CN-121990344-A - Method, apparatus, program, and readable storage medium for adjusting posture of reaction container

CN121990344ACN 121990344 ACN121990344 ACN 121990344ACN-121990344-A

Abstract

The invention belongs to the technical field of silicon carbide material manufacturing, and discloses a posture adjustment method, a posture adjustment device, a program and a readable storage medium of a reaction container. The gesture adjusting method and the gesture adjusting device of the reaction container adopt an automatic control strategy, realize the detection and feedback of the real-time position of the reaction container through the cooperation of the position detecting component and the controller, ensure the accurate positioning of the reaction container in the moving process, realize the gesture adjustment of the reaction container in multiple directions through the cooperation of the forward blocking component and the lateral blocking component, not only adjust the position of the reaction container on the moving path, but also adjust the position of the reaction container in the direction vertical to the moving path, thereby ensuring the accurate connection of the reaction container and the gas supply system.

Inventors

PU ZHONGXUN
CUI HAIZHEN
JIN XIJIN

Assignees

苏州精材半导体科技有限公司
北京精材半导体科技有限公司

Dates

Publication Date: 20260508
Application Date: 20251231

Claims (13)

1. A method for adjusting the posture of a reaction vessel, which is applied to the chemical vapor deposition of silicon carbide materials, and is characterized by comprising the following steps: driving the forward blocking assembly to move to a blocking position in response to a preliminary seating signal generated after the reaction vessel reaches a designated position; responding to a first blocking signal generated after the forward blocking component moves to the blocking position, driving the lateral blocking component to move towards the direction of the reaction container and abutting against the reaction container to push the reaction container to move, and adjusting the posture of the reaction container; in response to a second blocking signal sent after the lateral blocking assembly moves to the first set position, the reaction vessel is pushed to move along the moving path of the reaction vessel so that the reaction vessel abuts against the forward blocking assembly.
2. The posture adjustment method according to claim 1, characterized by further comprising: The forward blocking assembly and the lateral blocking assembly are driven to reset in response to a full-in-place signal generated after the reaction vessel is fully in place.
3. The posture adjustment method according to claim 2, characterized by further comprising: acquiring a movement signal generated by the movement of the reaction container towards a designated position detected by the position sensor; in response to the movement signal, the lateral blocking assembly is driven to move to a second set position to guide movement of the reaction vessel.
4. The method of claim 2, wherein in the step of moving the reaction vessel by the lateral blocking assembly to adjust the posture of the reaction vessel, the method specifically comprises: driving the lateral blocking assembly on the same side to move towards a first set position; in response to a lateral seating signal generated when the lateral blocking assembly on one side moves to the first set position, the lateral blocking assembly on the other side is driven to move and the reaction assembly is driven to move.
5. The method according to claim 2, wherein in the step of pushing the reaction vessel to move by the lateral blocking assembly to adjust the posture of the reaction vessel, specifically comprising: Driving the lateral blocking assembly to move to a first set position; Acquiring pressure data generated by a pressure detector detecting the pressure of the lateral blocking assembly, and comparing the pressure data with set pressure data; If the pressure data detected by the pressure detector is larger than the set pressure data, the corresponding lateral blocking component is driven to continuously move for a set distance and reset.
6. The posture adjustment method according to claim 2, wherein the lateral blocking member includes a rear end blocking member, a central blocking member, and a front end blocking member, which are disposed in this order along the advancing direction of the reaction vessel, the rear end blocking member, the central blocking member, and the front end blocking member corresponding to the rear, middle, and front portions of the reaction vessel, respectively; In the step of the lateral blocking assembly pushing the reaction vessel to move to adjust the posture of the reaction vessel, the posture adjustment method further includes: Acquiring pressure data generated by the pressure detector for detecting the pressure of the front end blocking assembly and the pressure of the rear end blocking assembly, and comparing the pressure data with corresponding set pressure data; if the detected pressure data is larger than the corresponding set pressure data, keeping the central blocking assembly motionless, driving the lateral blocking assembly corresponding to the pressure data to continuously move for a set distance, and resetting.
7. A computer program, characterized in that the computer program, when executed, is capable of implementing the posture adjustment method according to any one of claims 1 to 6.
8. A readable storage medium, characterized in that, the readable storage medium has the computer program of claim 7 embedded therein.
9. A posture adjustment device of a reaction vessel, applied to silicon carbide material manufacturing equipment, characterized by comprising: A forward blocking assembly movable onto a path of movement of a reaction vessel and adapted to abut against the reaction vessel to limit the path of movement of the reaction vessel; The lateral blocking assemblies are positioned at two sides of the moving path of the reaction container, can move close to or away from the moving path, can abut against the reaction container and push the reaction container to move so as to adjust the gesture; a position detecting assembly for detecting a position of the reaction vessel; The controller is used for controlling the operation of the controller, the controller is used for: driving the forward blocking assembly to move to a blocking position in response to a preliminary seating signal generated after the reaction vessel reaches a designated position; responding to a first blocking signal generated after the forward blocking component moves to the blocking position, driving the lateral blocking component to move towards the direction of the reaction container and abutting against the reaction container to push the reaction container to move, and adjusting the posture of the reaction container; in response to a second blocking signal sent after the lateral blocking assembly moves to the first set position, the reaction vessel is pushed to move along the moving path of the reaction vessel so that the reaction vessel abuts against the forward blocking assembly.
10. The attitude adjustment device according to claim 9, wherein the lateral blocking assembly comprises: a blocking part for abutting on the reaction vessel; the driving structure is connected with the blocking part and used for driving the blocking part to move, and the driving structure is electrically connected with the controller; the guide assembly is connected with the blocking part and used for guiding the blocking part to move; And the pressure detector is electrically connected with the controller and is used for detecting the pressure of the blocking part abutting against the reaction container.
11. The posture adjustment device of claim 10, characterized in that the lateral blocking assembly includes a rear blocking assembly, a central blocking assembly and a front blocking assembly, which are disposed in order along the advancing direction of the reaction vessel, the rear blocking assembly, the central blocking assembly and the front blocking assembly corresponding to the rear, middle and front portions of the reaction vessel, respectively.
12. The attitude adjustment device according to claim 11, wherein the guide assembly includes: A guide shaft extending from outside the housing into the housing through a through-hole in the housing of the manufacturing apparatus, the guide shaft being movable relative to the through-hole; one end of the guide shaft, which is positioned in the housing, is connected with the blocking part, and the other end of the guide shaft is connected with the driving structure.
13. The posture adjustment device of claim 10, characterized in that the blocking portion includes: The bracket is respectively connected with the driving structure and the guide assembly; the roller is rotatably arranged on the bracket and is used for abutting against the reaction container.

