CN-121994068-A - Temperature control system, temperature control method and wet treatment equipment for process liquid

Abstract

The application provides a temperature control system, a temperature control method and semiconductor wet processing equipment for process liquid. The temperature control system comprises a constant temperature water unit, a first temperature control unit and a second temperature control unit, wherein a flow path of the process liquid sequentially flows through the first temperature control unit and the second temperature control unit, and a water outlet of the constant temperature water unit is connected with inlets of heat exchange channels of the two temperature control units in parallel so as to realize two-stage temperature regulation of the process liquid. The technical scheme of the application mainly realizes coarse adjustment and fine adjustment control on the temperature of the process liquid through a two-stage temperature control architecture with the process liquid connected in series and the constant temperature water connected in parallel, and can ensure the accuracy and stability of the temperature of the process liquid in the wet process. And the temperature control operation is continuously carried out, and the normal temperature control operation does not occupy extra process takt time, so that the operation efficiency of wet treatment is not affected.

Inventors

• LIANG BINGBING
• MA JIE
• ZHOU JIAHUA
• YU CHEN

Assignees

• 宁波润华全芯微电子设备有限公司

Dates

Publication Date

20260508

Application Date

20251229

Claims (18)

1. 1. A temperature control system for a process liquid, comprising: a constant temperature water unit for providing constant temperature water having a preset temperature; a first temperature control unit having a first fluid passage for passing a process liquid and a first heat exchange passage for passing constant temperature water; a second temperature control unit having a second fluid passage for passing a process liquid and a second heat exchange passage for passing constant temperature water; Wherein the flow path of the process liquid is arranged to flow through a first fluid channel of the first temperature control unit and a second fluid channel of the second temperature control unit in sequence; And the water outlet of the constant temperature water unit is connected in parallel with the inlet of the first heat exchange channel of the first temperature control unit and the inlet of the second heat exchange channel of the second temperature control unit, so that the constant temperature water provided by the constant temperature water unit is respectively supplied to the first temperature control unit and the second temperature control unit.
2. 2. The temperature control system of process liquid according to claim 1, further comprising a flow control device disposed between the water outlet of the constant temperature water unit and the inlet of the first heat exchange channel and the inlet of the second heat exchange channel for adjusting the flow rate of constant temperature water flowing into the first heat exchange channel and the second heat exchange channel.
3. 3. The temperature control system of process liquid according to claim 2, wherein the flow control means is a flow distribution valve for adjusting a flow ratio of the constant temperature water flowing from the constant temperature water unit into the first heat exchange passage and the second heat exchange passage.
4. 4. The temperature control system of process liquid according to claim 2, wherein said flow control means is constituted by a first control valve and a second control valve provided on the lines leading to said first heat exchange channel and second heat exchange channel, respectively, for independently controlling the flow of thermostatic water flowing into both heat exchange channels.
5. 5. The temperature control system for a process liquid of claim 2, further comprising: A temperature sensor arranged at the outlet of the process liquid of the second temperature control unit for detecting the final temperature of the process liquid, and A feedback control loop including a controller electrically connected to the temperature sensor and the flow control device; wherein the controller adjusts the flow control device to vary the flow of the constant temperature water flowing into the first heat exchange channel and/or the second heat exchange channel based on the deviation of the final temperature from the target temperature.
6. 6. The process liquid temperature control system of claim 5, further comprising an incoming material temperature sensor disposed at the process liquid inlet of the first temperature control unit for detecting a temperature of the incoming material process liquid; The controller is also electrically connected with the incoming material temperature sensor, and performs feedforward control based on the temperature of the incoming material process liquid so as to pre-adjust the flow control device.
7. 7. The temperature control system of process liquid of claim 5, wherein the feedback control loop further comprises a first flow meter and a second flow meter disposed downstream of the flow control device, the first flow meter and the second flow meter being configured to monitor the flow of constant temperature water into the first heat exchange channel and the second heat exchange channel, respectively, and to feed back a flow signal to the controller.
8. 8. The temperature control system of claim 1, wherein the heat exchange efficiency of the first temperature control unit is higher than the heat exchange efficiency of the second temperature control unit such that the first temperature control unit performs a primary temperature adjustment of the process liquid and the second temperature control unit performs a fine temperature adjustment and heat preservation of the process liquid.
9. 9. The temperature control system of a process liquid according to claim 8, wherein a design flow rate of the constant temperature water flowing into the first heat exchange passage is higher than a design flow rate of the constant temperature water flowing into the second heat exchange passage, or, The first fluid passage and the first heat exchange passage of the first temperature control unit are configured in a countercurrent heat exchange structure, or, The second temperature control unit is a water bath constant temperature pipeline.
10. 10. The temperature control system of a process liquid according to claim 1, wherein a preset temperature of the constant temperature water provided by the constant temperature water unit is maintained constant during the temperature control.
11. 11. The temperature control method of the process liquid is characterized by comprising the following steps of: Providing constant temperature water with preset temperature by a constant temperature water unit; Dividing constant-temperature water flowing out of the constant-temperature water unit into a first constant-temperature water branch and a second constant-temperature water branch; Flowing a process liquid through a first temperature control unit, and simultaneously flowing constant temperature water of the first constant temperature water branch through the first temperature control unit so as to perform first-stage temperature regulation on the process liquid; And enabling the process liquid subjected to the first-stage temperature regulation to flow through a second temperature control unit, and enabling the hot water of the second constant-temperature water branch to flow through the second temperature control unit at the same time so as to carry out second-stage temperature regulation on the process liquid.
12. 12. The method of claim 11, further comprising adjusting the flow rates of the first and second constant temperature water legs to control the heat exchange amounts of the first and second stage thermostats, respectively.
13. 13. The method of controlling the temperature of a process liquid of claim 12, further comprising: Detecting the final temperature of the process liquid after the second stage temperature adjustment, and And based on the deviation of the final temperature and the target temperature, feeding back and adjusting the flow of the first constant-temperature water branch and the second constant-temperature water branch.
14. 14. A method for controlling the temperature of a process liquid according to claim 13, wherein the step of feedback regulation comprises increasing the flow rate of the second thermostatic water branch when the final temperature is lower than the target temperature and/or decreasing the flow rate of the second thermostatic water branch when the final temperature is higher than the target temperature.
15. 15. The method of controlling the temperature of a process liquid of claim 14, further comprising: detecting the temperature of the incoming material of the process liquid before the process liquid flows through the first temperature control unit, and And based on the temperature difference between the incoming material temperature and the target temperature, feedforward adjusting the initial set value of the flow ratio of the first constant-temperature water branch and the second constant-temperature water branch.
16. 16. The method of claim 11, wherein the first stage temperature adjustment performs a primary temperature adjustment of the process liquid to adjust the temperature of the process liquid to within a preset range of a target temperature, and wherein the second stage temperature adjustment performs a fine temperature adjustment and incubation of the process liquid to precisely control the temperature of the process liquid at the target temperature.
17. 17. The method of controlling the temperature of a process liquid according to claim 11, wherein the step of providing constant temperature water having a preset temperature includes maintaining the preset temperature constant throughout the execution of the method.
18. 18. A semiconductor wet processing apparatus comprising a temperature control system for a process liquid according to any one of claims 1 to 10.

