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CN-121992356-A - PVD deposition method and device on square substrate

CN121992356ACN 121992356 ACN121992356 ACN 121992356ACN-121992356-A

Abstract

The invention relates to a PVD deposition method and device on a square substrate, which comprises the following steps of S1, inputting the size of the substrate and installing a counterweight, S2, calculating the size of a magnet, setting the rotation speed ratio, performing PVD deposition, S3, adjusting the self-rotation speed and the main rotation speed of the magnet, dynamically controlling the deposition process, S4, stopping each driving unit and taking out the substrate after the deposition is completed. The invention has the beneficial effects of improving the utilization rate of the target material and the deposition uniformity.

Inventors

  • YANG MEIGAO
  • FAN HAO

Assignees

  • 长沙华屹半导体有限公司

Dates

Publication Date
20260508
Application Date
20251231

Claims (9)

  1. 1. A method of PVD deposition on a square substrate comprising the steps of: s1, inputting the size of a substrate and installing a counterweight; S2, calculating the size of the magnet, setting the rotation speed ratio, and performing PVD deposition; S3, adjusting the self-rotation speed and the main rotation speed of the magnet, and dynamically controlling the deposition process; And S4, after the deposition is completed, stopping each driving unit and taking out the substrate.
  2. 2. The PVD deposition method on a square substrate according to claim 1, wherein in S1, the mass and position of the counterweight are determined by center of gravity calculation, expressed as follows: In the above-mentioned method, the step of, For the mass of the magnet(s), For the distance of the magnet from the central axis, Is the mass of the counterweight, and is the weight of the counterweight, Is the distance of the counterweight from the central axis.
  3. 3. The PVD deposition method on a square substrate according to claim 1, wherein in S2, the magnet size of the magnet is calculated according to the substrate size and shape as follows: In the above-mentioned method, the step of, As a parameter of the dimensions of the magnet, The coefficients associated with the substrate size and deposition requirements, Is the radius of rotation.
  4. 4. The PVD deposition method of claim 1 wherein in S2, the ratio of the main rotation speed to the self rotation speed is set to be 3:4 and the rotation directions are opposite.
  5. 5. The PVD deposition method on a square substrate according to claim 1, wherein S3 comprises the steps of: s301, detecting deposition thickness of each point of a substrate area; S302, comparing the detected deposition thickness with a preset uniform thickness, calculating thickness deviation of each region, and adjusting the self-rotation and main rotation speed of the magnet according to the deviation.
  6. 6. PVD deposition device on a square substrate, suitable for use in a PVD deposition method on a square substrate according to any of claims 1-5, comprising: a center fixed structure for providing a stable center support point; the rotating arm is used for supporting the magnet and driving the magnet to rotate and is connected with the center fixing structure through a bearing; The magnet is used for rotating to generate a magnetic field in the target area and is connected with the rotating arm through the rotatable connecting structure; The balance weight is used for balancing the gravity center and is arranged at the symmetrical position of the rotating arm; a target material, which is used as a source of deposition material and is arranged opposite to the magnet; the magnet self-rotation driving unit is used for driving the magnet to perform self-rotation and is connected with the magnet; a main rotation driving unit for driving the rotating arm to rotate around the central shaft; and the control module is used for controlling and adjusting the whole device and is connected with the magnet self-rotation driving unit and the main rotation driving unit.
  7. 7. The PVD deposition apparatus on a square substrate of claim 6 wherein the magnets are triangular in configuration and comprise permanent magnet material.
  8. 8. The PVD deposition apparatus on a square substrate according to claim 6, wherein the rotary arm comprises a main rotary arm, an electric telescopic rod, and an extendable portion, the main rotary arm is made of a lightweight high-strength material, and the extendable portion is length-adjusted by the electric telescopic rod.
  9. 9. The PVD deposition apparatus on a square substrate according to claim 6, wherein the magnet self-rotation driving unit comprises a gear, a transmission mechanism and a motor unit, the gear and the transmission mechanism being used for transmitting rotation of the spindle to the magnet, and the motor unit being used for controlling the self-rotation speed of the magnet, and communicating with the control module through a wire.

