CN-121986186-A - Multi-plenum showerhead without faceplate

Abstract

A spray head includes a plate and a baffle. The plate includes a first surface and an opening in the center of the first surface. The baffle is placed in the opening of the plate. The baffle extends into the plate through the opening. The baffle includes a second surface lying in a plane parallel to the first surface of the plate and includes a first set of apertures and a second set of apertures in the second surface. The first and second sets of apertures are not in fluid communication with each other. The baffle includes a connection plate to connect the baffle to the showerhead, a stem extending from the connection plate, and a gas delivery plate extending from the stem and including a first set of holes and a second set of holes to deliver one or more gases.

Inventors

• David Alan Tang Si
• Mojitaba Kazimi
• Dustin Zachary Austin
• Christopher Matthew Jones
• Peng Kim tower
• Emil Charles Drape

Assignees

• 朗姆研究公司

Dates

Publication Date

20260505

Application Date

20241007

Priority Date

20231009

Claims (20)

1. 1. A spray head, comprising: A plate comprising a first surface and an opening in the center of the first surface, and A baffle disposed in the opening of the plate, the baffle extending into the plate through the opening, the baffle including a second surface lying in a plane parallel to the first surface of the plate, and including first and second sets of apertures in the second surface, the first and second sets of apertures not being in fluid communication with each other.
2. 2. The spray head of claim 1, wherein the second surface of the baffle is coplanar with the first surface of the plate.
3. 3. The spray head of claim 1, wherein: nine holes of the first set of holes form a first square around the center of the second surface of the baffle; One or more holes of the first group of holes being located within the first square, and None of the second set of holes is located within the first square.
4. 4. A spray head according to claim 3, wherein: Four holes of the second set of holes form a second square larger than the first square, the second square having a center coincident with the center of both the first square and the second surface of the baffle, and Each of the four holes is located radially outward of a corresponding one of the nine holes at four corners of the first square.
5. 5. The showerhead of claim 4, wherein the second surface of the baffle further comprises a third set of holes having a diameter less than or equal to the diameters of the first and second sets of holes, and wherein at least four holes of the third set of holes are located inside the second square and outside the first square.
6. 6. The spray head of claim 5, wherein at least one aperture of the third set of apertures and two apertures of the first set of apertures form a triangle, and no other apertures are within the triangle.
7. 7. The showerhead of claim 5, wherein the third set of holes is located on a circle concentric with the centers of the first square and the second square and the center of the second surface of the baffle, and wherein corners of the first square are located on the circle.
8. 8. The spray head of claim 5, wherein the third set of orifices are in fluid communication with the second set of orifices, but not with the first set of orifices.
9. 9. The spray head of claim 5, wherein: Two diameters of the second surface of the baffle that are perpendicular to each other and intersect at the center of the second surface of the baffle form four quadrants on the second surface of the baffle; The two diameters comprising only the first set of holes, and Each quadrant contains one or more holes in the third set of holes.
10. 10. The spray head of claim 9, wherein each diameter comprises nine holes in the first set of holes.
11. 11. The showerhead of claim 1, wherein the showerhead is configured to supply one or more gases directly to a process chamber through the baffle.
12. 12. The showerhead of claim 1, wherein the showerhead is configured to supply one or more gases through the baffle to a substrate facing the plate, and wherein the showerhead does not comprise a faceplate having apertures facing the substrate.
13. 13. The showerhead of claim 1, wherein the showerhead is configured to supply a first gas to a substrate facing the plate through the first set of holes and a second gas to a substrate facing the plate through the second set of holes.
14. 14. The spray head of claim 1, wherein the first set of orifices and the second set of orifices have the same diameter.
15. 15. The showerhead of claim 1, wherein the first and second sets of holes are disposed along concentric circles, and wherein the holes on at least one circle have a different diameter than the holes on at least one other circle.
16. 16. The spray head of claim 1 wherein said first set of apertures and said second set of apertures are arranged in rows and columns.
17. 17. The spray head of claim 1, wherein the baffle is coupled to the plate by one or more fasteners.
18. 18. The spray head of claim 1, wherein the plate and the baffle are integral.
19. 19. The showerhead of claim 1, wherein the baffle comprises a ring surrounding the second surface of the baffle, the showerhead further comprising a gap between an outer diameter of the ring and an inner diameter of the opening of the plate.
20. 20. The showerhead of claim 1, wherein the baffle comprises a ring surrounding the second surface of the baffle, and wherein an outer diameter of the ring is less than an inner diameter of the opening of the plate.