Description

Method, apparatus, program, and readable storage medium for adjusting posture of reaction container Technical Field The invention belongs to the technical field of silicon carbide material manufacturing, and particularly relates to a posture adjustment method, a program, a readable storage medium and a corresponding posture adjustment device applied to a reaction container of a silicon carbide material manufacturing system. Background Silicon carbide is a representative ceramic material, and is widely used throughout the industrial field due to its excellent physical, chemical and electrical properties. In recent years, with the development of semiconductor processing components using silicon carbide materials, the importance of silicon carbide materials has been increasing. In particular, silicon carbide materials are widely used as a component for etching processes in semiconductor process components due to their high plasma resistance. Silicon carbide materials used in semiconductor etch process parts are conventional methods of manufacturing silicon carbide. Since quality and performance are not satisfactory with this method, chemical vapor deposition is often used in the prior art. Chemical vapor deposition silicon carbide uses a mixture of a Si-containing gas such as SiH 4、SiCl2、SiCl4 and a C-containing gas such as C 2H2、CH4、C3H8 or the like as a raw material gas, CH 3SiCl3、 CH3SiH3, (CH3)3 SiH), or the like. There are some deposition methods using a single piece of raw material, and manufacturing silicon carbide materials by chemical vapor deposition has a disadvantage of low productivity because the process is performed in a batch chemical vapor deposition furnace. However, if the batch type chemical vapor deposition furnace is to be modified to a continuous type chemical vapor deposition furnace, it is necessary to solve the problem of posture adjustment of the reaction vessel. Disclosure of Invention In order to solve the deficiencies of the prior art, a first aspect of the present invention discloses a method for adjusting the posture of a reaction vessel, which is applied to chemical vapor deposition of silicon carbide material, comprising: driving the forward blocking assembly to move to a blocking position in response to a preliminary seating signal generated after the reaction vessel reaches a designated position; responding to a first blocking signal generated after the forward blocking component moves to the blocking position, driving the lateral blocking component to move towards the direction of the reaction container and abutting against the reaction container to push the reaction container to move, and adjusting the posture of the reaction container; in response to a second blocking signal sent after the lateral blocking assembly moves to the first set position, the reaction vessel is pushed to move along the moving path of the reaction vessel so that the reaction vessel abuts against the forward blocking assembly. Further technical solution may further include: The forward blocking assembly and the lateral blocking assembly are driven to reset in response to a full-in-place signal generated after the reaction vessel is fully in place. Further technical solution may further include: acquiring a movement signal generated by the movement of the reaction container towards a designated position detected by the position sensor; in response to the movement signal, the lateral blocking assembly is driven to move to a second set position to guide movement of the reaction vessel. Further technical solution may further be that in the step of pushing the reaction vessel to move by the lateral blocking component to adjust the posture of the reaction vessel, the method specifically includes: driving the lateral blocking assembly on the same side to move towards a first set position; in response to a lateral seating signal generated when the lateral blocking assembly on one side moves to the first set position, the lateral blocking assembly on the other side is driven to move and the reaction assembly is driven to move. Further, the step of pushing the reaction vessel to move by the lateral blocking component to adjust the posture of the reaction vessel specifically includes: Driving the lateral blocking assembly to move to a first set position; Acquiring pressure data generated by a pressure detector detecting the pressure of the lateral blocking assembly, and comparing the pressure data with set pressure data; If the pressure data detected by the pressure detector is larger than the set pressure data, the corresponding lateral blocking component is driven to continuously move for a set distance and reset. The lateral blocking assembly comprises a rear end blocking assembly, a central blocking assembly and a front end blocking assembly which are sequentially arranged along the advancing direction of the reaction vessel, wherein the rear end blocking assembly, the central blocking assembly and the fr