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CN-121991595-A - Silica polishing solution for polishing quartz glass and preparation method thereof

CN121991595ACN 121991595 ACN121991595 ACN 121991595ACN-121991595-A

Abstract

The application discloses a silicon dioxide polishing solution for polishing quartz glass and a preparation method thereof. The silicon dioxide polishing solution comprises a nano silicon dioxide abrasive, water, a humectant, a PH regulator and a dispersing agent, wherein the mass ratio of the nano silicon dioxide abrasive to the water to the humectant is 30:45-60:10-25, and the humectant is one or more of polyacrylate, polyalkenol and polyvinylpyrrolidone. The preparation method comprises stirring silica abrasive, PH regulator, dispersant and water at room temperature, adding water bath ultrasound to obtain silica mother liquor, stirring humectant and water at 50-60deg.C to obtain humectant water solution, slowly adding silica mother liquor into humectant water solution, and stirring to room temperature. According to the technical scheme, a certain proportion of humectant is added into the silicon dioxide solution, so that the volatilization of moisture in the silicon dioxide solution is obviously weakened, the aggregation crystallization caused by the volatilization of the moisture is reduced, and the large-size polishing effect is improved.

Inventors

  • TANG LONG
  • CHEN WEI
  • ZHANG CHENG
  • XU GEN
  • LI XIN

Assignees

  • 湖南普照信息材料有限公司

Dates

Publication Date
20260508
Application Date
20251209

Claims (10)

  1. 1. The silica polishing solution for polishing quartz glass is characterized by comprising a nano silica abrasive, water, a humectant, a PH regulator and a dispersing agent, wherein the mass ratio of the nano silica abrasive to the water to the humectant is 30:45-60:10-25, and the humectant is one or more of polyacrylate, polyalkenol and polyvinylpyrrolidone.
  2. 2. The silica polishing solution according to claim 1, wherein the nano silica abrasive has a particle size of 80 to 200nm.
  3. 3. The silica polishing solution according to claim 1, wherein the polyacrylate is sodium polyacrylate, potassium polyacrylate or ammonium polyacrylate, and the polyacrylate has a molecular weight of 3000 to 10000.
  4. 4. The silica polishing solution according to claim 1, wherein the polyalcohol is polyvinyl alcohol or polypropylene alcohol, and the molecular weight of the polyalcohol is 400 to 2000.
  5. 5. The silica polishing solution according to claim 1, wherein the polyvinylpyrrolidone has a molecular weight of 10000 to 130000.
  6. 6. The silica polishing solution according to claim 1, wherein the PH adjuster is sodium hydroxide, and the PH adjuster is used to make ph=8 to 11 of the silica polishing solution.
  7. 7. The silica polishing solution according to claim 1, wherein the dispersant is fatty alcohol polyoxyethylene ether, the molecular weight of the dispersant is 500-1000, and the amount of the dispersant is 0.1% -2% of the mass fraction of the polishing solution.
  8. 8. The method for preparing a silica polishing liquid for quartz glass polishing according to any one of claims 1 to 7, comprising the steps of: Adding dispersing agent into pure water, stirring at room temperature, adding PH regulator to make the solution alkaline, adding nano silicon dioxide abrasive, and stirring at room temperature in water bath under ultrasonic condition to obtain silicon dioxide mother liquor; adding a humectant into pure water, heating to 50-60 ℃ and uniformly stirring to obtain a humectant aqueous solution; And stopping heating the humectant aqueous solution, keeping the stirring speed unchanged, adding the silicon dioxide mother solution, and stirring until the mixed solution is completely cooled to room temperature after the addition is finished, thus obtaining the silicon dioxide polishing solution.
  9. 9. The method for preparing a silica polishing slurry according to claim 8, wherein the stirring speeds are each 300rpm.
  10. 10. The method for producing a silica polishing slurry according to claim 8, wherein the rate of adding the silica mother liquor to the aqueous humectant solution is 。

