Search

CN-121976156-A - Praseodymium target, and preparation method and application thereof

CN121976156ACN 121976156 ACN121976156 ACN 121976156ACN-121976156-A

Abstract

The invention discloses a praseodymium target and a preparation method and application thereof, and belongs to the technical field of nuclear target preparation. The praseodymium target comprises a titanium foil substrate, a praseodymium film deposited on the titanium foil substrate, and a carbon film covered on the praseodymium film. The preparation method comprises the steps of preparing a substrate, cutting titanium foil and fixing the titanium foil on a target frame, vacuum evaporating a praseodymium film plating step of placing the target frame fixed with the titanium foil in vacuum evaporation equipment, placing metal praseodymium evaporation materials into the vacuum evaporation equipment, vacuumizing, adding evaporation current for evaporation, depositing the praseodymium film on the titanium foil substrate to obtain the praseodymium film, and magnetron sputtering a carbon film plating step of transferring the titanium foil plated with the praseodymium film into vacuum magnetron sputtering equipment, taking a carbon target as a sputtering target, vacuumizing, performing magnetron sputtering under argon atmosphere, and depositing a carbon film on the surface of the praseodymium film to obtain the praseodymium target. The invention solves the problem that praseodymium materials are easy to oxidize, and obtains the praseodymium target meeting the requirements of nuclear physics experiments, and the scheme has strong operability and practicability.

Inventors

  • LU ZIWEI
  • LIU FENGQIONG
  • ZHANG HONGBIN
  • LI HAIXIA
  • LI RONGHUA
  • WANG XIUHUA
  • CHEN CUIHONG
  • LI ZHANKUI

Assignees

  • 中国科学院近代物理研究所

Dates

Publication Date
20260505
Application Date
20251215

Claims (10)

  1. 1. A praseodymium target, comprising: a substrate, wherein the substrate is titanium foil; praseodymium films deposited on the substrate; And a carbon film covering the praseodymium film.
  2. 2. The praseodymium target of claim 1 wherein the titanium foil substrate has a thickness of 1 μm to 3 μm.
  3. 3. The praseodymium target of claim 1 wherein the praseodymium film has a mass thickness of 0.5mg/cm 2 -2mg/cm 2 .
  4. 4. The praseodymium target of claim 1 wherein the carbon film has a mass thickness of 10 μg/cm 2 -100μg/cm 2 .
  5. 5. A method for producing a praseodymium target, characterized in that the method for producing a praseodymium target according to any one of claims 1 to 4 comprises: preparing a substrate, namely cutting titanium foil and fixing the titanium foil on a target frame; Vacuum evaporating to plate praseodymium film, namely placing a target frame fixed with titanium foil into vacuum evaporation equipment, placing metal praseodymium evaporation material, vacuumizing the vacuum evaporation equipment until the vacuum degree is not higher than 1.0 multiplied by 10 -3 Pa, adding evaporation current to evaporate, and depositing on a titanium foil substrate to obtain praseodymium film; transferring titanium foil coated with a praseodymium film into vacuum magnetron sputtering equipment, taking a carbon target as a sputtering target, vacuumizing the vacuum magnetron sputtering equipment until the vacuum degree is not higher than 5.0 multiplied by 10 -4 Pa, performing magnetron sputtering in an argon atmosphere, and depositing a carbon film on the surface of the praseodymium film to obtain the praseodymium target.
  6. 6. The method according to claim 5, wherein the vacuum evaporation praseodymium plating film has an evaporation current of 70A to 90A.
  7. 7. The method according to claim 5 or 6, wherein the mass thickness of the praseodymium film is controlled to be 0.5mg/cm 2 -2mg/cm 2 .
  8. 8. The method according to claim 5, wherein in the magnetron sputtering carbon film, the sputtering voltage is 400V to 500V, the sputtering current is 350mA to 450mA, and the argon gas pressure is 0.40Pa to 0.50Pa.
  9. 9. The production method according to claim 5 or 8, characterized in that the mass thickness of the carbon film is controlled to be 10 μg/cm 2 -100μg/cm 2 .
  10. 10. Use of a praseodymium target according to any one of claims 1 to 4 or obtainable by a preparation method according to any one of claims 5 to 9 in nuclear physics experiments.

