CN-121994419-A - Method and device for detecting air tightness of gas distribution plate, equipment and medium

CN121994419ACN 121994419 ACN121994419 ACN 121994419ACN-121994419-A

Abstract

The invention relates to a gas tightness detection method, a device, equipment and a medium of a gas distribution plate, which relate to the technical field of gas tightness detection and comprise the steps of obtaining the use condition of the gas distribution plate for vapor deposition; setting a gas tightness detection parameter according to the use condition, carrying out first gas tightness detection on the gas distribution plate for vapor deposition according to the gas tightness detection parameter, using the gas distribution plate for vapor deposition to a preset time under the use condition if the first gas tightness detection is qualified, carrying out second gas tightness detection on the gas distribution plate for vapor deposition according to the gas tightness detection parameter, and marking the second gas tightness detection as qualified if the second gas tightness detection is qualified. According to the air tightness detection method provided by the invention, the air tightness of the gas distribution plate is effectively detected by optimizing the air tightness detection process, the condition of pseudo qualification in the detection process can be obviously avoided, and the use stability of the gas distribution plate is obviously improved.

Inventors

YAO LIJUN
YU HANGKE

Assignees

宁波江丰芯创科技有限公司
宁波江丰电子材料股份有限公司

Dates

Publication Date: 20260508
Application Date: 20260227

Claims (10)

1. A gas tightness detection method of a gas distribution plate, the gas tightness detection method comprising: Acquiring the use condition of a gas distribution plate for vapor deposition; Setting an air tightness detection parameter according to the use condition; Performing first tightness detection on the gas distribution plate for vapor deposition according to the tightness detection parameters; if the first tightness detection is qualified, using a gas distribution plate for vapor deposition to a preset time under the use condition; And then, carrying out second air tightness detection on the gas distribution plate for vapor deposition according to the air tightness detection parameters, and if the second air tightness detection is qualified, marking the second air tightness detection as qualified.
2. The method of claim 1, wherein the operating conditions include a chamber temperature, a chamber pressure, a feed gas pressure, and a feed gas flow rate.
3. The method of claim 2, wherein the air tightness detection parameters include ambient temperature, ambient pressure, inflation pressure, and inflation flow; preferably, the setting of the tightness detection parameter according to the use condition comprises setting the ambient temperature to be 1-1.2 times of the chamber temperature, setting the ambient pressure to be 1-1.2 times of the chamber pressure, setting the inflation pressure to be 1-1.2 times of the feeding gas pressure, and setting the feeding gas flow to be 1-1.2 times of the feeding gas flow.
4. The method of claim 1, wherein the first tightness test comprises flushing helium gas into the sealed vapor deposition gas distribution plate at an inflation pressure and an inflation flow at an ambient temperature and an ambient pressure and maintaining the first pressure for a first time; preferably, the first pressure is 1.4-1.6 times the inflation pressure; preferably, the first time is 3-5 times the reaction time.
5. The method of claim 1, wherein the first airtight test is judged to be acceptable if the leak rate is less than 1 x 10 -9 Pa·m 3 /s, and is judged to be unacceptable if the leak rate is not acceptable.
6. The method of claim 1, wherein the predetermined time is an expected continuous operation time of the gas distribution plate for vapor deposition.
7. The method of claim 1, wherein the second tightness test comprises flushing helium gas into the sealed vapor deposition gas distribution plate at an inflation pressure and an inflation flow at an ambient temperature and an ambient pressure and maintaining the helium gas at a second pressure for a second time; preferably, the second pressure is 2-2.5 times the inflation pressure; Preferably, the second time is 10-20 times the reaction time; Preferably, the second tightness test is rated as pass if the leak rate is <1×10 -9 Pa·m 3 /s, and is not rated as pass if the leak rate is not equal to 1×10 -9 Pa·m 3 /s.
8. An air tightness detection device of a gas distribution plate, characterized in that the air tightness detection device comprises: the acquisition module is used for acquiring the use condition of the gas distribution plate for vapor deposition; the setting module is used for setting the air tightness detection parameter according to the use condition; The first detection module is used for carrying out first tightness detection on the gas distribution plate for vapor deposition according to the tightness detection parameters; the use module is used for using a gas distribution plate for vapor deposition to a preset time under the use condition when the first tightness detection is qualified; and the second detection module is used for carrying out second air tightness detection on the gas distribution plate for vapor deposition according to the air tightness detection parameters.
9. An electronic device, the electronic device comprising: and a memory communicatively coupled to the at least one processor; wherein the memory stores a computer program executable by the at least one processor to enable the at least one processor to perform the gas tightness detection method of the gas distribution plate of any of claims 1-7.
10. A computer storage medium having stored therein computer executable instructions which when executed by a processor implement the gas tightness detection method of a gas distribution plate according to any of claims 1-7.

