CN-121974572-A - Infrared anti-reflection toughened glass film and preparation method thereof

Abstract

The invention relates to the technical field of anti-reflection toughened glass films and discloses an infrared anti-reflection toughened glass film which comprises an AF layer, a hardening layer, an anti-reflection module, a silicon dioxide layer and a glass layer, wherein the AF layer, the hardening layer, the anti-reflection module, the silicon dioxide layer and the glass layer are sequentially covered and arranged, the anti-reflection module is used for improving the transmittance of visible light and infrared light, the anti-reflection module comprises a silicon dioxide bottom film layer, a plurality of magnesium fluoride film layers and a plurality of germanium film layers, the silicon dioxide bottom film layer is arranged in a bottom layer, and the magnesium fluoride film layers and the germanium film layers are sequentially staggered and coated. The multi-layer coating process is adopted, the refractive index of the toughened glass film is improved, the reflectivity is reduced, the transmittance of visible light and infrared light is improved, and the influence of the toughened glass film on the screen infrared sensor or the laser radar function is reduced when the front infrared sensor or the infrared laser radar function is used.

Inventors

• HU XIAOJUN
• WEI DAYAN

Assignees

• 东莞市嘉逸光电有限公司

Dates

Publication Date

20260505

Application Date

20260210

Claims (10)

1. 1. The infrared anti-reflection toughened glass film is characterized by comprising an AF layer, a hardening layer, an anti-reflection module, a silicon dioxide layer and a glass layer, wherein the AF layer, the hardening layer, the anti-reflection module, the silicon dioxide layer and the glass layer are sequentially covered and arranged, the anti-reflection module is used for improving the transmittance of visible light and infrared light, the anti-reflection module comprises a silicon dioxide bottom film layer, a plurality of magnesium fluoride film layers and a plurality of germanium film layers, the silicon dioxide bottom film layer is arranged in a bottom layer, and the magnesium fluoride film layers and the germanium film layers are sequentially staggered and covered and arranged.
2. 2. The infrared anti-reflection toughened glass film according to claim 1, wherein the total number of layers formed by the silicon dioxide bottom film layer, the magnesium fluoride film layer and the germanium film layer coating film is 7-12.
3. 3. The infrared anti-reflection toughened glass film as claimed in claim 2, wherein the thickness of the staggered coating of the magnesium fluoride film layer and the germanium film layer is 280-480nm.
4. 4. The infrared anti-reflection toughened glass film as claimed in claim 2, wherein the anti-reflection module comprises a silicon dioxide film sealing layer, wherein the magnesium fluoride film layer and the germanium film layer are arranged between the silicon dioxide bottom film layer and the silicon dioxide film sealing layer, the silicon dioxide film sealing layer is in a flat coating arrangement, and the silicon dioxide bottom film layer and the silicon dioxide film sealing layer are respectively made of silicon dioxide materials.
5. 5. The preparation method of the infrared anti-reflection toughened glass film is characterized by comprising the following steps: (1) Cleaning a glass layer, and plating a silicon dioxide layer on the glass layer; (2) The anti-reflection module comprises a silicon dioxide bottom film layer, a plurality of magnesium fluoride film layers and a plurality of germanium film layers, wherein the silicon dioxide bottom film layer is arranged in a bottom layer, and the magnesium fluoride film layers and the germanium film layers are sequentially arranged in a staggered film coating manner; (3) The anti-reflection module comprises a silicon dioxide film sealing layer, wherein the magnesium fluoride film layer and the germanium film layer are arranged between the silicon dioxide bottom film layer and the silicon dioxide film sealing layer, and the silicon dioxide film sealing layer is in flat coating arrangement.
6. 6. (4) And sequentially plating a hardening layer and an AF layer on the silicon dioxide sealing film layer, curing, and covering a protective film.
7. 7. The method of manufacturing an infrared reflection enhancing tempered glass film as claimed in claim 5, wherein the total number of layers formed by the silica base film layer, the magnesium fluoride film layer and the germanium film layer is 7-12.
8. 8. The method for producing an infrared reflection-preventing tempered glass film according to claim 5, wherein the silica bottom film layer and the silica sealing film layer are made of silica material, respectively, and the thickness of the silica sealing film layer is 60nm.
9. 9. The method for preparing an infrared anti-reflection toughened glass film according to claim 5, wherein the refractive index of the magnesium fluoride film layer is 1.38, the refractive index of the germanium film layer is 4.0, the refractive indexes of the silicon dioxide bottom film layer and the silicon dioxide sealing film layer are 1.46, and the magnesium fluoride film layer and the germanium film layer are arranged in a staggered film mode with high and low refractive indexes.
10. 10. The method of manufacturing an infrared anti-reflection tempered glass film according to claim 5, wherein the thickness of the magnesium fluoride film layer is greater than the thickness of the germanium film layer, and the thickness of the magnesium fluoride film layer is more than twice the thickness of the germanium film layer.

