CN-121820253-B - Dust monitoring and cleaning system and cleaning control method thereof

CN121820253BCN 121820253 BCN121820253 BCN 121820253BCN-121820253-B

Abstract

The application belongs to the technical field of industrial dust explosion safety prevention and control, and particularly relates to a dust monitoring and cleaning system and a cleaning control method thereof. The control module is arranged to be capable of determining dust deposition thickness according to the frequency signal sent by the sensing module, controlling the self-cleaning module to clean the sensing module when the dust deposition thickness is not smaller than a first threshold value, and controlling the area cleaning module to clean an area to be monitored when the dust deposition thickness is not smaller than a second threshold value. Based on interaction among the self-cleaning module, the regional cleaning module and the control module, maintenance-free operation and measurement accuracy continuity of the sensing module in a severe industrial environment are guaranteed, crossing of a dust monitoring and cleaning system from perception to execution is realized, and an intelligent, active and closed-loop safety barrier is formed.

Inventors

JIANG HAIPENG
WANG XINHAN
GAO WEI
LU ZHENGKANG
HONG YU

Assignees

大连理工大学

Dates

Publication Date: 20260508
Application Date: 20260316

Claims (9)

1. A dust monitoring and cleaning system, comprising: a housing (1); the sampling module (2) is arranged in the shell (1) and is used for introducing dust-containing airflow in a region to be monitored into the shell (1); A sensing module (3) arranged in the housing (1) for generating a frequency signal based on the dust-laden air stream; The self-cleaning module (4) is arranged in the shell (1) and is used for cleaning the sensing module (3); an area cleaning module (5) arranged outside the housing (1), and The control module (6) is connected with the sampling module (2), the sensing module (3), the self-cleaning module (4) and the area cleaning module (5); the control module (6) is configured to determine a dust deposition thickness according to a frequency signal sent by the sensing module (3), and control the self-cleaning module (4) to clean the sensing module (3) when the dust deposition thickness is not less than a first threshold value, and control the area cleaning module (5) to clean the area to be monitored when the dust deposition thickness is not less than a second threshold value, wherein the first threshold value is less than the second threshold value; The sampling module (2) comprises a dustproof grating (21), an airflow guide ring (22), a sedimentation member (23) and a centrifugal fan (24); the dustproof grating (21), the airflow guide ring (22) and the sedimentation member (23) are sequentially arranged in the shell (1), and the dustproof grating (21) is positioned at the end part of the shell (1); The airflow guide ring (22) is arranged at intervals with the dustproof grating (21), and the airflow guide ring (22) is provided with a central through hole (222) and a plurality of guide holes (221) positioned outside the central through hole (222); One end of the sedimentation member (23) is abutted against the airflow guiding ring (22), the other end is abutted against the sensing module (3), and the sedimentation member (23) is enclosed to form a sedimentation chamber (231) communicated with a central through hole (222) of the airflow guiding ring (22); The centrifugal fan (24) is arranged in the shell (1) and is communicated with the outside of the shell (1) through the guide holes (221) and the dustproof grille (21), so that dust-containing airflow in the area to be monitored is introduced into the shell (1), and the sensing module (3) can collect dust in the dust-containing airflow through the settling chamber (231) and the central through hole (222).
2. The dust monitoring and cleaning system according to claim 1, characterized in that the sensing module (3) comprises at least a sensor (31), the sensor (31) comprising a quartz wafer, a metal electrode and an oscillating circuit; The metal electrode is used for applying an alternating electric field in the shell (1), the quartz wafer can generate resonance vibration under the alternating electric field, and the oscillating circuit collects frequency signals of the quartz wafer in real time and outputs the frequency signals to the control module (6).
3. The dust monitoring and cleaning system according to claim 2, wherein the sensing module (3) further comprises a temperature and humidity sensor (32), the temperature and humidity sensor (32) being arranged in the housing (1) for monitoring environmental data in the housing (1); The control module (6) is further connected with the temperature and humidity sensor (32), and corrects the frequency signal output by the oscillating circuit by utilizing the environmental data monitored by the temperature and humidity sensor (32).
4. The dust monitoring and cleaning system according to claim 2, characterized in that the self-cleaning module (4) comprises a piezoelectric vibrator (41), a plurality of pulsed air flow nozzles (42) and a plurality of control assemblies (43); The piezoelectric vibrators (41) are arranged below the sensing module (3), the pulse air flow nozzles (42) are arranged on the outer side of the sensing module (3) in a spacing ring mode, and the control assemblies (43) are arranged in one-to-one correspondence with the pulse air flow nozzles (42); the control module (6) is connected with the piezoelectric vibrator (41) and the control assembly (43) and is used for controlling the piezoelectric vibrator (41) to vibrate and controlling the corresponding pulse airflow nozzle (42) to jet airflow by the control assembly (43) so as to clean the sensing module (3).
5. The dust monitoring and cleaning system according to any one of claims 2-4, characterized in that the control module (6) comprises a main control board (61), a power and communication board (62) and a rechargeable battery (63); The rechargeable battery (63) is used for supplying power to the main control board (61), the sampling module (2), the sensing module (3) and the self-cleaning module (4); The main control board (61) is connected with the power supply and communication board (62), the sampling module (2), the sensing module (3) and the self-cleaning module (4); The power supply and communication board (62) is in communication connection with the zone cleaning module (5) and is used for sending a zone cleaning trigger signal to the zone cleaning module (5) when the deposition thickness is not smaller than a second threshold value.
6. A cleaning control method configured in the dust monitoring and cleaning system according to any one of claims 2-5, and comprising: controlling the operation of the sampling module (2) to introduce a dust-laden air stream in the area to be monitored into the housing (1); receiving a frequency signal generated by the sensing module (3) based on the dust-containing air flow, and calculating the dust deposition thickness deposited on the sensing module (3) according to the frequency signal; controlling the self-cleaning module (4) to clean the sensing module (3) under the condition that the dust deposition thickness is not smaller than a first threshold value; and controlling the area cleaning module (5) to clean the area to be monitored under the condition that the dust deposition thickness is not smaller than a second threshold value.
7. The cleaning control method according to claim 6, characterized in that the calculating the dust deposition thickness deposited on the sensor module (3) from the frequency signal comprises: Determining the inherent frequency of the quartz wafer according to the thickness, the reinforced elastic coefficient and the crystal density of the quartz wafer; determining the unit area mass variation of the quartz wafer caused by dust deposition according to the natural frequency, the frequency drift amount and the mass of the quartz wafer; and determining the dust deposition thickness according to the unit area mass variation quantity of the quartz wafer, the dust deposition density and the area of the area to be monitored, which are caused by the dust deposition.
8. The cleaning control method according to claim 7, characterized in that before calculating the dust deposition thickness deposited on the sensor module (3) from the frequency signal, the cleaning control method further comprises correcting the frequency signal from environmental data within the housing (1); and/or the cleaning control method further comprises correcting the sensitivity of the sensor (31) according to the frequency drift amount.
9. The cleaning control method according to claim 7, characterized in that the self-cleaning module (4) includes a piezoelectric vibrator (41), a plurality of pulse air flow nozzles (42), and a plurality of control components (43), the controlling the self-cleaning module (4) to clean the sensing module (3) includes: controlling the piezoelectric vibrator (41) to vibrate; -controlling the control assembly (43) to open a pulsed air flow nozzle (42) after the piezoelectric vibrator (41) is vibrated for a first period of time; -controlling the control assembly (43) to compress the air in the housing (1) and to spray an air flow through the pulsed air flow nozzle (42) towards the sensor module (3) for cleaning the sensor module (3).

