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CN-121972456-A - TC chamber self-cleaning system

CN121972456ACN 121972456 ACN121972456 ACN 121972456ACN-121972456-A

Abstract

The invention discloses an automatic cleaning system for a TC (tungsten carbide) cavity, which relates to the technical field of semiconductor manufacturing and comprises a cavity, wherein a vacuum hand disk is arranged in the cavity, the automatic cleaning system further comprises a second air inlet branch pipe, two ends of the bottom of the second air inlet branch pipe penetrate through the top of the cavity and extend to the inside of the cavity, the two ends of the bottom of the second air inlet branch pipe are fixedly communicated with the same annular air inlet pipe, the bottom of the annular air inlet pipe is fixedly communicated with a plurality of first jet heads, and the top end of the first air inlet branch pipe is fixedly communicated with the top of the second air inlet branch pipe.

Inventors

  • RAO XIN
  • Zhan Haoxin
  • YUAN BINGBING
  • Zhou Junzuo

Assignees

  • 浙江晶睿电子科技有限公司

Dates

Publication Date
20260505
Application Date
20251230

Claims (10)

  1. TC chamber self-cleaning system, including cavity (1), the internally mounted of cavity (1) has vacuum hand dish (2), its characterized in that, this self-cleaning system still includes: The two ends of the bottom of the second air inlet branch pipe (7) penetrate through the top of the cavity (1) and extend into the cavity (1), the two ends of the bottom of the second air inlet branch pipe (7) are fixedly communicated with the same annular air inlet pipe (8), and the bottoms of the annular air inlet pipes (8) are fixedly communicated with a plurality of first jet heads (9); The top end of the first air inlet branch pipe (5) is fixedly communicated with the top of the second air inlet branch pipe (7), the bottom end of the first air inlet branch pipe (5) penetrates through the left side of the cavity (1) and extends to the inside of the cavity (1), a hose (11) is fixedly communicated with the bottom end of the first air inlet branch pipe (5), a second jet head (12) is fixedly communicated with the bottom end of the hose (11), and a main air inlet pipe (4) is fixedly communicated with the first air inlet branch pipe (5); The exhaust assembly is arranged at the bottom of the cavity (1) and is used for exhausting gas and impurities in the cavity (1); The adjusting component is used for adjusting the angle of the second jet head (12), is arranged on the left inner wall of the cavity (1), and is matched with the second jet head (12).
  2. 2. The TC cavity automatic cleaning system according to claim 1, wherein an outlet is formed in an inner wall of a front side of the cavity (1), a material taking door (3) is hinged to a front side of the cavity (1), and the material taking door (3) is matched with the outlet.
  3. 3. The automatic cleaning system for TC cavities according to claim 2, wherein a sealing ring is fixedly arranged on the rear side of the material taking door (3), the sealing ring is in contact with the front side of the cavity (1), a lock body is arranged on the material taking door (3), and the lock body is clamped with the front side of the cavity (1).
  4. 4. The TC cavity automatic cleaning system according to claim 1, wherein the adjusting assembly includes two rotating shafts (13), a worm wheel (15), a motor (16), a transmission shaft (17) and a worm (18), one ends of the two rotating shafts (13) which are close to each other are respectively fixedly installed at a front side and a rear side of the second jet head (12), one ends of the two rotating shafts (13) which are far away from each other are both rotatably connected with a left inner wall of the cavity (1), the worm wheel (15) is fixedly sleeved on the rotating shaft (13) at the rear side, the motor (16) is fixedly installed at the left side of the cavity (1), an output shaft of the motor (16) penetrates through the left side of the cavity (1) and is fixedly installed at the left end of the transmission shaft (17), the worm (18) is fixedly sleeved on the transmission shaft (17), and the worm (18) is meshed with the worm wheel (15).
  5. 5. The TC cavity automatic cleaning system according to claim 4, wherein two brackets (14) are fixedly installed on a left side inner wall of said cavity (1), and bottom ends of the two brackets (14) are respectively rotatably connected with one ends of the two rotating shafts (13) which are far away from each other.
  6. 6. The TC cavity automatic cleaning system according to claim 4, wherein a stabilizer (19) is fixedly arranged on the left inner wall of the cavity (1), a bearing (20) is fixedly arranged on the stabilizer (19), and the bearing (20) is fixedly sleeved at the right end of the transmission shaft (17).
  7. 7. The TC cavity automatic cleaning system according to claim 1, wherein the exhaust assembly includes a plurality of air outlet pipes (21), an annular gas collecting pipe (22), an exhaust pipe (23) and a molecular pump (25), the top ends of the plurality of air outlet pipes (21) are fixedly connected to the bottom of the cavity (1), the bottom ends of the plurality of air outlet pipes (21) are fixedly connected to the top of the annular gas collecting pipe (22), the left end of the exhaust pipe (23) is fixedly connected to the annular gas collecting pipe (22), and the molecular pump (25) is fixedly connected to the right end of the exhaust pipe (23).
  8. 8. The TC cavity automatic cleaning system according to claim 7, wherein a plurality of said air outlet pipes (21) are annularly distributed and vertically correspond to an annular air collecting pipe (22), and a connection manner between said air outlet pipes (21) and said annular air collecting pipe (22) is screw-connected.
  9. 9. The TC cavity automatic cleaning system according to claim 7, wherein a first valve (6) is fixedly installed on the first air inlet branch pipe (5), a second valve (10) is fixedly installed at the bottom end of the second air inlet branch pipe (7), and a third valve (24) is fixedly installed on the exhaust pipe (23).
  10. 10. The TC cavity automatic cleaning system according to claim 1, wherein a temperature sensor (26), a pressure sensor (27) and a gas concentration sensor (28) are fixedly installed on top inner walls of the cavity (1), respectively.

