CN-121986298-A - System and method for providing output radiation

Abstract

Systems and methods for providing output radiation are described herein, including broadening and/or temporally shortening radiation to produce output radiation. The systems and methods may include widening and/or temporally shortening two radiation beams having different wavelengths, such as a pump radiation beam and a converted (e.g., second harmonic) radiation beam.

Inventors

• S. D.C. Roskam Abin
• D. ODwyer
• F. Kanpi
• P. W. Smoleberg
• J. Ruining

Assignees

• ASML荷兰有限公司

Dates

Publication Date

20260505

Application Date

20240925

Priority Date

20231012

Claims (15)

1. 1. A system for receiving pulsed pump radiation and providing output radiation, the system comprising: a first nonlinear optical component configured to convert a first portion of the pump radiation into converted radiation via a first nonlinear process; a spectral broadening stage configured to broaden a radiation spectrum of the converted radiation and broaden a radiation spectrum of a second portion of the pump radiation; A time compression stage configured to time shorten the pulses of the converted radiation and time shorten the pulses of the second portion of the pump radiation, and A second nonlinear component configured to receive the converted radiation and the second portion of the pump radiation, the second nonlinear component further configured to generate output radiation via a second nonlinear process.
2. 2. The system of claim 1, wherein the spectral broadening stage comprises a single spectral broadening element configured to receive both the converted radiation and the second portion of the pump radiation.
3. 3. The system of claim 1, wherein the spectral broadening stage comprises: A first spectral broadening element configured to receive the second portion of the pump radiation and broaden the radiation spectrum of the second portion of the pump radiation, and A second spectral broadening element configured to receive the converted radiation and broaden the radiation spectrum of the converted radiation.
4. 4. The system of any of the preceding claims, wherein the time compression stage comprises a single time compression element configured to receive both the converted radiation and the second portion of the pump radiation.
5. 5. A system according to any one of claims 1 to 3, wherein the time compression stage comprises: A first time compression element configured to receive the second portion of the pump radiation and to time shorten the pulse of the second portion of the pump radiation, and A second time compression element configured to receive the converted radiation and to time shorten the pulses of the converted radiation.
6. 6. The system of any one of the preceding claims, wherein the pulse duration of the pump radiation received by the system is 100 fs or longer.
7. 7. The system of any of the preceding claims, wherein a pulse duration of the second portion of the pump radiation after a time reduction by the first time compression element is less than 40 fs.
8. 8. The system of any preceding claim, wherein the pulse duration of the converted radiation after time shortening by the second time compression element is less than 40 fs.
9. 9. A measurement device comprising the system of any one of the preceding claims.
10. 10. A method of providing output radiation, the method comprising: Receiving pulsed pump radiation; converting a first portion of the pump radiation into converted radiation via a first nonlinear process; spectrally broadening a second portion of the pump radiation; Time shortening pulses of said second portion of said pump radiation; spectrally broadening said converted radiation; time shortening the pulses of the converted radiation, and Output radiation is generated from the converted radiation and the second portion of the pump radiation via a second nonlinear process.
11. 11. The method of claim 10, comprising spectrally broadening the second portion of the converted radiation and the pump radiation via a single spectral broadening element configured to receive both the converted radiation and the second portion of the pump radiation.
12. 12. The method of claim 10, comprising: Spectrally broadening the second portion of the pump radiation via a first spectral broadening element configured to receive the second portion of the pump radiation, and The converted radiation is spectrally broadened via a second spectral broadening element, the second spectral broadening element being configured to receive the converted radiation.
13. 13. The method of any one of claims 10 to 12, comprising temporally shortening the pulses of the conversion radiation and temporally shortening the pulses of the second portion of the pump radiation via a single temporal compression element configured to receive both the conversion radiation and the second portion of the pump radiation.
14. 14. The method according to any one of claims 10 to 12, comprising: time shortening the pulse of the second portion of the pump radiation via a first time compression element configured to receive the second portion of the pump radiation, and The pulses of the converted radiation are shortened in time via a second time compression element configured to receive the converted radiation.
15. 15. The method of any of claims 10 to 14, wherein the first nonlinear process comprises harmonic generation.

