CN-121976172-A - Multilayer circulation structure base station and manufacturing method thereof

CN121976172ACN 121976172 ACN121976172 ACN 121976172ACN-121976172-A

Abstract

The invention discloses a multilayer circulating structure base station and a manufacturing method thereof, comprising the following steps of S1, respectively machining a top boss and a water inlet pipe, arranging a mutually matched positioning structure between the lower end face of the top boss and the connecting end of the water inlet pipe, S2, after the top boss is connected with the water inlet pipe, calibrating the perpendicularity of the axis of the water inlet pipe and the reference face of the top boss to form a top boss and a water inlet pipe connector, S3, pre-assembling an air inlet plate and an air inlet column into a sub-assembly, and then splicing the sub-assembly with the top boss and the water inlet pipe connector, S4, sequentially superposing a second layer plate, a first layer plate and a bottom plate, and limiting the relative position with a positioning ring seat through a step-shaped positioning face, and S5, carrying out stress relief treatment after each connecting step is completed. The multi-layer structure is matched with the step-shaped positioning surface through step-by-step preassembly, and stress relief treatment is carried out in time after each connecting stage, so that welding dislocation between layers is effectively limited, integral buckling deformation is avoided, accumulated assembly errors of the multi-layer structure are reduced, and the sealing performance is good.

Inventors

REN XIAOHU
DUAN DONGDONG
CHEN JUN
NI JIAWEI
XIE RUYING

Assignees

杭州大和热磁电子有限公司

Dates

Publication Date: 20260505
Application Date: 20251229

Claims (10)

1. A manufacturing method of a multilayer circulation structure base station is characterized by comprising the following steps: S1, respectively machining a top boss and a water inlet pipe, and arranging a matched positioning structure between the lower end surface of the top boss and the connecting end of the water inlet pipe; S2, after the top boss is connected with the water inlet pipe, calibrating the perpendicularity between the axis of the water inlet pipe and a reference surface of the top boss to form a top boss and a water inlet pipe connector; s3, pre-assembling an air inlet plate and an air inlet column to form a sub-assembly, and splicing the sub-assembly with a top boss and a water inlet pipe connector; s4, sequentially stacking a second layer plate, a first layer plate and a bottom plate, and limiting the relative position of the second layer plate, the first layer plate and the bottom plate with the positioning ring seat through a step-shaped positioning surface; S5, carrying out stress relief treatment after finishing each connecting step.
2. The method of claim 1, wherein the top boss is joined to the inlet pipe by a fillet weld, and the fillet weld is calibrated for perpendicularity after welding.
3. The method of manufacturing a vacuum cleaner according to claim 1, wherein the air inlet plate and the air inlet column and the second laminate are connected by electron beam welding.
4. The method of manufacturing a laminated board according to claim 1, wherein the surface of the welded second laminate and/or first laminate is milled or ground to restore flatness.
5. The method of manufacturing a gas turbine engine according to claim 1, wherein the top boss and the gas inlet plate are spliced by double-sided groove welding, wherein the inner part is full-circle welding, and the outer part is reinforced by segment welding.
6. The method of manufacturing as set forth in claim 1, wherein after all the welding steps are completed, the entire structure is subjected to vacuum heat treatment and helium mass spectrometer leak detection is performed.
7. A multi-layer circulation structure base station is characterized by comprising a top boss, an air inlet plate and a bottom plate, wherein a positioning ring seat is annularly arranged on the outer circumference of the air inlet plate, the bottom plate is attached to the end face of the positioning ring seat, a multi-layer middle plate is arranged between the air inlet plate and the bottom plate, positioning steps matched with the air inlet plate and the middle plate are arranged on the inner wall of the positioning ring seat to control welding deformation, a fluid isolation cavity is formed between the middle plates, an air inlet column is arranged on the air inlet plate and communicated with the fluid isolation cavity, a water inlet pipe is arranged on the top boss along the central axis, an air outlet pipe communicated with the fluid isolation cavity is arranged on the middle plate along the central axis, and an air outlet pipe is arranged on the bottom plate along the central axis.
8. The multi-layer circulation structure base according to claim 7, wherein the middle plate comprises a second layer plate and a first layer plate, the outer edge of the second layer plate is matched with the positioning ring seat, the fluid isolation cavity is formed between the second layer plate and the first layer plate, the second layer plate is arranged towards the air inlet plate, the first layer plate is located between the second layer plate and the bottom plate, and the first layer plate is connected with the second layer plate through a water connection column to form a through flow channel.
9. The multi-layer circulating structure base station of claim 7, further comprising a bottom plugging column, wherein the bottom plugging column and the water outlet pipe are coaxially arranged in the central area of the bottom plate and form a limiting structure for limiting radial displacement of the bottom plate in the welding process, and the air inlet plate, the second layer plate and the first layer plate are penetrated and fixed through the positioning column.
10. The multi-layer circulation structure base station according to claim 9, wherein the water inlet pipe, the water outlet pipe and the water outlet pipe extend along the central axis of the base station and are coaxially assembled, the head end of the water inlet pipe is matched with the orifice of the inner cavity in the middle of the top boss, the tail end of the water outlet pipe is matched with the positioning step in the center of the end face of the bottom plugging column, and the water outlet pipe is matched with the positioning step at the outer edge of the end face of the bottom plugging column.

