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CN-121988086-A - Polishing solution treatment and filtration device and circulating treatment system

CN121988086ACN 121988086 ACN121988086 ACN 121988086ACN-121988086-A

Abstract

The invention relates to the field of separation and filtration devices for filtering solid impurities from liquid, and discloses a polishing solution treatment and filtration device and a circulating treatment system. The polishing solution treatment and filtration device comprises a machine body and a conical filter rotary drum arranged on the machine body, wherein the conical filter rotary drum is arranged in the horizontal direction, the bottom end of a cone of the conical filter rotary drum is of an open structure, and the rotary drum comprises a filtration section with a filter screen on the side wall and a slag discharge section positioned on one side of the bottom of the cone. The machine body is provided with a liquid inlet structure and a liquid collecting structure, polishing liquid enters from the top end of the cone, forms an adherent liquid film under the rotation action of the rotary drum and flows along the direction from the top end to the bottom end of the cone, solid-liquid separation is realized, separated liquid is collected and led out through the liquid collecting structure, and impurities are collected in a slag discharging section and continuously discharged through a impurity cleaning component extending into the slag discharging section. The invention also discloses a circulation treatment system, which can realize continuous filtration and continuous slag discharge of the polishing solution, avoid shutdown cleaning and improve treatment efficiency and operation stability.

Inventors

  • HUANG SHAODONG
  • ZHOU XINCHUN
  • XIE BO
  • Ye yuquan
  • Wu Fanbang

Assignees

  • 深圳市睿格晟设备有限公司

Dates

Publication Date
20260508
Application Date
20260410

Claims (10)