Description

Dust monitoring and cleaning system and cleaning control method thereof Technical Field The application belongs to the technical field of industrial dust explosion safety prevention and control, and particularly relates to a dust monitoring and cleaning system and a cleaning control method thereof. Background In many industrial fields such as coal, grain, metal processing, especially dust accumulation in areas where dust removing pipelines, combustion furnaces and flues are located, the dust accumulation is a main risk source for dust explosion, and effective monitoring and timely cleaning of the dust accumulation are important. The existing monitoring mode mainly comprises (1) an offline weighing method, which is used for weighing in a laboratory after a dust sample is manually collected, wherein the method cannot realize online early warning although the data are accurate, and has poor timeliness and large workload, (2) an online suspended dust concentration meter is used for measuring, which is based on the principles of light scattering, beta rays and the like, and only can be used for monitoring the suspended dust concentration in the air, so that a more key risk index of ground deposited dust cannot be directly quantified, (3) a deposited dust monitoring device, which adopts a passive waiting sedimentation mode, has a very small monitoring range and is not suitable for monitoring a larger area. Moreover, the related device used in the monitoring mode only provides a monitoring function, does not have a self-cleaning function and a monitoring area cleaning function, cannot form an effective risk prevention and control closed loop, and still has a large risk in the monitoring area. Disclosure of Invention The application aims to provide a dust monitoring and cleaning system and a cleaning control method thereof, which realize an effective risk prevention and control closed loop and greatly reduce the safety risk of a monitoring area. The application provides a dust monitoring and cleaning system which comprises a shell, a sampling module, a sensing module, a self-cleaning module, an area cleaning module and a control module, wherein the sampling module is arranged in the shell and used for introducing dust-containing air flow in an area to be monitored into the shell, the sensing module is arranged in the shell and used for generating a frequency signal based on the dust-containing air flow, the self-cleaning module is arranged in the shell and used for cleaning the sensing module, the area cleaning module is arranged outside the shell, and the control module is connected with the sampling module, the sensing module, the self-cleaning module and the area cleaning module. The control module is configured to determine a dust deposition thickness according to a frequency signal sent by the sensing module, control the self-cleaning module to clean the sensing module when the dust deposition thickness is not smaller than a first threshold, control the area cleaning module to clean the area to be monitored when the dust deposition thickness is not smaller than a second threshold, and control the first threshold to be smaller than the second threshold. In an alternative aspect of the application, the sensing module includes at least a sensor including a quartz wafer, a metal electrode, and an oscillating circuit. The metal electrode is used for applying an alternating electric field in the shell, the quartz wafer can generate resonance vibration under the alternating electric field, and the oscillating circuit collects frequency signals of the quartz wafer in real time and outputs the frequency signals to the control module. In an alternative scheme of the application, the sensing module further comprises a temperature and humidity sensor, wherein the temperature and humidity sensor is arranged in the shell and used for monitoring environmental data in the shell. The control module is also connected with the temperature and humidity sensor, and corrects the frequency signal output by the oscillating circuit by utilizing the environmental data monitored by the temperature and humidity sensor. In an alternative aspect of the application, the self-cleaning module includes a piezoelectric vibrator, a plurality of pulsed air flow nozzles, and a plurality of control assemblies. The piezoelectric vibrator is arranged below the sensing module, the pulse air flow nozzles are arranged on the outer side of the sensing module in a spacing ring mode, and the control assemblies are arranged in one-to-one correspondence with the pulse air flow nozzles. The control module is connected with the piezoelectric vibrator and the control assembly and is used for controlling the piezoelectric vibrator to vibrate and controlling the corresponding pulse airflow nozzle to jet airflow so as to clean the sensing module. In an alternative aspect of the application, the sampling module includes a dust grill, an airflow guide ring, a sedime