CN-121994848-A - Charge compensation film, charge neutralization device and sample surface analysis equipment

Abstract

The application provides a charge compensation film, a charge neutralization device and sample surface analysis equipment, and particularly relates to the technical field of photoelectron spectrometer analysis. The charge compensation film is applied to sample surface analysis equipment, and sample surface analysis equipment includes loading mechanism and X ray source, and loading mechanism is used for carrying the sample, and X ray source is used for to sample emission X ray. The charge compensation film is arranged in a light path of the X-ray source for irradiating the sample, and is used for generating photoelectrons under the irradiation of the X-ray source so as to reduce positive charges accumulated on the surface of the sample due to the fact that the photoelectrons continuously exit. Therefore, the charge compensation film provided by the application is directly arranged in an X-ray light path, and the structure of the device is simplified. The low-energy photoelectrons generated by the excitation of the charge compensation film can migrate to the surface of the sample and be combined with positive charges accumulated on the surface of the sample, so that the neutralization and compensation of charges are realized.

Inventors

• YU XIUMING
• MAO MINGYANG
• WU ZEBIN

Assignees

• 深圳市新凯来工业机器有限公司

Dates

Publication Date

20260508

Application Date

20260403

Claims (15)

1. 1. A charge compensation film for use in a sample surface analysis apparatus comprising a carrier mechanism for carrying a sample and an X-ray source for emitting X-rays towards the sample, comprising: The charge compensation film is arranged in a light path of the X-ray source irradiating the sample, and is used for generating photoelectrons under the irradiation of the X-ray source so as to reduce positive charges accumulated on the surface of the sample due to the fact that the photoelectrons continuously exit.
2. 2. The charge compensation film of claim 1, wherein the charge compensation film is made of a metal, and the metal comprises at least one of aluminum, gold, magnesium, silver, or tin.
3. 3. The charge compensation film of claim 2 wherein the thickness of the charge compensation film is less than 10 microns.
4. 4. A charge compensation film according to any one of claims 1 to 3 wherein the size of the charge compensation film is greater than the spot size of the X-ray source impinging on the charge compensation film.
5. 5. A charge compensation film according to any one of claims 1 to 3 wherein the length and width of the charge compensation film are both greater than 200 microns and less than 3mm.
6. 6. A charge neutralization apparatus, comprising: The charge compensation film according to any one of claims 1 to 5; And the mounting base is used for fixedly mounting the charge compensation film.
7. 7. The charge neutralization apparatus of claim 6, wherein the mounting base includes a first mounting member and a second mounting member, the charge compensation film being fixedly mounted between the first mounting member and the second mounting member.
8. 8. The charge neutralizing device of claim 6 wherein the mounting base has an annular step structure defining a hollow region, the charge compensation film being secured to the annular step structure.
9. 9. A sample surface analysis apparatus, comprising: the bearing mechanism is used for bearing the sample; an X-ray source for emitting X-rays toward a sample; and a charge neutralization apparatus according to any one of claims 6 to 8; Wherein the charge neutralization device is arranged in a light path of the X-ray source irradiating the sample.
10. 10. The sample surface analysis device of claim 9, wherein the charge compensation film is closer to the sample than the X-ray source.
11. 11. The sample surface analysis device of claim 10, wherein a distance between the charge compensation film and the sample is in the range of 3-5mm.
12. 12. The sample surface analysis apparatus according to any one of claims 9 to 11, wherein the charge compensation film is perpendicular to an irradiation direction of the X-rays.
13. 13. The sample surface analysis device of any one of claims 9 to 11, wherein the mounting base is fixed to an optomechanical structure in the sample surface analysis device or a cavity of the sample surface analysis device.
14. 14. The sample surface analysis device of claim 13, wherein the optomechanical structure comprises an imaging module for acquiring an image of a sample surface, the mounting base being secured to the imaging module.
15. 15. The sample surface analysis device of claim 13, wherein the optomechanical structure comprises an electron energy analyzer for receiving photoelectrons excited from the sample surface and analyzing energy thereof, the mounting base being secured to the electron energy analyzer.

