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CN-121971939-A - Dust treatment device for preparing semiconductor material

CN121971939ACN 121971939 ACN121971939 ACN 121971939ACN-121971939-A

Abstract

The invention discloses a dust treatment device for preparing semiconductor materials, which belongs to the technical field of semiconductor processing and comprises a box body, wherein one end of the box body is fixedly connected with a first connecting plate, one end of the first connecting plate, which is far away from the box body, is fixedly connected with a first driving mechanism, the first driving mechanism is fixedly connected with a first dust collection head, the first dust collection head is detachably connected with a flexible hose, the flexible hose is communicated with the box body, an induced air mechanism is arranged in the box body and is communicated with the flexible hose, the induced air mechanism is communicated with the dust treatment mechanism, the dust treatment mechanism comprises a first partition plate fixedly connected in the box body, a first filtering part is fixedly connected between the first partition plate and the inner wall of the box body, and one side, which is far away from the first partition plate, of the box body is provided with a second filtering part. The invention adopts the flexible hose to cooperate with the driving mechanism, realizes dust capture in a long distance and multiple angles, has wide application range, ensures the cleanliness of the discharged gas by arranging the first filtering part and the second filtering part, and meets the high requirement of semiconductor production on the environment.

Inventors

  • LI LIN
  • ZHANG XUEHUA
  • WANG JIANJUN
  • ZHAO BIN
  • SUN JINGJING

Assignees

  • 中原工学院

Dates

Publication Date
20260505
Application Date
20260212

Claims (10)

  1. 1. The dust treatment device for preparing the semiconductor material is characterized by comprising a box body (1), wherein one end of the box body (1) is fixedly connected with a first connecting plate (2), one end of the first connecting plate (2) which is far away from the box body (1) is fixedly connected with a first driving mechanism, the first driving mechanism is fixedly connected with a first dust collection head (3), the first dust collection head (3) is detachably connected with a flexible hose (4), the flexible hose (4) is communicated with the inside of the box body (1), an air inducing mechanism is arranged in the box body (1), the air inducing mechanism is communicated with the flexible hose (4), the air inducing mechanism is communicated with a dust treatment mechanism, the dust treatment mechanism comprises a first partition plate (5) which is fixedly connected with the inside of the box body (1), a first filtering part is fixedly connected between the first partition plate (5) and the inner wall of the box body (1), one side of the box body (1) which is far away from the first partition plate (5) is provided with a second filtering part, the first filtering part is communicated with the air outlet (6) is arranged on the top surface of the box body, and the air outlet (6) is communicated with the first filtering part.
  2. 2. The dust treatment device for preparing semiconductor materials according to claim 1, wherein the first driving mechanism comprises a connecting frame (7) fixedly connected to the top surface of the first connecting plate (2), the connecting frame (7) is located on one side, far away from the box body (1), of the first connecting plate (2), first sliding grooves (8) are symmetrically formed in the connecting frame (7), second connecting plates (9) are connected in the first sliding grooves (8) in a sliding mode, one side, far away from the box body (1), of the second connecting plates (9) is provided with the first dust collection head (3), the second connecting plates (9) are connected with a first driving portion in a transmission mode, and the first driving portion is fixedly connected with the connecting frame (7).
  3. 3. The dust treatment device for preparing semiconductor materials according to claim 2, wherein the first driving part comprises a first motor (10) fixedly connected to the top surface of the connecting frame (7), a lead screw (11) is fixedly connected to an output shaft of the first motor (10), the bottom of the lead screw (11) is rotationally connected with the first connecting plate (2), and the lead screw (11) is in threaded connection with the second connecting plate (9).
  4. 4. The dust disposal device for semiconductor material production according to claim 1, wherein the first dust collection head (3) is connected to the flexible hose (4) via a quick release joint (12).
  5. 5. The dust treatment device for preparing semiconductor materials according to claim 1, wherein the induced air mechanism comprises a shell (13) fixedly connected in the box body (1), a fan (14) is installed in the shell (13), the shell (13) is communicated with the flexible hose (4), the shell (13) is connected with a first connecting pipe (15), and the first connecting pipe (15) penetrates through the first filtering part and is located below the first filtering part.
  6. 6. The dust treatment device for preparing semiconductor materials according to claim 5, wherein cleaning liquid (16) is arranged below the first filtering part, an outlet of the first connecting pipe (15) is located below the liquid level of the cleaning liquid (16), one end, far away from the induced draft fan (14), of the first partition board (5) is fixedly connected with a liquid tank (17), the top of the liquid tank (17) is communicated with a liquid supplementing pipe (18), the liquid supplementing pipe (18) extends out of the tank body (1), the bottom of the liquid tank (17) is communicated with a second connecting pipe (19), the second connecting pipe (19) penetrates through the first partition board (5) and is communicated with the cleaning liquid (16), and a liquid outlet (20) is formed in the side wall, close to the cleaning liquid (16), of the tank body (1).
  7. 7. A dust disposal apparatus for semiconductor material production as claimed in claim 6, wherein a turbidity detector (21) is provided in said tank (1), said turbidity detector (21) being located in said cleaning liquid (16).
  8. 8. The dust treatment device for semiconductor material preparation of claim 5, wherein the first filter unit comprises a first filter screen (22) fixedly connected between the first partition plate (5) and the inner wall of the box body (1), the first connecting pipe (15) penetrates through the first filter screen (22), a vibrating piece is arranged above the first filter screen (22) and comprises a second motor (23) fixedly connected with the inner wall of the box body (1), a cam (24) is fixedly connected to an extension shaft of the second motor (23), and the cam (24) is abutted against the first filter screen (22).
  9. 9. The dust treatment device for preparing semiconductor materials according to claim 6, wherein a first through hole (25) is formed in the top of the first partition board (5), the first through hole (25) is located above the liquid tank (17), a second partition board (26) is fixedly connected in the tank body (1), a second through hole (27) is formed in the bottom of the second partition board (26), a third partition board (28) is fixedly connected between the second partition board (26) and the liquid tank (17), the second filtering part comprises a first activated carbon adsorbent (29) arranged on the top surface of the third partition board (28), absorbent cotton (30) is arranged at the bottom of the third partition board (28), the absorbent cotton (30) is located above the second through hole (27), and a second activated carbon adsorbent (31) is fixedly connected between the second partition board (26) and the inner wall of the tank body (1).
  10. 10. The dust disposal apparatus for semiconductor material manufacturing according to claim 9, wherein a fourth partition plate (32) is fixedly connected to the bottom surface of the liquid tank (17), a blower (33) is fixedly connected to a side of the fourth partition plate (32) away from the second partition plate (26), and an opening of the blower (33) faces the second through hole (27).