Description

Temperature control system, temperature control method and wet treatment equipment for process liquid Technical Field The invention relates to the technical field of semiconductor manufacturing equipment, in particular to a temperature control system, a temperature control method and semiconductor wet processing equipment for process liquid. Background With the development of the semiconductor industry in China, the process level of each large chip manufacturer is also increasing. In order to adapt to continuously updated process nodes, the requirement of increased productivity is not increased, and the control of the semiconductor wet process on each process parameter is gradually transited to the direction of high precision and high stability. The accurate control of the temperature of the process liquid is one of the main attack directions for solving the problems of narrow process window, difficult yield improvement and the like in the industry at present. Semiconductor wet processes, such as photoresist development, high precision wet etching, and the like, are extremely sensitive to the temperature of the process liquid. The tiny fluctuation of the temperature of the process liquid can cause the change of the chemical reaction rate of the surface of the substrate, thereby directly affecting the development rate or etching rate and finally affecting the yield and performance of the chip. Existing process liquid temperature control schemes typically employ a single stage temperature regulation approach. Generally, in order to ensure the temperature control response, a section of water bath constant temperature pipeline is arranged on a pipeline close to a process point. When the method is used for coping with large temperature difference or flow fluctuation of incoming liquid, high-precision temperature control is difficult to realize, and the problems of slow response, easy overshoot and poor stability exist. If the temperature of the incoming process liquid fluctuates too much, not only will the final temperature not be exactly stabilized at the set point, but also deviations in the process results of the entire batch of wafers may result, and more serious failures may be caused by process window drift. Disclosure of Invention In order to solve the problems of limited temperature control precision and poor stability in the prior art liquid temperature control scheme, the application provides a temperature control system, a temperature control method and semiconductor wet processing equipment for process liquid. The technical scheme of the invention provides a temperature control system of process liquid, which comprises a constant temperature water unit, a first temperature control unit and a second temperature control unit, wherein a flow path of the process liquid is arranged to sequentially and serially flow through the first temperature control unit and the second temperature control unit, and a water outlet of the constant temperature water unit is connected with inlets of heat exchange channels of the first temperature control unit and the second temperature control unit in parallel so that the constant temperature water is respectively supplied to the two temperature control units. Preferably, the constant-temperature water heater further comprises a flow control device which is arranged between the water outlet of the constant-non-rotatable unit and the inlets of the first heat exchange channel and the second heat exchange channel and is used for adjusting the flow of constant-temperature water flowing into the first heat exchange channel and the second heat exchange channel. Preferably, the flow control device is a flow distribution valve. Preferably, the flow control means is constituted by a first control valve and a second control valve provided on the lines leading to the first heat exchange channel and the second heat exchange channel, respectively. Preferably, the system further comprises a temperature sensor arranged at the process liquid outlet of the second temperature control unit, and a feedback control loop, wherein the controller adjusts the flow control device based on the deviation of the final temperature and the target temperature. Preferably, the feed-forward control system further comprises an incoming material temperature sensor, wherein the incoming material temperature sensor is arranged at the process liquid inlet of the first temperature control unit, and the controller is further electrically connected with the incoming material temperature sensor and performs feed-forward control based on the temperature of the incoming material process liquid. Preferably, the feedback control loop further comprises a first flow meter and a second flow meter arranged downstream of the flow control device. Preferably, the heat exchange efficiency of the first temperature control unit is higher than the heat exchange efficiency of the second temperature control unit. Preferably, the de