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CN-121991390-A - High-light-transmittance radiation refrigeration film and preparation method thereof

CN121991390ACN 121991390 ACN121991390 ACN 121991390ACN-121991390-A

Abstract

The invention discloses a preparation method of a high-light-transmittance radiation refrigeration film, which comprises the steps of mixing a transparent resin matrix with a diluted monomer solution, adding an ultraviolet absorbent, a surface auxiliary agent and a photoinitiator, preparing a coating liquid by ultrasonic dispersion, coating the coating liquid on the surface of a transparent polymer matrix, and curing by irradiation of 365nm ultraviolet light to form the radiation refrigeration film. The visible light transmittance of the film obtained by the invention is more than or equal to 92%, the ultraviolet blocking rate is more than or equal to 99%, the infrared emissivity in the air window wave band is more than or equal to 0.90, and the film can effectively realize cooling through radiation and heat dissipation. The surface of the film is hydrophobic, the contact angle of water is more than 90 degrees, and the film has potential self-cleaning maintenance capability. The invention has simple process, can be rapidly solidified at room temperature, is suitable for large-area continuous production, and has the advantages of low cost and high industrialization potential.

Inventors

  • TANG SHAOCHUN
  • PAN HAOYU
  • SHANG HUIHUA
  • LIN XIAO
  • Lin Zhangbu
  • HE JIAJUN

Assignees

  • 南京大学
  • 江苏宇狮薄膜科技有限公司

Dates

Publication Date
20260508
Application Date
20260303

Claims (10)

  1. 1. The preparation method of the high-light-transmittance radiation refrigeration film is characterized by comprising the following steps of: Uniformly mixing 40-60% of transparent resin matrix and 20-40% of diluted monomer solution according to mass fraction, sequentially adding 1-3% of ultraviolet absorbent, 1-3% of surface auxiliary agent and 3-5% of photoinitiator, and carrying out ultrasonic dispersion treatment to prepare uniformly dispersed coating liquid; step two, coating the coating liquid in the step one on the surface of a transparent polymer substrate to form a wet film; And thirdly, carrying out irradiation curing on the wet film in the second step by adopting ultraviolet light with the wavelength of 365nm to obtain the high-light-transmittance radiation refrigeration film.
  2. 2. The method of claim 1, wherein the transparent resin matrix is one or more selected from the group consisting of difunctional aliphatic urethane acrylates, cyclic phenol a epoxy acrylates.
  3. 3. The method according to claim 1, wherein the diluted monomer solution is one or more selected from isobornyl acrylate and methyl methacrylate.
  4. 4. The method of claim 1, wherein the ultraviolet absorber is one or more selected from the group consisting of UV1130, UV571, tinuvin 477.
  5. 5. The method of claim 1, wherein the surface aid is one or more selected from the group consisting of BYK-310, BYK-333, and BYK-3456.
  6. 6. The method of claim 1, wherein the photoinitiator is one or more selected from the group consisting of 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide, 2-hydroxy-2-methyl propiophenone, and 1-hydroxycyclohexyl phenyl ketone.
  7. 7. The method according to claim 3, wherein the diluted monomer solution is a mixed solution of isobornyl acrylate and methyl methacrylate in a mass ratio of 9:1.
  8. 8. The preparation method according to claim 7, wherein the photoinitiator is a mixture of 2-hydroxy-2-methyl propiophenone and 1-hydroxycyclohexyl phenyl ketone in a mass ratio of 8:1.
  9. 9. The method of claim 8, wherein the ultraviolet absorber is Tinuvin 477.
  10. 10. The high light transmittance radiation refrigeration film made by the method of any one of claims 1 to 9.

Description

High-light-transmittance radiation refrigeration film and preparation method thereof Technical Field The invention relates to the technical field of film material preparation, in particular to a high-light-transmittance radiation refrigeration film and a preparation method thereof. Background Existing radiant refrigerant materials generally rely on extremely high solar reflectance for efficient daytime refrigeration. However, the technical feature of high reflection inevitably leads to opacity of the material, which is in fundamental contradiction with the application requirements of scenes such as building glass, automobile sunroofs and the like on light transmittance. In recent years, the transmission type radiation refrigeration film tries to solve the problem, but the problems of difficult combination of light transmittance and refrigeration performance, complex preparation process, high production cost and the like often exist. The patent of the utility model with the application number 202322825631.4 discloses a transmission type radiation refrigeration film in the prior art, which comprises a self-cleaning layer, a base film, a metal layer, a refrigeration layer and an adhesive layer, wherein the transmittance of the transmission type radiation refrigeration film is more than 30 percent, the haze of the transmission type radiation refrigeration film is less than 2 percent, the scheme realizes certain light transmittance, but the visible light transmittance is still relatively low, and the technical difficulty is increased by the multilayer structure. Another chinese patent application number 202510042753.7 discloses a high-transmittance radiation refrigeration coating and a preparation method, which adopts a three-dimensional ordered pore structure to achieve higher light transmittance, but the preparation depends on a template method, and the mass productivity is poor. Therefore, development of a high-transmittance radiation refrigeration film which has high visible light transmittance, high atmospheric window infrared emissivity, simple preparation process and suitability for mass production is needed. Disclosure of Invention The embodiment of the application provides a high-light-transmittance radiation refrigeration film and a preparation method thereof, and aims to solve the problems that the light transmittance and the refrigeration performance of the existing radiation refrigeration material are difficult to be compatible, the preparation process is complex, the cost is high and the like. By adopting the ultraviolet curing technology, the functional coating is constructed by a transparent resin matrix, a diluent monomer, an ultraviolet absorber, a surface auxiliary agent and a photoinitiator according to a specific proportion, the infrared emissivity of an atmospheric window is high while the visible light transmittance is kept high, and the ultraviolet curing coating has excellent ultraviolet blocking and surface self-cleaning performances. The process can be rapidly cured at room temperature, is suitable for large-area continuous production, and has remarkable industrial application potential. The embodiment of the application provides a preparation method of a high-light-transmittance radiation refrigeration film, which comprises the following steps: Uniformly mixing 40-60% of transparent resin matrix and 20-40% of diluted monomer solution according to mass fraction, sequentially adding 1-3% of ultraviolet absorbent, 1-3% of surface auxiliary agent and 3-5% of photoinitiator, and carrying out ultrasonic dispersion treatment to prepare uniformly dispersed coating liquid; step two, coating the coating liquid in the step one on the surface of a transparent polymer substrate to form a wet film; And thirdly, carrying out irradiation curing on the wet film in the second step by adopting ultraviolet light with the wavelength of 365nm to obtain the high-light-transmittance radiation refrigeration film. Preferably, the transparent resin matrix is one or more selected from difunctional aliphatic polyurethane acrylate and cyclic phenol A epoxy acrylate. Preferably, the diluted monomer solution is one or more selected from isobornyl acrylate and methyl methacrylate. Preferably, the ultraviolet absorber is one or more selected from UV1130, UV571 and Tinuvin 477. Preferably, the surface auxiliary agent is one or more selected from BYK-310, BYK-333 and BYK-3456. Preferably, the photoinitiator is one or more selected from 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide, 2-hydroxy-2-methyl propiophenone and 1-hydroxycyclohexyl phenyl ketone. Preferably, the diluted monomer solution is a mixed solution of isobornyl acrylate and methyl methacrylate according to a mass ratio of 9:1. Preferably, the photoinitiator is a mixture of 2-hydroxy-2-methyl propiophenone and 1-hydroxycyclohexyl phenyl ketone in a mass ratio of 8:1. Preferably, the ultraviolet absorber is Tinuvin 477. The invention also provides the hig