Description

Charge compensation film, charge neutralization device and sample surface analysis equipment Technical Field The application relates to the technical field of photoelectron spectrometer analysis, in particular to a charge compensation film, a charge neutralization device and sample surface analysis equipment. Background X-ray photoelectron spectroscopy (X-ray Photoelectron Spectroscopy, XPS) has surface analysis techniques, which are mainly used to characterize the surface elements of materials and their chemical states. When the insulator or the semiconductor is measured by XPS, enough electron supplement cannot be obtained due to continuous emission of photoelectrons, positive charges are accumulated on the surface of a sample, the photoelectrons escape from the sample to be bound, the kinetic energy of the emitted photoelectrons is reduced, spectral lines are displaced, and the problems of spectrum front broadening, distortion and the like are caused. In the existing sample surface analysis apparatus, a dual beam neutralization system is generally used to neutralize excess charges on the sample surface, in the dual beam neutralization system, a positively charged argon ion beam with low energy neutralizes negative charges on the sample surface, so that the area of the negatively charged area disappears, and meanwhile, an electron beam with low energy floats on the sample to form an electron cloud, when the positively charged area appears on the sample surface, the electron cloud is attracted by the electric field force to form an electron rain falling to the charged area, so that the electron beam with low energy can easily and accurately reach an analysis position and neutralize the positive charges of the charged area, but the complexity of the sample surface analysis apparatus is increased due to the additional electron gun and ion gun used in the sample surface analysis apparatus. Disclosure of Invention The application provides a charge compensation film, a charge neutralization device and sample surface analysis equipment, which are used for solving the technical problem of how to reduce the complexity of the sample surface analysis equipment. A first aspect of the present application provides a charge compensation film for use in a sample surface analysis apparatus, the sample surface analysis apparatus comprising a carrier mechanism for carrying a sample and an X-ray source for emitting X-rays towards the sample, comprising: The charge compensation film is arranged in a light path of the X-ray source for irradiating the sample, and is used for generating photoelectrons under the irradiation of the X-ray source so as to reduce positive charges accumulated on the surface of the sample due to the fact that the photoelectrons continuously exit. In this embodiment, since the charge compensation film is disposed in the optical path of the sample irradiated by the X-ray source, when the X-ray source works, the emitted X-rays are synchronously irradiated onto the charge compensation film, and the charge compensation film can directly generate photoelectrons under the irradiation of the X-rays, and these photoelectrons can migrate to the surface of the sample and combine with positive charges accumulated on the surface of the sample due to continuous emission of photoelectrons, thereby effectively realizing charge neutralization and compensation of the surface of the sample. Meanwhile, no extra substances (such as ions generated by an ion gun) are introduced, so that the surface of the wafer is prevented from being polluted, and the cleanliness of the surface of the sample can be improved. In one possible embodiment, the material of the charge compensation film is a metal, and the metal includes at least one of aluminum, gold, magnesium, silver, or tin. In this embodiment, since the metal (aluminum, gold, magnesium, silver or tin) has a relatively high photoelectric effect cross section under the irradiation of X-rays, the metal can efficiently absorb X-ray photons and excite a large number of photoelectrons, and can rapidly neutralize positive charges accumulated on the surface of the sample due to the continual emission of photoelectrons, thereby improving the neutralization efficiency of the positive charges. In one possible embodiment, the charge compensation film has a thickness of less than 10 microns. In this embodiment, the charge compensation film thickness is less than 10 microns, and the thin layer structure avoids shielding of X-ray flux, so that not only is sufficient mechanical strength ensured, but also loss of X-ray intensity is reduced. In one possible embodiment, the size of the charge compensation film is larger than the spot size of the X-ray source impinging on the charge compensation film. In this embodiment, the size of the charge compensation film is larger than the size of the spot irradiated on the charge compensation film by the X-ray source, so that the whole area irradiated by