CN-121973076-A - Silicon nitride vacuum carrier plate curved surface polishing device and polishing method

CN121973076ACN 121973076 ACN121973076 ACN 121973076ACN-121973076-A

Abstract

The invention discloses a silicon nitride vacuum carrier plate curved surface polishing device and a polishing method, and aims to provide the silicon nitride vacuum carrier plate curved surface polishing device and the polishing method which can improve the polishing efficiency of a silicon nitride vacuum carrier plate curved surface, reduce the labor intensity, improve the polishing effect of the silicon nitride vacuum carrier plate curved surface and effectively reduce the rework rate. The silicon nitride vacuum carrier disc curved surface polishing device comprises a shell, an elastic pressing assembly and a polishing resin block, wherein an installation part is arranged on the shell, the elastic pressing assembly comprises a floating component and an elastic element, the floating component is arranged on the shell in a sliding mode along the vertical direction, the elastic element drives the floating component to move downwards, the polishing resin block is detachably fixed on the downward bottom surface of the floating component, the side face, facing to the upper surface, of the polishing resin block is a polishing curved surface, and the polishing curved surface is matched with the silicon nitride vacuum carrier disc curved surface.

Inventors

Wang Diejun
MA YUQI
CAI DEQI

Assignees

杭州大和江东新材料科技有限公司

Dates

Publication Date: 20260505
Application Date: 20251119

Claims (10)

1. The utility model provides a silicon nitride vacuum carrier dish curved surface burnishing device which characterized in that includes: A housing provided with a mounting portion thereon; the elastic compression assembly comprises a floating part which is arranged on the shell in a sliding manner along the vertical direction and an elastic element which drives the floating part to move downwards; And the polishing resin block is detachably fixed on the downward bottom surface of the floating component, the upward side surface of the polishing resin block is a polishing curved surface, and the polishing curved surface is matched with the curved surface of the silicon nitride vacuum carrier disc.
2. The apparatus according to claim 1, further comprising a pressure detecting unit including a pressure sensor provided between the elastic member and the housing or between the elastic member and the floating member, for detecting a pressure applied to the elastic member.
3. The silicon nitride vacuum carrier plate curved surface polishing device according to claim 1, wherein said floating member comprises: The floating block is arranged on the shell in a sliding manner along the vertical direction; The polishing resin block is detachably fixed on the downward bottom surface of the mounting plate; The adjusting assembly comprises an adjusting spring and an adjusting bolt, an adjusting block is arranged on the mounting plate, a bolt through hole is formed in the adjusting block, an adjusting screw hole is formed in the side face of the floating block, the adjusting bolt penetrates through the bolt through hole and is connected with the adjusting screw hole, the adjusting bolt is parallel to the sliding direction of the mounting plate, and the bolt head of the adjusting bolt abuts against the floating block through the adjusting spring.
4. The silicon nitride vacuum carrier plate curved surface polishing device according to claim 1, wherein said floating member comprises: The floating block is arranged on the shell in a sliding manner along the vertical direction; The mounting plate is fixed at the bottom of the floating block, and the polishing resin block is detachably fixed on the downward bottom surface of the mounting plate.
5. The curved surface polishing device for a silicon nitride vacuum carrier disc according to claim 1, 2,3 or 4, wherein the housing is provided with a limiting portion, the elastic element is a compression spring, the elastic element is located above the floating member, the elastic element abuts between the housing and the floating member, and the floating member abuts against the limiting portion under the action of the elastic element.
6. The polishing device for the curved surface of the silicon nitride vacuum carrier plate according to claim 1, 2, 3 or 4, wherein a partition groove is arranged on the polishing curved surface, extends along the radial direction of the silicon nitride vacuum carrier plate and penetrates through the polishing curved surface, the partition groove comprises two side walls, one end of one side wall is provided with an outward extending flow guide baffle, and the free end of the flow guide baffle is inclined towards the other side wall of the partition groove.
7. The silicon nitride vacuum carrier plate curved surface polishing device according to claim 6, wherein the width of the partition groove gradually increases from top to bottom.
8. A silicon nitride vacuum carrier plate curved surface polishing apparatus according to claim 1 or 2 or 3 or 4, wherein said polishing resin block is adhesively fixed to the bottom surface of the floating member facing downward, or the polishing resin block is fixed to the bottom surface of the floating member facing downward by bolts or rivets or clips.
9. A method for polishing curved surface of silicon nitride vacuum carrier disc is characterized by comprising the following steps in sequence, Fixing a silicon nitride vacuum disc on the surface of a turntable of a vertical machining center; Fixing the silicon nitride vacuum carrier disc curved surface polishing device on a main shaft of a vertical machining center, wherein the polished curved surface of the polishing resin block faces the silicon nitride vacuum carrier disc curved surface; the rotary table drives the silicon nitride vacuum carrier disc to rotate, and the curved surface of the silicon nitride vacuum carrier disc is subjected to rough polishing; the method comprises the steps of precisely polishing, replacing polished resin blocks with larger mesh number, then driving a curved surface polishing device of a silicon nitride vacuum carrier disc to descend to a designated position by a main shaft, and then driving the silicon nitride vacuum carrier disc to rotate by a rotary table to precisely polish the curved surface of the silicon nitride vacuum carrier disc.
10. The method for polishing a curved surface of a silicon nitride vacuum carrier plate according to claim 9, wherein the rough polishing is performed by the following specific process, The main shaft drives the silicon nitride vacuum carrier disc curved surface polishing device to descend to a zero position, and the polished curved surface is just contacted with the silicon nitride vacuum carrier disc curved surface at the moment; The method comprises the steps of performing secondary rough polishing, wherein a main shaft drives a silicon nitride vacuum carrier disc curved surface polishing device to descend for a set distance L1, and then a turntable drives a silicon nitride vacuum carrier disc to rotate so as to perform secondary polishing on the silicon nitride vacuum carrier disc curved surface; and (3) rough polishing for three times, wherein the main shaft drives the silicon nitride vacuum carrier plate curved surface polishing device to descend for a set distance L2, and then the turntable drives the silicon nitride vacuum carrier plate to rotate so as to polish the silicon nitride vacuum carrier plate curved surface for three times.

