CN-121659684-B - Metal mask, pattern selection method and device thereof, and storage medium

CN121659684BCN 121659684 BCN121659684 BCN 121659684BCN-121659684-B

Abstract

The application provides a metal mask, a pattern selection method, a pattern selection device and a storage medium. The pattern selection method comprises the steps of processing n different transition region images to obtain n groups of corresponding pattern design parameters used for representing pattern distribution states of the transition regions, determining minimum equivalent regions based on the n groups of pattern design parameters, conducting mechanical simulation on the minimum equivalent regions through a finite element algorithm to obtain n groups of material properties corresponding to n different metal masks, conducting mechanical simulation on the n different metal masks based on the n groups of material properties to obtain n groups of first deformation values corresponding to the n different metal masks, determining at least one group of target first deformation values from the n groups of first deformation values, and outputting transition region images corresponding to the target first deformation values. The embodiment of the application adopts a full-computer simulation test mode, so that the product development period can be shortened, the manufacturing cost can be reduced, and the research and development efficiency can be improved.

Inventors

WANG ZHIXIN
WANG FENGJIAO
XU HUAWEI
WU YAN
HUANG TING

Assignees

浙江众凌科技有限公司

Dates

Publication Date: 20260508
Application Date: 20260206

Claims (10)

1. The pattern selection method of the metal mask plate comprises an effective area positioned in the middle, clamping areas positioned at two ends and a transition area positioned between the effective area and the clamping areas, and is characterized by comprising the following steps of: S101, processing n different transition area images to obtain corresponding n groups of pattern design parameters for representing pattern distribution states of the transition areas, wherein the patterns of the transition areas of n different metal masks are different, and n is a positive integer; S102, based on the n groups of pattern design parameters, respectively determining the minimum equivalent areas of the effective areas, the transition areas and the clamping areas of the n different metal masks, and carrying out mechanical simulation on the minimum equivalent areas through a finite element algorithm to obtain n groups of material attributes corresponding to the n different metal masks, wherein each group of material attributes comprises the material attributes of the effective areas, the transition areas and the clamping areas of the corresponding metal masks; s103, carrying out mechanical simulation on the n different metal masks through a finite element algorithm based on the n groups of material properties to obtain n groups of first deformation values corresponding to the n different metal masks, wherein each group of first deformation values comprises first deformation values of an effective area, a transition area and a clamping area of the corresponding metal mask; s104, determining at least one group of target first deformation amount from the n groups of first deformation amounts, and outputting the transition region image corresponding to the target first deformation amount.
2. The pattern selection method according to claim 1, wherein in step S101, each of the n sets of pattern design parameters includes at least one of a hole size, a hole pitch, and a hole distribution density of the pattern design of the transition region.
3. The pattern selection method according to claim 1, wherein in step S102, determining the minimum equivalent regions of the effective regions, the transition regions, and the clamping regions of the n different metal reticles, respectively, includes: dividing the effective area of each metal mask plate into m 1 equivalent areas, wherein the area of each equivalent area is s 1 , the patterns are the same, m 1 is a positive integer, and the equivalent area corresponding to the minimum value of s 1 is the minimum equivalent area of the effective area; dividing the transition region of each metal mask plate into m 2 equivalent regions, wherein the area of each equivalent region is s 2 , the patterns are the same, m 2 is a positive integer, and the equivalent region corresponding to the minimum value of s 2 is the minimum equivalent region of the transition region; and equally dividing the clamping area of each metal mask plate into m 3 equivalent areas, wherein the area of each equivalent area is s 3 , the patterns are the same, m 3 is a positive integer, and the equivalent area corresponding to the smallest value of s 3 is the smallest equivalent area of the clamping area.
4. The pattern selection method as recited in claim 1, wherein the material property comprises at least one of an elastic modulus, a Poisson's ratio, and a shear modulus.
5. The pattern selection method according to claim 4, wherein in step S102, mechanical simulation is performed on each minimum equivalent region by a finite element algorithm to obtain n sets of material properties corresponding to the n different metal masks, including: respectively carrying out tension simulation on each minimum equivalent region of n different metal masks in the X direction, the Y direction, the Z direction and the shearing direction, and calculating second deformation amounts of the minimum equivalent regions in the X direction, the Y direction and the Z direction respectively; Based on the second deformation, obtaining the material properties of the minimum equivalent region, and further obtaining n groups of material properties corresponding to the n different metal masks; the X direction is the length direction of the minimum equivalent region, the Y direction is the width direction of the minimum equivalent region, the Z direction is the thickness direction of the minimum equivalent region, and the shearing direction is the diagonal direction of the minimum equivalent region.
6. The pattern selection method according to claim 5, wherein the performing tension simulation on each minimum equivalent region of the n different metal masks in the X direction, the Y direction, the Z direction and the shearing direction, respectively, and calculating second deformation amounts of the minimum equivalent regions in the X direction, the Y direction and the Z direction, respectively, includes: fixing one end of each minimum equivalent area along the X direction, applying a pulling force on the other end along the X direction, and calculating second deformation amounts of the minimum equivalent areas along the X direction and the Y direction; fixing one end of each minimum equivalent area along the Y direction, applying a pulling force on the other end along the Y direction, and calculating second deformation amounts of the minimum equivalent areas along the X direction and the Y direction; Fixing one surface of each minimum equivalent area along the Z direction, applying a pulling force on the other surface along the Z direction, and calculating second deformation amounts of the minimum equivalent areas along the X direction, the Y direction and the Z direction; And applying pulling force to two opposite angles of each minimum equivalent area, and calculating second deformation of the minimum equivalent area in the X direction and the Y direction.
7. The pattern selection method according to claim 1, wherein determining at least one set of target first deformation amounts from the n sets of first deformation amounts in step S104 includes: determining at least one set of first deformation amounts of the effective region, the transition region and the clamping region, each satisfying a target threshold; At least one set of first deformation amounts with minimum comprehensive data is determined as the target first deformation amount from at least one set of first deformation amounts meeting a target threshold based on a weight analysis method.
8. A metal mask is characterized by comprising an effective area positioned in the middle, clamping areas positioned at two ends and a transition area positioned between the effective area and the clamping areas; The pattern distribution state of the transition region is selected by the pattern selection method according to any one of claims 1 to 7.
9. The utility model provides a pattern selection device of metal mask version which characterized in that includes: The processing module is used for processing n different transition area images to obtain n groups of corresponding pattern design parameters which are used for representing pattern distribution states of the transition areas, wherein the patterns of the transition areas of n different metal masks are different; The first simulation module is used for respectively determining the minimum equivalent areas of the effective areas, the transition areas and the clamping areas of the n different metal masks based on the n groups of pattern design parameters, and carrying out mechanical simulation on the minimum equivalent areas through a finite element algorithm to obtain n groups of material attributes corresponding to the n different metal masks; The second simulation module is used for carrying out mechanical simulation on the n different metal masks through a finite element algorithm based on the n groups of material properties to obtain n groups of first deformation corresponding to the n different metal masks, wherein each group of first deformation comprises first deformation corresponding to an effective area, a transition area and a clamping area of the metal mask; And the output module is used for determining a target first deformation amount from the n groups of first deformation amounts and outputting the transition region image corresponding to the target first deformation amount.
10. A computer readable storage medium having stored thereon a computer program, wherein the computer program when executed by a processor implements the pattern selection method of a metal reticle according to any one of claims 1 to 7.