  1. 1. The polishing solution treatment and filtration device is characterized by comprising a machine body (1) and a rotary filtration assembly arranged on the machine body (1), wherein the rotary filtration assembly comprises a conical filtration rotary drum (2) with an axis arranged in the horizontal direction, the conical filtration rotary drum (2) is rotatably arranged on the machine body (1) and is driven by a driving device to rotate around the axis of the conical filtration rotary drum, and the conical bottom end of the conical filtration rotary drum (2) is of an open structure; the conical filter drum (2) comprises: a filter section (2 a) having a side wall at least partially formed by a filter screen; the slag discharging section (2 b) is positioned at one side of the cone bottom of the filtering section (2 a) and is communicated with the filtering section (2 a), and the side wall of the slag discharging section (2 b) is of a non-filtering structure; The machine body (1) is provided with: the liquid inlet structure (3) is used for leading the polishing liquid to be treated into the conical filter rotary drum (2) from the conical top end; a liquid collecting structure (4) for collecting the liquid thrown out or oozed out from the filtering section (2 a); The slag discharging section (2 b) is internally provided with a impurity removing component (7), the impurity removing component (7) comprises a suction port and a guide structure, the suction port extends into the slag discharging section (2 b) through an open structure at the bottom end of the cone, the guide structure is used for guiding impurities to the suction port, and the suction port faces the inner wall of the slag discharging section (2 b).
  2. 2. The polishing solution treatment and filtration device according to claim 1, wherein the conical top end and the conical bottom end of the conical filter drum (2) are respectively provided with a support structure for supporting the conical filter drum (2) to rotate, so that the conical filter drum (2) can rotate around the axis thereof.
  3. 3. The polishing liquid treatment filter device according to claim 1, wherein the guide structure comprises an aggregate scraper positioned on the upstream side of the suction port in the rotation direction, during the rotation of the conical filter drum (2), the muddy impurities deposited in the slag discharging section (2 b) are conveyed to the aggregate scraper along with the rotation of the drum under the circumferential conveying action, and are loosened and guided by the aggregate scraper, enter the suction port and are discharged, thereby realizing continuous slag discharging; A gap of 2 mm-10 mm is arranged between the aggregate scraping plate and the inner wall of the slag discharging section (2 b), and the aggregate scraping plate is obliquely arranged relative to the rotation direction of the slag discharging section (2 b) so as to guide impurities to be collected towards the suction port.
  4. 4. The polishing solution treatment and filtration device according to claim 1, further comprising a back flushing device (8), the back flushing device (8) comprising a spray head (8 a) arranged along a bus bar outside the filtration section (2 a), the filter screen being back flushed circumferentially during rotation of the conical filter drum (2); The back flushing device (8) is provided with a plurality of injection units along the direction of the bus, and the injection units at different axial positions have different injection parameters, so that the back flushing strength is gradually increased along the direction from the cone top to the cone bottom; The spray direction of the spray head (8 a) has a radial component relative to the surface of the filter screen and an axial component directed towards the cone bottom.
  5. 5. The polishing solution treatment and filtration device according to claim 1, wherein a spiral conveying scraper (5) extending spirally along the inner wall of the filtering section (2 a) is arranged in the filtering section (2 a), and the spiral conveying scraper (5) extends into the conical filtering rotary drum (2) through a rotating shaft (6) and is connected with a driving device for guiding impurities deposited on the inner wall of the filtering section (2 a) to a slag discharging section (2 b); The spiral conveying scraping plate (5) is connected with a driving device or an independent servo motor through a rotating shaft (6), and the rotating speed of the spiral conveying scraping plate (5) and the rotating speed of the conical filter rotary drum (2) have a rotating speed difference of 1% -10%, and the rotating directions of the spiral conveying scraping plate and the rotating speed of the conical filter rotary drum are the same; The screw pitch of the spiral conveying scraper (5) is 0.3-1.0 times of the diameter of the corresponding position of the filtering section (2 a); A gap is arranged between the spiral conveying scraper (5) and the inner wall of the filtering section (2 a), and the gap is 1 mm-5 mm.
  6. 6. The polishing liquid treatment filter device according to claim 1, wherein the half cone angle of the conical filter drum (2) is 8 ° to 20 °.
  7. 7. The polishing solution treatment and filtration device according to claim 1, wherein the solution inlet structure (3) sprays along the tangential direction of the conical filter drum (2) so that the entering solution forms an adherent flow along the inner wall of the filter segment (2 a); The injection direction of the liquid inlet structure (3) is arranged along the tangential direction of the circumferential direction of the filter drum and is inclined towards the cone bottom direction, and the inclination angle is 5-30 degrees so as to have an axial component pointing towards the cone bottom; The injection direction of the liquid inlet structure (3) is along the rotation direction of the conical filter rotary drum (2).
  8. 8. The polishing solution treatment and filtration device according to claim 1, wherein the liquid collecting structure (4) comprises a cover body (4 a), the cover body (4 a) covers the rotary filter assembly, and a separation structure (4 b) is arranged in the cover body (4 a) to separate the inside of the cover body (4 a) into a liquid collecting space corresponding to the filter section (2 a) and a protection space corresponding to the slag discharging section (2 b); The separation structure (4 b) is provided with a through hole for the conical filter rotary drum (2) to pass through, and a gap is arranged between the through hole and the conical filter rotary drum (2).
  9. 9. The polishing solution treatment and filtration device according to claim 5, further comprising a cover plate (9), wherein the cover plate (9) is detachably mounted on the machine body (1), and the cover plate (9) covers the open structure of the cone bottom end of the cone-shaped filter drum (2) to avoid liquid splashing; the rotating shaft (6) of the spiral conveying scraping plate (5) and the pipeline of the impurity removing component (7) penetrate through the cover plate (9).
  10. 10. A cyclical processing system, comprising: the polishing liquid treatment and filtration device according to any one of claims 1 to 9, which is used for solid-liquid separation of waste polishing liquid; the liquid collecting structure (4) of the filtering device guides the separated liquid into the liquid supply box (10); The clean water tank is used for supplementing clean water to the liquid supply tank (10); The thick liquid box is used for supplementing the polishing liquid thick liquid to the liquid supply box (10); The stirrer is arranged in the liquid supply box (10) and is used for mixing liquid in the liquid supply box (10); the concentration detection device is used for detecting the concentration of the polishing solution in the solution supply box (10); a control unit for controlling the replenishment amount of the clear water tank and/or the concentrate tank to the liquid supply tank (10) according to the detection result of the concentration detection device; The output pump is used for conveying the prepared polishing solution to the solution using equipment; And the impurity treatment unit is communicated with the output end of the impurity cleaning component (7) of the filtering device and is used for collecting and further dehydrating the discharged muddy impurities.

