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CN-121983491-A - Replaceable lining type ICP device and replacement detection method thereof

CN121983491ACN 121983491 ACN121983491 ACN 121983491ACN-121983491-A

Abstract

The invention relates to the technical field of ICP equipment cleaning, and particularly discloses a replaceable lining type ICP equipment and a replacement detection method thereof, wherein the replaceable lining type ICP equipment comprises an ICP equipment chamber and a lining, and the lining is arranged in the ICP equipment chamber; the invention monitors the thickness of etching reaction products attached to the inner wall of the lining in real time through the acquisition module, controls ICP equipment to stop working after the thickness of the etching reaction products is greater than or equal to a preset early warning thickness, and then analyzes the thickness change data of the etching reaction products through the analysis control module to judge whether the lining needs to be replaced or not, thereby achieving the aim of improving the working efficiency in the working process of the ICP equipment and further achieving the effect of maximizing the production profit of the ICP equipment.

Inventors

  • LIU YANG
  • DAI YISHAN
  • HU YAN
  • SUN QING
  • LIU LINGFENG
  • Dai Mingke

Assignees

  • 合肥芯昊半导体设备有限公司

Dates

Publication Date
20260505
Application Date
20240319

Claims (8)

  1. 1. The replaceable lining type ICP device is characterized by comprising an ICP device chamber (3) and a lining (1), wherein the lining (1) is arranged in the ICP device chamber (3); The side wall of the lining (1) is provided with annular exhaust holes (2) which are uniformly distributed, the exhaust holes (2) are distributed in multiple layers, the layers of the exhaust holes (2) are longitudinally distributed at equal intervals, and the exhaust holes (2) of each layer are uniformly distributed along the same plane direction at equal intervals; the exhaust hole (2) is of a conical structural design, the opening area of the exhaust hole (2) facing the outside of the lining (1) is larger than the opening facing the inside of the lining (1), and the inner space of the lining (1) is communicated with the inner space of the I CP equipment chamber (3) through the exhaust hole (2).
  2. 2. The replaceable lining type ICP device according to claim 1, wherein an air inlet pipe is communicated above the lining (1), external threads are arranged outside the air inlet pipe, internal threads are arranged in an air inlet of a chamber (3) of the ICP device, and the internal threads and the external threads are matched with each other; The inner liner is characterized in that a chamber mounting platform is arranged in the I CP equipment chamber (3), and a buckle (4) is mounted on the chamber mounting platform and used for locking the bottom of the liner (1).
  3. 3. A method of replaceable liner-type icp device replacement detection for a replaceable liner-type icp device of any one of claims 1-2, the method comprising: s1, monitoring the thickness of an etching reaction product attached to the inner wall of a liner (1) in real time, and controlling the I CP equipment to stop working when the thickness of the etching reaction product is greater than or equal to a preset early warning thickness, and executing a step S2; S2, analyzing the thickness change data of the etching reaction product, judging whether the lining (1) needs to be replaced, if so, executing a step S3, otherwise, turning to a step S4; s3, replacing the lining (1); S4, cleaning etching reaction products attached to the inner wall of the lining (1) through an ICP device cleaning mechanism.
  4. 4. A replaceable lining type ICP apparatus replacement detection method according to claim 3, wherein in step S1, the process of controlling the ICP apparatus to stop operation includes: the thickness of an etching reaction product attached to the inner wall of the lining (1) is monitored in real time through the acquisition module; Comparing the thickness H s of the monitored etching reaction product attached to the inner wall of the lining (1) with a preset early warning thickness H a in real time; when H s >H a , the ICP apparatus is controlled to stop operating, and step S2 is performed.
  5. 5. The method for detecting replacement of a replaceable liner type ICP apparatus according to claim 4, wherein the obtaining the predetermined pre-warning thickness comprises: Modeling the thickness of the etching reaction product attached to the inner wall of the liner (1) according to the historical data acquired by the acquisition module, and obtaining a standard curve H (t) of the thickness of the etching reaction product attached to the inner wall of the liner (1) along with the change of time; H a ＝H(t 2 ) H z ＝H(t 1 ) The preset early warning thickness H a is obtained through the simultaneous calculation of the formulas; Wherein H z is the initial thickness of the etching reaction product attached to the inner wall of the liner (1), H (t 1 ) is the thickness of the etching reaction product attached to the inner wall of the liner (1) when the time node is t 1 , H (t 2 ) is the thickness of the etching reaction product attached to the inner wall of the liner (1) when the time node is t 2 , f (t) is a curve of profit change with time obtained by producing qualified wafers in unit time in the operation process of ICP equipment, g (t) is a curve of cost change with time of producing unqualified wafer loss in unit time in the operation process of ICP equipment, Q is the cost of performing single cleaning on the inner wall of the liner (1), and N is the number of times of cleaning in the use process of a single liner (1).
  6. 6. The replacement detection method for a replaceable liner type ICP apparatus according to claim 5, wherein in step S2, the process of determining whether the liner (1) needs replacement includes: When the ICP equipment stops working, collecting the time delta t from the ICP equipment to the time when the inner wall of the upper liner (1) is cleaned to the time when the ICP equipment stops working through a timing module; Comparing the time delta T from the ICP equipment to the stop of working after the inner wall of the previous lining (1) is cleaned with the preset critical replacement time T std ; If Deltat is less than or equal to T std , executing the step S3; If Deltat > T std , further analyzing the thickness change data of the etching reaction product attached to the inner wall of the lining (1).
  7. 7. The replacement detection method for a replaceable liner ICP apparatus according to claim 6, wherein the process of obtaining the preset replacement threshold time includes: T std ＝t 4 -t 3 H a ＝H(t 4 ) the preset replacement critical time T std is obtained through the simultaneous calculation of the formulas; Wherein [ t 3 ,t 4 ] is an estimated time interval, and H (t 4 ) is the thickness of etching reaction products attached to the inner wall of the liner (1) when the time node is t 4 .
  8. 8. A replacement detection method for a replaceable liner type ICP apparatus according to claim 7, wherein further analyzing the thickness variation data of the etching reaction product attached to the inner wall of the liner (1) comprises: modeling to obtain a real-time curve H s (t) of the thickness change of the etching reaction product attached to the inner wall of the liner (1) along with time through real-time data of the thickness of the etching reaction product attached to the inner wall of the liner (1) acquired by the acquisition module; Calculating and obtaining a thickness variation deviation parameter sigma of an etching reaction product attached to the inner wall of the liner (1) through the formula; wherein Δt=t b -t a ; comparing the thickness variation deviation parameter sigma of the etching reaction product attached to the inner wall of the lining (1) with a preset standard deviation parameter sigma std ; If sigma is more than or equal to sigma std , executing step S3; If σ < σ std , go to step S4.

