CN-121985702-A - Method of manufacturing display device

Abstract

A method of manufacturing a display device includes forming a conductive layer on a substrate, forming a preliminary insulating pattern on the conductive layer, forming a first insulating pattern by developing with a first solution, and treating the first insulating pattern with a second solution, wherein the first solution includes a nitrogen compound and the second solution includes a Buffered Oxide Etchant (BOE).

Inventors

• SUGITANI KOICHI
• JIN HUIREN
• Pu Guixuan
• Pu Zheyuan
• ZHAO HENGBIN
• Hong Mixun

Assignees

• 三星显示有限公司

Dates

Publication Date

20260505

Application Date

20201105

Priority Date

20191112

Claims (20)

1. 1. A method of manufacturing a display device, wherein the method comprises: forming a conductive layer on a substrate; forming a preliminary insulating pattern on the conductive layer; Forming a first insulating pattern by developing with a first solution, and Treating the first insulating pattern with a second solution, wherein, The first solution includes a nitrogen compound, and The second solution includes a buffered oxide etchant.
2. 2. The method of claim 1, wherein the buffered oxide etchant comprises HF.
3. 3. The method of claim 1, further comprising forming a pixel electrode on the first insulating pattern prior to the processing, wherein the pixel electrode is electrically connected to the conductive layer.
4. 4. The method of claim 1, further comprising forming a pixel electrode on the first insulating pattern after the processing, wherein the pixel electrode is electrically connected to the conductive layer.
5. 5. The method of claim 1, wherein the method further comprises curing the first insulating pattern prior to treating the first insulating pattern with the second solution.
6. 6. The method of claim 5, further comprising removing residues on the conductive layer by dry etching after the curing the first insulating pattern and before the treating the first insulating pattern with the second solution.
7. 7. The method of claim 6, wherein the dry etching is performed using oxygen or CF 4 gas.
8. 8. The method of claim 1, wherein the nitrogen compound is represented by formula 1: < 1> NR 1 R 2 R 3 OH Wherein, in the formula 1, R 1 to R 3 are each independently selected from hydrogen, substituted or unsubstituted C 1 -C 20 alkyl, substituted or unsubstituted C 6 -C 30 aryl, and substituted or unsubstituted C 7 -C 30 aralkyl.
9. 9. The method of claim 1, wherein the nitrogen compound comprises tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, benzyltriethylammonium hydroxide, or any combination thereof.
10. 10. The method of claim 1, wherein the first insulating pattern consists essentially of a first material.
11. 11. The method of claim 10, wherein the first material comprises an alkali soluble polymer.
12. 12. The method of claim 10, wherein the first material comprises a siloxane-based polymer.
13. 13. The method of claim 1, wherein the conductive layer comprises molybdenum, aluminum, titanium, neodymium, copper, or a combination thereof.
14. 14. The method of any one of claims 1, 2, 5 to 13, wherein the method further comprises: a pixel electrode electrically connected to the conductive layer is formed on the first insulating pattern.
15. 15. The method of claim 14, wherein, The first insulating pattern includes an opening exposing a portion of the conductive layer, and The pixel electrode contacts the conductive layer through the opening.
16. 16. The method of claim 15, wherein the portion of the conductive layer exposed by the opening comprises molybdenum.
17. 17. The method of claim 14, wherein the method further comprises: A second insulating pattern is formed on the pixel electrode, and wherein the second insulating pattern contacts the first insulating pattern outside the pixel electrode.
18. 18. The method of claim 17, wherein, The first insulating pattern comprises a first material, The second insulating pattern includes a second material, and The first material and the second material comprise the same material.
19. 19. The method of any one of claims 1 to 13, wherein the method further comprises, prior to forming the conductive layer, Forming an active layer on the substrate; Forming a first insulating layer on the active layer; forming a gate electrode on the first insulating layer; Forming a second insulating layer on the gate electrode, and And forming contact holes in the first insulating layer and the second insulating layer.
20. 20. The method of claim 19, wherein, The conductive layer is electrically connected to the active layer through the contact hole.

Description

Method of manufacturing display device The present application is a divisional application of an application patent application of which the application date is 11/5/2020, the application number is 202011224951.9, and the application name is "display device and method of manufacturing the same". Cross Reference to Related Applications The present application claims priority and rights of korean patent application No. 10-2019-0143933 filed in the korean intellectual property office on 11/12 of 2019, the entire contents of which are incorporated herein by reference. Technical Field Embodiments of the present disclosure relate to a display device and a method of manufacturing the display device, and relate to a display device and a method of manufacturing the display device capable of preventing or reducing degradation of image quality during a manufacturing process or use. Background Display devices have been diversified in use. In recent developments, the thickness of the display device is smaller and its weight is lighter, and thus, the display device is used in a wider range of use. For example, the use of display apparatuses is extended not only to small-sized devices such as MP3 players and mobile phones but also to medium-and large-sized devices such as large-screen televisions. In addition, there have been researches and developments of foldable or rollable display devices. For this reason, it is desirable to improve the flexibility of the substrate of the display device. Disclosure of Invention Embodiments of the present disclosure provide a display device capable of preventing or reducing degradation of image quality during a manufacturing process or use, and a method of manufacturing the same. Technical objects to be achieved by the present disclosure are not limited to the above-described embodiments, and other technical objects, which are not described, will be clearly understood by those skilled in the art from the description of the present disclosure. Additional aspects will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the proposed embodiments of the disclosure. In one embodiment, a display device may include a substrate, a conductive layer disposed on the substrate, and a first insulating pattern disposed on the conductive layer, wherein the first insulating pattern includes a fluorine compound. In one embodiment, the concentration of the fluorine compound may decrease from a first surface of the first insulating pattern to a second surface of the first insulating pattern, and the first surface faces the second surface. In one embodiment, the second surface of the first insulating pattern is in contact with the conductive layer. In one embodiment, the first insulating pattern may further include a nitrogen compound. In one embodiment, the nitrogen compound may be represented by formula 1. < 1> NR1R2R3OH In formula 1, R 1 to R 3 may each be independently selected from hydrogen, substituted or unsubstituted C 1-C20 alkyl, substituted or unsubstituted C 6-C30 aryl, and substituted or unsubstituted C 7-C30 aralkyl. In one embodiment, the concentration of the nitrogen compound may decrease from a first surface of the first insulating pattern to a second surface of the first insulating pattern, wherein the first surface faces the second surface. In one embodiment, the first insulating pattern may further include a nitrogen compound and a first material, and the first material may be different from the fluorine compound and the nitrogen compound. In one embodiment, the first insulating pattern consists essentially of the first material. In one embodiment, the first material may be an alkali soluble polymer. In one embodiment, the first material may be a silicone-based polymer. In one embodiment, the first insulating pattern includes a first region and a second region, the second region may be between the conductive layer and the first region, and an amount of the first material in the first region may be greater than an amount of the first material in the second region. In one embodiment, the ratio of the amount of the fluorine compound in the first region to the amount of the fluorine compound in the second region may be from about 10:1 to about 10000:1. In one embodiment, the ratio of the thickness of the first region to the thickness of the second region may be from about 1:10 to about 1:1000. In one embodiment, the conductive layer may comprise molybdenum, aluminum, titanium, neodymium, copper, or a combination thereof. In one embodiment, the display device may further include a pixel electrode disposed on the first insulating pattern and electrically connected to the conductive layer. In one embodiment, the first insulating pattern may include an opening exposing a portion of the conductive layer, and the pixel electrode may electrically contact the conductive layer through the opening. In one embodiment