Search

CN-121976161-A - Tungsten diboride-based composite nano multilayer film and preparation method and application thereof

CN121976161ACN 121976161 ACN121976161 ACN 121976161ACN-121976161-A

Abstract

The invention discloses a tungsten diboride-based composite nano multilayer film and a preparation method and application thereof. The film comprises a chromium transition layer and a composite nano multilayer structure which are sequentially laminated on the surface of a substrate in the thickness direction, wherein the composite nano multilayer structure comprises a plurality of laminated periodic units, and each periodic unit comprises a chromium carbide nano layer and a tungsten diboride-carbon nano layer. The preparation method comprises the steps of adopting a magnetron sputtering technology to deposit a chromium transition layer on the surface of a substrate, sequentially laminating and depositing a chromium carbide nano layer and a tungsten diboride-carbon nano layer on the chromium transition layer to form a periodic unit, and repeatedly preparing a plurality of periodic units to prepare the film. The film has the advantages of high temperature resistance, extremely low friction, strong binding force and the like, and can be applied to the surface protection of a substrate in an extreme environment.

Inventors

  • WANG HAIXIN
  • WANG LIPING
  • GUO WUMING
  • Zhu Qianye
  • WU LIJIE

Assignees

  • 中国科学院宁波材料技术与工程研究所

Dates

Publication Date
20260505
Application Date
20260203

Claims (10)

  1. 1. The tungsten diboride-based composite nano multilayer film is characterized by comprising a chromium transition layer and a composite nano multilayer structure which are sequentially laminated on the surface of a substrate in the thickness direction, wherein the composite nano multilayer structure comprises a plurality of laminated periodic units, and each periodic unit comprises a chromium carbide nano layer and a tungsten diboride-carbon nano layer; The chromium transition layer is arranged adjacent to the surface of the matrix, the chromium carbide nano layer in the periodic unit adjacent to the chromium transition layer is arranged adjacent to the chromium transition layer, and the top end of the composite nano multilayer structure is a tungsten diboride-carbon nano layer.
  2. 2. The tungsten diboride-based composite nano multilayer film according to claim 1, wherein the composite nano multilayer structure comprises 5-20 periodic units; and/or the composite nano multi-layer structure comprises chromium carbide nano layers and tungsten diboride-carbon nano layers which are sequentially and alternately laminated; And/or the tungsten diboride-based composite nano multilayer film comprises 9.35-10.88% of B atom, 74.02-78.68% of C atom, 7.82-10.68% of Cr atom and 3.21-5.18% of W atom. And/or the thickness of the chromium transition layer is 0.2-0.4 mu m; and/or the thickness of the chromium carbide nano layer is 0.1-0.3 mu m; And/or the thickness of the tungsten diboride-carbon nano layer is 0.2-0.8 mu m; And/or the total thickness of the tungsten diboride-based composite nano multilayer film is 4-4.5 mu m.
  3. 3. The tungsten diboride-based composite nano multilayer film according to claim 1, wherein the bonding force of the tungsten diboride-based composite nano multilayer film is 30.1-38.2N; And/or the tungsten diboride-based composite nano multilayer film has a high temperature resistant friction coefficient of less than 0.2 at 120 ℃.
  4. 4. A method for producing a tungsten diboride-based composite nano multilayer film according to any one of claims 1 to 3, comprising: depositing a chromium transition layer on the surface of the substrate by adopting a magnetron sputtering technology; and sequentially stacking and depositing a chromium carbide nano layer and a tungsten diboride-carbon nano layer on the chromium transition layer by adopting the magnetron sputtering technology to form periodic units, and repeatedly preparing a plurality of periodic units to prepare the tungsten diboride-based composite nano multilayer film.
  5. 5. The preparation method according to claim 4, which comprises the following steps: The magnetron sputtering technology is adopted, a chromium target is used as a cathode target material, inert gas is used as working gas, target current is applied to the chromium target, negative bias is applied to the matrix, and the chromium transition layer is deposited on the surface of the matrix; Wherein the inert gas comprises argon.
  6. 6. The preparation method according to claim 4, which comprises the following steps: The magnetron sputtering technology is adopted, a chromium target is used as a cathode target material, inert gas and unsaturated hydrocarbon gas are used as working gases, target current is applied to the chromium target, and negative bias is applied to the matrix, so that a chromium carbide nano layer is deposited on the chromium transition layer; The deposition time is 150-600 s, the inert gas comprises argon, and the unsaturated hydrocarbon gas comprises acetylene.
  7. 7. The preparation method according to claim 4, which comprises the following steps: The magnetron sputtering technology is adopted, a tungsten diboride target is used as a cathode target material, inert gas and unsaturated hydrocarbon gas are used as working gases, target current is applied to the tungsten diboride target, negative bias is applied to the matrix, and therefore the tungsten diboride-carbon nano layer is obtained through deposition on the chromium carbide nano layer, and the periodic unit is formed; wherein the deposition time is 300-1200 s, the inert gas comprises argon, and the unsaturated hydrocarbon gas comprises acetylene; And/or the preparation method comprises the step of repeatedly preparing 5-20 periodic units.
  8. 8. The method of claim 4, further comprising performing a plasma etch process on the substrate prior to depositing the chromium transition layer; And/or the material of the matrix comprises at least any one of A100 steel and monocrystalline silicon piece.
  9. 9. Use of a tungsten diboride based composite nanomultilayer film as claimed in any of claims 1 to 3 for the surface protection of a substrate comprising at least a partial surface of a marine equipment transfer system or component, wherein the marine equipment comprises a marine vessel.
  10. 10. A wear resistant and high temperature resistant protective component comprising a substrate and the tungsten diboride based composite nanomultilayer film of any one of claims 1 to 3 deposited on a surface of the substrate.

