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CN-121990821-A - Rare earth modified IZO doped target material and preparation method and application thereof

CN121990821ACN 121990821 ACN121990821 ACN 121990821ACN-121990821-A

Abstract

The invention relates to the technical field of targets, in particular to a rare earth modified doped IZO target, a preparation method and application thereof, wherein the rare earth modified IZO target comprises, by mole percent, 10-35% of ZnO, 1-5% of rare earth oxide and the balance of In 2 O 3 , and the rare earth oxide is one or a mixture of two of Gd 2 O 3 、Y 2 O 3 . Gd 2 O 3 、Y 2 O 3 is precisely selected as a rare earth doping element, the ion radius of the rare earth doping element is close to that of In 3 +, the rare earth doping element is easy to enter IZO crystal lattice to form solid solution, and meanwhile, the rare earth doping element and the nano Al 2 O 3 -SnO 2 composite filler modified by plasma are matched to generate synergistic effect, wherein the rare earth element refines grains, inhibits defect diffusion, and the modified filler fills crystal boundary gaps and enhances interface binding force.

Inventors

  • TANG ZHIYONG
  • LIU HUIMING
  • ZHANG WEIFENG

Assignees

  • 株洲火炬安泰新材料有限公司

Dates

Publication Date
20260508
Application Date
20260129

Claims (10)

  1. 1. The rare earth modified IZO doped target is characterized by comprising, by mole, 10-35% of ZnO, 1-5% of rare earth oxide and the balance of In 2 O 3 , wherein the rare earth oxide is one or a mixture of two of Gd 2 O 3 、Y 2 O 3 .
  2. 2. The rare earth modified doped IZO target according to claim 1, wherein the mixed molar ratio of Gd 2 O 3 and Y 2 O 3 in the rare earth oxide is 1:1 to 3:1.
  3. 3. The rare earth modified doped IZO target according to claim 1, wherein said Y 2 O 3 is further subjected to a modification treatment.
  4. 4. The rare earth modified doped IZO target according to claim 3, wherein the specific improvement method is: S01, preheating Y 2 O 3 for 1h at 55-60 ℃ to obtain preheated Y 2 O 3 , and uniformly stirring preheated Y 2 O 3 in sodium citrate solution with the total amount of 5-8 times of that of Y 2 O 3 to obtain Y 2 O 3 solution; S02, adding an alumina agent which is 5-8 times of the total amount of Y 2 O 3 solution into the Y 2 O 3 solution, ball milling for 1-2 hours at a ball milling rotating speed of 1000-1500r/min, and performing suction filtration and drying after ball milling; the preparation method of the alumina agent comprises the following steps: S02a, uniformly blending 3-5 parts of aluminum oxide, 2-4 parts of nano magnesium oxide and 5-8 parts of sodium alginate solution to obtain nano aluminum oxide liquid; s02b, uniformly stirring a silane coupling agent KH560 and an ethanol water solution according to a weight ratio of 2:5 to obtain a silane solution, and fully mixing 3-5 parts of the silane solution, 2-4 parts of nano zirconia and 1-2 parts of lanthanum oxide to obtain a silane modified solution; And (3) stirring the silane modified liquid and the nano alumina liquid according to the weight ratio of (3-5) to 7, and carrying out suction filtration and drying after the stirring is finished to obtain the alumina agent.
  5. 5. The rare earth modified doped IZO target according to claim 4, wherein the mass fraction of the sodium alginate solution is 2-5%, and the mass fraction of the sodium citrate solution is 8-12%.
  6. 6. The rare earth modified doped IZO target according to claim 4, wherein the mass fraction of the aqueous ethanol solution is 75-85%.
  7. 7. The rare earth modified IZO doped target according to claim 4, wherein the stirring speed of the stirring treatment is 350-500r/min, stirring is carried out for 2 hours, and the stirring temperature is 55-60 ℃.
  8. 8. A method for preparing the rare earth modified doped IZO target according to any one of claims 1 to 7, comprising the steps of: Firstly, raw material pretreatment, namely drying each powder for 4-6 hours at 100-120 ℃, wherein the modified filler is subjected to plasma surface modification treatment at the treatment power of 80-120W for 15-30 min; Weighing the raw material powder according to the mole percentage of the chemical composition of claim 1, adding zirconia balls and absolute ethyl alcohol, wherein the ball-material ratio is 10:1-15:1, the mass ratio of the dispersing agent to the raw material powder is 1:1-2:1, and ball-milling for 8-12 hours at the rotating speed of 200-300 r/min to obtain mixed slurry; Step three, drying the slurry, namely evaporating and drying the mixed slurry at 60-80 ℃ and a vacuum degree of 0.06-0.08 MPa, and sieving the obtained dry powder with a 200-300 mesh sieve; step four, molding, namely filling the sieved mixed powder into a mold, and performing cold isostatic pressing molding under the conditions of the pressure of 150-200 MPa and the dwell time of 5-10 min to obtain a blank; and fifthly, sintering to obtain the rare earth modified doped IZO target.
  9. 9. The preparation method according to claim 8, wherein the green body is placed in an atmosphere sintering furnace in sintering, the green body is heated to 600-800 ℃ at 5-10 ℃ per minute under an air atmosphere, the temperature is kept for 2-3 hours, then the green body is switched to an oxygen atmosphere, the green body is heated to 1350-1500 ℃ at 3-5 ℃ per minute, the green body is kept for 4-8 hours, the green body is cooled to room temperature at 2-5 ℃ per minute, and the flow rate of the oxygen atmosphere is 0.5-2L per minute.
  10. 10. The preparation method of the transparent conductive film according to claim 8, wherein the target is used for preparing the transparent conductive film through a magnetron sputtering process, the magnetron sputtering process parameters are that the sputtering power is 100-200W, the sputtering air pressure is 0.3-0.8 Pa, the substrate temperature is 150-300 ℃, the argon-oxygen volume ratio is 8:1-12:1, and the sputtering time is 10-30 min.