Description

Silicon nitride vacuum carrier plate curved surface polishing device and polishing method Technical Field The invention relates to the technical field of wafer carrier disc processing, in particular to a silicon nitride vacuum carrier disc curved surface polishing device and a polishing method. Background The silicon nitride vacuum carrier is mainly used for wafer positioning, supporting and heat conduction control in bonding equipment. Can stably work at 1200 ℃ and is suitable for high-temperature environment in bonding process, ensures that the carrier plate is not deformed in thermal cycle, and has good performances of high temperature resistance, wear resistance, corrosion resistance, high thermal conductivity and the like. For example, chinese patent publication No. CN206385256U, the name of the invention is a durable wafer carrier. Along with the growth of the demands of 3D integration and heterogeneous bonding, the back surface (i.e. the supporting surface) of the vacuum carrier plate is designed into a vacuum special-shaped curved surface, so that the fixing stability and heat conduction of a wafer can be better enhanced, wherein the surface smoothness and the contour accuracy of the curved surface of the silicon nitride vacuum carrier plate are very important, and the bonding quality is influenced. The surface curved surface size requirement of the existing silicon nitride vacuum disc product is that the profile degree is 0.1, the surface finish degree Ra0.4, the silicon nitride material hardness is high, the bending strength is high, the curved surface characteristics are narrow, the cutter abrasion is serious during processing, the surface cutter lines are poor, the polishing difficulty is high, and the requirement is high. At present, the polishing of the curved surface generally adopts a manual wool felt polishing process, and has the advantages of high labor intensity, long processing time, poor polishing effect and high reworking rate. In view of the above, there is an urgent need to design and develop a polishing apparatus and a polishing method for irregular curved surfaces of silicon nitride vacuum carrier plates to solve the above problems existing in the conventional polishing by manual polishing. Disclosure of Invention The invention aims to provide the silicon nitride vacuum carrier plate curved surface polishing device and the polishing method, which not only can improve the polishing efficiency of the silicon nitride vacuum carrier plate curved surface and reduce the labor intensity, but also can improve the polishing effect of the silicon nitride vacuum carrier plate curved surface and effectively reduce the rework rate. The technical scheme of the invention is as follows: a silicon nitride vacuum carrier plate curved surface polishing device, comprising: A housing provided with a mounting portion thereon; the elastic compression assembly comprises a floating part which is arranged on the shell in a sliding manner along the vertical direction and an elastic element which drives the floating part to move downwards; And the polishing resin block is detachably fixed on the downward bottom surface of the floating component, the upward side surface of the polishing resin block is a polishing curved surface, and the polishing curved surface is matched with the curved surface of the silicon nitride vacuum carrier disc. The silicon nitride vacuum carrier plate curved surface polishing device of the scheme is specifically used as follows, Firstly, fixing a silicon nitride vacuum carrier disc on the surface of a turntable of a vertical machining center, wherein the curved surface of the silicon nitride vacuum carrier disc faces upwards; The curved surface polishing device of the silicon nitride vacuum carrier disc is fixed on a main shaft of the vertical machining center through the mounting part, the polishing resin block is positioned above the silicon nitride vacuum carrier disc, and the polished curved surface faces the curved surface of the silicon nitride vacuum carrier disc. And secondly, rough polishing, namely, the main shaft drives the silicon nitride vacuum carrier disc curved surface polishing device to descend to a designated position, so that the polished curved surface of the polished resin block is propped against the silicon nitride vacuum carrier disc curved surface under the action of elastic force exerted by the elastic element, and then, the turntable drives the silicon nitride vacuum carrier disc to rotate, and rough polishing is carried out on the silicon nitride vacuum carrier disc curved surface. Meanwhile, polishing liquid is added to the curved surface of the vacuum carrier plate in the rough polishing process. Thirdly, finely polishing, namely, the main shaft drives the silicon nitride vacuum carrier disc curved surface polishing device to move upwards for resetting, then, removing polishing resin blocks in the silicon nitride vacuum carrier disc curved surface pol