Description

Polishing solution treatment and filtration device and circulating treatment system Technical Field The invention relates to the technical field of separation and filtration devices for filtering solid impurities from liquid, in particular to a polishing solution treatment and filtration device and a circulating treatment system. Background Polishing solutions are widely used in the fields of metal processing, optical processing, semiconductor processing, and the like, and are generally solid-liquid mixed systems formed by mixing a base liquid with abrasive grains. In the polishing process, the polishing liquid not only participates in trace removal of the material surface, but also plays roles of cooling, lubricating and carrying processing scraps. As the polishing operation continues, the composition of the polishing liquid gradually changes. On one hand, the removed material on the surface of the processed workpiece can enter the polishing solution to continuously increase the content of solid impurities in the polishing solution, and on the other hand, particles or aggregates with larger particle sizes can be generated in the polishing process and mixed in the original abrasive to damage the particle size distribution of the polishing solution, thereby influencing the polishing precision and the surface quality. When the impurity content or particle size distribution in the polishing liquid exceeds the allowable range, the polishing liquid cannot be used continuously and stably. Therefore, in actual production, it is generally necessary to recycle the waste polishing liquid, remove impurities therein by filtration or the like, and adjust the concentration of the treated liquid for reuse. In some large polishing scenes, such as multi-station or multi-equipment parallel production lines, waste polishing liquid can be continuously and massively generated, and high requirements are placed on the continuous operation capacity and the treatment efficiency of treatment equipment. In the prior art, common polishing solution filtering modes comprise solid-liquid separation by adopting a rotary filtering device. For example, the inventor's prior patent CN115837638B, by providing a rotary filter cartridge with a filter screen structure, the liquid and fine particles are discharged through the filter screen by centrifugation during rotation, while larger particle impurities are trapped inside the filter cartridge. The device has a relatively simple structure and can realize continuous filtration to a certain extent. However, the above prior art still has the following disadvantages: First, the impurities trapped during the filtration process gradually accumulate inside the filter cartridge, typically in the form of a sludge-like material having a gradually decreasing water content, and adhere or accumulate on the inner wall of the filter cartridge. Over time, these impurities tend to clog the filter mesh, resulting in reduced filtration efficiency and even affecting the proper operation of the device. Second, in order to restore the filtering performance, the impurities accumulated inside the filter cartridge need to be cleaned. However, since the existing filtering devices are mostly of closed structures, the filtering process is usually required to be stopped when cleaning operation is performed, and thus the equipment cannot continuously operate. Under the continuous production condition, the waste polishing solution is continuously generated, and if the filtering device is stopped, the processing capacity is insufficient, so that the overall production efficiency is affected. For this reason, some solutions work alternately by providing a plurality of filtering devices to maintain continuous operation, but this approach can add significantly to the number of devices and complexity of the system. In addition, in the prior art, the conveying and discharging of impurities in the filtering process lack of an effective structural design, and especially under the conditions that the water content of the impurities is reduced and the fluidity is poor, the impurities are easy to stay in equipment, so that the blocking problem is further aggravated. Meanwhile, the filter screen is easy to be blocked by larger particles in the use process, cleaning of the filter screen usually depends on manual or shutdown back flushing, and online continuous maintenance is difficult to realize. In summary, the existing polishing solution filtering technology still has the defects in continuous operation capability, impurity discharge efficiency, filtering stability and the like, and needs to be further improved. Disclosure of Invention Aiming at the problems that a filter screen is easy to block, impurities are difficult to discharge in time and the continuous operation is difficult to realize due to the need of shutdown cleaning in the using process of a polishing solution treatment and filtration device in the prior art, the invention