Description

Multi-plenum showerhead without faceplate Cross Reference to Related Applications The present application claims priority from U.S. provisional patent application No. 63/543,203 filed on day 9, 10, 2023. The entire contents of the above application are incorporated herein by reference. Technical Field The present disclosure relates generally to substrate processing systems, and more particularly, to a panelless multi-plenum showerhead for a substrate processing system. Background The background description provided herein is for the purpose of generally presenting the context of the disclosure. Work of the presently named inventors, to the extent it is described in this background section, as well as aspects of the description that may not otherwise qualify as prior art at the time of filing, are neither expressly nor impliedly admitted as prior art against the present disclosure. A substrate processing system (also referred to as a tool) is used to process substrates such as semiconductor wafers. The substrate processing system includes a processing chamber. The process chamber contains a plurality of process modules (also referred to as stations). Each processing module may process a substrate. For example, processing may include deposition, etching, cleaning, and/or other substrate processing. During processing, the substrate is disposed on a substrate support in a processing module. The gas delivery system introduces one or more gases and/or vaporized precursors into the process module via a gas delivery device. For example, the gas delivery device may be a showerhead, a syringe, or the like. In some processes, a plasma may be used to initiate a chemical reaction. Examples of processes include Chemical Vapor Deposition (CVD), atomic Layer Deposition (ALD), plasma Enhanced (PE) CVD (PECVD), and PEALD. Disclosure of Invention A spray head includes a plate and a baffle. The plate includes a first surface and an opening in the center of the first surface. The baffle is placed in the opening of the plate. The baffle extends through the opening into the plate. The baffle includes a second surface lying in a plane parallel to the first surface of the plate and includes a first set of apertures and a second set of apertures in the second surface. The first and second sets of apertures are not in fluid communication with each other. In an additional feature, the second surface of the baffle is coplanar with the first surface of the plate. In an additional feature, nine holes of the first set of holes form a first square around a center of the second surface of the baffle. One or more holes of the first set of holes are located within the first square. The second set of holes does not have any one located within the first square. In an additional feature, four holes in the second set of holes form a second square that is larger than the first square. The second square has a center that coincides with the center of both the first square and the second surface of the baffle. Each of the four holes is located radially outward of a corresponding one of the nine holes at four corners of the first square. In an additional feature, the second surface of the baffle further comprises a third set of holes having a diameter less than or equal to the diameters of the first set of holes and the second set of holes. At least four holes of the third set of holes are located inside the second square and outside the first square. In an additional feature, at least one aperture of the third set of apertures and two apertures of the first set of apertures form a triangle, and no other apertures are within the triangle. In an additional feature, the third set of holes are located on a circle concentric with the centers of the first and second squares and the center of the second surface of the baffle. The corners of the first square are located on circles. In an additional feature, the third set of apertures is in fluid communication with the second set of apertures, but not the first set of apertures. In an additional feature, two diameters of the second surface of the baffle that are perpendicular to each other and intersect at a center of the second surface of the baffle form four quadrants on the second surface of the baffle. The two diameters contain only a first set of holes. Each quadrant contains one or more holes in the third set of holes. In an additional feature, each diameter comprises nine holes of the first set of holes. In an additional feature, the showerhead is configured to supply one or more gases directly to the process chamber through the baffle plate. In an additional feature, the showerhead is configured to supply one or more gases through the baffle to the substrate facing the plate. The showerhead does not include a faceplate having holes facing the substrate. In an additional feature, the showerhead is configured to supply a first gas through the first set of holes and a second gas through the second set Ko