Description

Silica polishing solution for polishing quartz glass and preparation method thereof Technical Field The application relates to the technical field of semiconductor glass substrate polishing, in particular to a silicon dioxide polishing solution for quartz glass polishing and a preparation method thereof. Background The nano silicon dioxide can be used for chemical mechanical polishing of quartz glass to obtain an ultra-smooth surface. However, for polishing of large-size quartz glass (diameter is larger than 1 m), the silicon dioxide polishing solution (silicon solution) is easy to agglomerate and crystallize and separate out because of large flow area of the polishing solution, high volatilization rate, large polishing contact area and rapid temperature rise, and scratches are generated on the surface of the quartz glass. The silicon dioxide and the quartz glass are the same materials, the Mohs hardness is 7, when silicon dioxide agglomerate crystallization occurs, the same materials are mutually opposite-ground, so that heavy scratches are easily generated on the surface of the quartz glass, and the polishing effect is poor. Disclosure of Invention The application aims to provide a silicon dioxide polishing solution for polishing quartz glass and a preparation method thereof, so as to improve the large-size polishing effect. In one aspect, the application provides a silica polishing solution for polishing quartz glass, which comprises a nano silica abrasive, water, a humectant, a PH regulator and a dispersing agent, wherein the mass ratio of the nano silica abrasive to the water to the humectant is 30:45-60:10-25, and the humectant is one or more of polyacrylate, polyalkenol and polyvinylpyrrolidone. Further, the particle size of the nano silicon dioxide abrasive is 80-200nm. Further, the polyacrylate is sodium polyacrylate, potassium polyacrylate or ammonium polyacrylate, and the polyacrylate has molecular weight of 3000-10000. Further, the polyalcohol is polyvinyl alcohol or polypropylene alcohol, and the molecular weight of the polyalcohol is 400-2000. Further, polyvinylpyrrolidone has a molecular weight of 10000-130000. Further, the PH adjuster is sodium hydroxide, and the PH adjuster is used for making the ph=8-11 of the silica polishing liquid. Further, the dispersing agent is fatty alcohol polyoxyethylene ether, the molecular weight of the dispersing agent is 500-1000, and the dosage of the dispersing agent is 0.1-2% of the mass fraction of the polishing solution. In another aspect, the present application also provides a method for preparing a silica polishing liquid for quartz glass polishing, comprising the steps of: Adding dispersing agent into pure water, stirring at room temperature, adding PH regulator to make the solution alkaline, adding nano silicon dioxide abrasive, and stirring at room temperature in water bath under ultrasonic condition to obtain silicon dioxide mother liquor; adding a humectant into pure water, heating to 50-60 ℃ and uniformly stirring to obtain a humectant aqueous solution; And stopping heating the humectant aqueous solution, keeping the stirring speed unchanged, adding the silicon dioxide mother solution, and stirring until the mixed solution is completely cooled to room temperature after the addition is finished, thus obtaining the silicon dioxide polishing solution. Further, the stirring speeds were each 300rpm. Further, the rate of adding the silica mother liquor to the aqueous humectant solution is。 According to the technical scheme, the humectant with larger specific gravity is added into the silica solution, so that the moisture volatilization in the silica solution is obviously weakened, the aggregation crystallization caused by the moisture volatilization is reduced, the silica polishing solution is used for polishing large-size quartz glass, the surface of the quartz glass is not scratched again, the surface roughness is good after polishing, and the large-size polishing effect is improved. In addition, the humectant adopted in the technical scheme of the application is mainly made of polymer materials, and compared with small molecular materials, the polymer materials of the humectant can more easily form cladding on the surface of the nano silicon dioxide abrasive, plays a certain steric hindrance effect, and is more beneficial to preventing agglomeration and crystallization caused by dehydration of the nano silicon dioxide abrasive during polishing of large-size quartz glass. In addition, the silicon dioxide polishing solution added with the humectant according to the corresponding mass ratio can not only realize the moisture retention in the polishing process and prevent the abrasive from agglomerating and crystallizing, but also not excessively weaken the cutting force of the silicon dioxide abrasive, so that the surface roughness of the polished workpiece can meet the corresponding polishing processing requirement while the surface of the polished wor