Description

System and method for providing output radiation Cross Reference to Related Applications The present application claims priority from european application 23203121.1 filed on 10/12 of 2023 and european application 23211629.3 filed on 11/23 of 2023, which are incorporated herein by reference in their entireties. Technical Field The present invention relates to a system for receiving pump radiation and providing output radiation, a measuring device comprising such a system, and a method of providing output radiation. Background A lithographic apparatus is a machine that is configured to apply a desired pattern onto a substrate. For example, lithographic apparatus can be used in the manufacture of Integrated Circuits (ICs). For example, a lithographic apparatus may project a pattern (also commonly referred to as a "design layout" or "design") on a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer). To project a pattern onto a substrate, a lithographic apparatus may use electromagnetic radiation. The wavelength of the radiation determines the minimum feature size that can be formed on the substrate. Typical wavelengths currently in use are 365nm (i-line), 248nm, 193nm and 13.5nm. Lithographic apparatus using Extreme Ultraviolet (EUV) radiation (having a wavelength in the range of 4 to 20nm, e.g. 6.7nm or 13.5 nm) may form smaller features on a substrate than lithographic apparatus using radiation, e.g. 193 nm. Low k1 lithography can be used to process features that are smaller in size than the classical resolution limit of the lithographic apparatus. In this process, the resolution formula may be expressed as cd=k 1 ×λ/NA, where λ is the wavelength of the radiation employed, NA is the numerical aperture of the projection optics in the lithographic apparatus, CD is the "critical dimension" (typically the minimum feature size printed, but in this case half pitch), and k 1 is the empirical resolution factor. In general, the smaller the k 1, the more difficult it becomes to reproduce on the substrate a pattern that is similar in shape and size to that planned by the circuit designer for achieving a particular electrical function and performance. To overcome these difficulties, complex fine tuning steps may be applied to the lithographic projection apparatus and/or the design layout. These include, for example, but are not limited to, NA optimization, custom illumination schemes, use of phase shift patterning devices, various optimizations of the design layout, such as optical proximity correction (OPC, sometimes also referred to as "optical and process correction"), or other methods commonly defined as "resolution enhancement techniques" (RET). Alternatively, a tight control loop for controlling the stability of the lithographic apparatus may be used to improve pattern reproduction at low k 1. In lithographic processes, as well as other manufacturing processes, it is often desirable to measure the created structure, for example for process control and verification. Various tools for making such measurements are known, including scanning electron microscopes, which are commonly used to measure Critical Dimensions (CD), as well as specialized tools to measure overlay (alignment accuracy of two layers in a device). In recent years, various forms of scatterometers have been developed for use in the field of photolithography. The fabrication process may be, for example, photolithography, etching, deposition, chemical mechanical planarization, oxidation, ion implantation, diffusion, or a combination of two or more thereof. Examples of known scatterometers typically rely on the provision of dedicated metrology targets. For example, one approach may require a target in the form of a simple grating that is large enough that the measurement beam generates a spot smaller than the grating (i.e., the grating is underfilled). In the so-called reconstruction method, the characteristics of the grating can be calculated by modeling the interaction of the scattered radiation with a mathematical model of the target structure. The model parameters are adjusted until the simulated interactions produce a diffraction pattern similar to that observed from the actual target. In addition to measuring feature shape by reconstruction, diffraction-based coverage can also be measured using such a device, as described in published patent application US2006066855 A1. Diffraction-based overlay metrology using dark field imaging of diffraction orders enables overlay measurements on smaller targets. These targets may be smaller than the illumination spot and may be surrounded by product structures on the wafer. Examples of dark field imaging metrology can be found in many published patent applications, such as for example US2011102753A1 and US20120044470a. Multiple gratings may be measured in one image using a composite grating eye HAVING FAR shorter wavelengths mark. Known