Description

Rare earth modified IZO doped target material and preparation method and application thereof Technical Field The invention relates to the technical field of targets, in particular to a rare earth modified doped IZO target, and a preparation method and application thereof. Background Transparent Conductive Oxide (TCO) films are widely used in optoelectronic devices such as flat panel displays, solar cells, touch screens, light emitting diodes, and the like because of their excellent light transmittance and electrical conductivity. An Indium Zinc Oxide (IZO) target is taken as an important TCO target, consists of indium oxide (In 2O3) and zinc oxide (ZnO), and has the advantages of lower resource dependence, relatively controllable preparation cost, excellent low-temperature film forming performance and the like compared with the traditional Indium Tin Oxide (ITO) target, and is widely paid attention to In recent years. However, the conventional IZO target has many defects in practical application, such as poor high-temperature stability of the IZO film, easy occurrence of phenomena of grain growth, interface diffusion and the like in the subsequent heat treatment process of device preparation, and obvious reduction of light transmittance and conductivity of the film, and low compactness of the IZO target, easy occurrence of problems of particle splashing, target poisoning and the like in the magnetron sputtering film forming process, influence on the surface evenness and uniformity of the film, and further reduction of the performance and service life of the device. In order to solve the above problems, the industry often adopts a doping modification mode to optimize the performance of the IZO target material. The rare earth element has excellent optical, electrical and chemical stability due to unique electronic configuration, and is hopeful to improve the compactness and mechanical property of the target material and improve the high-temperature stability and photoelectric property of the prepared film by regulating and controlling the crystal structure, refining grains, inhibiting defect diffusion and other modes when being doped into an IZO system. However, the existing research on rare earth doped IZO targets still has the problems of low doping element selectivity, inaccurate doping proportion, low matching degree of preparation process parameters and the like, so that the modification effect is poor, and the application requirements of high-performance optoelectronic devices are difficult to meet. Disclosure of Invention Aiming at the defects of the prior art, the invention aims to provide a rare earth modified doped IZO target material, and a preparation method and application thereof, so as to solve the problems in the background art. The invention solves the technical problems by adopting the following technical scheme: The invention provides a rare earth modified doped IZO target, which comprises, by mole, 10-35% of ZnO, 1-5% of rare earth oxide, and the balance of In 2O3, wherein the rare earth oxide is one or a mixture of two of Gd 2O3、Y2O3. Preferably, the mixed molar ratio of Gd 2O3 and Y 2O3 in the rare earth oxide is 1:1-3:1. Preferably, the Y 2O3 is further subjected to an improvement treatment, and the specific improvement method is as follows: S01, preheating Y 2O3 for 1h at 55-60 ℃ to obtain preheated Y 2O3, and uniformly stirring preheated Y 2O3 in sodium citrate solution with the total amount of 5-8 times of that of Y 2O3 to obtain Y 2O3 solution; S02, adding an alumina agent which is 5-8 times of the total amount of Y 2O3 solution into the Y 2O3 solution, ball milling for 1-2 hours at a ball milling rotating speed of 1000-1500r/min, and performing suction filtration and drying after ball milling; the preparation method of the alumina agent comprises the following steps: S02a, uniformly blending 3-5 parts of aluminum oxide, 2-4 parts of nano magnesium oxide and 5-8 parts of sodium alginate solution to obtain nano aluminum oxide liquid; s02b, uniformly stirring a silane coupling agent KH560 and an ethanol water solution according to a weight ratio of 2:5 to obtain a silane solution, and fully mixing 3-5 parts of the silane solution, 2-4 parts of nano zirconia and 1-2 parts of lanthanum oxide to obtain a silane modified solution; And (3) stirring the silane modified liquid and the nano alumina liquid according to the weight ratio of (3-5) to 7, and carrying out suction filtration and drying after the stirring is finished to obtain the alumina agent. Preferably, the mass fraction of the sodium alginate solution is 2-5%, and the mass fraction of the sodium citrate solution is 8-12%. Preferably, the mass fraction of the ethanol aqueous solution is 75-85%. Preferably, the stirring speed of the stirring treatment is 350-500r/min, the stirring is carried out for 2 hours, and the stirring temperature is 55-60 ℃. The invention also provides a preparation method of the rare earth modified doped I