CN-121972088-A - Reaction process device, feeding device thereof and parameter optimization method

CN121972088ACN 121972088 ACN121972088 ACN 121972088ACN-121972088-A

Abstract

The disclosure provides a reaction process device, a feeding device thereof and a parameter optimization method. The feeding device comprises a feeding pipeline, an annular pipeline and at least two spiral nozzles, wherein the feeding pipeline comprises a main feeding branch pipe and at least two branch pipes, the main feeding branch pipe is communicated with the annular pipeline through the branch pipes, and each spiral nozzle is distributed on the annular pipeline. The material flow distribution uniformity can be guaranteed in the present disclosure, the dispersion uniformity of the material liquid on the cross section of the reaction kettle is enhanced, and scaling caused by excessive accumulation of partial materials of the reaction kettle is prevented. The clear runner design of spiral nozzle and the higher liquid velocity in the passageway can reduce the probability of feed line scale deposit jam to a certain extent.

Inventors

LI TINGTING
WANG DAJUN
ZHANG XINPING

Assignees

上海中化科技有限公司

Dates

Publication Date: 20260505
Application Date: 20250928

Claims (10)

1. The feeding device is characterized by comprising a feeding pipeline, an annular pipeline and at least two spiral nozzles, wherein the feeding pipeline comprises a main feeding branch pipe and at least two branch pipes, the main feeding branch pipe is communicated with the annular pipeline through the branch pipes, and each spiral nozzle is distributed on the annular pipeline.
2. The feeding device according to claim 1, wherein the number of the spiral nozzles is determined according to a spray range of the spiral nozzles and a cross section of a reaction tank included in a reaction process device to which the feeding device is applied.
3. The feed device of claim 1, wherein the spiral nozzles are equally spaced on the annular line; And/or each branch pipe is arranged on the annular pipeline at equal intervals; and/or the number of the spiral nozzles is 4; And/or the number of the branch pipes is 2.
4. The feed device of claim 1, wherein the feed line further comprises a feed reducer, a first end of the feed reducer is fixed to a feed port at the top of a reaction vessel included in the reaction process device, and a second end of the feed reducer is connected to the main feed branch pipe, wherein the first end has an inner diameter greater than that of the second end, and the feed device is applied to the reaction process device.
5. The feeding device as claimed in any one of claims 1-4, further comprising a pulse generator; The pulse generator is arranged in the main feeding branch pipe, or the feeding device further comprises an external feeding pipe, the pulse generator is arranged in the external feeding pipe, the external feeding pipe is arranged outside the reaction kettle, and the external feeding pipe is connected with the main feeding branch pipe or connected with the feeding reducing pipe when the feeding pipeline comprises the feeding reducing pipe.
6. The feeding device of claim 5, wherein the pulse generator generates pressure pulses at a fixed frequency, wherein the fixed frequency is an empirical value or the fixed frequency is obtained by performing a simulation calculation on a reaction vessel in which the feeding device is built; And/or the pulse intensity of the pulse generator is in the range of 0.1Mpa and 0.5Mpa, wherein the pulse intensity is an empirical value or is obtained by performing simulation calculation on a reaction kettle with the feeding device; And/or the feeding device further comprises a pressure regulating valve, and the pressure regulating valve is arranged in the main feeding branch pipe or the external feeding pipe.
7. The feed device of claim 6, further comprising a flow sensor, a pressure sensor, and a controller electrically connected to the flow sensor, the pressure sensor, and the pulse generator, respectively, the flow sensor and the pressure sensor being disposed within the main feed leg or within the external feed tube, and the flow sensor and the pressure sensor being downstream of the pressure regulator valve and upstream of the pulse generator; The controller is used for adjusting the pulse frequency of the pulse generator according to the flow data detected by the flow sensor and the pressure data detected by the pressure sensor until the flow data and the pressure data accord with preset conditions.
8. A reaction process unit comprising a reaction vessel and a feed unit according to any one of claims 1 to 7; The top of reation kettle is equipped with the feed inlet, feed arrangement is located inside the reation kettle, just the feed line with the feed inlet is connected.
9. A method for optimizing parameters of a feed device, characterized in that the method is used for optimizing structural parameters of the feed device according to any one of claims 1-7, the method comprising the steps of: obtaining a flow field calculation result of a reaction kettle with the feeding device arranged therein through numerical simulation; Optimizing structural parameters of the feeding device according to the flow field calculation result, wherein the structural parameters comprise at least one of the number of the branch pipes, the number of the spiral nozzles, the angle of the spiral nozzles, the layout mode of the branch pipes, the size of the main feeding branch pipe, the size of the branch pipes, the size of the annular pipeline, the connection mode of the spiral nozzles and the annular pipeline, the pulse frequency of the pulse generator and the pulse intensity of the pulse generator.
10. The method of claim 9, wherein optimizing structural parameters of the feed device based on the flow field calculations comprises: Determining a cross-section prepolymer concentration kurtosis value according to the flow field calculation result; optimizing structural parameters of the feeding device according to the cross-section prepolymer concentration kurtosis value; the calculation formula of the kurtosis value of the cross-section prepolymer concentration is as follows: Wherein n represents the number of data points of the cross section of the reaction kettle, i represents the ith data, c i represents the concentration value of the ith data point, Mean sample concentration and SD standard deviation sample concentration are shown.

