular lower cover plate.
  2. 2. The base ring assembly of claim 1, further comprising a first top polymeric ring disposed between an edge of the upper cover and an upper surface of the annular upper cover plate; the upper annular gas passage at least comprises one upper annular gas passage positioned at the inner side and/or the outer side of the first top polymer ring, the gas regulating device is used for exhausting gas from the upper annular gas passage positioned at the inner side and/or the outer side of the first top polymer ring, and/or The lower annular gas passage at least comprises one lower annular gas passage which is positioned at the inner side and/or the outer side of the first bottom polymer ring, and the gas regulating device is used for exhausting gas from the lower annular gas passage positioned at the inner side and/or the outer side of the first bottom polymer ring.
  3. 3. The base ring assembly of claim 2, The edge of the upper cover, the top surface of the annular upper cover plate and the side wall of the first top polymeric ring define the upper annular gas passage, and/or The edge of the lower cover, the bottom surface of the annular lower cover plate and the side wall of the first bottom polymeric ring define the lower annular gas passage.
  4. 4. The base ring assembly of claim 3, further comprising a second top polymeric ring disposed between the rim of the upper cover and the upper surface of the annular upper cover plate and surrounding the first top polymeric ring, the upper annular gas passage being located outside of the second top polymeric ring, the gas regulating device being configured to inflate the upper annular gas passage located outside of the second top polymeric ring, and/or The second bottom polymer ring is arranged between the edge of the lower cover and the lower surface of the annular lower cover plate and surrounds the first bottom polymer ring; the lower annular gas passage is positioned outside the second bottom polymer ring, and the gas regulating device is used for inflating the lower annular gas passage positioned outside the second bottom polymer ring.
  5. 5. The base ring assembly of claim 4, The inner side wall of the upper fluid groove extends upwards to form an upper bulge, the outer side of the upper bulge is abutted with the inner side wall of the annular upper cover plate, and/or The inner side wall of the lower fluid groove extends downwards to form a lower bulge, and the outer side of the lower bulge is abutted with the inner side wall of the annular lower cover plate.
  6. 6. The base ring assembly of claim 5, The outer part of the upper bulge and the inner part of the annular upper cover plate define a first top annular groove for placing the first top polymer ring, the upper annular gas passage is positioned at the inner side and/or the outer side of the first top annular groove, and/or The outer part of the lower bulge and the inner part of the annular lower cover plate define a first bottom annular groove, the first bottom annular groove is used for placing the first bottom polymer ring, and the lower annular gas passage is positioned on the inner side and/or the outer side of the first bottom annular groove.
  7. 7. The base ring assembly of claim 6, further comprising a second top annular groove formed by a top surface of said annular upper cover plate being recessed downward and disposed around said first top annular groove, said second top annular groove for receiving said second top polymeric ring, said upper annular gas passage being located inside and/or outside of said second top annular groove, and/or The second bottom annular groove is formed by upwards sinking the bottom surface of the annular lower cover plate and is arranged around the first bottom annular groove, the second bottom annular groove is used for placing the second bottom polymer ring, and the lower annular gas passage is positioned on the inner side and/or the outer side of the second bottom annular groove.
  8. 8. The base ring assembly of claim 7, wherein the bottom surface of the annular upper cover plate is planar, the bottom surface of the annular upper cover plate and the upper fluid groove form a closed upper fluid passage, and/or The top surface of the annular lower cover plate is a plane, and the top surface of the annular lower cover plate and the lower fluid groove form a closed lower fluid channel.
  9. 9. The base ring assembly of claim 8, wherein an inner sidewall of the annular upper cover plate is welded to an outer surface of the upper boss and/or an inner sidewall of the annular lower cover plate is welded to an outer surface of the lower boss.
  10. 10. The base ring assembly of claim 7, The upper port of the gas branch is positioned on the top surface of the annular upper cover plate and positioned on the inner side of the first top polymer ring and/or the outer side of the second top polymer ring, and the lower port of the gas branch is positioned on the bottom surface of the annular lower cover plate and positioned on the inner side of the first bottom polymer ring and/or the outer side of the second bottom polymer ring.