Description

Metal mask, pattern selection method and device thereof, and storage medium Technical Field The invention relates to the technical field of metal masks, in particular to a metal mask, a pattern selection method and device thereof and a storage medium. Background In the process of manufacturing a semiconductor display device (such as an Organic Light-Emitting Diode (OLED)), many film structures are formed by vapor deposition using a metal mask. The metal mask plate is strip-shaped and comprises an effective area (also called AA area) positioned in the middle, clamping areas positioned at two ends and a transition area (also called dummy area) positioned between the effective area and the clamping areas, wherein the effective area is provided with pixel evaporation holes corresponding to a substrate of the display equipment, the metal mask plate is required to be welded on a mask plate frame in a screen-tensioning mode before evaporation, then the clamping areas are removed, the effective area is reserved, and then a luminescent material is evaporated onto the substrate through the pixel evaporation holes. In the screen expanding process, the clamping area of the metal mask plate is clamped by the clamping jaw, so that the metal mask plate is opened. In the process of stretching, the effective area is easy to generate fold deformation and even fracture under the action of tensile force. Therefore, the transition region is distributed with a plurality of full-etched hollowed-out patterns (such as round holes, square holes or strip holes and the like) for buffering the stress mutation of the mask plate from the clamping region to the effective region, and for bearing the deformation brought by the stress buffering, so that the effective region is protected, and the influence of the deformation even the breakage of the effective region on the evaporation effect is avoided. It can be understood that the deformation of different metal masks corresponding to transition areas of different pattern designs is different. The smaller the deformation is, the stronger the capability of the buffer stress of the transition region is, the higher the precision of the metal mask is, the higher the precision of vapor deposition is, and the screen tensioning test is required to be carried out on different metal masks corresponding to the transition regions with different pattern designs, the deformation of the different metal masks after screen tensioning is obtained and compared, and then the smaller the deformation of the metal mask corresponding to the transition regions with any one or more pattern designs after screen tensioning is selected, the stronger the capability of the buffer stress is. In the prior art, pattern selection modes aiming at different metal masks are generally modes of metal mask physical test selection, patterns of transition areas are required to be designed in advance and the metal masks are correspondingly manufactured, screen tensioning tests are respectively carried out, and patterns with smaller deformation are selected, so that design cost and development period are increased. Moreover, because the metal mask plate has higher precision, thinner thickness, easy damage and higher manufacturing cost, the damaged metal mask plate can only be discarded, thereby causing the resource waste of the metal mask plate. Disclosure of Invention The application provides a metal mask, a pattern selection method, a pattern selection device and a storage medium thereof, which are used for solving the technical problems that the design cost and the development period are increased or the resource waste of the metal mask is caused by adopting a metal mask physical test mode in the related art. In a first aspect, the application provides a pattern selection method for a metal mask, the metal mask comprises an effective region in the middle, clamping regions at two ends, and a transition region between the effective region and the clamping regions, and the pattern selection method comprises the following steps: s101, processing n different transition region images to obtain corresponding n groups of pattern design parameters for representing pattern distribution states of the transition regions, wherein the patterns of the transition regions of n different metal masks are different; S102, based on n groups of pattern design parameters, respectively determining the minimum equivalent areas of the effective areas, the transition areas and the clamping areas of n different metal masks, and carrying out mechanical simulation on the minimum equivalent areas through a finite element algorithm to obtain n groups of material attributes corresponding to the n different metal masks, wherein each group of material attributes comprises the material attributes of the effective areas, the transition areas and the clamping areas of the corresponding metal masks; S103, carrying out mechanical simulation on n different metal masks thr