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CN-121992196-A - Desilication agent and application thereof in alkaline vanadium-containing leaching solution

CN121992196ACN 121992196 ACN121992196 ACN 121992196ACN-121992196-A

Abstract

The application discloses a desilication agent and application thereof in alkaline vanadium-containing leaching solution, the desilication agent is obtained by taking aluminum-containing desilication slag as a raw material, putting the raw material into an NaOH solution, continuously stirring, filtering, collecting solids, drying and grinding to obtain the desilication agent, wherein the pH value of the NaOH solution is 8.0-10.0, the NaOH solution also contains cationic polyacrylamide, the concentration of the cationic polyacrylamide is 0.1-0.3 mg/ml, the temperature during stirring is 80-95 ℃, and the stirring is kept at the temperature for 60-120 min. The alkaline vanadium-containing leaching solution obtained by a sodium roasting-water leaching process of a vanadium-containing raw material (vanadium slag and the like) is used as a raw material, aluminum salt (aluminum sulfate, sodium metaaluminate and the like) is used as a impurity removing agent, precipitate sodium aluminosilicate hydrate is added, and the precipitate sodium aluminosilicate hydrate is treated to obtain the sodium aluminosilicate porous material which is used as a silicon removing agent and also used as a precipitate floccule, and silicon impurities in the solution are removed under the weak alkaline condition.

Inventors

  • Li Hongai
  • JIANG LIN
  • DIAO JIANG
  • WU ZHENXIU
  • WANG ZHONGTING
  • TAN SHUANGSHUANG

Assignees

  • 重庆大学

Dates

Publication Date
20260508
Application Date
20260330

Claims (10)

  1. 1. A silicon remover, characterized in that the silicon remover is obtained by the following steps: taking aluminum-containing silicon-removing slag as a raw material, adding the aluminum-containing silicon-removing slag into a NaOH solution, continuously stirring, filtering, collecting solids, drying and grinding to obtain the silicon-removing agent; The pH value of the NaOH solution is 8.0-10.0, the NaOH solution also contains cationic polyacrylamide, the concentration of the cationic polyacrylamide is 0.1-0.3 mg/ml, the temperature during stirring is 80-95 ℃, and the stirring is kept at the temperature for 60-120 min.
  2. 2. The silicon remover according to claim 1, wherein the drying temperature is 100-120 ℃.
  3. 3. The silicon remover according to claim 1, wherein the particle size of the ground solid is less than or equal to 0.125 μm.
  4. 4. The silicon remover according to claim 1, wherein the aluminum-containing silicon-removing slag is obtained by the steps of: Taking alkaline vanadium-containing leaching solution as a raw material, adding aluminum salt, and collecting precipitate to obtain aluminum-containing silicon-removing slag; The alkaline vanadium-containing leaching solution contains Si element, and the addition amount of the aluminum salt is calculated according to the mole ratio of the Al element to the Si element of (0.05-0.1): 1.
  5. 5. The desilication agent of claim 4, wherein the alkaline vanadium-containing leachate is derived from a sodium roasting-water leaching process of a vanadium-containing feedstock.
  6. 6. Use of the silicon remover according to any of claims 1-5 for removing Si element from vanadium-containing leaching solutions.
  7. 7. The use according to claim 6, characterized by the specific steps of: step1, adding a silicon removing agent into an alkaline vanadium-containing solution, and continuously stirring to enable the silicon removing agent to be fully dispersed in the solution; wherein, 0.5-1.0 g of silicon removing agent is added into every 100mL alkaline vanadium-containing solution; Step 2, adding aluminum salt into the mixture obtained in the step 1, and adjusting the pH value of the solution after the aluminum salt is dissolved; The alkaline vanadium-containing leaching solution contains Si element, the addition amount of the aluminum salt is calculated according to the molar ratio of the Al element to the Si element of (0.05-0.1): 1, and the pH value is adjusted to 8.0-10.5; Step 3, heating the mixture obtained in the step 2 to 50-90 ℃, continuously stirring and reacting for 15-60 min; and 4, standing and filtering the product obtained after the reaction in the step 3 to obtain a purified vanadium liquid and aluminum-containing silicon-removing slag, wherein the purified vanadium liquid is used for preparing vanadium-containing products, and the aluminum-containing silicon-removing slag is used for preparing the silicon-removing agent.
  8. 8. The method according to claim 7, wherein in the step 1, the stirring speed is 350-500 r/min.
  9. 9. The use according to claim 7, wherein in step 2, the pH adjustment is performed with H 2 SO 4 or NaOH, and the stirring speed is 150-250 r/min.
  10. 10. The use according to claim 7, wherein in step 4, the mixture is left for 4 to 24 hours.