Description

PVD deposition method and device on square substrate Technical Field The invention relates to the technical field of PVD (physical vapor deposition), in particular to a PVD deposition method and device on a square substrate. Background Physical vapor deposition (PVD, physical Vapor Deposition) is a technique in which materials are vaporized into an atomic, molecular or ionic state by a physical process and then deposited on a substrate surface to form a thin film. For some application scenarios requiring extremely high film uniformity, such as high-end semiconductor chip manufacturing, uneven film may affect the performance and reliability of the chip. In the prior art, certain non-uniformity exists in PVD deposition on a square substrate during etching, and the problem of serious material waste also exists in PVD deposition, so that the target utilization rate and the deposition uniformity need to be improved. Disclosure of Invention Aiming at the defects of the prior art, the application provides a PVD deposition method and device on a square substrate, which can improve the utilization rate of a target material and deposition uniformity. The following is a technical scheme of the invention, a PVD deposition method on a square substrate, comprising the following steps: s1, inputting the size of a substrate and installing a counterweight; S2, calculating the size of the magnet, setting the rotation speed ratio, and performing PVD deposition; S3, adjusting the self-rotation speed and the main rotation speed of the magnet, and dynamically controlling the deposition process; And S4, after the deposition is completed, stopping each driving unit and taking out the substrate. In S1, as a preferable aspect of the present invention, the mass and the position of the counterweight are determined by center of gravity calculation, and the expression is as follows: In the above-mentioned method, the step of, For the mass of the magnet(s),For the distance of the magnet from the central axis,Is the mass of the counterweight, and is the weight of the counterweight,Is the distance of the counterweight from the central axis. As a preferred embodiment of the present invention, in S2, the magnet size of the magnet is calculated according to the substrate size and shape, expressed as follows: In the above-mentioned method, the step of, As a parameter of the dimensions of the magnet,The coefficients associated with the substrate size and deposition requirements,Is the radius of rotation. In a preferred embodiment of the present invention, in S2, a ratio of the main rotation speed to the self rotation speed is set to 3:4, and the rotation directions are opposite. As a preferred embodiment of the present invention, S3 comprises the steps of: s301, detecting deposition thickness of each point of a substrate area; S302, comparing the detected deposition thickness with a preset uniform thickness, calculating thickness deviation of each region, and adjusting the self-rotation and main rotation speed of the magnet according to the deviation. A PVD deposition apparatus on a square substrate comprising: a center fixed structure for providing a stable center support point; the rotating arm is used for supporting the magnet and driving the magnet to rotate and is connected with the center fixing structure through a bearing; The magnet is used for rotating to generate a magnetic field in the target area and is connected with the rotating arm through the rotatable connecting structure; The balance weight is used for balancing the gravity center and is arranged at the symmetrical position of the rotating arm; a target material, which is used as a source of deposition material and is arranged opposite to the magnet; the magnet self-rotation driving unit is used for driving the magnet to perform self-rotation and is connected with the magnet; a main rotation driving unit for driving the rotating arm to rotate around the central shaft; and the control module is used for controlling and adjusting the whole device and is connected with the magnet self-rotation driving unit and the main rotation driving unit. As a preferable scheme of the invention, the magnet is of a triangular structure and is made of permanent magnet materials. The invention is characterized in that the rotating arm comprises a main rotating arm, an electric telescopic rod and an extensible part, wherein the main rotating arm is made of light high-strength materials, and the length of the extensible part is adjusted through the electric telescopic rod. As a preferred scheme of the invention, the magnet self-rotation driving unit comprises a gear, a transmission mechanism and a motor unit, wherein the gear and the transmission mechanism are used for transmitting the rotation of the main shaft to the magnet, and the motor unit is used for controlling the self-rotation speed of the magnet and is communicated with the control module through an electric wire. The invention has the a