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CN-121983485-A - Beam current adjusting device and ion implantation equipment

CN121983485ACN 121983485 ACN121983485 ACN 121983485ACN-121983485-A

Abstract

The application relates to the technical field of semiconductor ion implantation, in particular to a beam adjusting device and ion implantation equipment, wherein the beam adjusting device comprises a mounting plate, two baffles and two groups of driving components. The baffle is installed in one side of mounting panel, and is formed with the slit between two baffles. The two groups of driving components are arranged on the opposite sides of the mounting plate, the two groups of driving components are respectively connected with the corresponding baffle plates and drive the corresponding baffle plates to move close to or away from each other or synchronously, and the driving components are in sealing connection with the mounting plate. In the beam adjusting device, the driving component and the baffle are respectively arranged at two sides of the mounting plate, so that the space utilization rate of the upper side and the lower side of the mounting plate can be improved, and the driving component can be separated from the sealing space of the baffle, thereby being convenient for sealing the space where the baffle is positioned and improving the cleanliness of the surrounding environment of the ion beam in the space where the baffle is positioned.

Inventors

  • CAO JIANWEI
  • SHEN WENJIE
  • HUANG JIANLI
  • YAO QINGYU
  • MAO MIN
  • FENG GUODONG

Assignees

  • 浙江求是创芯半导体设备有限公司

Dates

Publication Date
20260505
Application Date
20251230

Claims (10)

  1. 1. A beam adjustment device (2), characterized by comprising: A mounting plate (100), Two baffles (200) mounted on one side of the mounting plate (100) with a slit formed between the two baffles (200), and The two groups of driving assemblies (300) are arranged on opposite sides of the mounting plate (100), and the two groups of driving assemblies (300) are respectively connected with the corresponding baffle plates (200) and drive the corresponding baffle plates (200) to move close to or away from each other or synchronously; The driving assembly (300) is in sealing connection with the mounting plate (100).
  2. 2. The beam adjustment device according to claim 1, wherein the drive assembly (300) comprises Linear drive structure (310) A linkage structure mounted to the barrier (200) and transmitting a driving force of the linear driving structure (310); The two groups of linkage structures are adjacently arranged, and the two groups of linear driving structures (310) are respectively positioned at two sides of the two groups of adjacent linkage structures.
  3. 3. The beam adjustment device according to claim 2, characterized in that the linear driving structure (310) comprises; A motor (311) fixed to the mounting plate (100); a lead screw (312) connected to the output shaft of the motor (311), and The moving block (313) is sleeved outside the screw rod (312) and is in threaded connection with the screw rod (312); the linkage structure is fixed on the moving block (313) and limits the rotation of the moving block (313) on the screw (312).
  4. 4. A beam adjusting device according to claim 2 or 3, wherein the interlocking structure comprises A connecting rod (321) having one end fixed to one end corresponding to the baffle (200), and A fixed block (322) connected to the other end of the connecting rod (321) and connected to the linear driving structure (310); the connecting rod (321) is in sealing connection with the mounting plate (100).
  5. 5. The beam adjusting device according to claim 4, wherein the mounting plate (100) is concavely provided with a mounting cavity (130), the baffle plate (200) is mounted in a space communicated with the mounting cavity (130), the connecting rod (321) penetrates through the side wall of the mounting cavity (130), and a sealing structure (400) for sealing connection is arranged between the connecting rod (321) and the mounting cavity (130).
  6. 6. The beam adjusting device according to claim 5, wherein the sealing structure (400) comprises a bellows (410) sleeved outside the connecting rod (321), one end of the bellows (410) is fixed on the outer wall of the mounting cavity (130), and the other end of the bellows is fixed on the fixing block (322).
  7. 7. The beam adjustment device according to claim 6, characterized in that the connecting rod (321) and the fixing block (322) are fixed by a screw rod, and the screw rod passes through the fixing block (322) and is screwed at the end of the connecting rod (321); The sealing structure (400) further comprises a sealing plate (420), the sealing plate (420) is connected to one side, far away from the connecting rod (321), of the fixed block (322) and covers the end face of the screw rod, and a flexible sealing element is clamped between the sealing plate (420) and the fixed block (322), and the flexible sealing element is located on the periphery of the screw rod.
  8. 8. The beam adjustment device according to claim 5, wherein two sets of the linear driving structures (310) are located on both sides of the mounting cavity (130), respectively.
  9. 9. A beam adjusting device according to claim 3, characterized in that the mounting plate (100) is provided with a linear guide (120) parallel to the screw (312), the linear guide (120) being in sliding engagement with a moving block (313).
  10. 10. An ion implantation apparatus, comprising An ion source for generating ions; an ion extraction system for directing ions to form an ion beam; a mass analysis device (1) for performing a preliminary screening of the ion beam; The beam current adjusting device (2) according to any one of claims 1 to 9, for rescreening an ion beam.