Description

TC chamber self-cleaning system Technical Field The invention relates to the technical field of semiconductor manufacturing, in particular to an automatic cleaning system for a TC cavity. Background The silicon epitaxial device is special for growing high-quality silicon epitaxial films and is widely applied to the fields of semiconductor manufacture, photoelectric devices, solar cells and the like. Epitaxial growth refers to the growth of an additional silicon layer onto an existing silicon substrate by Chemical Vapor Deposition (CVD) or the like. This process can provide very high crystal quality and good electrical properties. The TC chamber is generally referred to collectively as the process chamber in which Temperature Controlled Chamber or, more specifically, temperature Controlled Chuck (temperature controlled chuck) is located. The core function is to precisely control the temperature of the semiconductor Wafer (Wafer) during processing. In the prior art, a wafer is fixed through a vacuum hand disc in a TC cavity, however, particles are stuck to the surface of a piece when the particles are stained on the surface of the vacuum hand disc to take the piece, so that the piece is scrapped, the only solution is to manually clean the hand disc by opening the TC cavity, the process is time-consuming, and the production efficiency is affected by frequent cavity opening. Disclosure of Invention The application aims to provide an automatic cleaning system for a TC cavity, which solves the problems that particles are stuck to the surface of a piece when the particles are stained on the surface of a vacuum hand disc and taken out of the piece, so that the piece is scrapped, and the only solution is to open the TC cavity to manually clean the hand disc, so that the process is time-consuming and the production efficiency is affected by frequent opening of the cavity. In order to achieve the purpose, the application provides the technical scheme that the TC cavity automatic cleaning system comprises a cavity, wherein a vacuum hand disc is arranged in the cavity, and the automatic cleaning system further comprises: The two ends of the bottom of the second air inlet branch pipe penetrate through the top of the cavity and extend into the cavity, the two ends of the bottom of the second air inlet branch pipe are fixedly communicated with the same annular air inlet pipe, and the bottom of the annular air inlet pipe is fixedly communicated with a plurality of first jet heads; The bottom end of the first air inlet branch pipe is fixedly communicated with a hose, the bottom end of the hose is fixedly communicated with a second jet head, and the first air inlet branch pipe is fixedly communicated with a main air inlet pipe; The exhaust assembly is arranged at the bottom of the cavity and is used for exhausting gas and impurities in the cavity; The adjusting component is used for adjusting the angle of the second jet head, is arranged on the inner wall of the left side of the cavity and is matched with the second jet head; By means of the structure, high-pressure nitrogen is input into the cavity through the main air inlet pipe, then the second air inlet branch pipe and the annular air inlet pipe are fixedly communicated with the plurality of first jet heads, clean air is sprayed from the top of the cavity to the inside, the area around the vacuum hand disc is widely covered, meanwhile, the first air inlet branch pipe is connected with the second jet heads through the hose, the spraying direction is adjusted through the matching adjusting component, local accurate cleaning of the surface of the vacuum hand disc is achieved, the exhaust component timely discharges cleaned air and impurities, the whole cleaning process is automatically completed in the cavity, the cavity is not required to be opened manually, the downtime is remarkably reduced, the scrapping of the wafer caused by the fact that the particles are adhered to the surface of the wafer is avoided, the production continuity and efficiency are improved, the manual intervention requirement is reduced, meanwhile, the system is compact in structure, and easy and convenient to operate, and frequent cleaning scenes are adapted. Preferably, an outlet is formed in the inner wall of the front side of the cavity, and a material taking door is hinged to the front side of the cavity and matched with the outlet. Further, through setting up and getting the material door and hinging in the cavity front side, be convenient for open in order to get and put the wafer when necessary, export and the cooperation of getting the material door ensure closely to close, get the material door and keep sealing state in self-cleaning in-process, maintain the inside stable environment of cavity, prevent that external pollutant from getting into, reduce frequent open cavity operation to reduce the wafer and pollute the risk, improve production efficiency, get the design of material door and sim