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CN-121974569-A - Preparation method of textured glass

CN121974569ACN 121974569 ACN121974569 ACN 121974569ACN-121974569-A

Abstract

The invention discloses a preparation method of textured glass, which comprises the steps of forming a metal film layer on the surface of the glass, forming a photoresist layer on the surface of the metal film layer, exposing and developing the photoresist layer to form a micropore array randomly distributed according to a preset size range and a preset interval range, removing the metal film layer corresponding to the micropore array position to expose the glass at the position corresponding to the micropore array position, etching the glass at the exposed position for a first etching time by a wet method until a micro-groove array with a preset depth is formed on the surface of the glass at the exposed position, and continuing etching the micro-groove array for a second etching time until the surface of the glass covered by the metal film layer is etched to be communicated with the adjacent micro-groove array, and forming honeycomb micro-groove textures on the surface of the glass. The textured glass prepared by the invention can convert a light source into a surface light source through the concave part of the micro groove, has good light guide effect, and can have good anti-glare effect through the convex part of the micro groove, so that the textured glass has good optical performance.

Inventors

  • XU XIANGQIAN
  • HU ZHENGMING
  • ZHANG LEI

Assignees

  • 源卓微纳科技(苏州)股份有限公司

Dates

Publication Date
20260505
Application Date
20241028

Claims (10)

  1. 1. The preparation method of the textured glass is characterized by comprising the following steps of: Forming a metal film layer on the clean glass surface; forming a photoresist layer on the surface of the metal film layer; Exposing and developing the photoresist layer to form a micropore array which is randomly distributed according to a preset size range and a preset interval range; Removing the metal film layer corresponding to the position of the micropore array to expose the glass at the position corresponding to the micropore array; Wet etching the exposed glass for the first etching time until the glass surface of the exposed glass forms a micro-groove array with a preset depth, and continuing etching the micro-groove array for the second etching time until the glass surface covered by the metal film layer is etched to connect the adjacent micro-groove arrays, so that the glass surface forms honeycomb micro-groove textures.
  2. 2. The method of producing textured glass according to claim 1, wherein the photoresist layer is exposed by a direct-write exposure machine according to a preset stencil pattern, the preset stencil pattern being an array of micro-holes randomly generated according to a preset size range and a preset pitch range.
  3. 3. The method for manufacturing textured glass according to claim 1, wherein the micro-hole array is a micro-hole array, and after exposing and developing the photoresist layer, the photoresist layer forms a micro-hole array randomly distributed according to a preset diameter range and a preset center distance range, wherein the preset diameter range is 2 μm to 10 μm, and the preset center distance range is 15 μm to 30 μm.
  4. 4. The method for preparing textured glass according to claim 1, wherein a metal film layer is formed on the surface of the glass by sputtering or vapor deposition, the thickness of the metal film layer is 100 nm-500 nm, and the metal film layer comprises any one or more of a chromium layer, a nickel layer and a titanium layer.
  5. 5. The method for preparing textured glass according to claim 1, wherein the step of removing the metal film layer comprises etching the metal film layer with ceric ammonium nitrate based aqueous solution at a temperature of 10 ℃ to 30 ℃ for 60 to 80 seconds.
  6. 6. The method for preparing textured glass according to claim 1, wherein the preset depth of the micro-groove array is 5 μm to 10 μm, an etching solution is mixed by a volume ratio of 49% HF aqueous solution to 40% NH4F aqueous solution=1:6, the etching temperature is 10 ℃ to 30 ℃, the total etching time is 2h to 3h, and the total etching time is the sum of the first etching time and the second etching time.
  7. 7. The method for preparing textured glass according to claim 1, wherein the photoresist is a positive photoresist or a negative photoresist, and the thickness of the photoresist layer is 100nm to 1000nm.
  8. 8. The method according to claim 1, wherein after the step of forming a honeycomb-like micro-groove texture on the glass surface, the method comprises a step of removing the remaining metal film layer; or after the step of removing the metal film layer corresponding to the positions of the micropore arrays, the step of removing the photoresist layer is included before the step of forming honeycomb micro groove textures on the glass surface, and the step of removing the rest metal film layer is included after the step of forming honeycomb micro groove textures on the glass surface.
  9. 9. The method of manufacturing textured glass according to claim 8, wherein the step of removing the photoresist layer comprises heating the photoresist layer to 60+ -3deg.C, immersing the glass in the photoresist layer while maintaining the glass in a shaking state or a constant shaking state at regular time intervals, wherein the glass immersing time is not less than 30min, and the photoresist layer comprises one or more of alkaline photoresist layer, acidic photoresist layer, and solvent type photoresist layer.
  10. 10. The method of claim 8, further comprising polishing the honeycomb-like micro-groove texture of the glass surface after the step of removing the remaining metal film layer.