Description

Dust treatment device for preparing semiconductor material Technical Field The invention belongs to the technical field of semiconductor processing, and particularly relates to a dust treatment device for preparing semiconductor materials. Background The preparation of semiconductor materials (e.g., silicon wafers, photoresists, targets, etc.) is typically performed in a high-cleanliness environment. Once dust particles (especially metal dust and particulate matter) in the air adhere to the wafer surface, short circuit, open circuit or performance parameter drift can be caused, and the yield is greatly reduced. Traditional suction hoods are mostly fixed, are difficult to cover large-scale reation kettle or multistation's dust production point, have the dead angle, rely on dry-type filter cartridge (HEPA) simultaneously and block up easily, and to viscidity or wet dust treatment effect poor, frequent change filter core is with high costs. Disclosure of Invention The invention aims to provide a dust treatment device for preparing semiconductor materials, which solves the problems in the prior art. The dust treatment device for preparing the semiconductor material comprises a box body, wherein a first connecting plate is fixedly connected to one end of the box body, a first driving mechanism is fixedly connected to one end, far away from the box body, of the first connecting plate, a first dust collection head is fixedly connected to the first driving mechanism, a flexible hose is detachably connected to the first dust collection head, the flexible hose is communicated with the box body, an air inducing mechanism is arranged in the box body and is communicated with the flexible hose, the air inducing mechanism is communicated with a dust treatment mechanism, the dust treatment mechanism comprises a first partition plate fixedly connected in the box body, a first filtering part is fixedly connected between the first partition plate and the inner wall of the box body, a second filtering part is arranged on one side, far away from the first partition plate, of the box body, the first filtering part is communicated with the second filtering part, an air outlet is formed in the top surface of the box body, and the air outlet is communicated with the second filtering part. Optionally, the first actuating mechanism is in including the rigid coupling the link of first connecting plate top surface, the link is located first connecting plate is kept away from one side of box, the symmetry is equipped with first spout in the link, sliding connection has the second connecting plate in the first spout, the second connecting plate is kept away from one side of box has estimated first dust absorption head, the transmission of second connecting plate is connected with first drive division, first drive division with the link rigid coupling. Optionally, the first drive portion includes the rigid coupling first motor of link top surface, the output shaft rigid coupling of first motor has the lead screw, the bottom of lead screw with first connecting plate rotates to be connected, the lead screw with second connecting plate threaded connection. Optionally, the first dust collection head is connected with the flexible hose through a quick-release connector. Optionally, the induced air mechanism includes the rigid coupling is in casing in the box, install the fan in the casing, the casing with flexible hose intercommunication, the casing is connected with first connecting pipe, first connecting pipe passes first filter unit and be located the below of first filter unit. Optionally, the below of first filter unit is equipped with the cleaning solution, the export of first connecting pipe is located below the liquid level of cleaning solution, first baffle is kept away from induced air mechanism's one end rigid coupling has the liquid case, the top intercommunication of liquid case has the fluid replacement pipe, and the fluid replacement pipe stretches out to the outside of box, the bottom intercommunication of liquid case has the second connecting pipe, the second connecting pipe passes first baffle and with the cleaning solution intercommunication, the box is close to the lateral wall of cleaning solution is equipped with the liquid outlet. Optionally, a turbidity detector is arranged in the box body, and the turbidity detector is positioned in the cleaning solution. Optionally, the first filter part is including the rigid coupling first baffle with first filter screen between the box inner wall, first connecting pipe passes first filter screen, the top of first filter screen is equipped with the vibrating piece, the vibrating piece include with the second motor of box inner wall rigid coupling, the extension axle rigid coupling of second motor has the cam, the cam with first filter screen butt. Optionally, the top of first baffle is equipped with first through-hole, first through-hole is located the top of liquid case, the rigid