Description

Praseodymium target, and preparation method and application thereof Technical Field The invention belongs to the technical field of nuclear target preparation, and particularly relates to a praseodymium target as well as a preparation method and application thereof. Background Praseodymium (Pr) target is one of important nuclear targets required in the field of nuclear physics research, and whether the praseodymium (Pr) target meeting the requirements of nuclear physics experiments can be developed is critical to the success or failure of related experiments. In order to eliminate the interference of other elements on experimental measurements, the targets used in nuclear physics experiments are mostly self-supporting, i.e. without any substrate. Praseodymium is a rare earth element, has particularly active chemical properties, and is easy to react with oxygen to generate powdery oxide. Therefore, praseodymium targets used as nuclear targets cannot be self-supporting, other materials need to be found as support films, and how to insulate the praseodymium materials from air needs to be considered. Disclosure of Invention In view of the above problems, the present invention aims to prepare praseodymium targets meeting the requirements of nuclear physics experiments. To this end, according to a first aspect of the present invention, there is provided a praseodymium target comprising: a substrate, wherein the substrate is titanium foil; praseodymium films deposited on the substrate; And a carbon film covering the praseodymium film. Further, the thickness of the titanium foil substrate is 1 μm to 3 μm. Further, the praseodymium film has a mass thickness of 0.5mg/cm 2-2mg/cm2. Further, the mass thickness of the carbon film was 10. Mu.g/cm 2-100μg/cm2. In a second aspect of the present invention, there is provided a method for producing the praseodymium target described above, comprising: preparing a substrate, namely cutting titanium foil and fixing the titanium foil on a target frame; Vacuum evaporating to plate praseodymium film, namely placing a target frame fixed with titanium foil into vacuum evaporation equipment, placing metal praseodymium evaporation material, vacuumizing the vacuum evaporation equipment until the vacuum degree is not higher than 1.0 multiplied by 10 -3 Pa, adding evaporation current to evaporate, and depositing on a titanium foil substrate to obtain praseodymium film; transferring titanium foil coated with a praseodymium film into vacuum magnetron sputtering equipment, taking a carbon target as a sputtering target, vacuumizing the vacuum magnetron sputtering equipment until the vacuum degree is not higher than 5.0 multiplied by 10 -4 Pa, performing magnetron sputtering in an argon atmosphere, and depositing a carbon film on the surface of the praseodymium film to obtain the praseodymium target. Further, in the vacuum evaporation praseodymium-plated film, the evaporation current is 70A-90A. Further, the mass thickness of the praseodymium film is controlled to be 0.5mg/cm 2-2mg/cm2. Further, in the magnetron sputtering carbon film, the sputtering voltage is 400V-500V, the sputtering current is 350mA-450mA, and the argon gas pressure is 0.40Pa-0.50Pa. Further, the mass thickness of the carbon film was controlled to be 10. Mu.g/cm 2-100μg/cm2. In a third aspect of the invention, there is provided an application of the praseodymium target in nuclear physics experiments. Compared with the prior art, the invention at least comprises the following beneficial effects: The praseodymium target provided by the invention solves the problem that praseodymium materials are easy to oxidize, and the praseodymium target meeting the requirements of nuclear physics experiments is obtained, and the scheme has strong operability and practicability. Drawings In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art. FIG. 1 is a schematic diagram of a titanium foil just removed from a vacuum chamber and coated with a praseodymium film and then a carbon film according to example 1 of the present invention. FIG. 2 is a diagram showing a titanium foil just removed from a vacuum chamber and coated with a praseodymium film according to comparative example 1 of the present invention. FIG. 3 is a diagram showing the titanium foil coated with a praseodymium film and then a carbon film according to example 1 of the present invention after 3 days of air-laying. FIG. 4 is a diagram showing a titanium foil coated with a praseodymium film of comparative example 1 of the present invention after 3 days of air-laying. Detailed Description In order to b