Description

Preparation method of textured glass Technical Field The invention relates to the technical field of display screen glass, in particular to a preparation method of textured glass. Background At present, glass materials are widely applied to display screens of products such as mobile phones, notebooks, tablets and the like. Because the common glass has higher specular reflectance, the contrast and the visual angle of a screen picture are affected, and a large amount of specular reflection light enters human eyes, so that the user experience is poor. Researchers find that after etching the surface of the glass, the surface of the glass is provided with special textures, so that the specular reflectance of the glass can be reduced, the interference of ambient light can be reduced, and the contrast and the visual angle of a screen picture can be improved. However, the conventional etching method is to coat or coat a layer of photosensitive material (mostly ink) on the surface of glass, expose and develop the glass, and then etch the glass, because the photosensitive material has poor etching resistance, the etched texture has insufficient depth and poor smoothness, and the anti-dazzle effect of the treated glass is poor. Disclosure of Invention The invention aims to provide a preparation method of textured glass, which can form honeycomb micro-groove textures on the surface of the glass, can ensure the depth and smoothness of the textures, and simultaneously ensures that the glass has good anti-dazzle and light guiding effects. The invention provides a preparation method of textured glass, which comprises the following steps: Forming a metal film layer on the clean glass surface; forming a photoresist layer on the surface of the metal film layer; Exposing and developing the photoresist layer to form a micropore array which is randomly distributed according to a preset size range and a preset interval range; Removing the metal film layer corresponding to the position of the micropore array to expose the glass at the position corresponding to the micropore array; Wet etching the exposed glass for the first etching time until the glass surface of the exposed glass forms a micro-groove array with a preset depth, and continuing etching the micro-groove array for the second etching time until the glass surface covered by the metal film layer is etched to connect the adjacent micro-groove arrays, so that the glass surface forms honeycomb micro-groove textures. As a further improvement of the invention, a direct-writing exposure machine is adopted to expose the photoresist layer according to a preset template pattern, wherein the preset template pattern is a micropore array randomly generated according to a preset size range and a preset interval range. As a further improvement of the invention, the micropore array can be a micro round hole array, after the photoresist layer is exposed and developed, the photoresist layer forms the micro round hole array which is randomly distributed according to a preset diameter range and a preset center distance range, wherein the preset diameter range is 2-10 mu m, and the preset center distance range is 15-30 mu m. As a further improvement of the invention, a metal film layer is formed on the surface of the glass in a sputtering or vapor plating mode, the thickness of the metal film layer is 100-500 nm, and the metal film layer comprises any one or more of a chromium layer, a nickel layer or a titanium layer. As a further improvement of the invention, the step of removing the metal film layer comprises the specific steps of adopting ammonium ceric nitrate based aqueous solution to etch the metal film layer, wherein the etching temperature is 10-30 ℃, and the etching time is 60-80s. As a further improvement of the invention, the preset depth of the micro groove array is 5-10 mu m, an etching solution formed by mixing a 49% HF aqueous solution and a 40% NH4F aqueous solution=1:6 is adopted, the etching temperature is 10-30 ℃, the total etching time is 2-3 h, and the total etching time is the sum of the first etching time and the second etching time. As a further improvement of the invention, the photoresist is positive photoresist or negative photoresist, and the thickness of the photoresist layer is 100 nm-1000 nm. As a further improvement of the invention, the step of removing the residual metal film layer is included after the step of forming honeycomb micro groove texture on the glass surface, or the step of removing the residual metal film layer is included after the step of removing the metal film layer corresponding to the positions of the micropore array and before the step of forming honeycomb micro groove texture on the glass surface. The photoresist layer is removed by heating the photoresist layer to 60+/-3 ℃, soaking the glass in the photoresist layer, and simultaneously keeping the glass in a shaking state or a shaking state at fixed time intervals, wherein the soaking