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CN-119285342-B - Alumina target material and preparation method and application thereof

CN119285342BCN 119285342 BCN119285342 BCN 119285342BCN-119285342-B

Abstract

The invention discloses an alumina target material, a preparation method and application thereof, wherein the alumina target material comprises the following raw materials of alumina and nano aluminum hydroxide, and the mass percentage of the nano aluminum hydroxide is 0.5% -20% calculated by the total mass of the alumina and the nano aluminum hydroxide. On the premise of not introducing impurities, the alumina target material has high density and lower sintering temperature.

Inventors

  • XU WEI
  • GE CHUNQIAO
  • DING JINDUO

Assignees

  • 中山智隆新材料科技有限公司

Dates

Publication Date
20260508
Application Date
20240906

Claims (7)

  1. 1. The preparation method of the alumina target is characterized by comprising the following steps: S1, mixing aluminum oxide, nano aluminum hydroxide and a dispersing agent, and performing ball milling to obtain slurry; S2, pressing and cold isostatic pressing are carried out on the powder to obtain a biscuit; S3, degreasing and sintering the biscuit to obtain the aluminum oxide target, wherein the sintering temperature in the sintering process is 1350-1550 ℃ at the highest; the sintering step in the step S3 comprises the steps of firstly heating to 500-700 ℃ and keeping the temperature for 2-8 hours, then heating to 800-950 ℃ and keeping the temperature for 3-8 hours, and then heating to 1350-1550 ℃ and keeping the temperature for 6-17 hours; the mass percentage of the nano aluminum hydroxide is 5% -15% calculated by the total mass of the aluminum oxide and the nano aluminum hydroxide, and the D90 particle size of the nano aluminum hydroxide is less than or equal to 20nm.
  2. 2. The method of producing an alumina target according to claim 1, wherein the alumina is at least one selected from α -Al2O3, β -Al2O3 and γ -Al2O 3.
  3. 3. The method for producing an alumina target according to claim 1, wherein the D90 particle diameter of the alumina is in the range of 1.0 μm to 10.0 μm.
  4. 4. The method for producing an alumina target according to claim 1, wherein in step S2, the pressure of the cold isostatic pressing is 150mpa to 220mpa.
  5. 5. The method for preparing an alumina target according to claim 1, wherein oxygen is introduced during the last temperature rise in the sintering process in step S3.
  6. 6. The method for preparing an alumina target according to claim 5, wherein the oxygen gas is introduced at a rate of 20 to 50l/min.
  7. 7. The application of the alumina target prepared by the preparation method of any one of claims 1-6 in magnetron sputtering coating.

Description

Alumina target material and preparation method and application thereof Technical Field The invention relates to the technical field of sputtering targets, in particular to an alumina target, a preparation method and application thereof. Background The aluminum oxide film has excellent insulating property and high light transmittance, and is often used as an antireflection film, an interference film, a protective film and a passivation film in the fields of optical devices, automobiles, solar batteries and the like. The magnetron sputtering coating has the advantages of high efficiency, good uniformity of the formed film and the like, is suitable for large-scale coating in industrial production, and has higher requirement on the density of the target material. The melting point of the alumina exceeds 2000 ℃, and the high-purity and high-density alumina target is difficult to obtain by adopting a conventional preparation process. Therefore, there is a need to develop a new alumina target. Disclosure of Invention The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, the first aspect of the present invention proposes an alumina target, which can effectively improve the compactness and can reduce the sintering temperature. The second aspect of the invention also provides a method for preparing the alumina target. The third aspect of the invention also provides an application of the alumina target. According to the alumina target provided by the embodiment of the first aspect of the invention, the alumina target comprises the following raw materials of alumina and nano aluminum hydroxide, wherein the mass percentage of the nano aluminum hydroxide is 0.5% -20% calculated by the total mass of the alumina and the nano aluminum hydroxide. The alumina target material provided by the embodiment of the invention has at least the following beneficial effects: According to the invention, 0.5-20% of nano aluminum hydroxide is doped into the alumina by mass percent, on one hand, the nano aluminum hydroxide can be filled between alumina particles, on the other hand, the nano aluminum hydroxide is decomposed at a lower temperature to generate high-activity nano alumina, migration of alumina grain boundaries is promoted in the sintering process, and on the premise of not introducing impurities, the sintering temperature of an alumina target is effectively reduced, and meanwhile, the compactness is improved. Further, when the nanometer aluminum hydroxide is less than 0.5%, the effect is not obvious, and when the nanometer aluminum hydroxide is more than 20%, the target density is reduced. According to some embodiments of the invention, the mass percentage of the nano aluminum hydroxide is 1% -15%. Thus, a better density can be obtained. According to some embodiments of the invention, the mass percentage of the nano aluminum hydroxide is 5% -15%. Thus, the sintering temperature is kept at a low level on the premise of higher density. According to some embodiments of the invention, the D 90 particle size of the nano-aluminum hydroxide is less than or equal to 20nm. Therefore, the nanometer aluminum hydroxide has higher specific surface area and stronger sintering activity, can be filled among aluminum oxide particles, and improves the density. According to some embodiments of the invention, the alumina is selected from at least one of α -Al 2O3、β-Al2O3 or γ -Al 2O3. Further, when the alumina is selected from α -Al 2O3, the grain stability is good. According to some embodiments of the invention, the alumina has a D 90 particle size in the range of 1.0 μm to 10.0 μm. Thus, the size distribution of the prepared alumina target is uniform. According to a second aspect of the present invention, there is provided a method for preparing the alumina target, including the steps of: S1, mixing aluminum oxide, nano aluminum hydroxide and a dispersing agent, and performing ball milling to obtain slurry; S2, pressing and cold isostatic pressing are carried out on the powder to obtain a biscuit; And S3, degreasing and sintering the biscuit to obtain the aluminum oxide target, wherein the sintering temperature in the sintering process is 1350-1550 ℃ at the highest. The preparation method of the alumina target material has at least the following beneficial effects: The preparation method of the invention realizes high density without introducing impurities under the condition of lower sintering temperature, and prepares the alumina target with high purity and high density. Further, the alumina target prepared by the present invention has a larger size. Is suitable for industrial mass production. According to some embodiments of the invention, the sintering step in the step S3 is that the temperature is raised to 500-700 ℃ for 2-8 hours, then the temperature is raised to 800-950 ℃ for 3-8 hours, then the temperature is raised to 1350-1550 ℃ for 6-17 hours. According to some embodiments o