CN-121731873-B - Kr sample gas impurity removal method, system, terminal and storage medium

CN121731873BCN 121731873 BCN121731873 BCN 121731873BCN-121731873-B

Abstract

The application relates to a Kr sample gas impurity removal method, a system, a terminal and a storage medium, and relates to the technical field of gas purification, comprising the steps of conveying sample air to a preset three-stage filter according to a preset air tank with a preset single air volume for preliminary impurity removal so as to obtain primary impurity removal air; the method comprises the steps of collecting the water content of primary air and the carbon dioxide content of the primary air in primary impurity-removing air, controlling a preset molecular sieve according to the water content of the primary air and the carbon dioxide content of the primary air to carry out impurity-removing operation on the primary impurity-removing air so as to generate secondary impurity-removing air, collecting the internal temperature of the molecular sieve after secondary impurity removal, controlling a preset deep impurity-removing device according to the internal temperature of the molecular sieve to carry out deep impurity removal on the secondary impurity-removing air, and controlling a preset gas collecting device to collect the deep impurity-removing air. The application has the effect of improving the impurity removal efficiency and the impurity removal capacity.

Inventors

LI HAI
WU DAN
WANG YUAN
YU WANLI
TAO SHIHUA
LI ZHIYI

Assignees

杭州湘亭科技有限公司

Dates

Publication Date: 20260512
Application Date: 20260211

Claims (9)