  11. 11. The base ring assembly of claim 10 wherein the upper annular gas passage comprises an upper inner gas passage located inside the first top polymeric ring, The upper inner gas passage is defined by the top surface of the upper protrusion, the bottom surface of the upper cover and the inner side surface of the first top polymeric ring; And/or the number of the groups of groups, The lower annular gas passage includes an inner lower inner gas passage located inside the first bottom polymeric ring, The lower internal gas passageway is defined by a bottom surface of the lower protrusion, a top surface of the lower cover, and an inner side surface of the first bottom polymeric ring, the lower internal gas passageway being disposed proximate an inner surface of the annular body.
  12. 12. The base ring assembly of claim 11 wherein the upper annular gas passage comprises an upper outer gas passage located outside of the second top polymeric ring; the outer top surface of the annular upper cover plate extends upwards to form an outer top wall; the upper external gas passageway is defined by a top surface of a groove wall of the second top polymeric ring, of the second top annular groove, proximate the outer top wall, an inner surface of the outer top wall, and a bottom surface of the upper cover; The upper external gas passage is provided away from an inner surface of the annular body; And/or the number of the groups of groups, The lower annular gas passage comprises a lower external gas passage positioned outside the second bottom polymer ring, and the outer bottom surface of the annular lower cover plate extends downwards to form an outer bottom wall; the lower external gas passageway is defined by a bottom surface of the second bottom polymeric ring, a groove wall of the second bottom annular groove proximate the outer bottom wall, an inner surface of the outer bottom wall, and a top surface of the lower cover; the lower external gas passageway is disposed away from an inner surface of the annular body.
  13. 13. The base ring assembly of claim 12, wherein the upper annular gas passage comprises an upper middle gas passage between the first top polymeric ring and the second top polymeric ring, the upper middle gas passage being defined by a top surface of a groove wall of the second top annular groove remote from the outer top wall, a bottom surface of the upper cover, the first top polymeric ring and the second top polymeric ring; The upper middle gas passage is located between the upper inner gas passage and the upper outer gas passage; And/or the number of the groups of groups, The lower annular gas passage includes a lower middle gas passage between the first bottom polymeric ring and the second bottom polymeric ring, The lower middle gas passageway is defined by a bottom surface of a groove wall of the second bottom annular groove remote from the outer bottom wall, a top surface of the lower cover, the first bottom polymeric ring, and the second bottom polymeric ring; The lower middle gas passage is located between the lower inner gas passage and the lower outer gas passage.
  14. 14. The base ring assembly of claim 10 wherein the gas regulating means is for reducing or increasing the gas pressure of the upper annular gas passage and/or the lower annular gas passage.
  15. 15. The base ring assembly of claim 14, The gas regulating device comprises a suction pump, a clean gas source and a compressed air source.
  16. 16. The base ring assembly of claim 8, wherein a gap is provided in the circumferential direction of the annular upper cover plate and/or the annular lower cover plate; The upper surface and/or the lower surface of the annular main body are/is provided with notch protrusions which are matched with the notches so that the notch protrusions are inserted into the notches; The annular upper cover plate and/or the annular lower cover plate are/is eccentrically arranged relative to the circle center of the inner circumference of the annular main body, and the centers of the annular upper cover plate and the annular lower cover plate deviate towards the direction away from the notch bulge.
  17. 17. The base ring assembly of claim 16, The gas branch is communicated with the notch bulge and is arranged avoiding the upper fluid groove and the lower fluid groove.
  18. 18. The base ring assembly of claim 17, further comprising an upper baffle plate and a lower baffle plate disposed within the upper fluid channel and the lower fluid channel, respectively, for dividing the upper fluid channel into two independent upper sub-fluid channels and the lower fluid channel into two independent lower sub-fluid channels.
  19. 19. The base ring assembly of claim 9 wherein the first top polymeric ring covers a weld between the annular upper cover plate and the upper boss.