Description

Reaction process device, feeding device thereof and parameter optimization method Technical Field The disclosure relates to the technical field of chemical equipment, in particular to a reaction process device, a feeding device thereof and a parameter optimization method. Background The reaction process device of the reaction kettle and the like is important industrial equipment, generally comprises a kettle body, a stirring system, a heat transfer system, a feed/discharge port, a monitoring instrument and the like, realizes uniform mixing and heat mass transfer of reactants through mechanical stirring, and is widely applied to industrial processes of hydrolysis, neutralization, crystallization, distillation, storage, hydrogenation, alkylation, polymerization, condensation, heating and mixing, constant-temperature reaction and the like. In the process route applied to the reaction kettle, liquid-liquid mixing reaction is more common, the reaction is carried out by adopting a single hole mode at the top of the kettle to add materials, so that the material dispersion effect in the kettle is poor, excessive accumulated materials are easy to occur at a baffle plate close to the liquid level, excessive reaction is easy to occur due to excessive local concentration, scaling on the kettle wall is further aggravated, the quality of products is influenced, and the cleaning difficulty of the reaction kettle is increased. Meanwhile, the flow rate in the dripping feeding pipe is low, and the dripping feeding pipe is easy to block, so that the normal operation of the production process is influenced. Disclosure of Invention The technical problem to be solved by the disclosure is to overcome the defects of uneven material dispersion, easy blockage of a feeding pipeline, local excessive reaction and scaling in a device caused by a feeding mode of a reaction process device in the prior art, and provide the reaction process device, the feeding device and a parameter optimization method thereof. The technical problems are solved by the following technical scheme: In a first aspect, a feeding device is provided, the feeding device comprises a feeding pipeline, an annular pipeline and at least two spiral nozzles, the feeding pipeline comprises a main feeding branch pipe and at least two branch pipes, the main feeding branch pipe is communicated with the annular pipeline through the branch pipes, and each spiral nozzle is distributed on the annular pipeline. Preferably, the feeding device is applied to a single-feed-port reaction process device. Optionally, the number of the spiral nozzles is determined according to the spraying range of the spiral nozzles and the cross section of a reaction kettle contained in the reaction process device. Optionally, the spiral nozzles are equally spaced on the annular pipeline; And/or each branch pipe is arranged on the annular pipeline at equal intervals; and/or the number of the spiral nozzles is 4; And/or the number of the branch pipes is 2. Optionally, the feeding pipeline further comprises a feeding reducing pipe, a first end of the feeding reducing pipe is fixed at a feeding hole at the top of a reaction kettle contained in the reaction process device, a second end of the feeding reducing pipe is connected with the main feeding branch pipe, and the inner diameter of the first end is larger than that of the second end. Optionally, the feeding device further comprises a pulse generator, wherein the pulse generator is arranged in the main feeding branch pipe; Optionally, the feeding device further comprises a pulse generator and an external feeding pipe, the pulse generator is arranged in the external feeding pipe, the external feeding pipe is arranged outside the reaction kettle, and the external feeding pipe is connected with the main feeding branch pipe or connected with the feeding reducing pipe under the condition that the feeding pipeline comprises the feeding reducing pipe. Optionally, the pulse generator generates pressure pulses at a fixed frequency, wherein the fixed frequency can be an empirical value or can be obtained by performing simulation calculation on a reaction kettle with the feeding device; And/or the pulse intensity of the pulse generator is in the range of 0.1Mpa and 0.5Mpa, and the pulse intensity can be an empirical value or can be obtained by performing simulation calculation on a reaction kettle with the feeding device. And/or, the feeding device further comprises a pressure regulating valve, wherein the pressure regulating valve is arranged in the main feeding branch pipe, or in the case that the feeding device comprises an external feeding pipe, the pressure regulating valve is arranged in the external feeding pipe. Preferably, a flow sensor is further arranged in the external feeding pipe, and the pressure regulating valve is positioned at the downstream of the external fluid source and at the upstream of the flow sensor. Optionally, the feeding device furthe