Description

Method and device for detecting air tightness of gas distribution plate, equipment and medium Technical Field The invention relates to the technical field of air tightness detection, in particular to an air tightness detection method and device, equipment and medium of a gas distribution plate, and especially relates to an air tightness detection method and device, equipment and medium for a vapor deposition gas distribution plate. Background The gas distribution plate is a key component in the semiconductor and film preparation process, and is mainly used for uniformly distributing reaction gas in the reaction cavity so as to ensure uniformity and consistency of deposited films. Through the precisely designed air holes or channels, the reaction gas is uniformly guided into the surface of the substrate, so that the local concentration is prevented from being too high or too low. The vapor deposition device comprises a reaction cavity, a radio frequency device and a gas distribution plate which are arranged in the reaction cavity, a heater which is arranged opposite to the gas distribution plate and used for placing and heating a wafer which is deposited with a film by utilizing plasma, a horizontal adjusting plate which is arranged below the heater and fixedly connected with the heater, and an automatic height adjusting mechanism which is arranged below the horizontal adjusting plate and used for adjusting the distance between the gas distribution plate and the heater according to the thickness of the film deposited by the wafer. CN113584465A discloses a chemical vapor deposition device, which belongs to the technical field of semiconductors. The chemical vapor deposition equipment comprises a reaction cavity, a gas supply assembly, a gas distribution plate and a gas control assembly. The reaction cavity is provided with a plurality of bearing tables for bearing wafers. And a gas supply assembly for supplying a reaction gas. The gas distribution plate is a plurality of and is arranged in one-to-one correspondence with the bearing tables. The gas control assemblies are multiple in number and are arranged in one-to-one correspondence with the multiple gas distribution plates. The gas distribution plate is connected with the gas supply assembly through the corresponding gas control assembly. At present, the gas distribution plate needs to carry out gas tightness detection when in use, so that the gas fed in the use process can be strictly distributed along the design of the gas distribution plate, unstable gas flow is avoided, however, the gas tightness detection is usually carried out in a normal temperature and normal pressure environment by adopting a blowing method or a suction gun method at present, the gas tightness detection is obviously separated from the use condition of the gas distribution plate, and the condition that the gas tightness of the gas distribution plate is unqualified when in use is caused although the gas tightness detection is passed, so that the coating result is unqualified. Disclosure of Invention In view of the problems in the prior art, the invention aims to provide a method, a device, equipment and a medium for detecting the air tightness of a gas distribution plate, so as to solve the defect that the service performance of a film layer obtained by film coating is poor due to the fact that the existing gas distribution plate is subjected to air tightness detection. To achieve the purpose, the invention adopts the following technical scheme: in a first aspect, the present invention provides a gas tightness detection method of a gas distribution plate, the gas tightness detection method comprising: Acquiring the use condition of a gas distribution plate for vapor deposition; Setting an air tightness detection parameter according to the use condition; Performing first tightness detection on the gas distribution plate for vapor deposition according to the tightness detection parameters; if the first tightness detection is qualified, using a gas distribution plate for vapor deposition to a preset time under the use condition; And then, carrying out second air tightness detection on the gas distribution plate for vapor deposition according to the air tightness detection parameters, and if the second air tightness detection is qualified, marking the second air tightness detection as qualified. According to the air tightness detection method provided by the invention, the air tightness of the gas distribution plate is effectively detected by optimizing the air tightness detection process, the condition of pseudo qualification in the detection process can be obviously avoided, and the use stability of the gas distribution plate is obviously improved. As a preferred embodiment of the invention, the use conditions include chamber temperature, chamber pressure, feed gas pressure and feed gas flow. As a preferable technical scheme of the invention, the air tightness detection parameters comp