1. A Kr sample gas impurity removal method, comprising: According to a preset single air volume, a preset air tank conveys sample air to a preset three-stage filter for preliminary impurity removal so as to obtain primary impurity removal air; Collecting the water content of primary air and the carbon dioxide content of the primary air in primary impurity-removed air; Controlling a preset molecular sieve according to the water content of the primary air and the carbon dioxide content of the primary air to perform impurity removal operation on the primary impurity removal air so as to generate secondary impurity removal air; Collecting the internal temperature of the molecular sieve after secondary impurity removal; Controlling a preset deep impurity removing device according to the internal temperature of the molecular sieve to deeply remove impurities from secondary impurity removing air, and controlling a preset gas collecting device to collect the deep impurity removing air; the method for generating secondary impurity removal air by controlling a preset molecular sieve according to the water content of primary air and the carbon dioxide content of primary air comprises the following steps of: substituting the water content of the primary air and the carbon dioxide content of the primary air into a preset molecular sieve height calculation formula to calculate so as to generate a target molecular sieve height, wherein the molecular sieve height calculation formula is as follows In which, in the process, Refers to the height of the target molecular sieve, Refers to the mass of water molecules in the impurity-removed air, the water content of the primary air is multiplied by 1m 3 through a processing terminal to obtain the water-free air, Refers to the water absorption capacity of the molecular sieve, Refers to the mass of carbon dioxide molecules in the impurity-removed air, the carbon dioxide content of the primary air is multiplied by 1m 3 through a treatment terminal to obtain the carbon dioxide-free air, Refers to the carbon dioxide absorption capacity of the molecular sieve, Refers to the horizontal cross-sectional area of the molecular sieve, Refers to the packing density of the molecular sieve particles; collecting the actual molecular sieve height; calculating the difference between the target molecular sieve height and the actual molecular sieve height to generate the height to be compensated of the molecular sieve; controlling a preset molecular sieve supplementing device to supplement the molecular sieve according to the height to be compensated by the molecular sieve; inputting primary impurity removal air into a molecular sieve to perform secondary impurity removal operation, and collecting actual molecular sieve pressure and actual molecular sieve gas flow rate; And adjusting the valve opening of a preset molecular sieve air inlet and a preset molecular sieve air outlet according to the actual molecular sieve pressure and the actual molecular sieve gas flow rate so as to generate secondary impurity-removing air.
2. The Kr sample gas impurity removal method according to claim 1, wherein the step of adjusting the valve opening of the preset molecular sieve gas inlet and the preset molecular sieve gas outlet according to the actual molecular sieve pressure and the actual molecular sieve gas flow rate to generate the secondary impurity removal air comprises: Judging whether the actual molecular sieve pressure meets the preset normal molecular sieve pressure; if it is satisfied that the set of parameters, the valve opening of the molecular sieve gas outlet is adjusted according to the actual molecular sieve gas flow rate; If the pressure difference does not meet the preset pressure difference, calculating a difference value between the actual molecular sieve pressure and the normal molecular sieve pressure to generate a molecular sieve pressure difference; substituting the molecular sieve pressure difference into a preset molecular sieve air inlet valve opening calculation formula to calculate so as to generate an air inlet valve opening adjustment value; And controlling the valve opening of the molecular sieve air inlet to adjust according to the valve opening adjusting value of the air inlet so as to ensure that the molecular sieve pressure meets the requirement of the normal molecular sieve pressure.
3. The Kr sample gas impurity removal method according to claim 2, wherein the step of adjusting the valve opening of the molecular sieve gas outlet according to the actual molecular sieve gas flow rate comprises: Calculating the difference between the actual molecular sieve gas flow rate and the preset normal molecular sieve gas flow rate to generate a molecular sieve gas flow rate difference; substituting the molecular sieve gas flow velocity difference into a preset molecular sieve gas outlet valve opening calculation formula to calculate so as to generate a gas outlet valve opening adjustment value; judging whether the valve opening adjustment value of the air outlet meets the preset valve opening increasing requirement or not; If not, controlling a valve of the molecular sieve gas outlet to reduce the opening according to the valve opening adjusting value of the gas outlet; if the value is satisfied, calculating an absolute value of an opening adjustment value of the valve of the air outlet, and controlling the valve of the air outlet of the molecular sieve to increase the opening according to the absolute value.
4. The Kr sample gas impurity removal method according to claim 1, wherein the deep impurity removal device comprises a phosphorus pentoxide impurity removal column and a carbon dioxide removal column, the deep impurity removal device is controlled to deeply remove impurities from secondary impurity removal air according to the internal temperature of the molecular sieve, and the step of controlling the preset gas collection device to collect the deep impurity removal air comprises the following steps: calculating according to the internal temperature of the molecular sieve to generate water vapor unadsorbed quantity and carbon dioxide unadsorbed quantity; substituting the unadsorbed water vapor into a preset water removal column volume calculation formula to calculate so as to generate a target water removal column volume; Controlling a preset medium compensation device according to a target water removal volume to supplement a medium for the phosphorus pentoxide water removal column, and controlling a phosphorus pentoxide water removal column to remove water from secondary impurity removal air so as to generate deep water removal air; substituting the unadsorbed carbon dioxide into a preset calculation formula of the volume of the carbon dioxide removal column to calculate so as to generate a target volume of the gas removal column; and controlling a medium compensation device according to the volume of the target degassing column to supplement the medium to the carbon dioxide removal column so as to control the carbon dioxide removal column to remove carbon dioxide from the deep water removal air and control a gas collecting device to collect the generated deep impurity removal air.
5. The Kr sample gas impurity removal method according to claim 4, wherein the step of calculating based on the internal temperature of the molecular sieve to produce a moisture non-adsorbed amount and a carbon dioxide non-adsorbed amount comprises: Calculating the difference between the internal temperature of the molecular sieve and the preset standard internal temperature of the molecular sieve to generate the internal temperature difference of the molecular sieve; substituting the internal temperature difference of the molecular sieve into a preset non-adsorbed water vapor quality calculation formula to calculate so as to generate the non-adsorbed water vapor quantity; substituting the internal temperature difference of the molecular sieve into a preset mass calculation formula of the unadsorbed carbon dioxide to calculate so as to generate the unadsorbed carbon dioxide.
6. The Kr sample gas impurity removal method according to claim 4, wherein the step of controlling a preset medium compensation device according to a target water removal volume to perform medium replenishment on the phosphorus pentoxide water removal column and controlling the phosphorus pentoxide water removal column to perform water removal operation on secondary impurity removal air to generate deep water removal air comprises the steps of: calculating the quotient between the volume of the target dewatering column and the preset cross section area of the dewatering column to generate the height of the target dewatering column; Collecting the actual water removal column height of the phosphorus pentoxide water removal column; judging whether the actual height of the water removal column is smaller than the target height of the water removal column or not; If the water content is not less than the preset water content, controlling the phosphorus pentoxide water removal column to carry out deep water removal operation on the secondary impurity removal air so as to generate deep water removal air; if the height of the water removal column is smaller than the actual height of the water removal column, calculating a difference between the target water removal column height and the actual water removal column height to generate a water removal column compensation height; And controlling a medium compensation device according to the compensation height of the water removal column to supplement the medium to the phosphorus pentoxide water removal column, and continuously collecting the actual height of the water removal column to carry out circulation judgment.
7. A Kr sample gas impurity removal system comprising: The acquisition module is used for acquiring the water content of the primary air, the carbon dioxide content of the primary air and the internal temperature of the molecular sieve; a memory for storing a program of a Kr sample gas impurity removal method according to any one of claims 1 to 6; a processor, a program in a memory capable of being loaded and executed by the processor and realizing a Kr sample gas impurity removal method as defined in any one of claims 1 to 6.
8. An intelligent terminal, characterized by comprising a memory and a processor, wherein the memory stores a computer program capable of being loaded by the processor and executing a Kr sample gas impurity removal method according to any one of claims 1 to 6.
9. A computer-readable storage medium, characterized in that a computer program capable of being loaded by a processor and executing a Kr sample gas impurity removal method according to any one of claims 1 to 6 is stored.