Description

Replaceable lining type ICP device and replacement detection method thereof Technical Field The invention relates to the technical field of ICP equipment cleaning, in particular to a replaceable lining type ICP equipment and a replacement detection method thereof. Background In semiconductor manufacturing, inductively Coupled Plasma (ICP) etching is used for etching GaN, si, alGaInP and other materials, and one of the problems of plasma etching is that, as the etching process proceeds, the inner wall of the reaction chamber adsorbs certain etching reaction products, the reaction products are deposited to a certain thickness, and the reaction chamber must be cleaned, otherwise, the reaction deposited film may be peeled off from the chamber wall, particles are introduced, and problems of pollution and etching failure are easily caused in the subsequent process, thereby affecting the quality and yield of wafer etching. At present, the cleaning mode of ICP equipment is mainly in-situ cleaning, fluorine-containing cleaning gas such as nf3 is introduced into a reaction chamber, a radio frequency generator is started to provide radio frequency power so as to ionize the fluorine-containing cleaning gas, ionized f active radicals react with a silicon film to generate silicon fluoride gas which is pumped out and discharged, the cleaning mode has some defects, the residual sediment at the lower part of the chamber is heavier in a lower pumping mode, and cleaning plasma cannot reach the bottom of the chamber, so that film deposition at the bottom of the chamber is thicker and thicker due to long-term operation, and the cleaning cannot be thoroughly performed. Disclosure of Invention The invention aims to provide a replaceable lining type ICP device and a replacement detection method thereof, which solve the following technical problems: how to improve the cleaning effect of the cleaning mechanism in the ICP equipment on etching reaction products. The aim of the invention can be achieved by the following technical scheme: The replaceable lining type ICP device comprises an ICP device cavity and a lining, wherein the lining is arranged in the ICP device cavity; the side wall of the lining is provided with annular exhaust holes which are uniformly distributed in a multi-layer mode, all layers of the exhaust holes are longitudinally distributed at equal intervals, and all layers of the exhaust holes are uniformly distributed at equal intervals along the same plane direction; the exhaust hole is of a conical structure design, the opening area of the exhaust hole facing the outside of the lining is larger than the opening facing the inside of the lining, and the inner space of the lining is communicated with the inner space of the ICP equipment chamber through the exhaust hole. Further, an air inlet pipe is communicated above the inner liner, an external thread is arranged outside the air inlet pipe, an internal thread is arranged in an air inlet of the cavity of the ICP equipment, and the internal thread and the external thread are matched with each other; the ICP equipment chamber is internally provided with a chamber mounting platform, and the chamber mounting platform is provided with a buckle for locking the bottom of the liner. A replaceable liner ICP apparatus replacement detection method for a replaceable liner ICP apparatus, the method comprising: S1, monitoring the thickness of an etching reaction product attached to the inner wall of the liner in real time, and controlling ICP equipment to stop working when the thickness of the etching reaction product is greater than or equal to a preset early warning thickness, and executing a step S2; s2, analyzing thickness change data of an etching reaction product, judging whether the lining needs to be replaced, if so, executing a step S3, otherwise, turning to a step S4; S3, replacing the lining; S4, cleaning etching reaction products attached to the inner wall of the lining through an ICP device cleaning mechanism. Further, in step S1, the process of controlling the ICP apparatus to stop operation includes: the thickness of the etching reaction product attached to the inner wall of the lining is monitored in real time through the acquisition module; Comparing the thickness H s of the monitored etching reaction product attached to the inner wall of the lining with the preset early warning thickness H a in real time; when H s>Ha, the ICP apparatus is controlled to stop operating, and step S2 is performed. Further, the process of obtaining the preset early warning thickness includes: Modeling the thickness of the etching reaction product attached to the inner wall of the liner according to the historical data acquired by the acquisition module, and obtaining a standard curve H (t) of the thickness of the etching reaction product attached to the inner wall of the liner, which changes with time; Ha＝H(t2) Hz＝H(t1) The preset early warning thickness H a is obtained through the s