Description

Beam current adjusting device and ion implantation equipment Technical Field The present application relates to the field of semiconductor ion implantation technology, and in particular, to a beam current adjusting device and an ion implantation apparatus. Background Ion implantation equipment is one of the key devices in semiconductor chip fabrication, and its core function is to implant ions of a specific kind and specific energy into a specific region of a wafer, thereby changing the electrical properties of that region. The ion implantation equipment mainly comprises an ion source and ion extraction system, a beam line transmission system, a target chamber and terminal system and a vacuum and control system. Ions generated by the ion source form ion beams with certain flow velocity through the ion extraction system, then the ion beams with specific types and specific energies are formed through screening of the beam transmission system and then are input into the target chamber, and the ion beams are injected into wafers in the target chamber. The beam line transmission system is a core part of the ion implantation equipment, and is used for purifying, accelerating and shaping the rough and mixed ion beam led out from the ion source and finally accurately and uniformly projecting the rough and mixed ion beam onto the surface of the wafer. The stability and accuracy of this process directly determine the three main core parameters of ion implantation, dopant species, implant energy, and implant uniformity. The beam entering the beam line transmission system needs to be screened out of the specific types of beam through the mass analysis device, but the ion beam screened out by the mass analysis device still needs to be further screened out to remove stray ions deviating from the orbit. As in chinese patent application No. 200610168622.0, there is disclosed a technical means of "a plurality of movable shielding plates disposed on at least one side in the x direction of an ion beam path on the upstream side of the position of the target, the movable shielding plates being movable independently of each other in the x direction and blocking the ion beam, a shielding plate driving device reciprocally driving the plurality of movable shielding plates in the x direction in a mutually independent manner", to achieve removal of stray ions. However, the shielding plate driving devices are arranged on two sides of the movable shielding plate, which can cause the shielding plate driving devices to occupy a large space and is unfavorable for installation and later maintenance. Disclosure of Invention In order to solve the defects in the prior art, one of the purposes of the application is to provide a beam adjusting device, which can realize reasonable installation and driving of a driving assembly of a baffle, reduce the transverse space occupied by the driving assembly and improve the integral integration of the beam adjusting device. In order to achieve the above purpose, the application adopts the following technical scheme: A beam conditioning apparatus comprising: The mounting plate is provided with a plurality of grooves, Two baffles mounted on one side of the mounting plate and having a slit formed therebetween, and The two groups of driving assemblies are arranged on the opposite sides of the mounting plate, and the two groups of driving assemblies are respectively connected with the corresponding baffle plates and drive the corresponding baffle plates to move close to or away from each other or synchronously move; The driving assembly is in sealing connection with the mounting plate. Through above-mentioned setting, drive assembly and baffle are located the both sides of mounting panel respectively, both can improve the space utilization of mounting panel upper and lower both sides, can break away from drive assembly from the sealed space of baffle again to be convenient for seal the space at baffle place, improve the cleanliness factor of the surrounding environment of ion beam in the space at baffle place. Preferably, the drive assembly comprises Linear driving structure, and The linkage structure is arranged corresponding to the baffle plate and used for transmitting the driving force of the linear driving structure; the two groups of linkage structures are adjacently arranged, and the two groups of linear driving structures are respectively positioned at two sides of the two groups of adjacent linkage structures. Through the arrangement, the length required by the installation of the driving structure can be shortened by the arrangement of the linkage structure, so that the power which is originally moved towards one direction can turn, and the utilization rate of space is further improved. Preferably, the linear driving structure includes; The motor is fixed on the mounting plate; A screw rod connected to the motor output shaft, and The moving block is sleeved outside the screw rod and is in threaded c