Description

Kr sample gas impurity removal method, system, terminal and storage medium Technical Field The application relates to the technical field of gas purification, in particular to a Kr sample gas impurity removal method, a Kr sample gas impurity removal system, a Kr sample gas impurity removal terminal and a Kr sample gas storage medium. Background The adsorption tower is separation equipment capable of separating water vapor and carbon dioxide from air, and after the air enters the adsorption tower, the inside molecular sieve, activated carbon and other adsorbents of the adsorption tower adsorb the water vapor and the carbon dioxide in the air, so that the impurity removal function of the air can be realized. In the related art, the molecular sieve adsorption technology is to separate water and carbon dioxide from air by utilizing the selective adsorption characteristic of the molecular sieve, and enable the water and the carbon dioxide to be adsorbed inside the molecular sieve, thereby realizing the function of removing the water and the carbon dioxide in the air. The molecular sieve regeneration technology refers to a technology for removing adsorbed water and carbon dioxide from a molecular sieve which adsorbs water and carbon dioxide, so that the original adsorption capacity of the molecular sieve is recovered, and the molecular sieve is provided with energy by increasing the temperature, so that the acting force between the molecular sieve and the water and the carbon dioxide is weakened, and the desorption effect is realized. In view of the above-mentioned related art, on one hand, when air is purified by the adsorption tower with a fixed capacity, the adsorption capacity of the molecular sieve needs to be recovered by heating operation every time the air is purified, so that the purification efficiency is low, and on the other hand, the adsorption capacity of the molecular sieve is weakened and the purification is insufficient due to the change of the pressure and the gas flow rate in the molecular sieve caused by the temperature rise in the adsorption tower caused by the heat released when the molecular sieve adsorbs water and carbon dioxide. Disclosure of Invention In order to improve the impurity removal efficiency and the impurity removal capacity, the application provides a Kr sample gas impurity removal method, a Kr sample gas impurity removal system, a Kr sample gas impurity removal terminal and a Kr sample gas impurity removal storage medium. In a first aspect, the application provides a Kr sample gas impurity removal method, which adopts the following technical scheme: a Kr sample gas impurity removal method comprising: According to a preset single air volume, a preset air tank conveys sample air to a preset three-stage filter for preliminary impurity removal so as to obtain primary impurity removal air; Collecting the water content of primary air and the carbon dioxide content of the primary air in primary impurity-removed air; Controlling a preset molecular sieve according to the water content of the primary air and the carbon dioxide content of the primary air to perform impurity removal operation on the primary impurity removal air so as to generate secondary impurity removal air; Collecting the internal temperature of the molecular sieve after secondary impurity removal; and controlling a preset deep impurity removing device according to the internal temperature of the molecular sieve to deeply remove impurities from the secondary impurity removing air, and controlling a preset gas collecting device to collect the deep impurity removing air. Through adopting above-mentioned technical scheme, carry sample air to tertiary filter according to single air volume gas pitcher and carry out preliminary edulcoration and obtain primary edulcoration air, carry out edulcoration operation to primary edulcoration air according to primary air water content and primary air carbon dioxide content control molecular sieve and obtain secondary edulcoration air, carry out degree of depth edulcoration to secondary edulcoration air according to the inside temperature control degree of depth edulcoration device of molecular sieve, and control gas collecting device collects degree of depth edulcoration air, get rid of the hydrone and the carbon dioxide molecule in the sample air through three edulcoration procedures, thereby make the hydrone and the carbon dioxide content increase that the edulcoration step got rid of, and then improve the edulcoration ability. Optionally, the step of performing a purifying operation on the primary purified air according to the primary air water content and the primary air carbon dioxide content by controlling a preset molecular sieve to generate secondary purified air includes: Substituting the water content of the primary air and the carbon dioxide content of the primary air into a preset molecular sieve height calculation formula for calculation so as to generate a target molec