Description

Tungsten diboride-based composite nano multilayer film and preparation method and application thereof Technical Field The invention belongs to the technical field of surface protection treatment, and particularly relates to a tungsten diboride-based composite nano multilayer film and a preparation method and application thereof. Background With continuous exploration and penetration of the human beings in the ocean field, the problem of service failure of key moving parts of ocean equipment in a high-salt and strong-friction coupling environment is increasingly outstanding, the traditional lubricating or anti-corrosion material is difficult to achieve both antifriction, wear resistance and corrosion resistance, the equipment performance and service life are severely restricted, and the development of a film material adapting to the complex environment becomes a key for guaranteeing the reliable operation of the equipment. The hard tungsten diboride material is a core candidate system for dealing with extreme service environment, wherein a tungsten diboride (WB 2) base film has excellent high-temperature stability, chemical inertness, ultra-high hardness and wear resistance, and self-lubricating potential of a lubricating reaction layer generated in situ in the friction process, can effectively resist coupling damage of marine salt spray corrosion and friction wear, and becomes a material with great application prospect in the field of marine equipment key part protection. But WB 2 belongs to covalent bond dominant crystal tungsten diboride, has compact atomic arrangement, extremely low plastic deformation capability and lower fracture toughness, is impacted by load on marine equipment transmission parts, and a surface film is extremely easy to peel off due to microcrack expansion, so that protection failure is finally caused. In addition, the WB 2 is easy to generate micro defects in the film preparation process, salt mist generated by high temperature in the ocean can permeate to the film-substrate interface through the defects, metal substrates and the WB 2 film form galvanic corrosion, corrosion products are accumulated at the interface to generate obvious internal stress, and the film is peeled off. At present, researchers have studied different kinds of nano multilayer ceramic-based films, but the researches mainly focus on wear resistance and corrosion resistance in the atmospheric environment and corrosion resistance in the conventional salt spray environment, but the marine environment is complex and various, the salt spray corrosion problem is still serious in the high-temperature environment, and the WB 2 -based film has double contradictions in the aspects of toughness and corrosion resistance. Disclosure of Invention The invention mainly aims to provide a tungsten diboride-based composite nano multilayer film as well as a preparation method and application thereof, so as to overcome the defects of the prior art. In order to achieve the purpose of the invention, the technical scheme adopted by the invention comprises the following steps: The first aspect of the invention provides a tungsten diboride-based composite nano multilayer film, which comprises a chromium transition layer and a composite nano multilayer structure which are sequentially laminated on the surface of a substrate in the thickness direction, wherein the composite nano multilayer structure comprises a plurality of laminated periodic units, and each periodic unit comprises a chromium carbide nano layer (CrC) and a tungsten diboride-carbon nano layer (WB 2 -C); The chromium transition layer is arranged adjacent to the surface of the matrix, the chromium carbide nano layer in the periodic unit adjacent to the chromium transition layer is arranged adjacent to the chromium transition layer, and the top end of the composite nano multilayer structure is a tungsten diboride-carbon nano layer. The second aspect of the invention provides a preparation method of the tungsten diboride-based composite nano multilayer film, which comprises the following steps: depositing a chromium transition layer on the surface of the substrate by adopting a magnetron sputtering technology; and sequentially laminating and depositing a chromium carbide nano layer and a tungsten diboride-carbon nano layer on the chromium transition layer by adopting a magnetron sputtering technology to form periodic units, and repeatedly preparing a plurality of periodic units to prepare the tungsten diboride-based composite nano multilayer film. In a third aspect, the invention provides the use of the tungsten diboride based composite nanomultilayer film for surface protection of a substrate comprising at least a partial surface of a marine equipment transfer system or component, wherein the marine equipment comprises a marine vessel. In a fourth aspect, the invention provides a wear-resistant and high-temperature-resistant protective component, which comprises a substrate a