Description

Infrared anti-reflection toughened glass film and preparation method thereof Technical Field The invention relates to the technical field of anti-reflection toughened glass films, in particular to an infrared anti-reflection toughened glass film and a preparation method thereof. Background ‌ Toughened film is a toughened glass film ‌ for protecting the screen of electronic equipment such as mobile phones, and is processed by high-temperature quenching and other processes to form a compressive stress layer on the surface of glass, so that the hardness and the shock resistance are improved. Common ‌ tempering film has peeping prevention tempering film, anti-reflection tempering film etc. for example, grant the preceding patent of bulletin number CN218910219U, discloses a low haze cell-phone tempering film of high light transmittance, including substrate, glass layer, from type glue film, AF layer and conventional anti-reflection AR layer one, from type glue film and glass layer covers respectively the both sides of substrate, conventional anti-reflection AR layer one locates glass layer keeps away from one side of substrate, AF layer locates conventional anti-reflection AR layer one is kept away from one side of substrate, AF layer with cover between conventional anti-reflection AR layer one has colorless anti-reflection AR layer. In the prior art, the transmittance of visible light and infrared light is still insufficient, so that the use of the functions of the front infrared sensor or the infrared laser radar is limited, and the mobile phone is inconvenient to use. Disclosure of Invention The invention aims to provide an infrared anti-reflection toughened glass film and a preparation method thereof, and aims to solve the problem that the use of a front infrared sensor or an infrared laser radar function is limited in the prior art. The infrared anti-reflection toughened glass film comprises an AF layer, a hardening layer, an anti-reflection module, a silicon dioxide layer and a glass layer, wherein the AF layer, the hardening layer, the anti-reflection module, the silicon dioxide layer and the glass layer are sequentially covered, the anti-reflection module is used for improving the transmittance of visible light and infrared light, the anti-reflection module comprises a silicon dioxide bottom film layer, a plurality of magnesium fluoride film layers and a plurality of germanium film layers, the silicon dioxide bottom film layer is arranged in a bottom layer, and the magnesium fluoride film layers and the germanium film layers are sequentially staggered and covered. Further, the total layer number range formed by the silicon dioxide bottom film layer, the magnesium fluoride film layer and the germanium film layer coating film is 7-12 layers. Further, the thickness range of the staggered coating of the magnesium fluoride film layer and the germanium film layer is 280-480nm. Further, the anti-reflection module comprises a silicon dioxide sealing film layer, wherein the magnesium fluoride film layer and the germanium film layer are arranged between the silicon dioxide bottom film layer and the silicon dioxide sealing film layer in a flat coating arrangement, and the silicon dioxide bottom film layer and the silicon dioxide sealing film layer are respectively made of silicon dioxide materials. The preparation method of the infrared anti-reflection toughened glass film comprises the following steps: (1) Cleaning a glass layer, and plating a silicon dioxide layer on the glass layer; (2) The anti-reflection module comprises a silicon dioxide bottom film layer, a plurality of magnesium fluoride film layers and a plurality of germanium film layers, wherein the silicon dioxide bottom film layer is arranged in a bottom layer, and the magnesium fluoride film layers and the germanium film layers are sequentially arranged in a staggered film coating manner; (3) The anti-reflection module comprises a silicon dioxide film sealing layer, wherein the magnesium fluoride film layer and the germanium film layer are arranged between the silicon dioxide bottom film layer and the silicon dioxide film sealing layer, and the silicon dioxide film sealing layer is in flat coating arrangement. (4) And sequentially plating a hardening layer and an AF layer on the silicon dioxide sealing film layer, curing, and covering a protective film. Further, the total layer number range formed by the silicon dioxide bottom film layer, the magnesium fluoride film layer and the germanium film layer coating film is 7-12 layers. Further, the silicon dioxide bottom film layer and the silicon dioxide sealing film layer are respectively made of silicon dioxide materials, and the thickness of the silicon dioxide sealing film layer is 60nm. Further, the refractive index of the magnesium fluoride film layer is 1.38, the refractive index of the germanium film layer is 4.0, the refractive indexes of the silicon dioxide bottom film layer and the silicon dioxid