Search

CN-119876874-B - Preparation method and application of zirconium-aluminum bone-promoting electroactive film modified by magnetron sputtering technology

CN119876874BCN 119876874 BCN119876874 BCN 119876874BCN-119876874-B

Abstract

The invention discloses a preparation method and application of a zirconium-aluminum bone-promoting electroactive film modified by a magnetron sputtering technology, and relates to the technical field of bone electroactive film materials. The method comprises the steps of cleaning and drying a PVDF film, fixing the PVDF film on a glass slide, putting the glass slide into a magnetron sputtering chamber, and depositing a zirconium simple substance and an aluminum simple substance on the PVDF film in a magnetron sputtering mode to prepare the zirconium-aluminum bone-promoting electroactive film modified by the magnetron sputtering technology, wherein in the zirconium-aluminum bone-promoting electroactive film modified by the magnetron sputtering technology, the zirconium element content is 46.15-46.35 wt%, the oxygen element content is 19.25-19.45 wt%, the fluorine element content is 19.25-19.45 wt%, and the aluminum element content is 1.77-1.97 wt%. The film material prepared by the invention has excellent biocompatibility, antibacterial property and osteogenesis inducing capacity, and expands the application scene of the film material in oral cavity and other parts.

Inventors

  • ZHANG YUFENG
  • ZHANG FANYU
  • ZHOU CHENGKE

Assignees

  • 武汉大学

Dates

Publication Date
20260505
Application Date
20250103

Claims (5)

  1. 1. A preparation method of a zirconium-aluminum bone-promoting electroactive film modified by a magnetron sputtering technology is characterized by comprising the following steps of taking a PVDF film, cleaning and drying, fixing the PVDF film on a glass slide, putting the PVDF film into a magnetron sputtering chamber, and depositing a zirconium simple substance and an aluminum simple substance on the PVDF film in a magnetron sputtering mode to prepare the zirconium-aluminum bone-promoting electroactive film, wherein in the zirconium-aluminum bone-promoting electroactive film, the zirconium element content is 46.15-46.35 wt%, the oxygen element content is 19.25-19.45 wt%, the fluorine element content is 19.25-19.45 wt%, and the aluminum element content is 1.77-1.97 wt%; The magnetron sputtering mode is that under the inert atmosphere, the air pressure in the magnetron sputtering chamber is 0.5-5Pa, the sputtering distance is 4-10 cm, the sputtering power is maintained to be 50-100W, the temperature of the substrate is room temperature-300 ℃, the argon flow rate is 5-80 sccm, and the duration is 10-20 min.
  2. 2. The method for preparing the zirconium-aluminum osteogenic active thin film modified by the magnetron sputtering technology according to claim 1, wherein the zirconium-aluminum osteogenic active thin film contains 46.25wt% of zirconium element, 19.35 wt% of oxygen element, 19.35 wt% of fluorine element and 1.87% of aluminum element.
  3. 3. The method for preparing the zirconium-aluminum osteogenic active thin film modified by the magnetron sputtering technology according to claim 1, wherein the magnetron sputtering mode is carried out under the conditions of inert atmosphere, air pressure in the magnetron sputtering chamber of 0.5 Pa, sputtering distance of 5cm, sputtering power of 50W, substrate temperature of 200 ℃ and argon flow rate of 80 sccm, and the duration of 20 min.
  4. 4. A zirconium-aluminum osteogenic electrically active film prepared by the method of any one of claims 1-3.
  5. 5. Use of the zirconium-aluminum osteogenic electrically active film of claim 4 in the preparation of bone defect repair or tissue engineering materials.

Description

Preparation method and application of zirconium-aluminum bone-promoting electroactive film modified by magnetron sputtering technology Technical Field The invention relates to the technical field of bone electro-active film materials, in particular to a preparation method of a zirconium-aluminum bone electro-active film modified by a magnetron sputtering technology. Background The traditional bone tissue engineering is to repair by inoculating seed cells on a scaffold material to implant bone defect, but the defects of apoptosis of the seed cells, initiation of immune inflammatory reaction and the like exist, and the repair effect is weakened. To solve this deficiency, researchers have proposed the concept of "in situ tissue engineering" to construct materials with high osteogenic response, which accelerate the repair process of inducing defect sites by the regenerative potential of the body. The method focuses on inducing endogenous stem cells to a damaged part and mediating osteogenic differentiation by utilizing material characteristics so as to achieve the aim of bone repair, and is characterized by simulating the natural extracellular physiological regeneration microenvironment of bones. Electroactive materials are materials that can themselves generate an electrical signal upon external excitation, or that can change their physicochemical properties upon stimulation by an electrical signal. Currently, a range of electroactive biomaterials including ferroelectric, piezoelectric, electret and conductive materials and their mediated electro-stimulation materials have been developed to mimic the natural physiological electrical microenvironment as biophysical cues for regulating stem cell fate and regenerative medicine. The electroactive material is a bone repair material which effectively builds a regenerated electrical microenvironment. PVDF (polyvinylidene fluoride polymer, polyvinylidene fluoride) piezoelectric film, when subjected to external forces, exhibits a polarization charge on its surface similar to the piezoelectric properties of natural bone tissue, i.e., piezoelectric effect. The PVDF bone electroactive film has wide application in bone tissue engineering, bone repair, biological sensor, drug delivery and other aspects by virtue of excellent piezoelectric performance and larger specific surface area. However, PVDF bone electro-active membranes still have problems in practical application such as poor stability of electrical signals, poor regulation of bone regeneration, slow bone healing speed, etc. Therefore, how to prepare the PVDF bone electro-active film which has good biocompatibility and antibacterial activity, can exist stably in vivo and can regulate bone regeneration becomes the research hot spot direction of the application of the PVDF material in the electro-active bone repair material. Disclosure of Invention The invention provides a preparation method and application of a zirconium-aluminum bone-promoting electroactive film modified by a magnetron sputtering technology, and the prepared film material has excellent biocompatibility, antibacterial performance and osteogenesis inducing capacity, expands the application scene of the film material in oral cavities and other parts, and effectively solves the problems of poor osseointegration, poor bone healing speed and insufficient effectiveness of the traditional PVDF bone electroactive film. Specifically, the method is realized by the following technology. A preparation method of a zirconium-aluminum bone-promoting electroactive film modified by a magnetron sputtering technology comprises the following steps of taking a PVDF film, cleaning and drying, fixing the PVDF film on a glass slide, putting the glass slide into a magnetron sputtering chamber, and depositing a zirconium simple substance and an aluminum simple substance on the PVDF film in a magnetron sputtering mode to obtain the zirconium-aluminum bone-promoting electroactive film, wherein in the zirconium-aluminum bone-promoting electroactive film, the zirconium element content is 46.15-46.35 wt%, the oxygen element content is 19.25-19.45 wt%, the fluorine element content is 19.25-19.45 wt%, and the aluminum element content is 1.77-1.97 wt%. Further, in the zirconium-aluminum bone-promoting electroactive film, the content of zirconium element is 46.25wt%, the content of oxygen element is 19.35 wt%, the content of fluorine element is 19.35 wt%, and the content of aluminum element is 1.87wt%. Further, the magnetron sputtering mode is that under the inert atmosphere, the air pressure in the magnetron sputtering chamber is 0.5-5Pa, the sputtering distance is 4-10 cm, the sputtering power is maintained to be 0-100W, the temperature of the substrate is room temperature-300 ℃, the argon flow rate is 5-80 sccm, and the duration is 10-20 min. Further, the magnetron sputtering is performed under the conditions that the air pressure in the magnetron sputtering chamber is 0.5 Pa, the