Description

Multilayer circulation structure base station and manufacturing method thereof Technical Field The invention relates to the technical field of semiconductor manufacturing, in particular to a multilayer circulating structure base station and a manufacturing method thereof. Background In the modern equipment manufacturing industry, a deposition base with a multilayer circulation structure is used as a key component of a vacuum chamber, and a water circulation channel and a gas circulation channel are integrated in the deposition base to efficiently lead out waste heat generated in the deposition process, so that the temperature uniformity in the chamber and the stable operation of equipment are ensured. The base station adopts an umbrella-shaped multi-layer design of precise assembly, relates to the superposition combination of a plurality of parts such as a top boss, an air inlet plate, a second layer plate and a first layer plate, and has to maintain the channel smoothness and the structural tightness under the working condition of high temperature and high pressure so as to prevent the blockage of waterways or air flows or the leakage of welding points caused by micro deformation from causing equipment faults. The current preparation process generally depends on the conventional welding and grouping assembly modes, but the stress deformation caused by welding heat input often damages the geometric consistency of an internal runner, increases the later leakage risk and remarkably increases the maintenance cost. The prior solution is disclosed in Chinese patent literature, for example, "a semiconductor coating equipment is controllable Wen Jitai", the publication number of which is CN106609354A, and a base station medium heat price changing cavity is contained in the semiconductor coating equipment, so that the quick, accurate and uniform control of the temperature of the base station is realized. Belongs to the technical field of semiconductor film deposition application and manufacture. The problem of the base station temperature rise is too fast and the cooling is slow in the technological process, leads to current semiconductor coating equipment heat exchange efficiency and productivity lower, and wafer temperature is not even enough and leads to the film failure is solved. The base station comprises an upper disc body and a lower disc body, a sealing cavity is formed between the upper disc body and the lower disc body, medium can be introduced into the sealing cavity for temperature adjustment, and a medium inlet and a medium outlet are formed in the base station and are introduced into the sealing cavity for medium circulation. The prior art has taken optimization measures against the weld sealing problem, such as reducing the leakage probability of single layer welds by improving the weld material or local stress relief means, which still fails to address the systematic challenges in the fabrication of multi-layer structures. In particular, in the umbrella-shaped composite body assembly related to the invention, the umbrella-shaped composite body assembly comprises a plurality of overlapped welding links of a top boss, a water inlet pipe, an air inlet plate and a second laminate, welding thermal deformation is accumulated among thin-wall parts layer by layer, so that the displacement of an assembly interface or the throttling of a channel can be possibly caused, and meanwhile, the whole manufacturing process needs a plurality of heat treatment stress relief and post-welding machining to shape so as to ensure the matching precision of each layer. This results in equipment still subject to frequent medium leakage or flow channel blockage events, which not only damages the working environment of the vacuum chamber, but also forces manufacturers to frequently interrupt the production line for maintenance, resulting in significant economic loss. The technical defects not only obviously shorten the service life of the base station, but also restrict the localization process of high-end semiconductor equipment. Especially in the current industry upgrading background, a preparation process capable of systematically solving the problem of maintaining the interlayer geometric precision and guaranteeing the reliability of the multistage sealing structure is developed, and the preparation process has definite industrial value and urgency. Disclosure of Invention The invention aims to solve the problems of runner deflection and unreliable sealing caused by accumulated deformation of a multi-layer circulating base in the welding process in the prior art, and provides a multi-layer circulating structure base and a manufacturing method thereof. The technical scheme adopted by the invention for realizing the first invention purpose is that the manufacturing method of the multilayer circulation structure base station comprises the following steps: S1, respectively machining a top boss and a water inlet pipe, and arrang