CN-121988517-A - Preparation method of patterned graphene film based on flexible mask

Abstract

The application provides a preparation method of a patterned graphene film based on a flexible mask, which comprises the steps of preparing graphene dispersion liquid, preparing the flexible mask, covering the flexible mask on the surface of a substrate, and uniformly coating the graphene dispersion liquid on an opening area of the mask in a brushing mode to prepare the patterned graphene film. The low-temperature brush coating film forming is realized through the low boiling point of the solvent component of the graphene dispersion liquid, the high-temperature reduction process is avoided, the problem that the traditional CVD or high-temperature annealing process is incompatible with the flexible substrate is solved, the flexible mask is made of polyimide, the solvent only fills the opening area in the brush coating process, the subsequent etching process is not needed, the graphene is directionally deposited in the opening area by the brush coating process, and compared with the traditional spin coating-etching process, the waste of high-cost graphene raw materials is remarkably reduced.

Inventors

• AN WANQING
• XIA CHAORAN
• ZHANG YUCHANG
• ZHANG YU
• LI GAO
• SU XINMING
• PAN SHANGJIE
• LIU CHUN

Assignees

• 北京卫星环境工程研究所

Dates

Publication Date

20260508

Application Date

20251231

Claims (10)

1. 1. The preparation method of the patterned graphene film based on the flexible mask plate is characterized by comprising the following steps of: s101, preparing graphene dispersion liquid, wherein the graphene dispersion liquid comprises ethylene glycol methyl ether, absolute ethyl alcohol, deionized water and graphene powder; s102, manufacturing a flexible mask, wherein the flexible mask is polyimide; And S104, covering the flexible mask plate on the surface of the substrate, and uniformly coating the graphene dispersion liquid on the mask opening area by adopting a brushing mode to prepare the graphene film with the pattern.
2. 2. The method of claim 1, wherein preparing the graphene dispersion comprises mixing 9-10% by volume of ethylene glycol methyl ether, 5-6% by volume of absolute ethyl alcohol and 2-3% by volume of deionized water, adding graphene powder, and magnetically stirring to form the graphene dispersion.
3. 3. The method according to claim 2, wherein the graphene dispersion is prepared under the condition that the stirring process is carried out under the water bath condition of 50-60 ℃ for 6-8 hours, and the graphene dispersion is kept stand.
4. 4. The method of claim 3, wherein the conditions for preparing the graphene dispersion further comprise concentrating the dispersion on a hot bench.
5. 5. The method of claim 1, wherein the pattern of the flexible reticle is processed by etching.
6. 6. The method as recited in claim 1, further comprising: And S103, assembling a plurality of substrates by using a clamp.
7. 7. The method of claim 6, wherein the clamp and the substrate are on the same horizontal plane.
8. 8. The method of claim 1, wherein the substrate material comprises glass, quartz, or other flexible polymer.
9. 9. The method according to claim 1, wherein the film forming condition of the patterned graphene film is that drying treatment is performed on a hot table, wherein the drying time is 2-3 hours.
10. 10. The method according to claim 1, wherein the graphene dispersion is uniformly coated on the mask opening area by brushing using a flat surface preparation device to prepare the patterned graphene film.

Description

Preparation method of patterned graphene film based on flexible mask Technical Field The application relates to the field of graphene film processing, in particular to a method for preparing a patterned graphene film based on a flexible mask. Background Graphene is a honeycomb two-dimensional crystal structure material composed of single-layer carbon atoms, is known as a future material because of excellent electrical conductivity, thermal conductivity, mechanical strength and optical transparency, and has wide application potential in the fields of flexible electronics, energy storage equipment, biosensors, transparent conductive films, micro-nano electronic devices and the like. Particularly, in the context of rapid development of flexible electronic devices, higher requirements are put on graphene films with high performance, low cost and controllable structure. Currently, the preparation of graphene films mainly depends on methods such as Chemical Vapor Deposition (CVD), mechanical stripping, liquid phase stripping (LPE) and the like. The CVD technology can obtain a high-quality graphene film, but has the problems of high cost, complex equipment, difficult scale and the like, the mechanical stripping method can obtain single-layer graphene, but has low preparation efficiency and cannot meet the requirement of large-area production, and the liquid phase stripping (LPE) rule is widely studied due to simplicity and low cost, but has technical bottlenecks in film uniformity, adhesiveness and pattern precision. The patterned graphene film is taken as an indispensable structural unit in the construction of electronic devices, and the preparation technology of the patterned graphene film becomes an important direction of research. The traditional patterning method mainly adopts a photoetching and etching process, and can realize higher pattern precision, but the method has the advantages of complex process flow, serious environmental pollution, high cost and high equipment requirement. In addition, the technology is generally applicable to rigid substrates, has poor adaptability to flexible and curved substrates, and is difficult to meet the requirements of the emerging fields of wearable devices, flexible display and the like. Therefore, the preparation method of the patterned graphene film based on the flexible mask plate is used for solving one of the technical problems. Disclosure of Invention The application aims to provide a preparation method of a patterned graphene film based on a flexible mask, which can solve at least one technical problem. The specific scheme is as follows: according to a specific embodiment of the application, a method for preparing a patterned graphene film based on a flexible mask comprises the following steps: s101, preparing graphene dispersion liquid, wherein the graphene dispersion liquid comprises ethylene glycol methyl ether, absolute ethyl alcohol, deionized water and graphene powder; s102, manufacturing a flexible mask, wherein the flexible mask is polyimide; And S104, covering the flexible mask plate on the surface of the substrate, and uniformly coating the graphene dispersion liquid on the mask opening area by adopting a brushing mode to prepare the graphene film with the pattern. In some embodiments, preparing the graphene dispersion liquid comprises the steps of mixing 9-10 volume percent of ethylene glycol methyl ether, 5-6 volume percent of absolute ethyl alcohol and 2-3 volume percent of deionized water, adding graphene powder, and magnetically stirring to form the graphene dispersion liquid. In some embodiments, the graphene dispersion is prepared under the condition that the stirring process is continued for 6-8 hours under the water bath condition of 50-60 ℃ and is kept stand. In some embodiments, the preparation conditions of the graphene dispersion further include concentrating the dispersion on a hot stage. In some embodiments, the pattern of the flexible reticle is processed by etching. In some embodiments, further comprising: And S103, assembling a plurality of substrates by using a clamp. In some embodiments, the clamp and the substrate are on the same horizontal plane. In some embodiments, the substrate material comprises glass, quartz, or other flexible polymer. In some embodiments, the film forming condition of the patterned graphene film is that drying treatment is carried out on a hot table, wherein the drying time is 2-3 hours. In some embodiments, the graphene dispersion is uniformly coated on the mask opening area by using a planar preparation method in a brushing manner, so as to prepare the graphene film with the pattern. Compared with the prior art, the method for preparing the patterned graphene film based on the flexible mask has the advantages that low-temperature brush coating film forming is achieved through the low boiling point of the solvent component of the graphene dispersion liquid, the high-temperature reduction process is avoided,