Description

Desilication agent and application thereof in alkaline vanadium-containing leaching solution Technical Field The application relates to the technical field of wet metallurgy of vanadium, in particular to a silicon removing agent and application thereof in alkaline vanadium-containing leaching solution. Background With the revolution of new energy and the rapid development of high-end manufacturing industry in recent years, the application proportion of vanadium in high-end fields such as energy storage batteries, special alloys, medical catalysis and the like is increased year by year, and higher demands are put forward on the product purity of vanadium oxide. For example, the electrolyte of the vanadium redox flow battery generally requires that the purity of V 2O5 is more than 99.9%, and the impurity silicon can cause the reduction of electrochemical activity and the acceleration of battery capacity attenuation, and in the medical field, when the vanadium compound is used as an insulin analogue, trace silicon elements can possibly cause biotoxic reaction. In addition, in aerospace applications, silicon impurities can also severely affect the high temperature creep resistance of the material. Therefore, the impurity silicon is deeply removed from the source of the leaching solution containing vanadium, the quality of vanadium oxide products is improved, and the method has important strategic significance for promoting the vanadium industry to climb to a high-end value chain. At present, methods for removing Si (IV) from vanadium-containing leaching solution mainly comprise a chemical precipitation method, a solvent extraction method, an ion exchange method, an adsorption method and the like. The solvent extraction method has the inherent defects of limited adsorption capacity, poor suitability for a high-concentration silicon-containing alkaline system, frequent regeneration of resin/adsorbent, high regeneration cost and incapability of realizing continuous industrial production, and is only suitable for deep refining of low-concentration vanadium liquid. Therefore, the chemical precipitation method with simple process flow, large treatment capacity and controllable desilication cost becomes the main technical route of desilication of the vanadium-containing leaching liquid in the current industry, wherein the magnesium salt precipitation method and the aluminum salt precipitation method are most widely applied. Patent CN101709376B discloses a method for purifying alkaline vanadium leaching solution, which adopts magnesium nitrate to purify alkaline vanadium leaching solution to obtain purified clear solution, and uses ammonium salt to precipitate vanadium in the purified clear solution to obtain vanadium product and vanadium precipitation wastewater, and the wastewater is partially returned to leaching step. However, in order to realize the deep removal of silicon, excessive magnesium nitrate is required to be added, which directly increases the cost of original auxiliary materials, and excessive nitrate ions can continuously accumulate in a leaching solution system, so that production equipment can be corroded, total nitrogen in discharged wastewater can be seriously exceeded, the cost of harmless treatment of wastewater and environmental-friendly control pressure are greatly increased, magnesium nitrate desilication relies on adsorption coprecipitation of magnesium hydroxide colloid on silicate, the magnesium hydroxide colloid can be greatly wrapped with vanadate ions while adsorbing silicon, direct loss of vanadium is caused, the total recovery rate of vanadium is reduced, and the continuous enrichment of nitrate in a system can influence the crystallization efficiency of the subsequent vanadium precipitation process, so that uneven granularity and reduced purity of vanadium products are easily caused. Patent CN117004834B discloses a preparation method and application of a silicon-removing agent for vanadium liquid, wherein the silicon-removing agent containing Mg 2+ is prepared in the vanadium liquid without silicon through electrolysis of Mg sheets, the pH value is adjusted by adding solid HVO 3、Na3VO4、NaVO3, the silicon-removing agent can react with the vanadium liquid containing silicon to form Mg x(SiO3)y, and then the silicon-removing agent is removed after heating and precipitation, so that the silicon-removing effect is achieved. The method has the advantages that the method needs a special electrolysis reaction device, has high requirements on corrosion resistance, tightness and power supply control system of equipment, is long in process flow, is complicated in operation and control, has much higher energy consumption in equipment investment and operation than the conventional precipitation process, cannot adapt to large-scale industrialized continuous production, and is difficult to realize deep removal of silicon due to the fact that a plurality of vanadium-containing solid compounds are ad