  20. 20. A substrate processing apparatus, comprising: the base ring assembly of any one of claims 1-19; the upper cover is arranged above the base ring assembly; The lower cover is arranged below the base ring assembly; wherein the upper cover, the base ring assembly and the lower cover define an interior volume of a reaction chamber; and the supporting piece is arranged in the reaction cavity and is used for supporting the substrate.

Description

Base ring assembly and substrate processing equipment Technical Field The invention relates to the technical field of semiconductor equipment, in particular to a base ring assembly and substrate processing equipment. Background Semiconductors (semiconductors) refer to materials that have electrical conductivity properties at room temperature that are intermediate between those of conductors and insulators, and are of great importance from a technological or economic point of view. With respect to substrates, particularly semiconductor substrates, are processed into semiconductor devices in substrate processing equipment for a wide range of applications, for example, in the fields of integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high power conversion, and the like. An important apparatus for the manufacture of substrate processing equipment, particularly epitaxial equipment (epitaxial equipment) semiconductor devices. When processing a substrate with an epitaxial apparatus, the yield of the substrate is related to the gas pressure distribution within the reaction chamber of the epitaxial apparatus. The epitaxial device comprises a reaction cavity and a supporting piece arranged in the reaction cavity and used for supporting and/or heating a substrate, wherein the reaction cavity is formed by encircling an upper cover, a lower cover and a base ring assembly, a sealing piece is arranged between the upper cover and/or the lower cover and the base ring assembly, and along with the extension of the epitaxial process time of the epitaxial device, the sealing piece can be aged and the like, so that the air pressure environment near the base ring assembly is changed, the air pressure distribution inside the reaction cavity can be influenced by the air pressure change near the base ring assembly, and the substrate yield is further influenced. The prior art generally adopts to increase the surface state of the contact surface between the upper cover and/or the lower cover and the base ring assembly, so as to solve the problem of air pressure variation in the reaction cavity caused by aging of the sealing element, for example, the air tightness of the reaction cavity is improved by increasing the flatness of the contact surface and/or reducing the roughness of the contact surface, but the flatness and/or roughness of the contact surface of the current base ring assembly is good enough, and the solution for further optimizing the flatness and/or roughness has too high requirements on the manufacturing process of the base ring assembly to be realized, so that the solution cannot solve the problem of air pressure variation caused by air leakage near the base ring assembly. In addition, as the base ring assembly needs to have a cooling function, the base ring assembly is urgently needed to cool the base ring assembly and adjust the air pressure near the base ring assembly, so that the aim of improving the substrate yield is fulfilled. Disclosure of Invention The invention aims to provide a base ring assembly and substrate processing equipment, so as to realize the purposes of cooling the base ring assembly, adjusting the air pressure near the base ring assembly and improving the substrate yield. In order to achieve the above object, the present invention is realized by the following technical scheme: A base ring assembly is applied to substrate processing equipment and comprises an annular main body, wherein the inner side wall of the annular main body surrounds a reaction cavity of the substrate processing equipment, a gas inlet and a gas outlet are arranged on the side wall of the annular main body, the gas inlet is opposite to the gas outlet, an upper fluid groove is formed by downwards sinking the top surface of the annular main body, a lower fluid groove is formed by upwards sinking the bottom surface of the annular main body, an annular upper cover plate covers the upper fluid groove and is provided with an upper annular gas passage, an annular lower cover plate covers the lower fluid groove and is provided with a lower annular gas passage, and the upper annular gas passage and the lower annular gas passage are connected with an external gas regulating device through a gas branch arranged in the annular main body, and the gas regulating device is used for regulating the gas pressure born by the top surface of the annular upper cover plate and/or the bottom surface of the annular lower cover plate. Further, the annular body is disposed between an upper cover and a lower cover of the substrate processing apparatus, the lower cover being disposed opposite to the upper cover, wherein an edge of the upper cover is hermetically connected to an upper surface of the annular upper cover plate, a gap therebetween forms the upper annular gas passage, and/or The edge of the lower cover is connected with the lower surface of the annular lower cover plate in an airtight